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Preparation and Properties of Soluble Polyimide with Methacryloyl Group  

Yoon, Keun-byoung (Department of Polymer Science, Engineering College, Kyungpook National University)
Son, Hyung-jun (Chemicals & Polymers Business Unit, LG Chem, Ltd.)
Lee, Dong-ho (Department of Polymer Science, Engineering College, Kyungpook National University)
Publication Information
Applied Chemistry for Engineering / v.17, no.2, 2006 , pp. 217-222 More about this Journal
Abstract
Polyimides have been investigated extensively and used widely over the past three decades because of their high performance properties such as excellent thermal, mechanical, and electrical properties. Polyimides are difficult to be processed because of the aromatic moieties, imide group, and insoluble nature in most organic solvents. The soluble polyimides were synthesized from 2,2,-bis(3-amino-4-hydroxyphenyl) hexafluoropropane (BAPAF) and 3,3,-diamino-4,4-dihydroxybyphenyl (HAB) as aromatic diamines and 4,4-(hexafluoroisopropylidene)diphthalic dianhydride (6FDA), pyromellitic dianhydride (PMDA), 4,4-oxydiphthalic dianhydride (OPDA), 3,3,4,4-benzophenone tetracarboxylic dianhydride (BTDA) and 3,3,4,4-diphenylsulfone tetracarboxylic dianhydride (DSDA) as aromatic dianhydrides. The polyimides were characterized by NMR, FR-IR, TGA and the dielectric constant of the obtained polyimides was calculated from storage of electro-capacity. A novel photosensitive polyimide was synthesized by the reaction of polyimide, containing hydroxyl group and methacryloyl chloride using triethylamine. The good micro-pattern was obtained with photosensitive polyimide from the photolithographic technique.
Keywords
soluble and photosensitive polyimide; methacryloyl group; photolithography; micro-pattern;
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