• 한국주조공학회지
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• 제28권3호
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• pp.124-128
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• 2008

The nitride layer was formed on Ti and Ti-10 wt.%Ta-10 wt.%Nb alloy by a plasma nitriding method. Temperature was selected as the main experimental parameter for plasma nitriding. XRD, EDX, and hardness test were employed to analyze the evolution and material properties of the layer. The SEM observation of TiN nitride layer revealed that the thickness of nitride layer tended to increase with increasing temperature. ${\delta}-TiN$, ${\varepsilon}-Ti_{2}N$ and ${\alpha}-Ti$ phases were detected by XRD analysis and the preferred orientation of TiN nitride layer was obviously observed at (220) plane with increasing temperature. From XRD analysis after step polishing the nitride specimens treated at $850^{\circ}C$, as polishing from the surface, TiN and $Ti_{2}N$ phases decreased gradually. After polishing the surface by $4{\um}m$, a small amount of $Ti_{2}N$ and ${\alpha}-Ti$ phases were observed. The adhesive strength test result indicated that adhesive strength increased with increasing temperature.

• 대한기계학회논문집A
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• 제29권3호
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• pp.432-438
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• 2005

CMP characteristics such as material removal rate and edge effect were measured and investigated in accordance with pad grooving effect, groove width, depth and pitch. GSQ (Groove Stiffness Quotient) and GFQ (Groove Flow Quotient) were proposed to estimate pad grooving characteristics. GSQ is defined as groove depth(D) divided by pad thickness(T) and GFQ is defined as groove width(W) divided by groove pitch(P). As GFQ value increased, material removal rate increased some point but gradually saturated. It seems that material removal rate is not affected by each parameter respectively but by interaction of these parameters such as groove dimensions. In addition, an increase in GFQ and GSQ causes edge effect to be improved. Because, pad stiffness decreases as GSQ and GFQ increase. In conclusion, groove influences relative pad stiffness although original mechanical properties of pad are unchanged by grooving. Also, it affects the flow of slurry that has an effect on the lubrication regime and polishing results. The change of groove dimensions has influence on pad stiffness and slurry flow, so that polishing results such as removal rate and edge effect become changed.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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• pp.228-232
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• 2002

The rise throughput and the stability in the device fabrication can be obtained by applying chemical mechanical polishing(CMP) process in 0.18 ${\mu}m$ semiconductor device. However it does have various problems due to the CMP equipment. Especially, among the CMP components, process variables are very important parameters in determining removal rate and non-uniformity. In this paper, We studied the DOE(design of experiment) method for the optimized CMP process. Various process variations, such as table and head speed, slurry flow rate and down force, have investigated in the viewpoint of removal rate and non-uniformity. Through the above DOE results, we could set-up the optimal process parameters.

• 열처리공학회지
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• 제2권2호
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• pp.33-37
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• 1989

In order to improve hardness uniformity of standard-hardness blocks. experimental procedure was designed using Taguchi Method. For this purpose the following factors were studied: austenitizing temperature, tempering condition, grinding condition, subzero treatment, lapping time, $15{\mu}m$ polishing time, final polishing time. These factors were processed and then ten hardness values were measured on each specimen. SN (signal to noise) ratio for each condition was calculated with standard variations of these values. Finally, from the calculated value of ANOVA on SN ratios, the lapping time was found to be the main factor Better uniformity with longer lapping time implies that residual stress that was formed after quenching is a dominent parameter that affects on the uniformity of hardness. Therefore, step-quenching method was adapted to minimize the residual stress. By this modification of quenching procedure, the hardness uniformity was improved remarkably and the yield ratio was increased from 55% to 88%.

• Restorative Dentistry and Endodontics
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• 제42권1호
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• pp.9-18
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• 2017

Objectives: This study evaluated color differences (${\Delta}Es$) and translucency parameter changes (${\Delta}TPs$) of various computer-aided design/computer-aided manufacturing (CAD/CAM) blocks after immersion in coffee. Materials and Methods: Eight CAD/CAM blocks and four restorative composite resins were evaluated. The CIE $L^{\ast}a^{\ast}b^{\ast}$ values of 2.0 mm thick disk-shaped specimens were measured using the spectrophotometer on white and black backgrounds (n = 6). The ${\Delta}Es$ and ${\Delta}TPs$ of one day, one week, and one month immersion in coffee or water were calculated. The values of each material were analyzed by two-way ANOVA and Tukey's multiple comparisons (${\alpha}=0.05$). The ${\Delta}Es$ after prophylaxis paste polishing of 1 month coffee immersion specimens, water sorption and solubility were also evaluated. Results: After one month in coffee, ${\Delta}Es$ of CAD/CAM composite resin blocks and restorative composites ranged from 1.6 to 3.7 and from 2.1 to 7.9, respectively, and ${\Delta}TPs$ decreased. The ANOVA of ${\Delta}Es$ and ${\Delta}TPs$ revealed significant differences in two main factors, immersion periods and media, and their interaction except for ${\Delta}Es$ of TEL (Telio CAD, Ivoclar Vivadent). The ${\Delta}Es$ significantly decreased after prophylaxis polishing except GRA (Gradia Block, GC). There was no significant correlation between ${\Delta}Es$ and water sorption or solubility in water. Conclusions: The ${\Delta}Es$ of CAD/CAM blocks after immersion in coffee varied among products and were comparable to those of restorative composite resins. The discoloration of CAD/CAM composite resin blocks could be effectively removed with prophylaxis paste polishing, while that of some restorative composites could not be removed.

• 산업기술연구
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• 제17권
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• pp.5-10
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• 1997

Fatigue tests were performed to investigate how much vary the fatigue limit under the different surface conditions on Carbon Steel(SM55C). Four types of specimen which have different surface roughness each other, Series A by turning, Series B by grinding, Series C by polishing and Series D by roller finishing showed the fatigue limit of 265, 320, 335 and 365MPa, respectively. Series D show 36% higher than Series A, which is caused by compressive residential stress on the surface. Therefore, roller finishing machining is helpful not only increase the fatigue limit but also improve the surface roughness. Moreover, to predict the fatigue limit under the conditions of knowing surface roughness and hardness of specimen, ${\sqrt{area}}$ area parameter method is very useful.

• 한국전기전자재료학회논문지
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• 제15권11호
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• pp.939-945
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• 2002

The rise throughput and the stability in the device fabrication can be obtained by applying chemical mechanical polishing (CMP) process in 0.18 $\mu\textrm{m}$ semiconductor device. However, it still has various problems due to the CMP equipment. Especially, among the CMP components, process variables are very important parameters in determining the removal rate and non-uniformity. In this paper, we studied the DOE (design of experiment) method in order to get the optimized CMP equipment variables. Various process parameters, such as table and head speed, slurry flow rate and down force, have investigated in the viewpoint of removal rate and non-uniformity. Through the above DOE results, we could set-up the optimal CMP process parameters.

• 수산해양기술연구
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• 제38권1호
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• pp.79-88
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• 2002

SUS420J2강은 내식성이 우수하고 강도가 커서 어류가공용 기계의 재료로써 사용되어지고 있다. 그러나 이 역시 환경의 영향에 의하여 열화되고 있으며, 특히 후처리의 조건에 따라 그 정도가 심해질 수도 있다는 것을 알 수 있었다. 열처리 후 전해연마한 경우에 있어서는 부식의 정도가 미약하였으나 단일 후처리방법을 사용하였을 때에는 입계부식 및 공식의 영향이 커지고 부식생성물의 생성이 용이해졌다. 실험의 결과로부터 열처리후 전해연마한 SUS420J2강의 부식정도가 가장 덜 민감하게 나타났으므로, 어류 전처리 가공기계용 재료로서 SUS420J2강의 사용에 있어서는 열처리 후 전해연마의 방법으로 후처리를 하는 것이 바람직하다고 생각된다. 금후, 경도 및 표면상태의 파라미터(parameter)를 고려한 부식시험과 현장에서의 외력의 작용을 고려한 응력부식 실험이 결과도 병행되어져야만 한다고 생각한다

• Tribology and Lubricants
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• 제30권3호
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• pp.139-145
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• 2014

Nowadays, most micro-patterns are manufactured during flow line production. However, a conventional rotary chemical mechanical polishing (CMP) system has a limited throughput for the fabrication of large and flexible electronics. To overcome this problem, we propose a novel linear roll-CMP system for the planarization of large-area electronics. In this paper, we present a statistical analysis on the linear roll-CMP process of copper-clad laminate (CCL) to determine the impacts of process parameters on the material removal rate (MRR) and its non-uniformity (NU). In the linear roll-CMP process, process parameters such as the slurry flow rate, roll speed, table feed rate, and down force affect the MRR and NU. To determine the polishing characteristics of roll-CMP, we use Taguchi's orthogonal array L16 (44) for the experimental design and F-values obtained by the analysis of variance (ANOVA). We investigate the signal-to-noise (S/N) ratio to identify the prominent control parameters. The "higher is better" for the MRR and "lower is better" for the NU were selected for obtaining optimum CMP performance characteristics. The experimental and statistical results indicate that the down force and roll speed mainly affect the MRR and the down force and table feed rate determine the NU in the linear roll-CMP process. However, over 186.3 N of down force deteriorates the NU because of the bending of substrate. Roll speed has little relationship to the NU and the table feed rate does not impact on the MRR. This study provides information on the design parameter of roll-CMP machine and process optimization.

• 대한치과교정학회지
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• 제53권3호
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• pp.139-149
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• 2023

Objective: To assess the color stability and translucency of full cubic stabilized zirconia (FSZ) following orthodontic bonding with different surface treatments and coffee thermocycling (CTC). Methods: This in vitro study was conducted on 120 disc-shaped specimens of FSZ. Thirty specimens were selected as the control group and remained intact. The remaining specimens were randomly divided into three groups based on the type of surface treatment (n = 30): airborne particle abrasion (APA), silica-coating (CoJet), and carbon dioxide (CO₂) laser. After metal bracket bonding in the test groups, debonding and polishing were performed. Subsequently, all specimens underwent CTC (10,000 cycles). Color parameters, color difference (ΔE₀₀), and translucency parameter (TP) were measured three times at baseline (t0), after debonding and polishing (t1), and after CTC (t2). Data were statistically analyzed (α = 0.05). Results: Significant difference existed among the groups regarding ΔE₀₀t0t2 (p < 0.001). The APA group showed minimum (ΔE₀₀ = 1.15 ± 0.53) and the control group showed maximum (ΔE₀₀ = 0.19 ± 0.02) color stability, with no significant difference between the laser and CoJet groups (p = 0.511). The four groups were significantly different regarding ΔTPt0t2 (p < 0.001). Maximal increases in TP were noted in the CoJet (1.00 ± 0.18) and APA (1.04 ± 0.38) groups while minimal increase was recorded in the control group (0.1 ± 0.02). Conclusions: Orthodontic treatment makes zirconia restorations susceptible to discoloration and increased translucency. Nonetheless, the recorded ΔE₀₀ and ΔTP did not exceed the acceptability threshold.