• 제목/요약/키워드: photoluminescence(PL)

검색결과 944건 처리시간 0.023초

Effect of Si-doping on the luminescence properties of InGaN/GaN green LED with graded short-period superlattice

  • Cho, Il-Wook;Lee, Dong Hyun;Ryu, Mee-Yi;Kim, Jin Soo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.280.1-280.1
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    • 2016
  • Generally InGaN/GaN green light emitting diode (LED) exhibits the low quantum efficiency (QE) due to the large lattice mismatch between InGaN and GaN. The QE of InGaN-based multiple quantum wells (MQWs) is drastically decreased when an emission wavelength shifts from blue to green wavelength, so called "green gap". The "green gap" has been explained by quantum confined Stark effect (QCSE) caused by a large lattice mismatch. In order to improve the QE of green LED, undoped graded short-period InGaN/GaN superlattice (GSL) and Si-doped GSL (SiGSL) structures below the 5-period InGaN/GaN MQWs were grown on the patterned sapphire substrates. The luminescence properties of InGaN/GaN green LEDs have been investigated by using photoluminescence (PL) and time-resolved PL (TRPL) measurements. The PL intensity of SiGSL sample measured at 10 K shows stronger about 1.3 times compared to that of undoped GSL sample, and the PL peak wavelength at 10 K appears at 532 and 525 nm for SiGSL and undoped GSL, respectively. Furthermore, the PL decay of SiGSL measured at 10 K becomes faster than that of undoped GSL. The faster decay for SiGSL is attributed to the increased wavefunction overlap between electron and hole due to the screening of piezoelectric field by doped carriers. These PL and TRPL results indicate that the QE of InGaN/GaN green LED with GSL structure can be improved by Si-doping.

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Comparison of Blue Luminescence Between Spark-processed Photoluminescian Silicon and Ambient Air Aged Anodically Etched Porous Silicon

  • Chang, Sung-Sik;Yoon, Sang-Ok
    • The Korean Journal of Ceramics
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    • 제2권3호
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    • pp.137-141
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    • 1996
  • Ambient air aged anodically etched porous silicon (PS) and spark-processed silicon (sp-Si) show interesting similarities and dissimilarities in some of their luminescence-related properties. Among these similarties are: (1) the photoluminescence (PL) peak maximum in the blue/violet (410 nm);(2) the blue/violet PL peak positions are essentially unchanged with temperature ; (3) PL decay times in the nanosecond region which are independent of the detection wavelength, which is much faster in decay times compared to that of observed decay time in $SiO_2$.Among the dissimilarities are: (1) the PL intensity of blue/violet luminescence, namely, the PL intensity of sp-Si is at least 2 orders of magnitude larger than that of an ambient air aged PS; (2) the blue/violet PL intensity of sp-Si is more stable than that of ambient air aged PS under UV illuminations; (3) FTIR spectra of sp-Si favor those modes, which involve silicon -oxygen bonds in $SiO_2$ stoichiometry, whereas ambient air aged PS can be considered as a nonstoichiometric oxide judging from the observed vibrational spectra.

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다공성 실리콘의 제작조건과 열처리에 따른 Photoluminescence 변화 (Change in Photoluminescence of Porous Silicon with Processing Condition and Heat Treatment)

  • 서영제;최두진;박홍이;이덕희
    • 한국세라믹학회지
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    • 제33권10호
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    • pp.1170-1176
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    • 1996
  • Porous silicon was prepared by anodic reaction. The process was controlled by current density and etching time an the thickness change and the room temperature PL was measured. The thickness of porous silicon was increased with etching time and was decreased after critical time. It was the same as increasing current density. It needed only 15 sec to electropolish the surface of porous silicon above current density 70 mA/cm2. We can understand that increasing etching time leads narrow size of Si column by porous silicon formation mechanism. And the sample with narrow Si column revealed PL blue shift. The specimens were heated in the range of 300-1000$^{\circ}C$ in order to see PL changes. The heat treatment was proceeded in H2 atmosphere vacuum system to avoid oxidation. The PL was disappeared above 600$^{\circ}C$. In high temperature some sintered Si columns were observed in SEM photography. There was no difference of -Hx bonds which was suggested as evidence of hydride compounds luminescence between 500$^{\circ}C$ and 600$^{\circ}C$. Thus it is concluded that quantum confinement is major factor of PL of porous silicon.

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성장정지효과에 의한 InGaAs/InP 양자우물구조의 Photoluminescence 특성 변화 (Effects of growth interruption on the photoluminescence characteristics of InGaAs/InP quantum wells)

  • 문영부;이태완;김대연;윤의준;유지범
    • 한국진공학회지
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    • 제7권2호
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    • pp.104-111
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    • 1998
  • 저압 MOCVD 방법을 이용하여 InGaAs/InP 양자우물구조를 성장하였다. 성장 정지 시간에 따른 photoluminescence특성의 변화를 통하여 계면구조를 분석하였다. InP표면을 $PH_3$ 분위기로, InGaAs표면을 $AsH_3$분위기로 유지하며 성장을 정지하는 경우에는 성장 정지 시간이 길어짐에 따라 불순물 유입에 의한 것으로 생각되는 PL반가폭의 증가를 관찰하였다. InP표면에 AsH3을 공급하는 경우에는 As-P교환에 의해 우물층 두께가 증가하여 PL피크가 저에너지로 이동하였고, 반가폭의 변화는 크지 않았다. 계면 양자우물구조를 형성하여 As-P 교환작용에 대해 조사하였고, 1-2monolayer가 InAs유효두께로 계산되었다. InGaAs 표면에 $PH_3$을 공급한 결과, PL피크가 고에너지로 이동하는 것을 관찰하였고 동시에 반가폭도 증가 하였다. 이는 메모리 효과에 의해 InP층으로 As침투를 억제하고, InGaAs표면에서의 국부적 인 As-P교환에 의한 것으로 생각된다.

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Atomic Layer Epitaxy에 의해 제작된 ZnO 박막의 후열처리에 따른 발광특성 연구 (Post annealing effect on the photoluminescence properties of ZnO thin films prepared by atomic layer epitaxy)

  • 신경철;임종민;강승모;이종무
    • 한국진공학회지
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    • 제13권3호
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    • pp.103-108
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    • 2004
  • Atomic Layer Epitaxy (ALE)법으로 Zn 소스인 DEZn와 oxygen 소스인 $H_2O$를 사용하여 (001) sapphire 기판 위에 기판온도를 ALE 공정온도 범위 인 $170^{\circ}C$와 CVD 공정온도범위 인 $400^{\circ}C$에서 ZnO 박막을 증착하였다. 후열처리에 따른 발광 특성을 조사하기 위해서 산소분위기에서 600∼$1000^{\circ}C$의 온도로 1 시간 동안 후열처리한 후에 He-Cd laser를 사용하여 Photoluminescence (PL) 특성을 측정하였다. $170^{\circ}C$$400^{\circ}C$에서 증착된 시편의 경우 모두 as-grown 상태에서는 거의 발광이 일어나지 않았으나 후열처리를 거치면서 발광이 일어났으며 열처리온도가 높을수록 발광강도는 증가하였다. $400^{\circ}C$에서의 증착된 시편의 경우는 CVD 반응이 일어나 Zn-Zn 결합이 많이 생성되어 열처리 온도가 증가하여도 발광강도가 약하였고 가시광 영역의 발광이 크게 증가한 반면 $170^{\circ}C$에서 증착된 시편의 경우는 열처리 온도가 증가할수록 UV영역의 발광강도만이 크게 증가하였으며 가시광 영역에서의 발광은 거의 증가하지 않았다.

As 차단 시간 변화에 의한 InAs 양자점의 광학적 특성 (Optical Properties of InAs Quantum Dots Grown by Changing Arsenic Interruption Time)

  • 최윤호;류미이;조병구;김진수
    • 한국진공학회지
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    • 제22권2호
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    • pp.86-91
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    • 2013
  • Arsenic interruption growth (AIG)법을 이용하여 GaAs 기판에 성장한 InAs 양자점(quantum dots, QDs)의 광학적 특성을 PL (photoluminescence)과 time-resolved PL을 이용하여 분석하였다. AIG법은 InAs 양자점 성장 동안 In 공급은 계속 유지하면서 셔텨(shutter)를 이용해서 As 공급과 차단을 조절하는 방법이다. 본 연구에서는 As 공급과 차단을 1초(S1), 2초(S2), 또는 3초(S3) 동안 반복하여 성장한 InAs QDs과 As 차단 없이 성장한 기준시료(S0)를 사용하였다. AIG법으로 성장한 시료들의 PL 세기는 기준시료보다 모두 강하게 나타나고, As 차단 시간에 따라 PL 피크는 적색이동(redshifted) 또는 청색이동 (blueshifted)하여 나타났다. 기준시료 S0의 PL 피크와 비교하였을 때 S1의 PL 피크의 적색이동은 양자점 평균 길이가 S0보다 증가하였기 때문이며, S3의 청색이동은 양자점 평균 길이가 S0보다 감소하였기 때문이다. AIG법으로 성장한 QDs 시료들의 PL 세기의 증가는 cluster의 감소, 양자점 밀도의 증가, 균일도의 향상, 종횡비(aspect ratio) 향상으로 설명된다. 온도에 따른 PL 세기와 PL 피크 에너지, PL 소멸 시간과 발광 파장에 따른 PL 소멸 시간을 측정하였다. As 공급과 차단을 2초로 하였을 때 cluster는 전혀 나타나지 않았고 양자점의 밀도는 증가하였으며 균일도와 종횡비도 향상되었다. 또한 S2는 가장 강한 PL 세기와 가장 긴 소멸 시간을 나타내었다. 이러한 결과는 AIG법을 이용하여 InAs 양자점의 크기, 조밀도, 균일도, 종횡비 등을 조절하여 원하는 파장대의 양자점을 성장할 수 있으며 발광 특성도 향상시킬 수 있음을 확인하였다.

A New Approach to Synthesis and Photoluminescence of Silicon Nanoparticles

  • Kim, Beomsuk
    • 통합자연과학논문집
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    • 제2권1호
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    • pp.28-31
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    • 2009
  • We describe the synthesis and characterization of silicon nanoparticles prepared by the soluton reduction of SiCl4. These reactions produce Si nanoparticles with surfaces that are covalently terminated. The resultant organic derivatized Si nanoparticles as well as a probable distribution of Water-soluble Si nanoparticles are observed and characterized by photoluminescence(PL) spectroscopy. This work focuses originally on the organic- and water-soluble silicon nanoparticles in terms of the photoluminescence. Further this work displays probably the first layout of hydrogen terminated Si nanoparticles synthesized in solution at room temperature.

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Photoluminescence of Neutron-irradiated GaN Films and Nanowires

  • Seong, Ho-Jun;Yeom, Dong-Hyuk;Kim, Hyun-Suk;Cho, Kyoung-Ah;Kim, Sang-Sig
    • 한국전기전자재료학회논문지
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    • 제21권7호
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    • pp.603-609
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    • 2008
  • Photoluminescence (PL) of neutron-irradiated GaN films and nanowires is investigated in this study. The GaN films and nanowires were irradiated by neutron beams in air at room temperature, and the neutron-irradiated films and nanowires were annealed in an atmosphere of $NH_3$ at temperatures ranging from 500 to $1100^{\circ}C$. The line-shapes of the PL spectra taken from the neutron-irradiated GaN films and nanowires were changed differently with increasing annealing temperature. In this study, light-emitting centers created in the neutron-irradiated GaN films and nanowires are examined and their origins are discussed. In addition, it is suggested here that the neutron-transmutation-doping is a simple and useful means of homogeneous impurity doping into nanowires with control of the doping concentration.

적외선 센서 재료로 사용되는 고순도 ZnTe박막의 평가 (Evaluation of the High Purity ZnTe which is an Far-Infrared Sensor Material)

  • Kim, B.J.
    • 한국표면공학회지
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    • 제35권5호
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    • pp.305-311
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    • 2002
  • Optical measurements have been used to study the biaxial tensile strain in heteroeptaxial ZnTe epilayers on the (100) GaAs substrate by hot wall epitaxy (HWE) with Zn reservoir. It is effect on the low-temperature photoluminescence spectrum of the material. Optimum growth condition has been determined by a four-crystal rocking curve (FCRC) and a low temperature photoluminescence measurement (PL). It was found that Zn partial pressure from Zn reservoir has a strong influence on the quality of grown films. Under the determined optimum growth condition, ZnTe epitaxial films with thickness of 0.72~24.8$\mu\textrm{m}$ were grown for studying the effect of the thickness on crystalline quality. The PL and FCRC results indicated that the quality of ZnTe films becomes higher rapidly with increase of thickness up to 6$\mu\textrm{m}$. The best value of the FWHM of the four crystal rocking curve, 66 arcsec, was obtained on the film with 12$\mu\textrm{m}$ in thickness. The PL spectrum shows the splitted strong free exciton emissions and very weak deep band emissions. These results show the high quality of films.

Si-O 초격자 구조의 포토루미네슨스 특성 (Photoluminescence Characteristics of Si-O Superlattice Structure)

  • 정소영;서용진;박성우;이경진;김철복;김상용
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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    • pp.202-205
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    • 2002
  • The photoluminescence (PL) characteristics of the silicon-oxygen(Si-O) superlattice formed by molecular beam epitaxy (MBE) were studied. To confirm the presence of the nanocrystalline Si structure, Raman scattering measurement was performed. The blue shift was observed in the PL peak of the oxygen-annealed sample, compared to the hydrogen-annealed sample, which is due to a contribution of smaller crystallites. Our results determine the right direction for the fabrication of silicon-based optoelectronic and quantum devices as well as for the replacement of silicon-on-insulator (SOI) in high-speed and low-power silicon MOSFET devices in the future.

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