• Proceedings of the KWS Conference
• /
• 2001.05a
• /
• pp.245-247
• /
• 2001

In this study, the effects of dilution on the wear behavior of PTAW (Plasma Transferred Arc Welding) Inconel 625, Inconel 718 and Stellite 6 overlays on Nimonic 80A were investigated. Inorder to evaluate the wear performance, two-body and three-body abrasive wear test, and dry sliding wear test were performed. According to wear tests, the wear rate of deposit with dilution 30% was higher than that of dilution 10% by 10%, and it was also found the plastic deformation near worn surface.

• Clinical and Experimental Pediatrics
• /
• v.50 no.5
• /
• pp.430-435
• /
• 2007

Even though we drink and excrete water without recognition, the amount and the composition of body fluid remain constant everyday. Maintenance of a normal osmolality is under the control of water balance which is regulated by vasopressin despite sodium concentration is the dominant determinant of plasma osmolality. The increased plasma osmolality (hypernatremia) can be normalized by the concentration of urine, which is the other way of gaining free water than drinking water, while the low plasma osmolality (hyponatremia) can be normalized by the dilution of urine which is the only regulated way of free water excretion. On the other hand, volume status depends on the control of sodium balance which is regulated mainly by renin-angiotensin-aldosterone system, through which volume depletion can be restored by enhancing sodium retention and concomitant water reabsorption. This review focuses on the urine concentration and dilution mechanism mediated by vasopressin and the associated disorders; diabetes insipidus and syndrome of inappropriate antidiuretic hormone secretion.

• Nuclear Engineering and Technology
• /
• v.52 no.3
• /
• pp.589-596
• /
• 2020

Many components in the assembly section of Sodium-cooled Fast Reactor are made of good corrosionresistant 316 LN Stainless Steel material. To avoid self-welding of the components with the coolant sodium at elevated temperature, hardfacing is inevitable. Ni-based colmonoy-5 is used for hardfacing due to its lower dose rate by Plasma Transferred Arc process due to its low dilution. Since Ni-Cr-B-Si alloy becomes very fluidic while depositing, the major height of the weld overlay rests inside the groove. Hardfacing is also done over the plain surface where grooving is not possible. Therefore, grooved and ungrooved hardfaced specimens were prepared at different travel speeds. Fe content at every 100 ㎛ of the weld overlay was studied by Energy Dispersive Spectroscopy and also the micro hardness was determined at those locations. A correlation between iron dilution from the base metal and the micro hardness was established. Therefore, if the Fe content of the weld overlay is known, the hardness at that location can be obtained using the correlation and vice-versa. A new correlation between micro hardness and dilution coefficient is obtained at different locations. A comparative study between those specimens is carried out to recommend the optimum travel speed for lower dilution.

• Analytical Science and Technology
• /
• v.8 no.4
• /
• pp.427-434
• /
• 1995

Inductively coupled plasma mass spectrometry combined with the isotope dilution method is used for the determination of lithium. The isotope dilution method is based on the addition of a known amount of enriched isotope (spike) to a sample. The analyte concentration is obtained by measuring the altered isotope ratio. The spike solution is calibrated through so called reverse isotope dilution with a primary standard. The spike calibration is an important step to minimize error in the determined concentration. It has been found essential to add spike to a sample and the primary standard so that the two isotope ratios should be as dose as possible. Since lithium is neither corrosive nor toxic, lithium is used as a chemical tracer in the nuclear power plants to measure feedwater flow rate. 99.9% $^7Li$ was injected into a feedwater line of an experimental system and sample were taken downstream to be spiked with 95% $^6Li$ for the isotope dilution measurements. Effects of uncertainties in the spike enrichment and isotope ratio measurement error at various spike-to-sample ratios are presented together with the flow rate measurement results in comparison with a vortex flow meter.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.07a
• /
• pp.632-635
• /
• 2001

Microcrystalline Si films have been deposited by using five W-wire filaments of 0.5 mm diameter for hot-wire chemical vapor deposition (HWCVD). We compared the HWCVD grown films with the film exposed to transformer couple plasma system for the modification of seed layer. W-wire filament temperature was maintained below 1600$^{\circ}C$ to avoid metal contamination by thermal evaporation at the filament. Deposition conditions were varied with H$_2$dilution ratio, with and without plasma treatment. From the Raman spectra analysis, we observed that the film crystallization was strongly influenced by the H$_2$dilution ratio and weakly depended on the distance between the wire and a substrate. We were able to achieve the crystalline volume fraction of about 70% with an SiH$_4$/H$_2$ratio of 1.3%, a wire temperature of 1514$^{\circ}C$, a substrate separation distance of 4cm, and a chamber pressure of 38 mTorr. We investigated the influence of ${\mu}$c-Si film properties by using a plasma treatment. This article also deals with the influence of the H$_2$dilution ratio in crystallization modification.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.08a
• /
• pp.236-236
• /
• 2011

Silicon oxynitride (SiON) was deposited for gas barrier film on polyethylene terephthalate (PET) using octamethylycyclodisiloxane (Si4O4C8H24, OMCTS) precursor by plasma enhanced chemical vapor deposition (PECVD) at low temperature. The ion flux and substrate temperature were measured by oscilloscope and thermometer. The chemical bonding structure and barrier property of films were characterized by Fourier transform infrared (FT-IR) spectroscopy and the water vapor transmission rate (WVTR), respectively. The deposition rate of films increases with RF bias and nitrogen dilution due to increase of dissociated precursor and nitrogen ion incident to the substrate. In addition, we confirmed that the increase of nitrogen dilution and RF bias reduced WVTR of films. Because, on the basis of FT-IR analysis, the increase of the nitrogen gas flow rate and RF bias caused the increase of the C=N stretching vibration resulting in the decrease of macro and nano defects.

• Journal of the Korean Institute of Gas
• /
• v.26 no.5
• /
• pp.35-40
• /
• 2022

PCVD (Plasma Chemical Vapor Deposition), a solar cell manufacturing facility, is a facility that deposits plasma generated in a chamber (NH₃, SIH₄, O₂ on a wafer. In the PCVD facility, gas movement and injection is performed in the gas cabinet, and there are many leak points inside because MFC, regulator, valve, pipe, etc. are intricately connected. In order to prevent explosion in case of leakage of NH₃ with an upper explosive limit (UEL) of 33.6% and a lower explosive limit (LEL) of 15%, the dilution capacity must be capable of allowing the concentration of NH₃ to be out of the explosive range. This study was analyzed using the CFD analysis technique, which can confirm the dilution ability in 3D and numerical values when NH₃ gas leaks from the existing PCVD gas cabinet. As a result, it was concluded that it corresponds to medium dilution and that testicular ventilation is possible through facility improvement.

• Bulletin of the Korean Chemical Society
• /
• v.23 no.11
• /
• pp.1541-1544
• /
• 2002

The concentration of B in steels is important due to its influence on mechanical properties of steel such as hardenability, hot workability, and creep resistance. An analytical method has been developed to determine B in steel samples by high-resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). National Institute of Standard and Technology Standard Reference Material (NIST SRM) 348a was analyzed to validate the analytical method. The steel sample was digested in a centrifuge bottle with addition of aqua regia and $^{10}B$ spike isotope. Sample pH was then adjusted to higher than 10 to precipitate most matrix elements such as Fe, Cr, and Ni. After centrifugation, the supernatant solution was passed through a cation exchange column to enhance the matrix separation efficiency. B recovery efficiency was about 37%, while matrix removal efficiency was higher than 99.9% for major matrix elements. The isotope dilution method was used for quantification and the determined B concentration was in good agreement with the certified value.

• Nuclear Engineering and Technology
• /
• v.45 no.3
• /
• pp.415-420
• /
• 2013

A determination method for $^{237}Np$ in spent nuclear fuel samples was developed using an isotope dilution method with $^{239}Np$ as a spike. In this method, inductively coupled plasma mass spectrometry (ICP-MS) was taken for the $^{237}Np$ instead of the previously used alpha spectrometry. $^{237}Np$ and $^{239}Np$ were measured by ICP-MS and gamma spectrometry, respectively. The recovery yield of $^{237}Np$ in synthetic samples was $95.9{\pm}9.7$% (1S, n=4). The $^{237}Np$ contents in the spent fuel samples were 0.15, 0.25, and $1.06{\mu}g/mgU$ and these values were compared with those from ORIGEN-2 code. A fairly good agreement between the measurements (m) and calculations (c) was obtained, giving ratios (m/c) of 0.93, 1.12 and 1.25 for the three PWR spent fuel samples with burnups of 16.7, 19.0, and 55.9 GWd/MtU, respectively.

• Journal of Surface Science and Engineering
• /
• v.44 no.2
• /
• pp.39-43
• /
• 2011

Amorphous silicon thin film was deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD). Each films were prepared in different dilution in the chamber gas. As a result, silicon crystallites and crystal volume fraction was increased with raising the hydrogen dilution in the gas and optical band gap was decreased. Increasement of the hydrogen contents in the chamber affected on surface roughness. In this study, thickness and surface roughness of the a-Si thin film by different hydrogen dilution was investigated by various techniques.