• 제목/요약/키워드: photosensitive resist

검색결과 10건 처리시간 0.021초

감광성 폴리머 저항 페이스트 제조와 미세패턴 후막저항의 형성 (Fabrication of Photosensitive Polymer Resistor Paste and Formation of Finely-Patterned Thick Film Resistors)

  • 김동국;박성대;유명재;심성훈;경진범
    • 공업화학
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    • 제20권6호
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    • pp.622-627
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    • 2009
  • 알칼리 수용액에 현상이 가능한 감광성 수지재료와 전도성 카본블랙 필러를 이용하여 포토 패터닝이 가능한 폴리머 후막 저항 페이스트를 제조하고 평가하였다. 감광성 수지로는 인쇄회로기판의 보호층으로 주로 사용되는 photo solder resist(PSR)를 사용하여 자외선에 의한 노광 및 알칼리 수용액에의 현상이 가능하게 하였다. 감광성 폴리머 저항 페이스트를 제작한 후, PCB 테스트 보드를 이용하여 후막저항체의 전기적 특성을 평가하였다. 카본블랙의 첨가량에 따라 시트저항은 감소하였으나, 과량 첨가시에는 현상성에 한계를 나타내었다. 재경화에 따라서 시트저항이 감소하였으며, 카본블랙의 첨가량이 많을수록 그 변화율은 작게 나타났다. 포토공정을 적용하여, 미세 패터닝된 meander형 후막저항체를 제조할 수 있었고, 이 방법을 통하여 적은 면적에도 시트저항의 수십 배에 달하는 큰 저항값을 구현할 수 있었다.

Fine Line Lithography를 위한 Polymer Resist에 관한 연구 (Studies on Polymer Resist for Fine Line Lithography)

  • 박이순
    • 한국인쇄학회지
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    • 제11권1호
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    • pp.71-84
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    • 1993
  • Practically to put use high-photosensitive polymer, poly(vinyl cinnamoyl acetate), we investigated and confirmed UCHIDA`s synthesis, according to control solvent, which is the esterification of poly (vinyl alcohol) with monochloroacetic acid and can be freely conrolled the successive cinnamoyl acetoxyl esterfication of PVCiA, and intruducing photosensitizers,studied the photosensitivity of PVCiA.

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감광성 에칭 레지스트의 잉크젯 인쇄를 이용한 인쇄회로 기판 제작 (Fabrication of the Printed Circuit Board by Direct Photosensitive Etch Resist Patterning)

  • 박성준;이로운;정재우
    • 한국정밀공학회지
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    • 제24권5호
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    • pp.97-103
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    • 2007
  • A novel selective metallization process to fabricate the fine conductive line based on inkjet printing has been investigated. Recently, Inkjet printing has been widely used in flat panel display, electronic circuits, biochips and bioMEMS because direct inkjet printing is an alternative and cost-effective technology for patterning and fabricating objects directly from design without masks. The photosensitive etching resist used in this process is an organic polymer which becomes solidified when exposed to ultraviolet lights and has high viscosity at ambient temperature. A piezoelectric-driven inkjet printhead is used to dispense 20-30 ${\mu}m$ diameter droplets onto the copper substrate to prevent subsequent etching. Repeatability of circuitry fabrication is closely related to the formation of steady droplets, adhesion between etching resist and copper substrate. Therefore, the ability to form small and stable droplets and surface topography of the copper surface and chemical attack must be taken into consideration for fine and precise patterns. In this study, factors affecting the pattern formation such as adhesion strength, etching mechanism, UV curing have been investigated. As a result, microscale copper patterns with tens of urn high have been fabricated.

유가증권 인쇄용 감광성 수지 볼록판의 내마모성 및 화선 재현에 관한 연구 (The Study of Resistant Abrasion and Image Reproduction of the Photosensitive Plastic Convex Printing Plate for Securities Printing)

  • 김병현;강영립;이혁원
    • 한국인쇄학회지
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    • 제29권3호
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    • pp.55-63
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    • 2011
  • The convex printing plate in particular securities is classified three physical properties. The main ingredient(component)of photosensitive plastic is composed of thermosetting polyamide. After being hardened specimen at $80^{\circ}C$ is shown to resist highly, the Glass Transition Temperatures of photosensitive plastic are $85^{\circ}C$. When hardened plate has reached at $80^{\circ}C$, abrasion loss is minimized. the cause is considered it is more effective in hardening when the temperature of photosensitive plastic is $80^{\circ}C$-the vitrification temperature of those. The hardness and the durability of the convex printing plate in particular securities are affected to the hardening treatment temperature. And the resolution of original drawing has being better when the durability is superior.

Research of the TFT-LCD Photosensitive Resist Thickness

  • Zhang, Mi;Xue, Jian She;Wang, Wei;Park, Chun-Bae;Koh, Jai-Wan;Zhang, Zhi-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.1269-1271
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    • 2008
  • We find some array mura are caused by S/D bridge or channel open in 4 mask process. The gray tone PR thickness non-uniformity is the main reason of these defects. By the adjustment of exposure and dry etch parameters, S/D bridge and channel open ratio drops by 10.87%.

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반도체 약액용 자동제어 플라스틱 밸브의 내부 유동해석 (Internal Flow Analysis and Structural Design in Plastic Automatic Control Valve for the Semiconductor Chemical Liquid)

  • 이규훈;이응석;이민기;김진수;배일진
    • 한국생산제조학회지
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    • 제21권2호
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    • pp.311-315
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    • 2012
  • Diaphragm type noncontact automatic control valve is a valve for controling acidic PR(Photo Resist) liquid used in the semiconductor process. PR is photosensitive liquid that changes phases depending on light transmittance. PR is very toxic and expensive; the purpose of this paper is to address methods that prevent loss due to leaks. The design of noncontact precise automatic control valve is expected to play an important role in controlling fluid flow, therefore influencing energy conservation and environmental improvement. In this paper, diaphragm type automatic control valve's part design, assembly and simulation are introduced. Also, through the analysis of fluid flow the valve's internal velocity, pressure, and turbulent intensity are interpreted. This paper proposes to contribute to the improvement of the valve's performance.

에폭시 아크릴레이트 올리고머와 전도성 카본블랙을 이용한 감광성 저항 페이스트 조성 연구 (Study on the Compositions of Photosensitive Resistor Paste Using Epoxy Acrylate Oligomers and Conductive Carbonblack)

  • 박성대;강남기;임진규;김동국
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.421-421
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    • 2008
  • Generally, the polymer thick-film resistors for embedded organic or hybrid substrate are patterned by screen printing so that the accuracy of resistor pattern is not good and the tolerance of resistance is too high(${\pm}$20~30%). To reform these demerits, a method using Fodel$^{(R)}$ technology, which is the patterning method using a photosensitive resin to be developable by aqueous alkali-solution as a base polymer for thick-film pastes, was recently incorporated for the patterning of thermosetting thick-film resistor paste. Alkali-solution developable photosensitive resin system has a merit that the precise patterns can be obtained by UV exposure and aqueous development, so the essential point is to get the composition similar to PSR(photo solder resist) used for PCB process. In present research, we made the photopatternable resistor pastes using 8 kinds of epoxy acrylates and a conductive carbonblack (CDX-7055 Ultra), evaluated their developing performance, and then measured the resistance after final curing. To become developable by alkali-solution, epoxy acrylate oligomers with carboxyl group were prepared. Test coupons were fabricated by patterning copper foil on FR-4 CCL board, plating Ni/Au on the patterned copper electrode, applying the resistor paste on the board, exposing the applied paste to UV through Cr mask with resistor patterns, developing the exposed paste with aqueous alkali-solution (1wt% $Na_2CO_3$), drying the patterned paste at $80^{\circ}C$ oven, and then curing it at $200^{\circ}C$ during 1 hour. As a result, some test compositions couldn't be developed according to the kind of oligomer and, in the developed compositions, the measured resistance showed different results depending on the paste compositions though they had the same amount of carbonblack.

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LCD 컬러 필터용 알칼리 가용성, 감광성 폴리에스터의 합성과 물성 (Synthesis and Properties of Alkali-Soluble and Photosensitive Polyester Derivatives for LCD Color-Filter)

  • 이상훈;조영곤;김주성;배진영
    • 폴리머
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    • 제31권5호
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    • pp.442-446
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    • 2007
  • 알칼리 가용성, 광경화형 폴리에스터를 합성하기 위해 플루오렌형 에폭시 아크릴레이트에 다양한 산 2 무 수물을 반응시켰다. LCD (liquid crystal display) 컬러 필터용 블랙매트릭스를 제조하기 위해서 합성된 폴리에스터와 카본블랙 등을 혼합하여 포토레지스트 용액을 조제한 후 리소그래피 공정을 통해 유리 기판 위에 블랙매트릭스패턴을 형성하였다. 합성된 다양한 폴리에스터의 특성과 리소그래피 패턴을 비교 조사하였다.

곡면 유리 표면 위에서 박막 측온저항체 온도센서 어레이 제작 및 성능 평가 (Fabrication and Performance Evaluation of Thin Film RTD Temperature Sensor Array on a Curved Glass Surface)

  • 안철희;김형훈;박상후;손창민;고정상
    • 한국가시화정보학회지
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    • 제9권2호
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    • pp.34-39
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    • 2011
  • This paper presents a novel direct fabrication method of the thin metal film RTD temperature sensor array on an arbitrary curved surface by using MEMS technology to measure a distributed temperature field up to $300^{\circ}C$ without disturbing a fluid flow. In order to overcome the difficulty in the three dimensional photography of sensor patterning, the UV pre-irradiated photosensitive dry film resist technology has been developed newly. This method was applied to the fabrication of the temperature sensor array on a glass tube, which is arranged parallel and transverse to a main flow. Gold was used as a temperature sensing material. The resistance change was measured in a thermally controlled oven by increasing the environmental temperature. The linear increase in resistance change and a constant slope were obtained. Also, the sensitivity of each RTD temperature sensor was evaluated.

Fluorene 단위 구조를 함유한 감광성 고분자의 합성 및 LCD 컬러필터용 카본블랙 포토레지스트로의 응용 (Synthesis of Fluorene-containing Photosensitive Polymer and Its Application to the Carbon Black-based Photoresist for LCD Color-Filter)

  • 김주성;박겸재;이동근;배진영
    • 폴리머
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    • 제35권1호
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    • pp.87-93
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    • 2011
  • 본 연구에서는 LCD 컬러필터 레지스트용 fluorene 단위 구조를 가지는 다기능 바인더 고분자를 개발하여 카본블랙 기반 감광성 레지스트(CBR)를 제조하고 블랙 매트릭스(BM)에 적용하였다. 다기능 바인더 고분자를 얻기 위해 bisphcnol fluorene epoxy acrylate를 함유한 불포화 폴리에스터(BFEA-polyester)를 합성하였으며 이는 $^1H$ NMR, GPC 및 FTIR을 이용하여 분석하였다. 합성된 BFEA-polyester 바인더 고분자를 상업용 아크릴 바인더와 비교 평가하기 위하여 각각 CBR 제조 후 BM 리소그래피 테스트를 수행하였다. 그 결과, 본 연구에서 합성된 BFEA-polyester 바인더 고분자는 적합한 광경화 반응성과 알칼리 용해성을 가질 뿐만 아니라 기존 아크릴 바인더보다 더 우수한 공정 마진, 패턴 특성 및 유리 가판에 대한 접착력을 나타내었다.