• Title/Summary/Keyword: patterning technology

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Replication Characteristics of Micro-Patterns according to the Vibration Transmission Direction in the Ultrasonic Imprinting Process (초음파 성형시 진동전달 방향에 따른 미세패턴의 전사특성 고찰)

  • Seo, Young-Soo;Lee, Ki-Yeon;Cho, Young-Hak;Park, Keun
    • Journal of the Korean Society for Precision Engineering
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    • v.29 no.11
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    • pp.1256-1263
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    • 2012
  • The present study covers the ultrasonic patterning process to replicate micro-patterns on a polymer substrate. The ultrasonic patterning process uses ultrasonic waves to generate frictional heat between an ultrasonic horn and the polymer substrate, from which the surface region of the polymer substrate is softened sufficiently for the replication of micro-patterns. The ultrasonic patterning process can divided into two categories according to the direction of vibration transmission: direct patterning and indirect patterning. The direct patterning uses a patterned horn, and the ultrasonic vibration is transferred directly from the patterned horn to the substrate. On the contrary, the indirect patterning process uses a plain horn, and the micro-patterns are engraved on a mold that is located below the substrate. Thus, the micro-patterns are replicated as an indirect manner. In this study, these direct and indirect patterning processes are compared in terms of the replication characteristics. Additionally, the possibility of double-side patterning is also discussed in comparison with the conventional single-side patterning process.

Comprehensive Performance Analysis of Interconnect Variation by Double and Triple Patterning Lithography Processes

  • Kim, Youngmin;Lee, Jaemin;Ryu, Myunghwan
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.14 no.6
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    • pp.824-831
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    • 2014
  • In this study, structural variations and overlay errors caused by multiple patterning lithography techniques to print narrow parallel metal interconnects are investigated. Resistance and capacitance parasitic of the six lines of parallel interconnects printed by double patterning lithography (DPL) and triple patterning lithography (TPL) are extracted from a field solver. Wide parameter variations both in DPL and TPL processes are analyzed to determine the impact on signal propagation. Simulations of 10% parameter variations in metal lines show delay variations up to 20% and 30% in DPL and TPL, respectively. Monte Carlo statistical analysis shows that the TPL process results in 21% larger standard variation in delay than the DPL process. Crosstalk simulations are conducted to analyze the dependency on the conditions of the neighboring wires. As expected, opposite signal transitions in the neighboring wires significantly degrade the speed of signal propagation, and the impact becomes larger in the C-worst metals patterned by the TPL process compared to those patterned by the DPL process. As a result, both DPL and TPL result in large variations in parasitic and delay. Therefore, an accurate understanding of variations in the interconnect parameters by multiple patterning lithography and adding proper margins in the circuit designs is necessary.

Soft Lithography of Graphene Sheets Via Surface Energy Modification

  • Kim, Hansun;Jung, Min Wook;Myung, Sung;Jung, Daesung;Lee, Sun Sook;Kong, Ki-Jeong;Lim, Jongsun;Lee, Jong-Heun;Park, Chong Yun;An, Ki-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.144.2-144.2
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    • 2013
  • With the synthesis of graphene sheets as large-scale and high quality, it is essentially important to develop suitable graphene patterning process for future industrial applications. Especially, transfer or patterning method of CVD-grown graphene has been studied. We report simple soft lithographic process to develop easily applicable patterning method of large-scale graphene sheets by using chemically functionalized polymer stamp. Also important applications, the prototype capacitors with graphene electrode and commercial polymer dielectrics for the electrostatic-type touch panel are fabricated using the developed soft lithographic patterning and transfer process.

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A Study of Laser Patterning for $SiO_2$ Thin Film of Crystalline Solar Cells (결정질 태양전지 $SiO_2$ 박막의 Laser Patterning에 관한 연구)

  • Lee, C.S.;Lee, J.C.;Kim, K.S.;Kang, H.S.
    • Laser Solutions
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    • v.14 no.3
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    • pp.1-6
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    • 2011
  • Globally, the interest of renewable energy has become an upsurge. Especially, the solar industry is the one which is getting rapid growth rate. Many of researchers have been undertaking to improve the efficiency of solar cell to accomplish grid parity. The most of research has been concentrated on two methods, one on the selective emitter and the other is on LBSF (Local Back Surface Field) formation. Laser patterning will be needed to eliminate the thin film to form selective emitter and LBSF of solar cell. This paper reports some experimental results in laser patterning process for high-efficiency crystalline solar cell manufacturing. The experimental results indicate that the patterning quality depends on the average power and repetition rate of laser. The experimental results prove that the laser patterning process is an advantageous method to improve the efficiency of solar cell.

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Designing a nanocrystal-based temperature and strain multi-sensor with one-step inkjet printing

  • Bang, Junsung;Ahn, Junhyuk;Oh, Soong Ju
    • Journal of Sensor Science and Technology
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    • v.30 no.4
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    • pp.218-222
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    • 2021
  • Wearable multi-sensors based on nanocrystals have attracted significant attention, and studies on patterning technology to implement such multi-sensors are underway. Conventional patterning processes may affect material properties based on high temperatures and harsh chemical conditions. In this study, we developed an inkjet printing technique that can overcome these drawbacks through the application of patterning processes at room temperature and atmospheric pressure. Nanocrystal-based ink is used to adjust properties efficiently. Additionally, the viscosity and surface tension of the solvents are investigated and optimized to increase patterning performance. In the patterning process, the electrical, electrothermal, and electromechanical properties of the nanocrystal pattern are controlled by the ligand exchange process. Experimental results demonstrate that a multi-sensor with a temperature coefficient of resistance of 3.82 × 10-3 K-1 and gauge factor of 30.6 can be successfully fabricated using one-step inkjet printing.

Nano Patterning Functional Polymers Using Nano-imprint Technique

  • Gwon, Hyeon-Geun;Lee, Gyu-Tae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.430.2-430.2
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    • 2014
  • Previous studies to enhance optical properties of opto-electronic devices involve patterning of inorganic materials. Patterning of inorganic material usually encompasses vacuum process that hinders productivity and increases cost. In this research, we successfully formed nano patterns with polymer matrix and fabricated photonic crystals. This process is anticipated to increase the performance of opto-electronic devices without any vacuum process. Moreover, nano imprint technology reduces cost and bolsters productivity.

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Micro Patterning Using Near-Field Coupled Nano Probe Laser Photo Patterning Of Chloromethylated Polyimide Thin Film (클로로메틸 폴리이미드(CMPI) 박막과 근접장 나노 프로브 레이저 패터닝을 이용한 미세 형상 가공 기술)

  • 최무진;장원석;김재구;조성학;황경현
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.369-372
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    • 2004
  • Photo-induced surface alignment is charming as a non-contact photo-patternable alignment technology which can be used in the next generation of displays, such as large area, multi-domain. For decades, many polymer film have been investigated and developed to be used in the photo alignment. Among these photoreactive materials, recently developed polyimide, Chloromethylated Polyimide(CMPI) now became the focus of interests in this area because of its high photosensitivity and superior thermal stability. In this report, we present micro patterning method to form the nanoscale structure by Mask-Less laser patterning using this CMPI film and NSOM probe.

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Surface Patterning and Characterization of Food Packaging Films Using Femtosecond Laser (펨토초 레이저를 이용한 식품포장 필름의 표면 패터닝 및 특성)

  • Youngjin Cho
    • KOREAN JOURNAL OF PACKAGING SCIENCE & TECHNOLOGY
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    • v.29 no.2
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    • pp.111-118
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    • 2023
  • In this study, the feasibility of laser patterning on the surface of food packaging polymer film was confirmed, and the surface patterning process conditions of femtosecond laser were established. In addition, it was proved that the surface properties of the film can be changed and controlled through the fabrication of various patterned films on the surface of food packaging films such as HDPE, PP, and PET. Various patterned surfaces, including large-scale circular patterns induced by a single femtosecond laser pulse, roughness patterns achieved by overlapping single pulses by 30%, straight line patterns, roughness patterns obtained by overlapping straight line patterns, and grid patterns formed by intersecting straight line patterns were fabricated. The characteristics of the patterned HDPE, PP, and PET films, based on the surface pattern structure and size, were analyzed using SEM, AFM, and contact angle measurements. Compared to the surface of each control film without femtosecond laser patterning, the contact angles of the surfaces of large-area circular patterning HDPE and PP films, large-area roughness patterning HDPE and PP films by overlapping 30% of single pulses, and large-area roughness patterning PET film by overlapping rectilinear patterning were in the range of 27.1-37.5 degree. This indicated that the HDPE, PP, and PET films became more hydrophilic after patterning. On the other hand, the HDPE film patterned with a large-scale grid pattern exhibited a contact angle of 120.4 degree, indicating that the HDPE film became more hydrophobic after patterning. Therefore, films that have been changed to hydrophilic surfaces through patterning can be used in anti-fouling applications where proteins, cells, viruses, and other food materials do not adhere or are easily detached. In addition, if a superhydrophobic surface of 150 degrees or more is fabricated through more precise lattice patterning in the future, it will be possible to use it for superhydrophobic surface applications such as self-cleaning.

Patterning Biological Molecules onto Poly(amidoamine) Dendrimer on Gold and Glass

  • Hong, Mi-Young;Lee, Do-Hoon;Yoon, Hyun C.;Kim, Hak-Sung
    • Bulletin of the Korean Chemical Society
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    • v.24 no.8
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    • pp.1197-1202
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    • 2003
  • Patterning of biological molecules was attempted on both gold and glass using fourth generation (G4) poly(amidoamine) (PAMAM) dendrimer as an interfacing layer between solid surfaces and biomolecules. As for the patterning of avidin and anti-biotin antibody on gold, PAMAM dendrimers representing amine functionalities were firstly printed onto the 11-mercaptoundecanoic acid SAM by microcontact printing, followed by biotinylation, and reacted with fluorescence-labeled avidin or anti-biotin antibody. Fluorescence microscopic analysis revealed that the patterns of avidin and anti-biotin antibody were well constructed with the resolution of < 2 ㎛. The PAMAM dendrimers were also printed onto aldehyde-activated slide glass and reacted directly with anti-BSA antibodies, which had been oxidized with sodium periodate. As a result, distinct patterns of the anti-BSA antibodies were also obtained with a comparable edge resolution to that of avidin patterns on gold. These results clearly show that PAMAM dendrimers can be adopted as an interfacing layer for the patterning of biological molecules on solid surfaces with micrometer resolution.

Selective Ablation of Emissive Polymer Using Nanosecond-pulsed Laser (나노초 펄스 레이저를 이용한 발광폴리머 패터닝)

  • Ko, J.S.;Oh, B.K.;Kim, D.Y.;Lee, J.Y.;Lee, S.K.;Jung, S.H.;Hong, S.K.
    • Laser Solutions
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    • v.14 no.3
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    • pp.7-11
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    • 2011
  • As an active emission display using emissive polymer has had much attention recently, needs for a selective patterning of emissive layer for those displays have been increased abruptly. Therefore, the various laser sources in terms of its wavelength has been used for laser direct patterning. In this work, the feasibility of those processes is examined using numerical analysis and the experimental investigation. A sample has multi-layered structure, emissive polymer on aluminum which is deposited on a glass substrate. Key factors for optimizing the laser patterning of the emissive polymer are considered into the control of ablation products, large-sized particle, and the choice of the appropriate wavelength for minimizing the heat affected zone and the remnant layer.

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