• Journal of the Korean Geotechnical Society
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• v.30 no.6
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• pp.61-68
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• 2014

The main objective of this study is to evaluate the preliminary landslide hazard based on the identification of geomorphological features, which are believed to be critical values in the initial state of landslides. Two methods, SINMAP and Planarity analyses, are used to simulate those characteristics where landslides are actually located. Results showed that both methods well discriminate geomorphic features between stable and unstable domains in the landslide areas. SINMAP analysis which is the consecutive model considering external factors like infiltration identifies the landslide hazard especially for debris flow type landslides better than plararity analysis focusing on a specific area. This analysis combined with other methods dealing with specific characteristics of geomorphological feature, the accurate landslide hazard will be evaluated.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.136-139
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• 2004

The requirement of planarity, such as with-in-wafer nonuniformity, post thickness range, have become increasingly stringent as critical dimensions of devices are decreased and a better control of a planarity become important. The key factors influencing the planarity capability of the CMP process have been well understood through numerous related experiments. These usually include parameters such as process pressures, relative velocities, slurry temperature, polishing pad materials and polishing head structure. Many study have been done about polishing pad and its groove structure because it's considered as one of the key factors which can decide wafer uniformity directly. But, not many study have been done about polisher head structure, especially about polisher head plate design. The purpose of this paper is to know how the plate structure can affect wafer uniformity and how to deteriorate wafer yield. Furthermore, we studied several new designed plate to improve wafer uniformity and also improve wafer yield.

• The Research Journal of the Costume Culture
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• v.18 no.2
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• pp.261-276
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• 2010

The analysis of an art trend in the principle dimension starts by observing the object of work in the perspective of formative composition and recognizing it as a universal system. It can be said that it is consistent with an interpretation method for a form theory of formal history by Heinrich W$\ddot{o}$lfflin, a leading form critic in art criticism. Hence, the purpose of this study was to find out what are the formative principles in Renaissance Classicism as a design principle to be applicable to modern fashion by reviewing the formative characteristics of Renaissance Classicism Architecture with which W$\ddot{o}$lfflin directly dealt. As for the theoretical literature review, I used W$\ddot{o}$lfflin's theoretical framework and looked at the Renaissance Classicism Architecture that he studied and examined the possibility of utilizing his theory as a layout principle and the characteristics. As for analysis of design cases, I applied the aforementioned architecture layout principle to modern fashion and conducted case study analysis to delve into distinctive layout principles found in fashion. The study showed that the Renaissance Classicism Architectural Style is marked by linearity, planarity, closing and multiple unity: linearity was expressed in the observation form in fixed frontal view and an emphasis on a tangible silhouette homeogenous and definite line structures; planarity was achieved in the form of paralleled layers of frontal view element, planarity style, and identical and proportional repetition of various sizes.; closing signified the pursuit of complete and clear regularity, and architecture developed in a constructive phase through organizational inevitability and absolute invariability.; multiple unity was expressed in self-completedness and independent parallel of discrete forms and harmony of emphasized individual elements in a totality. Applying these layout characteristics of the Renaissance Classicism Architectural style and to see their individual expressive features, I found out that in adopting layout principles of the Renaissance Classicism Architecture to modern fashion, it turned out to be an emphasis of individual silhouettes, a flattened space, completed objects, organic harmony among independent parts: the emphasis of individual silhouettes was expressed in individual definitiveness of formative lines of clothes in accordance with body joints and an emphasis on formative lines of clothes; the flattened space was marked by single layer structure, planarity of elements of clothes, and listing arrangement by appropriate proportion.; the completedness of the objects was expressed by the stationary state where overall image is fixed, the construction of homogeneous and complete space, and absolute inevitability of internal layout in proportion; lastly, organic harmony of independent parts was stressed in independent completedness of each detail, and organic harmony of the whole. The expressive features would lead to a unique expression style of linear emphasis, proportion, constructive forms, and two-dimensional arrangement. The meaning of this study is follows: The characteristics of art school of thought are given shape by appling & analysing the architectural layout principles of historical art school of thought to modern fashion in the view point of formal construction dimension. The applied possibility of historical art school of thought as the source of inspiration about the fashion design is extended.

• Journal of the Korean Society for Precision Engineering
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• v.19 no.2
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• pp.49-57
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• 2002

The effect of mechanical parameters on chemical mechanical polishing (CMP) of blanket and patterned aluminum thin films are investigated. CMP process experiments are conducted using the soft pad and the slurry mainly composed of acid solution and A1$_2$O$_3$ abrasive. The result for the blanket film showed that as the concentration of abrasive in slurry is increased, the surface roughness gets worse but the waviness gets better. The planarity of the patterned Al films is slowly improved by CMP when the width of and gap between the patterns are relatively small. It is tried to find the optimized CMP process conditions by that the patterned Al thin film can be planarized with fine surface. The most satisfiable film surface is obtained when the applied pressure is low (10kPa) and the abrasive concentration is relatively high (5wt%).

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.9
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• pp.825-831
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• 2006

As an increase of chip complexity and level of chip integration, chip input/output (I/O) pad pitches are also drastically reduced. With arrival of high complexity SoC (System on Chip) and SiP (System in Package) products, conventional horizontal type probe card showed its limitation on probing density for wafer level test. To enhance probing density, we proposed new vertical type probe card that has the $70{\mu}m$ probe needle with tungsten wire in $80{\mu}m$ micro-drilled hole in ceramic board. To minimize alignment error, micro-drilling conditions are optimized and epoxy-hardening conditions are also optimized to minimize planarity changes. To apply wafer level test for target devices (T5365 256M SDRAM), designed probe card was characterized by probe needle tension for test, contact resistance measurement, leakage current measurement and the planarity test. Compare to conventional probe card with minimum pitch of $50{\sim}125{\mu}m\;and\;2\;{\Omega}$ of average contact resistance, designed probe card showed only $22{\mu}$ of minimum pitch and $1.5{\Omega}$ of average contact resistance. And also, with the nature of vertical probing style, it showed comparably small contact scratch and it can be applied to bumping type chip test.

• Journal of Korean Society for Geospatial Information Science
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• v.23 no.3
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• pp.23-29
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• 2015

Due to the characteristics of landslide disasters including debris flow, the rapid speed to downward and difficulty to respond or evacuate from them, it is imperative to identify their potential hazards and prepare the reduction plans. However, the current landslide hazards generated by a variety of methods has been raised its accuracy because of the complexity of input data and their analyses, and the simplification of the landslide model. The main objective of this study is, therefore, to evaluate the preliminary landslide hazard based on the identification of geomorphological features. Especially, two methodologies based on the statistics of the directional data, Vector dispersion and Planarity analyses, are used to find some relationships between geomorphological characteristics and the landslide hazard. Results show that both methods well discriminate geomorphological features between stable and unstable domains in the landslide areas. Geomorphological features are closely related to the landslide hazard and it is imperative to maximize their characteristics by adapting multiple models rather than individual model only. In conclusions, the mechanism of landslide is not determined solely by a simple cause but the complex natural phenomenon caused by the interactions of the numerous factors and it is of primary importance to require additional researches for the outbreaking mechanism that are based on various methodologies.

• Bulletin of the Korean Chemical Society
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• v.13 no.2
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• pp.155-157
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• 1992

Extensive search over the energy surface of bicyclo[4.2.2]decapentaene with MMP2 molecular mechanics method and AM1 semiempirical MO method revealed only one, deep energy minimum structure, which corresponds to 1. The alternative structure 2 could not be identified as a stationary point. Although the deviation of benzenoid ring from planarity is large in the energy minimum structure (${\phi} = 26^{\circ}$(MMP2), $37^{circ}$ (AM1)), the bond lengths show no severe alternation.

• Journal of the Korean Geotechnical Society
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• v.38 no.9
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• pp.19-33
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• 2022

Planarity geotechnical exploration missions were actively performed during the 1970s and there was a period of decline from the 1 990s to the 2000s because of budget. However, exploring space resources is essential to prepare for the depletion of Earth's resources in the future and explore resources abundant in space but scarce on Earth, such as rare earth and helium-3. Additionally, the development of space technology has become the driving force of future industry development. The competition among developed countries for exoplanet exploration has recently accelerated for the exploration and utilization of space resources. For these missions and resource exploration/mining, geotechnical exploration is required. There have been several missions to explore exoplanet ground, including the Moon, Mars, and asteroids. There are Apollo, LUNA, and Chang'E missions for exploration of the Moon. The Mars missions included Viking, Spirit/Opportunity, Phoenix, and Perseverance missions, and the asteroid missions included the Hayabusa missions. In this study, space planetary mineral resource exploration technologies are explained, and the future technological tasks of Korea are described.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.40 no.1
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• pp.91-98
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• 1991

Electrical conductivity of poly (3-alkylthiophene) derivatives with substituted long alkyl chain such as poly (3-butylthiophene), poly (3-hexylthiophene), poly (3-octylthiophene), poly (3-decylthiophene), poly (3-dodecylthiophene), and poly (3-docosylthiophene) increases with increasing temperature. However, after attaining a maxiumum value, it decreases with further temperature increase. Hysteresis is also observed in the temperature dependence of conductivity and absorption spectra. The absorption spectra also changes rapidly at the phase transition. These phenomena are discussed in terms of the increase of the energy band gap in the liquid states due to the decrease of co-planarity of thiophene rings accompanied by remarkable conformation changes.

• Journal of the Korean Society for Heat Treatment
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• v.4 no.4
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• pp.24-33
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• 1991

The effects of thermomechanical treatments on microstructure and fatigue properties of 7050 Al alloy were investigated. The precipitation kinetics changed to a faster rate due to cold deformation employed in this special TAHA thermomechanical treatments including pre-aging, plastic deformation and two step final-aging. The G.P. zones in the under-aged condition were cut by dislocations and dissolved during the plastic deformation. During the low cycle fatigue, the T6' condition showed cyclic hardening behavior whereas the TMT5, TMT27 and T76 conditions showed cyclic softening at above 0.7% total strain amplitudes. The ${\Delta}K_{th}$ value of TMT27 was improved more than two times, compared with that of T76 condition. The T6' with small shearable precipitates resulted in the markedly high ${\Delta}K_{th}$ value. This is thought to be resulted from dislocation reversibility and roughness-induced crack closure due to planarity of slip.