• Title/Summary/Keyword: photolithography

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ZnO Nanowire를 이용한 2D 배열 구조 제작

  • Im, Yeong-Taek;No, Im-Jun;Sin, Baek-Gyun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.603-603
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    • 2013
  • 3D 배열구조의 Vertical nanowire Integrated Nanogenerator (VING)은 낮은 출력, 유연 기판 상에 부적합, 나노선의 부서지기 쉬움, 장기 안정성, 균일한 나노선의 성장을 필요로 하는 문제점을 가지고 있다. 본 연구에서는 이러한 VING방식의 단점을 보완하여 2D 배열 구조의 Lateral nanowire Integrated Nanogenerator (LING)로 고출력 전압, 유연기판의 상에 적합 등을 개선하는 방향으로 연구를 하였다. 본 연구의 실험 방법으로는 RF magnetron sputter를 이용하여 AZO Seedlayer를 제작하였으며 제작된 AZO Seedlayer를 photolithography 공정으로 제작하였다. 패터닝된 샘플을 Hydro thermal synthesis method로 성장시켰다. 구조적 분석으로는 XRD, FE-SEM 등을 이용하여 측정하였다.

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Fabrication of OTFT-backplane with solution process for Electrophoretic Display panel

  • Lee, Myung-Won;Lee, Mi-Young;Park, Jong-Seung;Song, Chung-Kun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.428-430
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    • 2009
  • We fabricated flexible OTFT-backplanes with combining printing technique and conventional photolithography process for the electrophoretic display(EPD). The active area size of backplane was 6" in diagonal direction and consisted of $192{\times}150$ pixels, containing 1 OTFT employed bottom contact structure and 1 capacitance in each pixel.

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New Fabrication Process of Vertical-Type Organic TFTs for High-Current Drivers

  • Kudo, Kazuhiro;Nakamura, Masakazu
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.307-309
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    • 2009
  • We have fabricated vertical-type organic transistors (static induction transistors; SITs) with built-in nano-triode arrays formed in parallel by a colloidal-lithography technique. Using this technique, we could fabricate a microstructure in a lateral direction within a large-scale organic device without relying on photolithography. The organic transistor showed low operating voltages, high current output, and large transconductance.

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From Printing Graphics to Printing Electronics, The Digital Revolution in Display Manufacturing

  • Elizur, Eran
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.193-194
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    • 2007
  • In this paper we present work done by Kodak Graphic-Communications-Group and our partners demonstrating applications where laser direct imaging could replace photolithography in display manufacturing. Such applications range from direct manufacturing (e.g. LCD color-filters) to producing “masters” where manufacturing is done by traditional printing methods (e.g. flexography, Gravure-printing).

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CO2 Laser Assisted Recrystallization of Polysilicon Island (CO2 레이저 열처리에 의한 다결정 실리콘 Island의 재결정화)

  • Oh, Min-Rok;An, Chul
    • Proceedings of the KIEE Conference
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    • 1987.07a
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    • pp.536-538
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    • 1987
  • The recrystallization of polysilicon layer deposited on Si was attemped by means of C02 laser annealing. The polysilicon layer was defined in small island patterns ($50{\mu}m{\times}200{\mu}m$) by means of photolithography prior to the annealings. After the annealing an increase of grain size up to about 50um was obtained.

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Shift of center frequency of superconducting microwave liker (초전도 필터의 중심 주파수 변화)

  • 송석천;박정호;이상렬
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.787-789
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    • 2000
  • High temperature superconducting YBCO films have been grown on MgO substrates by pulsed laser deposition (PLD) with Nd:YAG laser Superconducting microwave filter was fabricated by conventional photolithography method. We have designed filter with the center frequency of 14 GHz. We have measured the center frequency of filter at 77 K and its critical temperature 89K. Also we have designed another filter to compare frequency responses. The measured frequency responses will be presented.

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A theoritical study on spin coating technique

  • Tyona, M.D.
    • Advances in materials Research
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    • v.2 no.4
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    • pp.195-208
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    • 2013
  • A comprehensive theory of the spin coating technique has been reviewed and the basic principles and parameters controlling the process are clearly highlighted, which include spin speed, spin time, acceleration and fume exhaust. The process generally involves four stages: a dispense stage, substrate acceleration stage, a stage of substrate spinning at a constant rate and fluid viscous forces dominate fluid thinning behaviour and a stage of substrate spinning at a constant rate and solvent evaporation dominates the coating thinning behaviour. The study also considered some common thin film defects associated with this technique, which include comet, striation, chucks marks environmental sensitivity and edge effect and possible remedies.

Preparation and Properties of Soluble Polyimide with Methacryloyl Group (Methacryloyl기를 함유한 가용성 폴리이미드의 합성과 감광 특성)

  • Yoon, Keun-byoung;Son, Hyung-jun;Lee, Dong-ho
    • Applied Chemistry for Engineering
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    • v.17 no.2
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    • pp.217-222
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    • 2006
  • Polyimides have been investigated extensively and used widely over the past three decades because of their high performance properties such as excellent thermal, mechanical, and electrical properties. Polyimides are difficult to be processed because of the aromatic moieties, imide group, and insoluble nature in most organic solvents. The soluble polyimides were synthesized from 2,2,-bis(3-amino-4-hydroxyphenyl) hexafluoropropane (BAPAF) and 3,3,-diamino-4,4-dihydroxybyphenyl (HAB) as aromatic diamines and 4,4-(hexafluoroisopropylidene)diphthalic dianhydride (6FDA), pyromellitic dianhydride (PMDA), 4,4-oxydiphthalic dianhydride (OPDA), 3,3,4,4-benzophenone tetracarboxylic dianhydride (BTDA) and 3,3,4,4-diphenylsulfone tetracarboxylic dianhydride (DSDA) as aromatic dianhydrides. The polyimides were characterized by NMR, FR-IR, TGA and the dielectric constant of the obtained polyimides was calculated from storage of electro-capacity. A novel photosensitive polyimide was synthesized by the reaction of polyimide, containing hydroxyl group and methacryloyl chloride using triethylamine. The good micro-pattern was obtained with photosensitive polyimide from the photolithographic technique.