• Proceedings of the Korean Society of Laser Processing Conference
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• 2005.06a
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• pp.21-25
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• 2005

• Applied Chemistry for Engineering
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• v.17 no.2
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• pp.217-222
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• 2006

Polyimides have been investigated extensively and used widely over the past three decades because of their high performance properties such as excellent thermal, mechanical, and electrical properties. Polyimides are difficult to be processed because of the aromatic moieties, imide group, and insoluble nature in most organic solvents. The soluble polyimides were synthesized from 2,2,-bis(3-amino-4-hydroxyphenyl) hexafluoropropane (BAPAF) and 3,3,-diamino-4,4-dihydroxybyphenyl (HAB) as aromatic diamines and 4,4-(hexafluoroisopropylidene)diphthalic dianhydride (6FDA), pyromellitic dianhydride (PMDA), 4,4-oxydiphthalic dianhydride (OPDA), 3,3,4,4-benzophenone tetracarboxylic dianhydride (BTDA) and 3,3,4,4-diphenylsulfone tetracarboxylic dianhydride (DSDA) as aromatic dianhydrides. The polyimides were characterized by NMR, FR-IR, TGA and the dielectric constant of the obtained polyimides was calculated from storage of electro-capacity. A novel photosensitive polyimide was synthesized by the reaction of polyimide, containing hydroxyl group and methacryloyl chloride using triethylamine. The good micro-pattern was obtained with photosensitive polyimide from the photolithographic technique.

• Journal of the Korean Ceramic Society
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• v.41 no.4
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• pp.313-322
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• 2004

Thick film photolithography is a new technology in that the lithography process such as exposure and development is applied to the conventional thick film process including screen-printing. In this research, low-temperature cofireable silver paste, which enabled the formation of thick film fine-line using photolithographic technology, was developed. The optimum composition for fine-line forming was studied by adjusting the amounts of silver powder, polymer and monomer, and the additional amount of photoinitiator, and then the effect of processing parameter such as exposing dose on the formation of fine-line was also tested. As the result, it was found that the ratio of polymer to monomer, silver powder loading, and the amount of photoinitiator were the main factors affecting the resolution of fine-line. The developed photosensitive silver paste was printed on low-temperature cofireable green sheet, then dried, exposed, developed in aqueous process, laminated, and fired. Results showed that the thick film fine-line under 20$\mu\textrm{m}$ width could be obtained after cofiring.

• Polymer(Korea)
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• v.26 no.5
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• pp.634-643
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• 2002

Ultrathin film of polyamic acid having benzene and sulfonyloxyimide moieties was prepared using the Langmuir-Blodgett (LB) technique, and then photosensitive polyimide LB film was obtained by the thermal treatment of precursor polyamic acid multilayers at 200$\^{C}$ for 1 hr. The polyamic acid was synthesized by condensation polymerization under THF and pyridine cosolvent. All monomers and polymers were identified through elemental analysis, FT-IR and $^1$H-NMR spectroscopic measurements. The microarray patterning of photosensitive polyimide LB film on a gold substrate was generated with a deep UV lithography technique. The well-characterized monolayer of cytochrome c was immobilized on the microarray patterns using two different self-assembly processes. Physical and electrochemical properties of the self-assembled cytochrome c monolayer were investigated based on cyclic voltammetry and atomic force microscopy (AFM). Also, its application in bioelectronic device was examined.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.989-993
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• 2002

Barrier ribs in the color plasma display panel(PDP) function to maintain the discharge space between to glass plates as well as to prevent optical crosstalk. Patterning of barrier ribs is one of unique processes for making PDP. In this work photosensitive barrier rib pastes were prepared by incorporating binder polymer, solvent, functional monomers photoinitiator, mid barrier rib powder. Study on the function of materials for the barrier rib paste were undertaken. After optimization of paste formulation, both photolithographic and transparent soft molding method resulted in fine pattern of barrier ribs with high aspect ratio.

• Journal of Sensor Science and Technology
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• v.2 no.1
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• pp.35-40
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• 1993

A FET(field effect transistor) type lipid sensor was fabricated uy immobilizing lipase enzyme on the gate of pH-ISFET($SiO_{2}/Si_{3}N_{4}$). A water soluble polymer, polyvinyl alcohol(PVA) was modified with 1-methyl-4-(formyl-styryl) pyridinium methosulfate(SbQ) to give a photosensitive membrane(PVA-SbQ) in which lipase was immobilized. The optimum photolithographic conditions were ; spin coating speed $5,000{\sim}6,000$ rpm. UV exposure time $20{\sim}30$ seconds, developing time in water $30{\sim}40$ seconds, and vacuum drying time 45 min. at room temperature with the suspension containing PVA-SbQ aqueous solution(SbQ 1mol%, 10 wt %) $200{\mu}L$, bovine serum albumin (BSA) 7.5 mg, and lipase 10 mg. The lipid sensor showed good linear calibration curve in the range of $10{\sim}100$ mM triacetin as a lipid sample.

• Macromolecular Research
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• v.8 no.4
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• pp.172-178
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• 2000

We synthesized polymethacrylate and polyurethane bearing a photosensitive azobenzene chromophore. Photo-induced birefringence of the thin film was observed under a linearly polarized light(λ = 532 nm). Dynamic behaviors of birefringence in two polymers were investigated in terms of the rate constants of growth and decay. An induced dichroism was observed from polarized UV-VIS absorption spectroscopy. Layers of two photosensitive polymers were used for aligning liquid crystal (LC) molecules instead of one of the rubbed polyimide layers in the conventional twisted nematic cell. For producing homogeneous alignment of a nematic LC molecule, a linearly polarized light was exposed to the films of two polymers. The stability of the LC alignment upon the linearly polarized light exposure was also studied.

• Applied Chemistry for Engineering
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• v.23 no.2
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• pp.157-163
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• 2012

Using six kinds of epoxy acrylates and a conductive carbon black, photosensitive resistor pastes were fabricated and then their developability in alkaline aqueous solution and the resistance values after thermal curing were evaluated. In order to impart the photocurability by UV exposure and the developability on alkaline solution, epoxy acrylate oligomers with carboxyl group, acrylate monomers, a photoinitiator and so forth were used. In addition, an organic peroxide was added into the paste to get a thermally curable composition. As a result, some of the pastes were not developed depending on the kinds of oligomers and, in the developed pastes, the measured resistance showed the different values depending on their compositions, even though they contain the same amount of carbon black. Finally, the optimum oligomer was selected and then, by adjusting the amount of carbon black, the kind of monomer and the curing temperature, the photosensitive resistor paste composition which showed the sheet resistance of about 0.5 $k{\Omega}/sq.$ could be obtained.

• Journal of Photoscience
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• v.9 no.3
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• pp.57-63
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• 2002

A homopolymer containing anthracene groups, poly[6-(9-anthryloxy)hexyl methacrylate] (PAn) was prepared and the effect of oxygen on its photochemical reaction was studied by UV and IR absorption spectroscopy in order to understand its photochemical behavior. Photochemical reaction of the PAn in THF solution under an atmosphere of air resulted in the formation of endoperoxide at the beginning stage of reaction followed by photodimerization reaction after all the oxygen was consumed, whereas photodimerization and endoperoxide formation took place concomitantly in the film state. The photoreversible reaction of the anthracene photodimer groups in the polymer by photolysis with 254 nm UV light was not efficient. The IR absorption spectral changes of the PAn film upon irradiation indicate that various photooxidation products were produced in the atmosphere of air.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.230-233
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• 2003

New photopolymers were designed and prepared using the photosensitive polymer binders. The photochemical reaction of the photosensitive polymer binder was studied by virtue of UV absorption and infrared spectroscopy. The holographic gratings were successfully fabricated in these photopolymer film samples by conventional optical interference method. We also investigated the effect of photocrosslink in the polymer binder on the diffraction behavior of the photopolymer. The dynamic behaviors of the grating formation were studied with the change of exposure intensity in terms of the diffraction efficiency. Particularly, we focused our efforts to observe the variation of the diffraction efficiency during post UV curing process.