• Title/Summary/Keyword: point defects

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Implementation of a Modified SQI for the Preprocessing of Magnetic Flux Leakage Signal

  • Oh, Bok-Jin;Choi, Doo-Hyun
    • Journal of Magnetics
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    • v.18 no.3
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    • pp.357-360
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    • 2013
  • A modified SQI method using magnetic leakage flux (MFL) signal for underground gas pipelines' defect detection and characterization is presented in this paper. Raw signals gathered using MFL signals include many unexpected noises and high frequency signals, uneven background signals, signals caused by real defects, etc. The MFL signals of defect free pipelines primarily consist of two kinds of signals, uneven low frequency signals and uncertain high frequency noises. Leakage flux signals caused by defects are added to the case of pipelines having defects. Even though the SQI (Self Quotient Image) is a useful tool to gradually remove the varying backgrounds as well as to characterize the defects, it uses the division and floating point operations. A modified SQI having low computational complexity without time-consuming division operations is presented in this paper. By using defects carved in real pipelines in the pipeline simulation facility (PSF) and real MFL data, the performance of the proposed method is compared with that of the original SQI.

FEW RESULTS ON RELATIVE (k, n) VALIRON DEFECTS FROM THE VIEW POINTS OF INTEGRATED MODULI OF LOGARITHMIC DERIVATIVE OF ENTIRE AND MEROMORPHIC FUNCTIONS

  • Datta, Sanjib Kumar;Sarkar, Sukalyan;Bandyopadhyay, Ashima;Biswas, Lakshmi
    • Korean Journal of Mathematics
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    • v.29 no.2
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    • pp.239-252
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    • 2021
  • The prime target of this paper is to compare some relative (k, n) Nevanlinna defects with relative (k, n) Valiron defects from the view point of integrated moduli of logarithmic derivative of entire and meromorphic functions where k and n are any two non-negative integers.

Analysis of Stress Distribution Around Micro Hole by F.E.M. -Stress Distribution around Defects Inclusions- (유한요소법에 의한 미소원공 주위의 응력분포 해석 -결함과 개재물 주위의 응력분포-)

  • 송삼홍;김진봉
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.18 no.3
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    • pp.555-564
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    • 1994
  • This study has been made to investigate the stress distribution around defects and inclusions that behave as stress concentrators. The stress distribution and interation effects around defects and inclusions was analyzed using Finite Element Method. The results are as follows;(1) Maximum stress point in case of $E_I/E_M>1$($E_I$:elasticity modulus forthe inclusion, $E_M$/:elasticity modulus for the base material)is the vertical point with respect to force direction and in case of $E_I/E_M<1$ it is the parallel point along the hole edge. (2) Interaction effects of ${\sigma}_y$ for the inclusion side is larger than the defect side when the interval between inclusion and defect is near. (3) stress interation effects is large if the difference of ${\sigma}_y$ is small and it is small if the difference of ${\sigma}_y$ is large for the case that the interval between inclusion and defect whose size and property are different is near.

Growth and point defect for $CdGa_2Se_4$single crystal thin film by hot wall epitaxy (Hot Wall Epitaxy(HWE)법에 의한 $CdGa_2Se_4$ 단결정 박막 성장과 점결함)

  • Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.81-82
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    • 2007
  • The stochiometric mix of evaporating materials for the $CdGa_2Se_4$ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, $CdGa_2Se_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $630^{\circ}C\;and\;420^{\circ}C$, respectively. After the as-grown single crystal $CdGa_2Se_4$ thin films were annealed in Cd-, Se-, and Ga -atmospheres, the origin of point defects of single crystal $CdGa_2Se_4$ thin films has been investigated by PL at 10 K. The native defects of $V_{Cd},\;V_{Se},\;Cd_{int},\;and\;Se_{int}$ obtained by PL measurements were classified as donors or acceptors. And we concluded that the heat-treatment in the Cd-atmosphere converted single crystal $CdGa_2Se_4$ thin films to an optical p-type. Also, we confirmed that Ga in $CdGa_2Se_4$/GaAs did not form the native defects because Ga in single crystal $CdGa_2Se_4$ thin films existed in the form of stable bonds.

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Annealing effects of AgInS$_2$/GaAs Epilayer grown by Hot Wall Epitaxy

  • K. J. Hong;Park, C.S.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.823-827
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    • 2001
  • The AgInS$_2$epilayers with chalcopyrite structure grown by using a hot-wall epitaxy (HWE) method have been confirmed to be a high quality crystal. From the optical absorption measurement, the temperature dependence of the energy band gap on the AgInS$_2$/GaAs was derived as the Varshni's relation of Eg(T)=2.1365 eV-(9.89${\times}$10$\^$-3/ eV)T$^2$/(2930+T). After the as-grown AgInS$_2$/GaAs was annealed in Ag-,S-, and In-atmosphere, the origin of point defects of the AgInS$_2$/GaAs has been investigated by using the photoluminescence (PL) at 10 K. The native defects of V$\_$Ag/, V$\_$s/, Ag$\_$int/, and S$\_$int/ obtained from PL measurement were classified to donors or acceptors type. And, we concluded that the heat-treatment in the S-atmosphere converted the AgInS$_2$/GaAs to optical p-type. Also, we confirmed that the In in the AgInS$_2$/GaAs did net from the native defects because the In in AgInS$_2$did exist as the form of stable bonds.

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Studies of point defects for annealed $AgInS_{2}/GaAs$ epilayer

  • Kwang-Joon Hong;Seung Nam Baek;Jun Woo Jeong
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.12 no.4
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    • pp.196-201
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    • 2002
  • The $AgInS_{2}$ epilayers with a chalcopyrite structure grown using a hot-wall epitaxy method have been confirmed to be a high quality crystal. From the optical absorption measurements, a temperature dependence of the energy band gap on $AgInS_{2}/GaAs$ was found to be $Eg(T)=2.1365eV-(9.89{\times}10^{-3}eV)T^{2}/(2930+T)$. After the as-grown $AgInS_{2}/GaAs$ was annealed in Ag-, S-, and In-atmospheres, the origin of point defects of $AgInS_{2}/GaAs$ has been investigated by using photoluminescence measurements at 10 K. The native defects of $V_{Ag},\;V_{S},\;Ag_{int}$ and $S_{int}$ obtained from photoluminescence measurements were classified as donors or accepters. It was concluded that the heat-treatment in the S-atmosphere converted $AgInS_{2}/GaAs$ to an optical p-type. Also, it was confirmed that In in $AgInS_{2}/GaAs$ did not form the native defects because In in $AgInS_{2}$ did exist in the stable form.

Primary damage of 10 keV Ga PKA in bulk GaN material under different temperatures

  • He, Huan;He, Chaohui;Zhang, Jiahui;Liao, Wenlong;Zang, Hang;Li, Yonghong;Liu, Wenbo
    • Nuclear Engineering and Technology
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    • v.52 no.7
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    • pp.1537-1544
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    • 2020
  • Molecular dynamics (MD) simulations were conducted to investigate the temperature effects on the primary damage in gallium nitride (GaN) material. Five temperatures ranging from 300 K to 900 K were studied for 10 keV Ga primary knock-on atom (PKA) with inject direction of [0001]. The results of MD simulations showed that threshold displacement energy (Ed) was affected by temperatures and at higher temperature, it was larger. The evolutions of defects under various temperatures were similar. However, the higher temperature was found to increase the peak number, peak time, final time and recombination efficiency while decreasing the final number. With regard to clusters, isolated point defects and little clusters were common clusters and the fraction of point defects increased with temperature for vacancy clusters, whereas it did not appear in the interstitial clusters. Finally, at each temperature, the number of Ga interstitial atoms was larger than that of N and besides that, there were other different results of specific types of split interstitial atoms.

Properties of Photoluminescience for AgInS2/GaAs Epilayer Grown by Hot Wall Epitaxy

  • Lee, Sang-Youl;Hong, Kwang-Joon
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.2
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    • pp.50-54
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    • 2004
  • The AgInS$_2$epilayers with chalcopyrite structure grown by using a hot-wall epitaxy (HWE) method have been confirmed to be a high quality crystal. From the optical absorption measurement, the temperature dependence of the energy band gap on the AgInS$_2$/GaAs was derived as the Varshni's relation of E$\_$g/(T) = 2.1365 eV - (9.89${\times}$10$\^$-3/ eV/K) T$^2$/(2930+T eV). After the as-grown AgInS$_2$/GaAs was annealed in Ag-, S-. and In-atmosphere, the origin of point defects of the AgInS$_2$/GaAs has been investigated by using the photoluminescence (PL) at 10 K. The native defects of $V_{Ag}$, $V_s$, $Ag_{int}$, and $S_{int}$ obtained from PL measurement were classified to donors or accepters type. And, we concluded that the heat-treatment in the S- atmosphere converted the AgInS$_2$/GaAs to optical p-type. Also, we confirmed that the In in the AgInS$_2$/GaAs did not form the native defects because the In in AgInS$_2$did exist as the form of stable bonds.

Study point defect and growth for $CuInSe_2$ single crystal thin film by hot wall epitaxy (Hot Wall Epitaxy (HWE) 법에 의한 $CuInSe_2$ 단결정 박막 성장과 점결함 연구)

  • Yu, Sang-Ha;Hong, Gwang-Jun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.152-153
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    • 2007
  • $CuInSe_2$ single crystal thin film was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. After the as-grown $CuInSe_2$ single crystal thin films was annealed in Cu-, Se-, and In-atmospheres, the origin of point defects of $CuInSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{Cu}$, $V_{Se}$, $Cu_{lnt}$, and $Se_{lnt}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Cu-atmosphere converted $CuInSe_2$ single crystal thin films to an optical n-type. Also, we confirmed that In in $CuInSe_2$/GaAs did not form the native defects because In in $CuInSe_2$ single crystal thin films existed in the form of stable bonds.

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A Study of End Point Detection Measurement for STI-CMP Applications (STI-CMP 공정 적용을 위한 연마 정지점 고찰)

  • 이경태;김상용;김창일;서용진;장의구
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.90-93
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    • 2000
  • In this study, the rise throughput and the stability in fabrication of device can be obtained by applying of CMP process to STI structure in 0.18um semiconductor device. To employ in STI CMP, the reverse moat process has been added thus the process became complex and the defects were seriously increased. Removal rates of each thin films in STI CMP was not equal hence the devices must to be effected, that is, the damage was occured in the device dimension in the case of excessive CMP process and the nitride film was remained on the device dimension in the case of insufficient CMP process than these defects affect the device characteristics. To resolve these problems, the development of slurry for CMP with high removal rate and high selectivity between each thin films was studied then it can be prevent the reasons of many defects by reasons of many defects by simplification of process that directly apply CMP process to STI structure without the reverse moat pattern process.

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