• The Journal of Advanced Prosthodontics
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• v.12 no.3
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• pp.150-156
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• 2020

PURPOSE. The aim of this study was to evaluate the effect of different surface finishing processes on the color stabilities of lithium disilicate glass-ceramics, zirconia-reinforced lithium silicate ceramics, and resin nanoceramics after artificial ageing. MATERIALS AND METHODS. 216 samples were prepared from 3 different CAD/CAM materials (LAVA Ultimate, IPS e.max CAD, VITA Suprinity) with A1 HT color at a size of 14 × 12 mm and a thickness of 0.5 ± 0.05 mm. Color measurements of the samples were performed with a spectrophotometer using color parameters and CIE Lab color system on a gray backing between baseline color and after 5000 cycles of artificial ageing in 4 stages (i.e. the first measurement before the treatment, the second measurement after polishing, the third measurement after cement application, and the fourth measurement after artificial ageing). The results were evaluated using the Variance analysis and Fisher's LSD test. RESULTS. Resin nanoceramics (LU) exhibited higher color change values than zirconia-reinforced lithium silicate (VS) and lithium disilicate (EC) ceramics after artificial ageing. Manual polishing and glazing resulted in similar color change for LU and VS (P>.05). In the EC group, glazing provided statistically different results as compared to the manual polishing and control groups (P<.05). Among the ceramic groups, color change values of the subgroup, which was treated by glazing, of the zirconia-reinforced lithium silicate (VS) and lithium disilicate (EC) samples were below the clinically acceptable level (ΔE < 3.5). CONCLUSION. The lowest color change for all stages was observed in Vita Suprinity.

• The Journal of Advanced Prosthodontics
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• v.5 no.4
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• pp.382-387
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• 2013

PURPOSE. Although several surface treatments have been recently investigated both under in vitro and in vivo conditions, controversy still exists regarding the selection of the most appropriate zirconia surface pre-treatment. The purpose of this study was to evaluate the effect of alumina (Al) and aluminium nitride (AlN) coating on the shear bond strength of adhesive resin cement to zirconia core. MATERIALS AND METHODS. Fifty zirconia core discs were divided into 5 groups; air particle abrasion with 50 ${\mu}m$ aluminum oxide particles ($Al_2O_3$), polishing + Al coating, polishing + AlN coating, air particle abrasion with 50 ${\mu}m$ $Al_2O_3$ + Al coating and air particle abrasion with 50 ${\mu}m$ $Al_2O_3$ + AlN coating. Composite resin discs were cemented to each of specimens. Shear bond strength (MPa) was measured using a universal testing machine. The effects of the surface preparations on each specimen were examined with scanning electron microscope (SEM). Data were statistically analyzed by one-way ANOVA (${\alpha}$=.05). RESULTS. The highest bond strengths were obtained by air abrasion with 50 ${\mu}m$ $Al_2O_3$, the lowest bond strengths were obtained in polishing + Al coating group (P<.05). CONCLUSION. Al and AlN coatings using the reactive magnetron sputtering technique were found to be ineffective to increase the bond strength of adhesive resin cement to zirconia core.

• Restorative Dentistry and Endodontics
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• v.25 no.3
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• pp.482-486
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• 2000

The purpose of the present study was first, to evaluate the relationship between composite surface conversion and surface discoloration, second, to know if there was difference in surface discoloration between celluloid-strip-finished composite surface and polished surface. In addition, the discoloration of composite surface was also evaluated with visual inspection or digital camera with high resolution monitor, Z100, Tetric Ceram, Spectrum, and Aelitfil were used. The composite surfaces were celluloid-strip finished (group 1), polished (group 2), celluloid-strip finished under nitrogen gas purging (group 3) or only light cured without finishing or polishing under nitrogen gas purging (group 4). The microhardness of each samples were also measured in each group. The samples of each group were also divided into 4 subgroup whether they were immediately placed in disclosing solution (0.2% Elythrosin, pH 7.0) (subgroup1), 1 day after light curing(subgroup 2), 3day after light curing(subgroup 3) or 7 day after light curing(subgroup 4). The computer controlled spectrophotometer was used to determine CIELAB coordinates ($L^*$, $a^*$, $b^*$). The amounts of color difference were compared. The results were as follows; 1. There was no difference in discoloration between celluloid strip finished composite surface and polished surface. 2. The samples discolored more when they were placed in disclosing solution immediately after polymerization than other groups. 3. When the samples were light cured under nitrogen gas purging and without polishing process, they discolored more than other groups even though they showed higher micro hardness. 4. With visual inspection or digital camera, only a limited information was available in detecting composite surface discoloration.

• Restorative Dentistry and Endodontics
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• v.28 no.5
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• pp.369-377
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• 2003

The aim of this study was to evaluate the effect of two polishing methods and chemical conditioning on the surface of hybrid composites. Ninety cylindrical specimens (diameter：8mm, depth：2mm) were made with three hybrid composites-Filtek Z250, Tetric Ceram. DenFil. Specimens for each composite were randomly divided into three treatment subgroups $^{\circled1}$ Mylar strip (no treatment). $^{\circled2}$ Sof-Lex XT system, $^{\circled3}$ PoGo system. Average surface roughness(Ra) was taken using a surface profilometer at the time of setting and after immersion into 0.02N lactic acid for 1 week and 1 month. Representative specimens were examined by scanning electron microscopy. The data were analyzed using ANOVA and Scheffe's tests at 0.05% significance level. The results were as follows：1. Mylar strip resulted in smoother surface than PoGo and Sof-Lex system (p<0.001). Sof-Lex system gave the worst results. 2. Tetric Ceram was smoother than DenFil and Z250 when cured under only mylar strip. However, it was significantly rougher than other materials when polished with PoGo system. 3. All materials showed rough surface after storage in 0.02N lactic acid, except groups polished with a PoGo system. The PoGo system gave a superior polish than Sof-Lex system for the three composites. However. the correlation to clinical practice may be limited, since there are several processes. such as abrasive, fatigue, and corrosive mechanisms. Thus. further studies are needed for polishing technique under in vivo conditions.

• Tribology and Lubricants
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• v.35 no.5
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• pp.274-285
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• 2019

Chemical mechanical polishing (CMP), which is a material removal process involving chemical surface reactions and mechanical abrasive action, is an essential manufacturing process for obtaining high-quality semiconductor surfaces with ultrahigh precision features. Recent rapid growth in the industries of digital devices and semiconductors has accelerated the demands for processing of various substrate and film materials. In addition, to solve many issues and challenges related to high integration such as micro-defects, non-uniformity, and post-process cleaning, it has become increasingly necessary to approach and understand the processing mechanisms for various substrate materials and abrasive particle behaviors from a tribological point of view. Based on these backgrounds, we review recent CMP R&D trends in this study. We examine experimental and analytical studies with a focus on substrate materials and abrasive particles. For the reduction of micro-scratch generation, understanding the correlation between friction and the generation mechanism by abrasive particle behaviors is critical. Furthermore, the contact stiffness at the wafer-particle (slurry)-pad interface should be carefully considered. Regarding substrate materials, recent research trends and technologies have been introduced that focus on sapphire (${\alpha}$-alumina, $Al_2O_3$), silicon carbide (SiC), and gallium nitride (GaN), which are used for organic light emitting devices. High-speed processing technology that does not generate surface defects should be developed for low-cost production of various substrates. For this purpose, effective methods for reducing and removing surface residues and deformed layers should be explored through tribological approaches. Finally, we present future challenges and issues related to the CMP process from a tribological perspective.

• Journal of Korea Technical Association of The Pulp and Paper Industry
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• v.44 no.4
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• pp.16-24
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• 2012

To characterize the coating structure, diverse methods such as mercury intrusion, nitrogen adsorption and oil absorption methods have been developed and widely employed. These indirect techniques, however, have some limitation to explain the actual coating structure. Recently microscopic observation methods have been tried for analyzing structural characteristics of coating layers. Preparation of the undamaged cross section of a coating layer is essential for obtaining high quality image for analysis. In this study, distortion-free cross-section of the coating layer was prepared using a grinding and polishing technique. The coated paper was embedded in epoxy resin and cured. After curing the resin block it was ground with abrasive papers and then polished with diamond particle suspension and nylon cloth. Polished coating layer was sufficient enough to obtain undamaged cross sectional images with scanning electron microscope under backscattered electron image mode. In addition, the SEM images allowed distinction of the coating layer components. Also S/B latex film formed between pigment particles was visualized by osmium tetroxide staining. Pore size distribution and pore orientation were evaluated by image analysis from SEM cross-sectional images.

• Transactions of the Korean Society of Automotive Engineers
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• v.25 no.3
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• pp.389-396
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• 2017

Restorations of automotive parts have been done ever since the first vehicle was produced. Because the most expensive parts of a vehicle are in the engine system, there have been various restoration methods developed for engine parts. In the case of commercial diesel engines, the fuel injection device is a key and expensive component. It also has a significant effect on vehicle performance. In particular, reduced engine power and increased exhaust gas emissions may result from mechanical damage due to abrasion of the spill valve in the fuel injection system of a diesel engine. In this paper, restoration techniques for damaged parts are applied to restore the abrasion of a spill valve of fuel injection, also called as the "unit injector", of commercial diesel engines. In order to recover the damage, optimized polishing techniques using hard-metal and coating processes are applied. To evaluate restoration techniques for the spill valve, performance and durability tests are performed on a test bench.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.22 no.2
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• pp.298-303
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• 2013

Magnetic abrasive polishing is one of the most promising finishing methods applicable to complex surfaces. Nevertheless this process has a low efficiency when applied to very hardened materials. For this reason, EP-MAP hybrid process was developed. EP-MAP process is expected to machine complex and hardened materials. In this research, deburring process using EP-MAP hybrid process was proposed. EP-MAP deburring process is applied to micro channel, thereby it can obtain both deburring process and polishing process. EP-MAP deburring process on the micro channel was performed. Through design of experiment method, error of height in this process according to process parameter is analyzed. When the level 1 parameter A(magnetic flux density) and level 2 parameter B(electric potential), C(working gap) and level 3 parameter D(feed rate) are applied in the deburring process using EP-MAP hybrid process, it provides optimum result of EP-MAP hybrid deburring process.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.86-89
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• 2003

Chemical Mechanical Planarization(CMP) has been accepted as the most effective processes for ultra large scale integrated (ULSI) chip manufacturing. However, as the polishing process continues, pad pores get to be glazed by polishing residues, which hinder the supply of new slurry. And pad surface is ununiformly deformed as real contact distance. These defects make material removal rate(MRR) decrease with a number of polishied wafer. Also the desired within-chip planarity, within wafer non-uniformity(WIWNU) and wafer to wafer non-uniformity(WTWNU) arc unable to be achieved. So, pad conditioning in CMP Process is essential to overcome these defects. The eletroplated or brazed diamond conditioner is used as the conventional conditioning. And. allumina long fiber, the jet power of high pressure deionized water, vacuum compression. ultrasonic conditioner aided by cavitation effect and ceramic plate conditioner are once used or under investigation. But. these methods arc not sufficient for ununiformly deformed pad surface and the limits of conditioning effect. So this paper focuses on the characteristics of diamond conditioner which reopens glazed pores and removes ununiformly deformed pad away.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.1
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• pp.12-16
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• 2005

Chemical mechanical polishing (CMP) process is one of the most useful methods for improving the surface roughness of films. The effects of CMP on the surface morphology of WO$_3$ films prepared by RF sputtering system were investigated in this paper. A removal rate of films increased, and the uniformity performance of surface decreased with the addition of an oxidizer to the tungsten slurry. Non-uniformity performance of surface was superior as its value was below 5 % when oxidizers of 5.0 vol% and 2.5 vol%, respectively, were added to the tungsten slurry. The optimized oxidizer concentration, reflected both the improved roughness values and hillock-free surface with the good uniformity performance, was 5.0 vol% as an atomic force microscopy(AFM) analysis of thin film topographies. Our CMP results will be a useful reference for advanced technology of thin films for gas sensor applications in the near future.