• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.27 no.6
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• pp.95-99
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• 2013

Furnace is currently the most important doping process using POCl3 in solar cell. However furnace need an expensive equipment cost and it has to purge a poisonous gas. Moreover, furnace typically difficult appling for selective emitters. In this study, we developed a new atmospheric pressure plasma source, in this procedure, we research the atmospheric pressure plasma doping that dopant is phosphoric acid($H_3PO_4$). Metal tube injected Ar gas was inputted 5 kV of a low frequency(scores of kHz) induced inverter, so plasma discharged at metal tube. We used the P type silicon wafer of solar cell. We regulated phosphoric acid($H_3PO_4$) concentration on 10% and plasma treatment time is 90 s, 150 s, we experiment that plasma current is 70 mA. We check the doping depth that 287 nm at 90 s and 621 nm at 150 s. We analysis and measurement the doping profile by using SIMS(Secondary Ion Mass Spectroscopy). We calculate and grasp the sheet resistance using conventional sheet resistance formula, so there are 240 Ohm/sq at 90 s and 212 Ohm/sq at 150 s. We analysis oxygen and nitrogen profile of concentration compared with furnace to check the doped defect of atmosphere.

• Proceedings of the KIEE Conference
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• 1995.07c
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• pp.1314-1316
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• 1995

Basic discharge characteristics of a ferroelectric ball and mica sheet double barrier have been studied for learning the fundamentals of the barrier discharges and for checking the potential to be used as a plasma generator. It is found that plasma generation of the plasma generator was influenced greatly by the dielectric constant of the ferroelectric ball barrier and applied power frequency. As a result, there are optimum conditions of the dielectric constant as a barrier and the applied frequency to generate ozone effectively, which were ${\varepsilon}_r$=600 and f=4 kHz at the present experimental case.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.5-6
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• 2009

In this paper, plasma ion implant is performed with $PH_3$ gas diluted by helium gas on P-type Si wafer (100). Spike Rapid Thermal Processing(RTP) annealing performed for 30~60 sec from $800\;^{\circ}C$ to $1000\;^{\circ}C$ in $N_2+O_2$ ambient. Crystalline defect is analyzed by Transmission Electron Microscope(TEM) and Double crystal X-ray Diffraction(DXRD). Contact resistivity($\rho c$), contact resistance(Rc) and sheet resistance(Rs) are analyzed by measuring Transfer Length Method(TLM) using 4155C analysis. As annealing temperature increase, Rs decrease and ${\rho}c$ and Rc increase at temperature higher than $850\;^{\circ}C$. We achieve low Rs, ${\rho}c$ and Rc with Plasma ion implant and spike RTP.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.6 no.6
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• pp.497-501
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• 2005

Dry film method was applied to fabricate lead-free transparent dielectric fur PDP(Plasma Display Panel). From various slurry compositions, it was able to find out the. best composition for producing high density green sheet. The slurry exhibited shear thinning characteristics which are known to be suitable fur producing a high quality green sheet. The thermal expansion coefficient of the fabricated transparent dielectric was measured to be $97{\times}10^{-7}/^{\circ}C$ which is close to the value of the glass substrate(PD-200). Cross sectional SEM of the transparent dielectric layer on PD-200 showed that the two layers were well attached each other with no observable gaps between them.

• Bulletin of the Korean Chemical Society
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• v.35 no.3
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• pp.905-907
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• 2014

The plasma and microwave surface treatments of carbon nanotubes that loaded on plastic substrates were carried out with expecting a change of carbon nanotube dispersion by increasing treatment time. The microwave treatment process was undergone by commercial microwave oven (800 W). The electrical property was measured by hall measurement and resistance was increased by increasing $O_2$ flow rate of plasma, suggesting an improvement of carbon nanotube dispersion and a possibility of controlling the resistances of carbon nanotubes by plasma surface treatment. The resistance was increased in both polyethylene terephthalate and polyimide substrates by increasing $O_2$ flow rate. Resistance changes only slightly with different $O_2$ flow treatment in measure rho for all polyimide samples. Sheet resistance is lowest in polyimide substrate not due to high carbon nanotube loading but due to tendency to remain in elongated structure. $O_2$ or $N_2$ plasma treatments on both polyethylene terephthalate and polyimide substrates lead to increase in sheet resistance.

• Applied Science and Convergence Technology
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• v.27 no.1
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• pp.5-8
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• 2018

In this paper, plasma treatment effects on a ploy(dimethyl siloxane) substrate were analyzed for the applications of stretchable silver nanowire (Ag NWs) electrodes. The oxygen plasma treated sample shows the best performance compared to nitrogen treated and untreated samples. The lowest sheet resistance and reasonable stretching capability was achieved up to 20% strain condition without open circuit fail for the oxygen plasma treated sample.

• Journal of the Korean Ceramic Society
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• v.41 no.4
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• pp.277-283
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• 2004

To fabricate green sheet of transparent dielectric for PDP front panel, dispersion of transparent dielectric slurry, density, and mechanical properties of green sheets have been investigated as a function of amount and composition of organic additives. Measurements of sedimentation and viscosity were employed to determine a proper dispersant and its amount for a well dispersed transparent dielectric powders in non-aqueous system. Green sheets, having various ratios of transparent dielectric powders to transparent dielectric powders＋ binder＋plasticizer and binder to binder＋plasticizer, were fabricated. All the tape casting slurries showed shear thinning effect, that is, the apparent viscosity decreased with the increase of shear rate. It was found that the amount and composition of organic additives were main variables to affect densities and mechanical properties of transparent dielectric green sheets for PDP.

• Journal of Welding and Joining
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• v.30 no.2
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• pp.54-58
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• 2012

Al-coated steel sheets with excellent heat and corrosion resistance are widely used in various applications. In welding of thin plate, some defects such as unmelted zone and metal-through occur easily in the beginning and ending of welding line. In the study, the welding defects in Al-coated steel sheets were investigated with respect to plasma arc current, height between Cu block and base metals, and using a roller to align the height of the base metal. Full penetration and voids free welds were obtained with a plasma arc current 52A and weld speed 2.3m/min. An unmelted zone increased and Ericshen rate decreased as the height between Cu block and base metal increased from 0 to 0.6mm. Using a roller moving ahead of the plasma arc, the length of unmelted zone decreased from 1.7mm to 0.5mm.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.1
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• pp.81-85
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• 2009

We has been analysed optical properties of OLED(organic light emitting diode) and characteristics of ITO(Indium Tin Oxide) in terms of $O_2$ plasma treatment for manufacturing high efficiency OLED, RF power of $O_2$ plasma was changed 25, 50, 100, 200 W. $O_2$ gas flow, gas pressure and treatment time were fixed. Sheet resistance and surface roughness of ITO were measured by Hall-effect measurement system and AFM, respectively. The ranges of sheet resistance and surface roughness were $5.5{\sim}6,06\;{\Omega}$ and $2.438{\sim}3.506\;nm$ changing of RF power, respectively, PM(Passive Matrix)OLED was fabricated with the structure of ITO(plasm treatment)/TPD($400\;{\AA}$)/$Alq_3(600\;{\AA})$/LiF($5\;{\AA}$)/Al($1200\;{\AA}$). Turn-on voltage of PMOLED was 7 V and luminance was $7,371\;cd/m^2$ at the RF power of 25 W, $O_2$ plasma treatment of ITO surface was result in lowering the operating voltage and improving luminance of PMOLED.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.32 no.2
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• pp.147-150
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• 2019

There is a need for the development of transparent conductive materials that are economical and environmentally friendly with exhibit low resistivity and high transmittance in the visible spectrum. In this study, the deposition rate and uniformity of Al-doped ZnO-thin films were improved by changing the Z-motion of the sputtering system. The deposition rate and the uniformity were determined to be 3.44 nm/min and 1.23%, respectively, under the 10 mm Z-motion condition. During $O_2$ plasma treatment, the intrusion-type metal elements in the thin film were reduced, which contributed to an oxygen vacancy reduction in addition to structural stabilization. Moreover, the sheet resistance was more easily saturated.