• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.5
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• pp.448-454
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• 2009

Hydrogen was produced from water plasma excited in high frequency (HF) inductively coupled tubular reactor. Mass spectrometry was used to monitor gas phase species at various process conditions, Water dissociation rate depend on the process parameters such as ICP power, $H_{2}O$ flow-rate and process pressure, Water dissociation percent in ICP reactor decrease with increase of chamber pressure, while increase with increase of ICP power and $H_{2}O$ flow rate. The effect of $CH_4$ gas addition to a water plasma on the hydrogen production has been studied in a HF ICP tubular reactor. The main roles of $CH_4$ additive gas in $H_{2}O$ plasma are to react with 0 radical for forming $CO_x$ and CHO and resulting additional $H_2$ production. Furthermore, $CH_4$ additives in $H_{2}O$ plasma is to suppress reverse-reaction by scavenging 0 radical. But, process optimization is needed because $CH_4$ addition has some negative effects such as cost increase and $CO_x$ emission.

• Analytical Science and Technology
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• v.15 no.2
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• pp.120-126
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• 2002

The analytical performance of four commercially-available pneumatic nebulizers(Meinhard, Cross-flow, Babington, ESI PFA) was evaluated using inductively coupled plasma-atomic emission spectrometry (ICP-AES) and ICP-mass spectrometry (ICP-MS) instruments. The performance of an inert concentric nebulizer and a modified conespray nebulizer, made in Korea Research Institute of Standards and Science (KRISS), is compared with that of the four commercial nebulizers. Variation of sample introduction efficiency was investigated as carrier argon pressure and sample uptake rate were changed. Variation of sensitivity, signal stability, blank intensity and oxide/hydride ratios were also studied when the nebulizers were connected to the ICP-MS and ICP-AES instruments. It was found that good analytical result such as high sensitivity, low blank, stable signal and so on can be obtained with judicious selection of the nebulizer depending on the type of sample, sample amount, type of analytical instrument and analyte.

• The Korean Journal of Pharmacology
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• v.19 no.1
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• pp.123-131
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• 1983

1) To delineate the role of central ${\alpha}_2-adrenoceptors$ in the pressor response to raised intracranial pressure(ICP), the influence of yohimbine, an ${alpha}_2-adrenoceptor$ antagonist, on the pressor response to raised ICP was investigated in urethane-anesthetized rabbits. 2) The ICP was raised by infusing saline into a balloon placed in the epidural space. The rise of ICP was slow in the beginning of the infusion but it became sharp as the infusion proceeded. 3) In response to raised ICP, blood pressure(BP) tended to decrease slightly in the beginning and then increased sharply. BP, however, fell abruptly and markedly if ICP was raised further. The maximal pressor response to raised ICP was the increase of $49{\pm}2.4%$ of the original $BP(mean{\pm}SE\;in\;32\;experiments)$, and at this point the volume of saline infused into the balloon was $1.22{\pm}0.15\;ml$, and the ICP $165{\pm}6.4\;mmHg$. 4) Intraventricular yohimbine $(50{\mu}g)$ by itself did not affect BP. After the administration of this dose of yohimbine the increase of both ICP and BP was observed after the infusion of much smaller volume of saline than in the control animals, i.e., after the infusion of $0.83{\pm}0.02\;ml$ of saline the maximal increase of preesor response$(57{\pm}4.5%\;in\;6\;experiments)$ appeared and at this state the ICP was $164{\pm}9.6\;mmHg$. 5) Intraventricular $clonidine(30{\mu}g)$ markedly decreased BP by itself, and in the clonidine-treated rabbits the increase of ICP induced by the infusion was much less than in the control group and the pressor response to raised ICP was hardly seen. 6) The hypotensive effect of intraventricular clonidine was reversed by a susequent intraventricular $yohimbine(500\;{\mu}g)$. At this state the pressor response to raised ICP appeared as in the control animals. 7) These results show that the pressor response to raised ICP was facilitated when ${\alpha}_2-adrenoceptors$ in the rabbit brain was blocked by yohimbine and that yohimbine antagonized the inhibitory effect of clonidine on the pressor response to raised ICP.

• Journal of Trauma and Injury
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• v.30 no.4
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• pp.140-144
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• 2017

Purpose: The optic nerve sheath diameter (ONSD) measured by ultrasonography is among the indicators of intracranial pressure (ICP) elevation. However, whether ONSD measurement is useful for initial treatment remains controversial. Thus, this study aimed to investigate the relationship between ONSD measured by computed tomography (CT) and ICP in patients with traumatic brain injury (TBI). Methods: A total of 246 patients with severe trauma from January 1, 2015 until December 31, 2015 were included in the study. A total of 179 patients with brain damage with potential for ICP elevation were included in the TBI group. The remaining 67 patients comprised the non-TBI group. A comparison was made between the two groups. Receiver operating characteristic (ROC) curve analysis was performed to determine the accuracy of ONSD when used as a screening test for the TBI group including those with TBI with midline shift (with elevated ICP). Results: The mean injury severity score (ISS) and glasgow coma scale (GCS) of all patients were $24.2{\pm}6.1$ and $5.4{\pm}0.8$, respectively. The mean ONSD of the TBI group ($5.5{\pm}1.0mm$) was higher than that of the non-TBI group ($4.7{\pm}0.6mm$). Some significant differences in age ($55.3{\pm}18.1$ vs. $49.0{\pm}14.8$, p<0.001), GCS ($11.7{\pm}4.1$ versus $13.3{\pm}3.0$, p<0.001), and ONSD ($5.5{\pm}1.0$ vs. $4.7{\pm}0.6$, p<0.001) were observed between the TBI and the non-TBI group. An ROC analysis was used to assess the correlation between TBI and ONSD. Results showed an area under the ROC curve (AUC) value of 0.752. The same analysis was used in the TBI with midline shift group, which showed an AUC of 0.912. Conclusions: An ONSD of >5.5 mm, measured on CT, is a good indicator of ICP elevation. However, since an ONSD is not sensitive enough to detect an increased ICP, it should only be used as one of the parameters in detecting ICP along with other screening tests.

• Journal of Yeungnam Medical Science
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• v.8 no.2
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• pp.35-44
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• 1991

Recently many authors have reported about the relationship of the volumes of hemorrhage in the brain parenchyme, hemorrhagic sites, optimal operation time, and the effects of mannitol and steroid on control of ICP to clinical manifestations. Many attempts to measue ICP in hydrocephalus, brain tumor, and head injury have been reported. But the measurements of intracranial pressure in spontaneous intracerebral hemorrhage are rare. Intracranial pressure was monitored prospectively in 30 patients who had stereotaxic surgery for spontaneous intracerebral hemorrhage. The results are as follows. 1. Intracranial pressure was increased in high $PaCO_2$. 2. There were no correlation in ICP, rebleeding and ADL at discharge(P > 0.05). 3. ICP was the most high level in 72 hours after operation. 4. There was 63.2% decrease in ICP after litigation with 6000 IU urokinase in the site of hemorrhage. 5. There was no correlation between the numbers of natural drainage and ADL at discharge(P > 0.05). 6. The higher the initial GCS, the higher the Postoperative GCS.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.8 no.3
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• pp.487-492
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• 1998

Ultrafine particles of $SnO_2$ or $(Sn,Ti)O_2$ and thin films of $SnO_2$ were synthesized by introducing aqueous tin chloride solution into a high temperature argon inductively coupled plasma (ICP) generated under ambient pressure (the spray-ICP technique). As-deposited $SnO_2$ particles from each concentration of solution were all tetragonal $SnO_2$ crystallline phase and their mean size decreased in proportion to the increase of solution concentration. The mean size of $SnO_2$ particles was in the 10~40 nm range.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.88-88
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• 2003

Optical Emission Spectroscopy(OES) is a very important technology for real-time monitoring of plasma in a reactor during dry etching process. OES technology is non-invasive to the plasma process. It can be used to collect information on excitation and recombination between electrons and ions in the plasma. It also helps easily diagnose plasma intensity and monitor end-point during plasma etch processing. We studied high density planar inductively coupled BCl$_3$ and BCl$_3$/Ar plasma with an OES as a function of processing pressure, RIE chuck power, ICP source power and gas composition. The scan range of wavelength used was from 400 nm to 1000 nm. It was found that OES peak Intensity was a strong function of ICP source power and processing pressure, while it was almost independent on RIE chuck power in BCl$_3$-based planar ICP processes. It was also worthwhile to note that increase of processing pressure reduced negatively self-induced dc bias. The case was reverse for RIE chuck power. ICP power and gas composition hardly had influence on do bias. We will report OES results of high density planar inductively coupled BCl$_3$ and BCl$_3$/Ar Plasma in detail in this presentation.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.361-365
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• 2003

Planar Inductively Coupled Plasma (PICP) etching of InGaP was performed in $BCl_3,\;BCl_3/Ar\;and\;BCl_3/Ne$ plasmas as a function of ICP source power ($0\;{\sim}\;500\;W$), RIE chuck power ($0\;{\sim}\;150\;W$), chamber pressure ($5\;{\sim}\;15\;mTorr$) and gas composition of $BCl_3/Ar\;and\;BCl_3/Ne$. Total gas flow was fixed at 20 sccm (standard cubic centimeter per minute). Increase of ICP source power and RIE chuck power raised etch rate of InGaP, while that of chamber pressure reduced etch rate. We also found that some addition of Ar and Ne in $BCl_3$ plasma improved etch rate of InGaP. InGaP etch rate was varied from $1580\;{\AA}/min$ with pure $BC_3\;to\;2800\;{\AA}/min$ and $4700\;{\AA}/min$ with 25 % Ar and Ne addition, respectively. Other process conditions were fixed at 300 W ICP source power, 100 W RIE chuck power and 7.5 mTorr chamber pressure. SEM (scanning electron microscopy) and AFM (atomic force microscopy) data showed vertical side wall and smooth surface of InGaP at the same condition. Proper addition of noble gases Ar and Ne (less than about 50 %) in $BCl_3$ inductively coupled plasma have resulted in not only increase of etch rate but also minimum preferential loss and smooth surface morphology by ion-assisted effect.

• Journal of the Korean institute of surface engineering
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• v.37 no.3
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• pp.164-168
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• 2004

Polycrystalline silicon thin films were deposited by inductively coupled plasma (ICP) assisted magnetron sputtering using a gas mixture of Ar and $H_2$ on a glass substrate at $250^{\circ}C$. At constant Ar mass flow rate of 10 sccm, the working pressure was changed between 10mTorr and 70mTorr with changing $H_2$ flow rate. The effects of RF power applied to ICP coil and $Ar/H_2$ gas mixing ratio on the properties of the deposited Si films were investigated. The crystallinity was evaluated by both X-ray diffraction and Raman spectroscopy. From the results of Raman spectroscopy, the crystallinity was improved as hydrogen mixing ratio was increased up to$ Ar/H_2$=10/16 sccm; the maximum crystalline fraction was 74% at this condition. When RF power applied to ICP coil was increased, the crystallinity was also increased around 78%. In order to investigate the surface roughness of the deposited films, Atomic Force Microscopy was used.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.179-179
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• 2012

Low pressure radio-frequency glow discharges are investigated using theoretical modeling and various experimental diagnostic methods. In the calculations, global models and transformer models are developed to understand the chemical kinetics as well as the electrical properties such as the effective collision frequency, the heating mechanism and the power transferred to the plasma electrons. In addition, Boltzmann equation solver is used to compensate the effect of the electron energy distribution function (EEDF) shape in the global model, and the general expression of energy balance for non-Maxwellian electrons is developed. In the experiments, a number of traditional plasma diagnostic methods are used to compare with calculated results such as Langmuir probe, optical emission spectroscopy (OES), optical absorption spectroscopy (OAS) and two-photon absorption laser-induced fluorescence (TALIF). These theoretical and experimental methods are applied to understand several interesting phenomena in low pressure ICP discharges. The chemical and physical properties of low pressure ICP discharges are described and the applications of these methods are discussed.