• 제목/요약/키워드: phase measuring

검색결과 1,024건 처리시간 0.029초

위상측정 간섭계를 이용한 수십 ${\AA}$급 및 sub ${\AA}$급 반사경 기판 조도 평가 (Evaluation of surface roughness using phase-measuring interferometer for a few ten ${\AA}$ and sub ${\AA}$-rough substrates)

  • 조민식;정태호;오문수
    • 한국광학회지
    • /
    • 제10권4호
    • /
    • pp.283-288
    • /
    • 1999
  • 위상측정 간섭계(phase-measuring interferometer)를 이용한 표면조도(surface roughness) RMS값 수십 $\AA$급과 sub $\AA$급 반사경 기판의 조도 평가 특성이 조사되었다. 위상측정 간섭계의 조도 측정오차에 대한 위상 및 강도 데이터 평균의 영향이 조사되었으며, 이를 근거로 조도 측정오차를 최소화하는 최적의 위상 평균횟수와 강도 평균횟수가 도출되었다. 수십 $\AA$급 샘플의 경우, 조도 측정값은 데이터 평균의 영향을 적게 받은 반면, sub $\AA$급 반사경 기판 조도 측정시에 위상 평균 30회, 강도 평균20회에서 안정적이고, 신호 대 잡음비가 최대인 조도 측정값을 얻을 수 있었다. 이때의 조도 측정값은 광학적 heterodyne 간섭계에 의한 조도 측정결과와도 잘 일치하였다. 최적 데이터 평균횟수에서 표면조도 측정 반복도 역시 0.01$\AA$이하의 양호한 측정오차를 보였다.

  • PDF

레이저 스페클 간섭법을 이용한 면내 변형 측정 및 해석에 대한 연구 (I) (A Study on Measurement and Analysis of In-Plane Deformations by Using Laser Speckle Interferometry (I))

  • 강영준;노경완;강형수
    • 한국정밀공학회지
    • /
    • 제15권11호
    • /
    • pp.121-129
    • /
    • 1998
  • In-plane ESPI(Electronic Speckle Pattern Interferometry) was devised to measure in-plane deformations and rotation of a specimen with laser in this study. ESPI is a optical measuring method to be able to measure the deformations of engineering components and materials in industrial fields. The conventional measuring methods of surface deformations such as the strain gauge have many demerits because they are contact and point-to-point measuring ones. But that ESPI is noncontact, nondestructive and whole field measuring method can overcome previous disadvantages. We used ESPI which is sensitive to in-plane displacement for measuring in-plane deformations of a disk. And the 4-frame phase shifting method was used for the quantitative analysis. First of all, the system calibration was done due to an in-plane rotation before getting deformations of a disk. Finally we showed good agreement between the experiment results and those of the FEA(Finite Element Analysis).

  • PDF

Thickness Measurement of a Transparent Thin Film Using Phase Change in White-Light Phase-Shift Interferometry

  • Kim, Jaeho;Kim, Kwangrak;Pahk, Heui Jae
    • Current Optics and Photonics
    • /
    • 제1권5호
    • /
    • pp.505-513
    • /
    • 2017
  • Measuring the thickness of thin films is strongly required in the display industry. In recent years, as the size of a pattern has become smaller, the substrate has become larger. Consequently, measuring the thickness of the thin film over a wide area with low spatial sampling size has become a key technique of manufacturing-yield management. Interferometry is a well-known metrology technique that offers low spatial sampling size and the ability to measure a wide area; however, there are some limitations in measuring the thickness of the thin film. This paper proposes a method to calculate the thickness of the thin film in the following two steps: first, pre-estimation of the thickness with the phase at the peak position of the interferogram at the bottom surface of the thin film, using white-light phase-shift interferometry; second, accurate correction of the measurement by fitting the interferogram with the theoretical pattern through the estimated thickness. Feasibility and accuracy of the method has been verified by comparing measured values of photoresist pattern samples, manufactured with the halftone display process, to those measured by AFM. As a result, an area of $880{\times}640$ pixels could be measured in 3 seconds, with a measurement error of less than 12%.

Separation of Isochromatics and Isoclinics from Photoelastic Fringes in a Circular Disk by Phase Measuring Technique

  • Baek, Tae-Hyun;Kim, Myung-Soo;Yoshihau Morimoto;Motoharu Fujigaki
    • Journal of Mechanical Science and Technology
    • /
    • 제16권2호
    • /
    • pp.175-181
    • /
    • 2002
  • A new polariscope system involving two rotating optical elements and a digital camera for whole field fringe analysis allows automated data to be acquired quickly and efficiently. The developed phase measuring technique that uses eight images through a circular polariscope is presented for the digital measurement of isochromatics and isoclinics, respectively, from photoelastic fringes in a circular disk under diametric compression. Isochromatics can directly be obtained using wrapped isoclinic phases calculated by the arc tangent operator which is the four-quadrant operator from -$\pi$ to $\pi$. It is not required to unwrap isoclinic phases for the calculations of isochromatics. Unwrapped isoclinics are directly determined from isochromatic parameters. Distributions of digitally determined isoclinics are in close agreement to manual measurements. The errors which would appear in unwrapping process of isoclinics can be avoided in the determination of isochromatics.

부하개폐기용 고전압 계측제어 장치에 관한 연구 (A Study on the High-Voltage Measuring & Control System for a Load Switch)

  • 박정훈;홍성훈;강문성
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 1998년도 하계학술대회 논문집 B
    • /
    • pp.757-759
    • /
    • 1998
  • This paper proposes a new high-voltage measuring system that is able to provide current enough to charge a storage battery for a motor driving a load switch, and detect each phase voltage and phase angle in three phase distribution line accurately. In order to develop the reliable voltage measuring system we had designed and manufactured condenser-type bushing having good characteristics for temperature on account of using epoxy resin as dielectric material, and investigated the variation characteristics of capacitance via variation of applied voltage. The experiment results show that the proposed condenser has good characteristics to environmental changes.

  • PDF

편향법을 이용한 웨이퍼 변형 측정 (Measurement of Wafer Deformation using Deflectometry)

  • 이호동;신상훈;유영훈
    • 한국광학회지
    • /
    • 제24권6호
    • /
    • pp.324-330
    • /
    • 2013
  • 편향법을 이용하여 면적이 비교적 크고 거울과 같이 산란이 거의 없는 물체의 3차원 측정을 하였다. 편향법을 통해 얻은 왜곡 무늬로부터 위상과 기울기를 구하기 위해 푸리에변환 방법을 이용하였고, 구한 기울기로부터 높이를 구하기 위해 최소자승법을 이용하였다. 웨이퍼에 미세 응력을 주었을 때 변형을 편향법을 이용하여 측정할 수 있음을 확인하였다.

Phase Measuring Profilometry를 이용한 반도체 칩의 Lead 높이 측정 방법 (A 3D Measurement System for the Leads of Semiconductor Chips Using Phase Measuring Profilometry)

  • 김영두;조태훈
    • 한국정보처리학회:학술대회논문집
    • /
    • 한국정보처리학회 2011년도 추계학술발표대회
    • /
    • pp.223-226
    • /
    • 2011
  • 반도체 공정에서 부품의 결함을 찾는 것은 완제품의 품질 개선을 위해 중요하다. 현재까지 많은 비전 알고리즘들이 부품의 결함을 찾기 위해 적용되고 있다. 그러나 이런 알고리즘 대부분은 2D 방식의 검사 방식에 머물고 있다. 그러나 이런 2D방식의 검사 방법은 반도체 칩의 Lead나 Pad 그리고 Solder Joint와 같이 3D 정보에 의해 불량 유무를 판결해야 하는 곳에 적용하기 어렵다. 이에 본 논문에서는 PMP(Phase Measuring Profilometry)방법에 의해 반도체 칩의 Lead부분을 검사하기 위한 시스템 구성과 방법을 제안한다.

Development of the Interfacial Area Concentration Measurement Method Using a Five Sensor Conductivity Probe

  • Euh, Dong-Jin;Yun, Byong-Jo;Song, Chul-Hwa;Kwon, Tae-Soon;Chung, Moon-Ki;Lee, Un-Chul
    • Nuclear Engineering and Technology
    • /
    • 제32권5호
    • /
    • pp.433-445
    • /
    • 2000
  • The interfacial area concentration (IAC) is one of the most important parameters in the two-fluid model for two-phase flow analysis. The IAC can be measured by a local conductivity probe method that uses the difference of conductivity between water and air/steam. The number of sensors in the conductivity probe may be differently chosen by considering the flow regime of two-phase flow. The four sensor conductivity probe method predicts the IAC without any assumptions of the bubble shape. The local IAC can be obtained by measuring the three dimensional velocity vector elements at the measuring point, and the directional cosines of the sensors. The five sensor conductivity probe method proposed in this study is based on the four sensor probe method. With the five sensor probe, the local IAC for a given referred measuring area of the probe can be predicted more exactly than the four sensor probe. In this paper, the mathematical approach of the five sensor probe method for measuring the IAC is described, and a numerical simulation is carried out for ideal cap bubbles of which the sizes and locations are determined by a random number generator.

  • PDF

부싱형 커패시터를 이용한 고전압 계측시스템에 관한 연구 (A study on high-voltage measuring system using bushing-type capacitor)

  • 강문성;심형관;유충현
    • 대한전기학회논문지:전력기술부문A
    • /
    • 제48권5호
    • /
    • pp.502-507
    • /
    • 1999
  • An improved, accurate and reliable high-voltage measuring system utilizing a bushing-type capacitor is proposed in this study. This system measures voltages and phase angles of three-phase 22.9 kV power distribution lines and provides enough current to charge a battery for a motor-driven load switch and to operate the measuring and communication circuits for the distribution automation. For reliability, epoxy resin was used as the dielectric material of the bushing-type capacitor since the dielectric strength of epoxy resin is very stable over the wide range of temperature. Capacitances were investigated and found to be stable over the wide range of temperature and applied voltage, and the results indicate that the proposed measurement system is very reliable.

  • PDF

Measurement of electron density of atmospheric pressure Ar plasma jet by using Michelson interferometer

  • Lim, Jun-Sup;Hong, Young June;Choi, Eun Ha
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
    • /
    • pp.195.1-195.1
    • /
    • 2016
  • Currently, as Plasma application is expanded to the industrial and medical industrial, low temperature plasma applications became important. Especially in medical and biology, many researchers have studied about generated radical species in atmospheric pressure low temperature plasma directly adapted to human body. Therefore, so measurement their plasma parameter is very important work and is widely studied all around world. One of the plasma parameters is electron density and it is closely relative to radical production through the plasma source. some kinds of method to measuring the electron density are Thomson scattering spectroscopy and Millimeter-wave transmission measurement. But most methods have very expensive cost and complex configuration to composed of experiment system. We selected Michelson interferometer system which is very cheap and simple to setting up, so we tried to measuring electron density by laser interferometer with laser beam chopping module for measurement of temporal phase difference in plasma jet. To measuring electron density at atmospheric pressure Ar plasma jet, we obtained the temporal phase shift signal of interferometer. Phase difference of interferometer can occur because of change by refractive index of electron density in plasma jet. The electron density was able to estimate with this phase difference values by using physical formula about refractive index change of external electromagnetic wave in plasma. Our guiding laser used Helium-Neon laser of the centered wavelength of 632 nm. We installed chopper module which can make a 4kHz pulse laser signal at the laser front side. In this experiment, we obtained more exact synchronized phase difference between with and without plasma jet than reported data at last year. Especially, we found the phase difference between time range of discharge current. Electron density is changed from Townsend discharge's electron bombardment, so we observed the phase difference phenomenon and calculated the temporal electron density by using phase shift. In our result, we suggest that the electron density have approximately range between 1014~ 1015 cm-3 in atmospheric pressure Ar plasma jet.

  • PDF