• Title/Summary/Keyword: photo current

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Effect of Photosensitive Carbon Nanotube Paste on Field Emission Properties (감광성 탄소나노튜브 페이스트의 조성과 열처리가 전계방출 특성에 미치는 영향)

  • Oh, Jeong-Seob;Kim, Dae-Jun;Jeong, Jin-Woo;Song, Yoon-Ho;Cho, Young-Rae
    • Korean Journal of Materials Research
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    • v.16 no.9
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    • pp.550-556
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    • 2006
  • Photosensitive carbon nanotube (CNT) pastes are explored to develop a CNT field emitter for field emission display (FED) application. We formulated a photosensitive paste including multi-walled CNTs (MWNTs) for screen printing. The photosensitive CNT paste was synthesized by mixing of MWNTs, inorganic fillers (nano metal), organic vehicle, monomers and photo initiator. The CNT paste films were patterned by using backside exposure technique. The CNTs were strongly fixed on a cathode by formation of carbon residue during firing process. For the CNT emitters, current-voltage(I-V) characteristics and images of field emission were evaluated. The emission properties of CNT emitters are dependent on the paste composition. A turn-on electric field for the CNT field emitters is measured to be 1 V/$\mu$m. Additionally, the effect of heat treatment parameter on field emission properties was discussed. The newly formulated photosensitive CNT paste can be potentially applicable to highly reliable CNT field emitters.

Photofield-Effect in Amorphous InGaZnO TFTs

  • Fung, Tze-Ching;Chuang, Chiao-Shun;Mullins, Barry G.;Nomura, Kenji;Kamiya, Toshio;Shieh, Han-Ping David;Hosono, Hideo;Kanicki, Jerzy
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.1208-1211
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    • 2008
  • We study the amorphous In-Ga-Zn-O thin-film transistors (TFTs) properties under monochromatic illumination ($\lambda=420nm$) with different intensity. TFT off-state drain current ($I_{DS_off}$) was found to increase with the light intensity while field effect mobility ($\mu_{eff}$) is almost unchanged; only small change was observed for sub-threshold swing (S). Due to photo-generated charge trapping, a negative threshold voltage ($V_{th}$) shift is also observed. The photofield-effect analysis suggests a highly efficient UV photocurrent conversion in a-IGZO TFT. Finally, a-IGZO mid-gap density-of-states (DOS) was extracted and is more than an order lower than reported value for a-Si:H, which can explain a good switching properties of the a-IGZO TFTs.

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Simple fabrication process and characteristic of a screen-printed triode-CNT field emission arrays for the flat lamp application

  • Jung, Y.J.;Park, J.H.;Jeon, S.Y.;Park, S.J.;Alegaonkar, P.S.;Yoo, J.B.;Park, C.Y.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.1214-1218
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    • 2006
  • We introduced simple fabrication process for field emission devices based on carbon nanotubes (CNTs) emitters. Instead of using the ITO material as a transparent electrode, a metal (Au) with thickness of 5-20nm was used. Moreover, the ITO patterning process was eliminated by depositing metal layer, before the CNT printing process. In addition, the thin metal layer on photo resist (PR) layer was used as UV block. We fabricated the CNT field emission arrays of triode structure with simple process. And I-V characteristics of field emission arrays were measured. The maximum current density of $254{\mu}A/cm2$ was achieved when the gate and the anode voltage was kept 150V and 3000V, respectively. The distance between anode and cathode was kept constant.

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Patterned Growth of ZnO Semiconducting Nanowires and its Field Emission Properties (ZnO 반도체 나노선의 패턴 성장 및 전계방출 특성)

  • Lee, Yong-Koo;Park, Jae-Hwan;Choi, Young-Jin;Park, Jae-Gwan
    • Journal of the Korean Ceramic Society
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    • v.47 no.6
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    • pp.623-626
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    • 2010
  • We synthesized ZnO nanowires patterned on Si substrate and investigated the field emission properties of the nanowires. Firstly, Au catalyst layers were fabricated on Si substrate by photo-lithography and lift-off process. The diameter of Au pattern was $50\;{\mu}m$ and the pattern was arrayed as $4{\times}4$. ZnO nanowires were grown on the Au catalyst pattern by the aid of Au liquid phase. The orientation of the ZnO nanowires was vertical on the whole. Sufficient brightness was obtained when the electric field was $5.4\;V/{\mu}m$ and the emission current was $5\;mA/cm^2$. The threshold electric field was $5.4\;V/{\mu}m$ in the $4{\times}4$ array of ZnO nanowires, which is quite lower than that of the nanowires grown on the flat Si substrate. The lower threshold electric field of the patterned ZnO nanowires could be attributed to their vertical orientation of the ZnO nanowires.

The Fabrication of ZnO UV Photodetector with p-type Inversion Layer and Analysis of Vrlph Properties (P형 반전층을 갖는 ZnO 자외선 수광소자의 제작과 Vrlph특성 분석)

  • Oh, Sang-Hyun;Kim, Deok-Kyu;Park, Choon-Bae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.10
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    • pp.883-888
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    • 2007
  • Investigation of improving the properties of UV detector which uses the wide bandgap of ZnO are under active progress. The present study focused on the design and fabrication of i-ZnO/p-inversion $layer/n^--Si$ Epi. which is characterized with very thin p-type inversion layer for UV detectors. The i-ZnO thin film for achieving p-inversion layer which was grown by RF sputtering at $450^{\circ}C$ and then annealed at $400^{\circ}C$ in $O_2$ gas for 20 min shows good intrinsic properties. High (0002) peak intensity of the i-ZnO film is shown on XRD spectrum and it is confirmed by XPS analysis that the ratio of Zn : O of the i-ZnO film is nearly 1 : 1. Measurement shows high transmission of 79.5 % in UV range (< 400 nm) for the i-ZnO film. Measurement of $V_r-I_{ph}$ shows high UV photo-current of 1.2 mA under the reverse bias of 30 V.

MoS2-Embedded Schottky Photoelectric Devices (MoS2 기반의 쇼트키 반도체 광전소자)

  • Ban, Dong-Kyun;Park, Wang-Hee;Jong, Bok-Mahn;Kim, Joondong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.7
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    • pp.417-422
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    • 2017
  • A high-performing photoelectric device was realized for the $MoS_2$-embedded Si device. $MoS_2$-coating was performed by an available large-scale sputtering method. The $MoS_2$-layer coating on the p-Si spontaneously provides the rectifying current flow with a significant rectifying ratio of 617. Moreover, the highly optical transmittance of the $MoS_2$-layer provides over 80% transmittance for broad wavelengths. The $MoS_2$-embedded Si photodetector shows the sensitive photo-response for middle and long-wavelength photons due to the functional $MoS_2$-layer, which resolves the conventional limit of Si for long wavelength detection. The functional design of $MoS_2$-layer would provide a promising route for enhanced photoelectric devices, including photovoltaic cells and photodetectors.

An Improved Theoretical Model to Explain Electronic and Optical Properties of p-Type GaAs/AlGaAs Superlattices for Multi-Wavelength Normal Incidence Photodetectors

  • Kim, Byoung-Whi;Choi, Eun-Chang;Park, Kwon-Chul;Kang, Seok-Youl
    • ETRI Journal
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    • v.18 no.4
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    • pp.315-338
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    • 1997
  • We extend our previous theoretical analysis of electronic and optical properties of p-type quantum well structures based on the two heavy- and light-hole system to include all the three valence bands. These theories are then used to clarify the origin of the normal incidence absorption and photo current at photon wavelengths of 2 - 3 ${\mu}m$, which was observed in addition to the absorption around 8 ${\mu}m$ by a recent experimental investigation with heavily doped p-type GaAs/AlGaAs multi-quantum well (MQW) structures. In the theoretical analysis, the Hartree and exchange-correlation many-body interactions are taken into account within one-particle local density approximation, and it is shown that normal incidence absorption occurs in two wavelength regions over the transition energy range higher than barrier height for p-type GaAs/AlGaAs superlattices with well doping of $2{\times}10^{19}\;cm^{-3}$; one region has broad absorption peaks with coefficients of about 5000 $cm^{-1}$ around 8 ${\mu}m$, and the other has two rather sharp peaks at 2.7 ${\mu}m$ and 3.4 ${\mu}m$ with 1800 $cm^{-1}$ and 1300 $cm^{-1}$, respectively. The result indicates that the theory explains the experimental observation well, as the theoretical and experimental results are in close agreement in general absorption features.

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Recent Trends of the Development of Photobioreactors to Cultivate Microalgae (미세조류 배양을 위한 광생물반응기 개발의 기술동향)

  • Kim, Jong-Tye;Ahn, Dong-Gyu;Park, Jong-Rak;Park, Jeong-Woo;Jeong, Sang-Hwa
    • Journal of the Korean Society for Precision Engineering
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    • v.28 no.2
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    • pp.125-132
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    • 2011
  • This paper describes current status and future prospects of the mass production of microalgae biomass. Microalgae have attracted considerable attention since they not only effectively fix $CO_2$ gas during their metabolic process but also have the great potential to be utilized for producing valuable substances as a kind of efficient light-harvesting cell factories. In this review, we outline various types of photobioreactors employed for mass production of biomass by culturing microalgae in a well controlled way and give an overview about the present state of affairs, both domestic and international, in the field of the microalgal culturing technologies.

Water-splitting Performance of TiO2 Nanotube Arrays Annealed in NH3 Ambient

  • Kim, Se-Im;Kim, Sung-Jin;Yang, Bee-Lyong
    • Journal of the Korean Ceramic Society
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    • v.48 no.2
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    • pp.200-204
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    • 2011
  • Increase of surface area and decrease of band gap in $TiO_2$ semiconductors are significant to improve the efficiency of water splitting by photoelectrolysis. In this study $TiO_2$ nanotube arrays with ~7 um length and ~100 nm diameter were fabricated by an anodizing technique of titanium foils using DMSO (dimethyl sulfoxide)-based electrolytes. Then to control the band gap of the $TiO_2$ arrays, they were annealed at $550^{\circ}C$ for up to 180 min in $NH_3$ gas ambient. The samples annealed in $NH_3$ gas for 30 min and 60 min showed superior photo-conversion efficiency for water splitting under white and visible light. A $TiO_2$ nanotube annealed in $NH_3$ gas ambient for a period longer than 120 min showed 1 order higher leakage current. It is believed that the decrease of band gap and increase of conductivity in $TiO_2$ nanotube arrays due to $NH_3$ gas treatments result in the superior water-splitting performance.

The Growth and Its Characteristics of Low Temperature (LT. $250^{\circ}C$) GaAS Epilayer (Low Temperature (LT) GaAs 에피층의 성장과 그 특성연구)

  • 김태근;박정호;조훈영;민석기
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.31A no.9
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    • pp.96-103
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    • 1994
  • The GaAs epilayer was grown at low temperature (LT. 250.deg. C) by molecular beam epitaxy. The properties of the LTT GaAs, before and after Rapid Thermal Annealing(RTA), were analyzed by Reflection of High Energy Electron Diffraction (RHEED), Double Crystal X-ray(DCX), Raman spectroscopy, PL and Photo-Induced Current Transient Spectroscopy (PICTS). The LT GaAs before RTA, was analyzed by RHEED and DCX, with a result of an improved surface morphology under a relatively As-rich(As/Ga ratio :28) condition, and of an increased lattics parameter of 1.1 1.7% in comparison with a GaAs substrate. However DCX and Raman spectroscopy revealed that the expanded lattics parameter and the crystallinity of LT GaAs could be recovered after RTA. On the other hand, PL spectra indicated that LT GaAs after RTA showed low optical sensitivity unlike High Temperature(HT) GaAs, and that its surface morphology and crystallinity were corresponded with those of HT GaAs. Finally PICTS spectra proved the fact that low sensitivity of LT GaAs was due to the deep level defects (Ec-0.85eV) which were strogly formed by raising RTA temperature to 750.deg. C.

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