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http://dx.doi.org/10.3807/KJOP.2013.24.6.324

Measurement of Wafer Deformation using Deflectometry  

Lee, Hodong (KPS)
Shin, Sanghoon (KPS)
Yu, Younghun (Department of Physics, Cheju National University)
Publication Information
Korean Journal of Optics and Photonics / v.24, no.6, 2013 , pp. 324-330 More about this Journal
Abstract
Phase-measuring deflectometry is a full-field gradient measuring technique that lends itself very well to testing specular optical surfaces. We have measured deformation of a large specular surface by deflectometry. In this work, we have used a Fourier-transform method to get the phase from a measured deformed fringe pattern, and we have used least squares method to obtain the height information of the specular surface from the calculated slope. Experimentally, we have confirmed that deflectometry can be used for deformation measurement of a specular surface like that of a wafer.
Keywords
Deflectometry; Phase measuring deflectometry; Fourier transform;
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Times Cited By KSCI : 1  (Citation Analysis)
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