• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2000년도 하계종합학술대회 논문집(2)
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• pp.282-285
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• 2000

Four helical resonators are distributed in a 2 ${\times}$ 2 array by modifying upper part of the conventional reactive ion etching(RIE) type LCD etcher in order to prepare a large area plasma source. Since the resonance condition of the RF signal to the helical antenna, one RF power supply is used for delivering the power efficiently to all four helical resonators without an impedance matching network Previous work of 2 ${\times}$ 2array inductively coupled plasma(ICP)requires one matching circuit to each ICP antenna for more efficient power deliverly Distributions of ion density and electron temperature are measured in terms of chamber pressure, gas flow rate and RF power . By adjusting the power distribution among the four helical resonator units, argon plasma density of higher than 10$\^$17/㎥ with the uniformity of better than 7％ can be obtained in the 620 ${\times}$ 620$\textrm{mm}^2$ chamber.

• Transactions on Electrical and Electronic Materials
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• 제18권2호
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• pp.74-77
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• 2017

In this work, we investigated the etching characteristics of TaNO thin films and the selectivity of TaNO to $SiO_2$ in an $O_2$/CF4/Ar inductively coupled plasma (ICP) system. The maximum etch rate of TaNO thin film was 297.1 nm/min at a gas mixing ratio of O2/CF4/Ar (6:16:4 sccm). At the same time, the etch rate was measured as a function of the etching parameters, such as the RF power, DC-bias voltage, and process pressure. X-ray photoelectron spectroscopy analysis showed the efficient destruction of the oxide bonds by the ion bombardment, as well as the accumulation of low volatile reaction products on the etched surface. Based on these data, the ion-assisted chemical reaction was proposed as the main etch mechanism for the $CF_4$-containing plasmas.

• 한국전기전자재료학회논문지
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• 제16권5호
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• pp.424-428
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• 2003

The channel of a superconducting flux flow transistor has been fabricated with plasma etching method using a inductively coupled plasma etching. The ICP conditions then were ICP Power of 450 W, rf chuck power of 150 W, the pressure in chamber of 5 mTorr, and Ar : Cl$_2$=1:1. Especially, over the 5 mTorr, the superconducting thin films were not etched. The channel etched by plasma gas showed the critical temperature over 85 K. The critical current of the SFFT was altered by varying the external applied current. As the external applied current increased from 0 to 12 mA, the critical current decreased from 28 to 22 mA. Then the obtained trans-resistance value was smaller than 0.1 $\Omega$ at a bias current of 40 mA.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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• pp.1659-1660
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• 2006

After end of the 20th environmental problem was became issue. So about mercury free lighting sources are being studied very much. In this paper, a mercury and electrode free bulb was designed. in this bulb was injected mixed of Xe, Ne and Kr Gases. and then the bulb was discharged by 13.56MHz RF Power after spectrum, color coordinates and brightness were measured by spectrum meter CS-1000. Measured results were compared and analyzed, also analysis was able to do a characteristic of a gas defensive fight in proportion to a mixing ratio. Therefore the most of high brightness which was 4500cd/m2 was gained in 1:1 ratio of Xe:Ne at 60W input power.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.319-320
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• 2008

본 연구에서는 대기압하에서 고품질의 산화막 증착을 목적으로 TEOS(Tetraethyl Orthosilicate)를 이용하여 APCVD법(Atmospheric Pressure CVD)으로 실리콘 산화막을 증착하고 하였으며, 특성 비교를 위하여 ICP-CVD를 이용하여 $SiH_4$ 와 $N_2O$ source gas를 이용하여 산화막을 증착하였다. 트랜지스터 제작후 Semiconductor measurement system을 이용하여 TFT의 전기적 특성을 측정 하였으며, 결과적으로 유기 사일렌을 사용한 경우 보다 우수한 전기적 특성을 확인할 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.579-579
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• 2013

We study on Argon metastable and 4p state neutral atom density in magnetized ICP Helicon plasmas by Laser Induced Fluorescence and plasma emission. The results show that metastable density is too low at the center of chamber due to significant neutral depletion. Otherwise, 4p state is high at the center of chamber because electron density is very high. Power and pressure dependence of metastable and 4p state neutral atom have been spatially measured in the radial direction of cylindrical chamber.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.380-381
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• 2012

Bioinspired sea urchin-like structures were fabricated on silicon by inductively coupled plasma (ICP) etching using lens-like shape hexagonally patterned photoresist (PR) patterns and subsequent metal-assisted chemical etching (MaCE) [1]. The lens-like shape PR patterns with a diameter of 2 ${\mu}m$ were formed by conventional lithography method followed by thermal reflow process of PR patterns on a hotplate at $170^{\circ}C$ for 40 s. ICP etching process was carried out in an SF6 plasma ambient using an optimum etching conditions such as radio-frequency power of 50 W, ICP power of 25 W, SF6 flow rate of 30 sccm, process pressure of 10 mTorr, and etching time of 150 s in order to produce micron structure with tapered etch profile. 15 nm thick Ag film was evaporated on the samples using e-beam evaporator with a deposition rate of 0.05 nm/s. To form Ag nanoparticles (NPs), the samples were thermally treated (thermally dewetted) in a rapid thermal annealing system at $500^{\circ}C$ for 1 min in a nitrogen environment. The Ag thickness and thermal dewetting conditions were carefully chosen to obtain isolated Ag NPs. To fabricate needle-like nanostructures on both the micron structure (i.e., sea urchin-like structures) and flat surface of silicon, MaCE process, which is based on the strong catalytic activity of metal, was performed in a chemical etchant (HNO3: HF: H2O = 4: 1: 20) using Ag NPs at room temperature for 1 min. Finally, the residual Ag NPs were removed by immersion in a HNO3 solution. The fabricated structures after each process steps are shown in figure 1. It is well-known that the hierarchical micro- and nanostructures have efficient light harvesting properties [2-3]. Therefore, this fabrication technique for production of sea urchin-like structures is applicable to improve the performance of light harvesting devices.

• 한국진공학회지
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• 제7권2호
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• pp.161-168
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• 1998

Taguchi가 제안한 강건설계 및 연구자의 주관에 의존하는 통상적인 실험방법을 병 행하여 CH4/H2 유도결합 고밀도 플라즈마를 이용한 InP 소재의 반응성이온에칭에 있어 공 정변수들이 식각특성에 미치는 영향을 분석하고 적정조건을 도출하였다. 연구 결과 ICP전력 은 표면거칠기와 측벽수직도, bias 전력은 식각속도와 수직도에, CH4분율은 수직도와 식각 속도, 석영창과 시료 사이의 거리는 표면 거칠기에 영향을 주는 변수로 작용하였고, 식각속 도에 가장 크게 영향을 주는 변수는 공정압력임을 알 수 있었다. 결과적으로 ICP Power 700W, bias Power 150W, 시편/coil 거리 14cm, 압력 7.5mTorr, 15% $CH_4$의 적정조건에서 시간당 약 3.1$\mu\textrm{m}$의 식각속도와 미려한 표면을 얻어, 기존의 반응성 이온 식각(RIE)과 비교하 여 1.5배 이상의 식각속도를 얻을 수 있었다.

• 한국의류산업학회지
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• 제19권5호
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• pp.602-607
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• 2017

This study was undertaken to compare the gait characteristics between the Korean elderly and young adults, we measured the plantar pressure and contact time of gait with barefoot along a walkway at their preferred walking speed. The results indicate that older people exhibited significantly less plantar pressure than young adult in all 3 regions (FF, MF and RF) and significantly less time % on the initial contact phase (ICP), forefoot push-off phase (FFPOP) and significantly more % forefoot contact phase (FFCP) and foot flat phase (FFP). The converted plantar pressure value to percentage, it showed more pressure in forefoot (FF) in the elderly person than the young adults. It could be explained that the forward shifting in plantar pressure are associated with a more flexed posture of elderly such as actual stabilizing fearrelated adaptations. Longer total foot contact time in the elderly means that the old people show the decreased gait velocity. In other words, lower velocity was found to be associated with pre-existing fear of falling. With longer contact time and slower stepping movement, the elderly become more unstable. With these findings, it could be confirmed that there were significant changes in foot characteristics which contribute to alter the plantar pressure and contact time during gait with advancing age. Further research is required to establish possible links to risk of falling and development of footwear in the elderly adults.

• 생약학회지
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• 제38권1호
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• pp.50-55
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• 2007

This study was designed to investigate the effects KH-204 on erectile dysfunction in hyperlipidemic rat. KH-204 has been evaluated antihyperlipidemic and antierectile dysfunction effects on experimental hyperlipidemic rats induced by high fat diet. After oral administration of the water extract KH-204 (50, 100, 200, 300 mg/kg) to hyperlipidemic rats for 8 weeks, the variables including body weight, total cholesterol, HDL and LDL levels in serum, the expression of eNOS and nNOS in penis were measured. And erectile function was determined by measurement of intracavernosal pressure (ICP) and maximal arterial pressure (MAP) after electrical stimulation of the cavernosal nerve. Oral administration of KH-204 significantly inhibited the increases of serum total cholesterol and LDL-cholesterol levels and the decreased of serum HDL-cholesterol levels in hyperlipidemic rats induced by high fat diet. The penile expression level of the two enzyme (eNOS, nNOS) were increased significantly after oral administration of the KH-204 50 mg/kg. Erectile function after 10 volts stimulation was significantly decreased in the hyperlipidemic rat compared with the normal rat, but increased in KH-204 group compared with hyperlipidemic group. These results suggest that KH-204 is effective for erectile dysfunction in hyperlipidemia.