• 제목/요약/키워드: patterning process

검색결과 443건 처리시간 0.023초

3차원 레이저 스캐너를 이용한 인쇄롤 가공에 관한 연구 (Study on Printing Roll Manufacturing by using 3 Dimensional Laser Scanner)

  • 강희신;노지환;손현기
    • 한국레이저가공학회지
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    • 제16권4호
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    • pp.17-23
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    • 2013
  • The research for the development of roll-to-roll printing process is actively underway on behalf of the existing semiconductor process. The roll-to-roll printing system can make the electronic devices to low-cost mass production. This study is performed for developing the manufacturing technology of the printing roll used in the printing process of electronic devices. The indirect laser engraving technology is used to create printable roll and the printable roll is made out of the chrome coated roll after coating copper and polymer on the surface of steel roll, ablating the polymer on the surface of roll and etching the roll. The 3 dimensional laser scanner and roll rotating systems are constructed and the system control program is developed. We have used the fiber laser of 100 W grade, the 3 dimensional laser scanner and the 3 axes moving stage system with a rotating axis. We have found the optimal conditions by performing the laser patterning experiments and can make the minimum line width of $24{\mu}m$ by using the developed 3 dimensional laser scanner system.

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스크린 인쇄와 리버스 오프셋 인쇄를 혼합한 대면적 미세 전극용 인쇄공정 (A Printing Process Combining Screen Printing with Reverse Off-set for a Fine Patterning of Electrodes on Large Area Substrate)

  • 박지은;송정근
    • 한국전기전자재료학회논문지
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    • 제24권5호
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    • pp.374-380
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    • 2011
  • In this paper a printing process for patterning electrodes on large area substrate was developed by combining screen printing with reverse off-set printing. Ag ink was uniformly coated by screen printing. And then etching resist (ER) was patterned in the Ag film by reverse off-set printing, and then the non-desired Ag film was etched off by etchant. Finally, the ER was stripped-off to obtain the final Ag patterns. We extracted the suitable conditions of reverse Using the process we successfully fabricated gate electrodes and scan bus lines of OTFT-backplane used for e-paper, in which the diagonal size was 6 inch, the resolution $320{\times}240$, the minimum line width 30 um, and sheet resistance 1 ${\Omega}/{\Box}$.

나노물질의 선택적 레이저소결을 이용한 유연전기소자 구현 연구현황 (Status of Research on Selective Laser Sintering of Nanomaterials for Flexible Electronics Fabrication)

  • 고승환
    • 대한기계학회논문집B
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    • 제35권5호
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    • pp.533-538
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    • 2011
  • 대부분의 유연전기소자는 플라스틱, 옷감, 종이와 같이 고온에 민감한 물질이기 때문에 열에 민감한 기판 위에 금속을 증착하고 패터닝할 수 있는 저온 공정의 개발이 필요하다. 최근 기존의 광식각과 진공증착 방법을 이용하지 않고 액상으로 금속 나노입자의 박막을 형성하고 선택적 레이저 소결을 이용하여 플라스틱에 열적손상을 최소화하고 고해상도의 금속 패터닝을 방법이 많은 연구가 활발히 진행되고 있다. 본 논문에서는 본 연구실에서 활발히 수행중인 나노물질의 선택적 레이저소결법을 이용하여 유연 디스플레이와 유연태양전지와 같은 유연전기소자의 개발 동향에 대해 알아보고 앞으로의 발전방향에 대해 논의한다.

Photosensitive Barrier Rib Paste and Materials and Process

  • Park, Lee-Soon;Kim, Soon-Hak;Jang, Dong-Gyu;Kim, Duck-Gon;Hur, Young-June;Tawfik, Ayman
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.823-827
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    • 2005
  • Barrier ribs in the plasma display panel (PDP) function to maintain the discharge space between the glass plates as well as to prevent optical crosstalk. Patterning of barrier ribs is one of unique processes for making PDP. Barrier ribs could be formed by screen-printing, sand blasting, etching, and photolithographic process. In this work photosensitive barrier rib pastes were prepared by incorporating binder polymer, solvent, functional monomers photoinitiator, and barrier rib powder of which surface was treated with fumed silica particles. Studies on the function of materials for the barrier rib paste were undertaken. After optimization of paste formulation and photolithographic process, it was applied to the photosensitive barrier rib green sheet and was found that photolithographic patterning of barrier ribs could be formed with good resolution up to $110{\mu}m$ height and $60{\mu}m$ width after sintering.

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Screening of spherical phosphors by electrophoretic deposition for full-color field emission display application

  • Kwon, Seung-Ho;Cho, sung-Hee;Yoo, Jae-Soo;Lee, Jong-Duk
    • Journal of Korean Vacuum Science & Technology
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    • 제3권1호
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    • pp.79-84
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    • 1999
  • the photolithographic patterning on an indium-tin oxide (ITO) glass and the electro-phoretic deposition were combined for preparing the screen of the full-color field emission display(FED). the patterns with a pixel of 400$\mu\textrm{m}$ on the ITO-glass were made by etching the ITO with well-prepared etchant consisting of HCL, H2O, and HNO3. Electrophoretic method was carried out in order to deposit each spherical red (R), green(G), and blue (B) phosphor on the patterned ITO-glass. The process parameters such as bias voltage, salt concentration, and deposition time were optimized to achieve clear boundaries. It was found that the etching process of ITO combined with electrophoretic method was cost-effective, provided distinct pattern, and even reduced process steps compared with conventional processes. The application of reverse bias to the dormant electrodes while depositing the phosphors on the stripe pattern was found to be very critical for preventing the cross-contamination of each phosphor in a pixel.

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연삭기법을 이용한 패터닝 기술 (Grinding Technology for Surface Texturing)

  • 고태조;한두섭;구강;박종권
    • 한국정밀공학회지
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    • 제31권5호
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    • pp.367-373
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    • 2014
  • Surface texturing is a machining process on the surface to give engineering functions. The representative process of the surface texturing is lotus effect to give hydrophobic property by the lithography and chemical etching, which is the bio mimic from the nature. Surface texturing can be manufactured by a lot of processes, in particular using mechanical method such as a precise diamond turning, grinding, rolling, embossing, vibrorolling, and abrasive jet machining (AJM). Among them, the grinding process is notable in terms of the wide range of texturing area and fast processing time. The patterning by grinding is done by the grooved grinding wheel on the work piece. In this case, the pattern shape is determined by the grinding conditions as well as the wheel dressing conditions. In this paper, experimental study on the pattern shapes were done and provide the feasibility in use for the large area patterning.

레이저 직접 패터닝에 의한 폴리이미드의 표면 특성 제어 (Tailoring Surface Properties of Polyimides by Laser Direct Patterning)

  • 황윤찬;손정민;박재희;남기호
    • 한국염색가공학회지
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    • 제35권2호
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    • pp.121-127
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    • 2023
  • In this study, a comprehensive investigation was conducted on the morphological and property changes of laser-induced nanocarbon (LINC) as a function of laser process parameters. LINC was formed on the surfaces of polyimide films with different backbone structures under various process conditions, including laser power, scan speed, and resolution. Three different forms of LINC electrodes (i.e., continuous 3D porous graphene, wooly nanocarbon fibers, line cut) were formed depending on the laser power and scan speed. Furthermore, heteroatom doping induced from the chemical structure of the polyimide during laser patterning was found to be effective in modifying the electrical properties of LINC electrodes. The LINC surfaces exhibited different microstructures depending on the laser beam resolution under constant laser power and scan speed, allowing for controllable surface wettability. The correlation between the chemical structure of the polymer substrate, laser process parameters, and carbonized surface properties in this study is expected to be utilized as fundamental understanding for the manufacturing of next-generation carbon-based electronic devices.

로봇 팔레타이징 시뮬레이터를 위한 적재 패턴 생성 및 시변 장애물 회피 알고리즘의 제안 (Algorithmic Proposal of Optimal Loading Pattern and Obstacle-Avoidance Trajectory Generation for Robot Palletizing Simulator)

  • 유승남;임성진;김성락;한창수
    • 제어로봇시스템학회논문지
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    • 제13권11호
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    • pp.1137-1145
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    • 2007
  • Palletizing tasks are necessary to promote efficient storage and shipping of boxed products. These tasks, however, involve some of the most monotonous and physically demanding labor in the factory. Thus, many types of robot palletizing systems have been developed, although many robot motion commands still depend on the teach pendant. That is, the operator inputs the motion command lines one by one. This is very troublesome and, most importantly, the user must know how to type the code. We propose a new GUI(Graphic User Interface) for the palletizing system that is more convenient. To do this, we used the PLP "Fast Algorithm" and 3-D auto-patterning visualization. The 3-D patterning process includes the following steps. First, an operator can identify the results of the task and edit them. Second, the operator passes the position values of objects to a robot simulator. Using those positions, a palletizing operation can be simulated. We chose a widely used industrial model and analyzed the kinematics and dynamics to create a robot simulator. In this paper we propose a 3-D patterning algorithm, 3-D robot-palletizing simulator, and modified trajectory generation algorithm, an "overlapped method" to reduce the computing load.

DPT를 위한 자동 레이아웃 분리 (Automatic Layout Decomposition for DPT)

  • 문동선;신현철;신재필
    • 대한전자공학회논문지SD
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    • 제45권4호
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    • pp.124-130
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    • 2008
  • Double patterning technology (DPT)를 위한 자동 레이아웃 분리 기술을 개발하였다 CMOS 공정이 45nm와 그 이하로 점차 미세화 됨에 따라 리소그래피 해상도를 향상시키는 기술이 요구되고 있다. 최소 거리 규칙을 완화하기 위해 두 개의 마스크로 레이아웃을 나누어 두 번 패터닝 하는 DPT 기술이 기존 리소그래피의 제한을 해소하기 위해 제안되었다. 그러나 레이아웃을 DPT에 적합하게 두 개의 마스크로 나누는 것은 항상 가능하지 않다. 이러한 문제를 해결하기 위해 새로운 자동 스티칭 기술을 개발하였다. 실험 결과는 본 논문에서 제안한 DPT를 위한 자동 레이아웃 분리 방법이 고무적임을 보여준다.

이층 박막 구조에서 ITO 전극의 레이저 직접 패터닝 시레이저 식각 패턴 중첩 비율의 변화 (Overlapping Rates of Laser Spots on the Laser Direct Patterning of ITO Electrode in the Double-layer Structure of Thin Film)

  • 왕건훈;박정철;권상직;조의식
    • 한국전기전자재료학회논문지
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    • 제25권5호
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    • pp.377-380
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    • 2012
  • Laser direct patterning of indium tin oxide(ITO) is one of new methods of direct etching process to replace the conventional photolithography. A diode pumped Q-switched Nd:$YVO_4$ (${\lambda}$= 1,064 nm) laser was used to produce ITO electrode on various transparent oxide semiconductor films such as zinc oxide(ZnO). The laser direct etched ITO patterns on ZnO were compared with those on glass substrate and were considered in terms of the overlapping rate of laser beam. In case of the laser etching on double-layer, it was possible to obtain the higher overlapping rate of laser beam.