• Title/Summary/Keyword: patterned film

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Tailoring Magnetic Interlayer Coupling Contribution via Lateral Confinement (가로 가둠을 통한 자성층간 결합 기여도 조절)

  • Lee, Dong Ryeol
    • Journal of the Korean Magnetics Society
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    • v.26 no.5
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    • pp.149-153
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    • 2016
  • In Fe/Gd multilayers, patterning effect on the interlayer coupling was studied by comparing patterned and unpatterned samples that were cut from a multilayer film. A comparative study of the two samples via temperature dependent Gd-specific magnetization vector using X-ray magnetic circular dichroism (XMCD) shows that the temperature dependence of the Gd magnetization vector can be modified in the patterned sample due to a competition between the patterning and antiferromagnetic interlayer coupling effects.

Influence of Stain on the High Frequency Impedance of Highly Magnetostrictive Films (고자왜막의 고주파임피던스에 미치는 스트레인의 영향)

  • ;M. Inoue;K. I, Arai
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.1
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    • pp.47-51
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    • 2000
  • To make a practical application of a micro-strain sensors with ultrahigh sensitivity, a strain on electrical properties of micro-patterned amorphous (Fe\ulcornerco\ulcorner)\ulcornerSi\ulcornerB\ulcorner films had influenced on the impedance over frequency range from 1 MHz to 1 GHz. Reflecting excellent magnetomachanical couping properties of films, high frequency impedance was subject to change sensitively by a strain : a change in impe-dance of 39% was observed at 200 MHz applied a strain of 224$\times$10\ulcorner. To determine a optimum shape of micro-patterned films, film impedance was analyzed by virtue of its constitutive components of resis-tance and reactance. Result was shown that reduction of the resistance term(hence increase of resultant reactance term) of impedance is more effective for enhancing the strain sensitivity of films at relatively low frequency range.

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Transient Protection of Intramolecular Hydrogen Bonding: A Simple but Elegant Approach for Functional Imaging

  • Kim, Jong-Man;Min, Sung-Jun;Park, Bum-Jun;Lee, Jae-Hyung;Ahn, Kwang-Duk
    • Macromolecular Research
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    • v.12 no.5
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    • pp.493-500
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    • 2004
  • We have developed a novel method for patterning functional images in thin polymer films. The key materials we utilized for the imaging were dihydroxyanthraquinones protected with acid-labile tert-butoxycarbonyl (t-Boc) blocking groups. Among the tested compounds, 1,4-dihydroxyanthraquinone (quinizarin; 1) underwent the most drastic change in terms of its color and fluorescence upon protection. We prepared the t-Boc-protected quinizarin and polymers bearing the protected quinizarins as pendent groups. To investigate the possibility of a single-component imaging system, we synthesized a styrenic monomer 14 incorporating protected quinizarin and a maleimide derivative 15 bearing a photoacid generating group and subjected them to polymerization. Selective removal of the protecting groups of the quinizarin moieties in the exposed area using photolithographic techniques allowed regeneration of quinizarin and patterned fluorescence images in the polymer films.

Electrical properties of Organic TFT patterned by shadow-mask with all layer

  • Lee, Joo-Won;Kim, Jai-Kyeong;Jang, Jin;Ju, Byeong-Kwon
    • Proceedings of the IEEK Conference
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    • 2006.06a
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    • pp.543-544
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    • 2006
  • Pentacene thin film transistors fabricated without photolithographic patterning were fabricated on the plastic substrates. Both the organic/inorganic thin films and metallic electrode were patterned by shifting the position of the shadow mask which accompanies the substrate throughout the deposition process. By using an optically transparent zirconium oxide ($ZrO_2$) as a gate insulator and octadecyltrimethoxysilane (OTMS) as an organic molecule for self-assembled monolayer (SAM) to increase the adhesion between the plastic substrate and gate insulator and the mobility with surface treatment, high-performance transistor with field effect mobility $.66\;cm^2$/V s and $I_{on}/I_{off}$>$10^5$ was formed on the plastic substrate. This technique will be applicable to all structure deposited at low temperature and suitable for an easy process for flexible display.

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Oxide Thickness Measurement of CMP Test Wafer by Dispersive White-light Interferometry (분산형 백색광 간섭계를 이용한 CMP 테스트 웨이퍼의 $SiO_2$ 두께 측정)

  • Park, Boum-Young;Kim, Young-Jin;Jeong, Hae-Do;Ghim, Young-Sik;You, Joon-Ho;Kim, Seung-Woo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.86-87
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    • 2007
  • The dispersive method of white-light interferometry is proper for in-line 3-D inspection of dielectric thin-film thickness to be used in the semiconductor and flat-panel display industry. This research is the measurement application of CMP patterned wafer. The results describe 3-D and 2-D profile of the step height during polishing time.

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Nanomolding of High Density Patterned Media and Measurement of Magnetic Domain (고밀도 패턴드 미디어 성형 및 자성 도메인 평가에 관한 연구)

  • Yang, J.M.;Lee, N.S.;Kang, S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2008.05a
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    • pp.305-308
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    • 2008
  • In this paper, the magnetic domain states and recordability of the molded magnetic nanopillars were examined and analyzed by magnetic force microscopy (MFM) measurement. We focused on the some of the technical issues for MFM measurement regarding the lift height and geometry of the MFM tip. The effects of MFM tip shape and lift height on the MFM resolution were analyzed. Finally, we showed that the magnetic film on each molded nanopillars has a single magnetic domain state.

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Conformal coating of Al-doped ZnO thin film on micro-column patterned substrate for TCO (TCO 응용을 위한 패턴된 기판위에 증착된 AZO 박막의 특성 연구)

  • Choi, M.K.;Ahn, C.H.;Kong, B.H.;Cho, H.K.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.28-28
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    • 2009
  • Fabrications of antireflection structures on solar cell were investigated to trap the light and to improve quantum efficiency. Introductions of patterned substrate or textured layer for Si solar cell were performed to prevent reflectance and to increase the path length of incoming light. However, it is difficult to deposit conformally flat electrode on perpendicular plane. ZnO is II-VI compound semiconductor and well-known wide band-gap material. It has similar electrical and optical properties as ITO, but it is nontoxic and stable. In this study, Al-doped ZnO thin films are deposited as transparent electrode by atomic layer deposition method to coat on Si substrate with micro-scale structures. The deposited AZO layer is flatted on horizontal plane as well as perpendicular one with conformal 200 nm thickness. The carrier concentration, mobility and resistivity of deposited AZO thin film on glass substrate were measured $1.4\times10^{20}cm^{-3}$, $93.3cm^2/Vs$, $4.732\times10^{-4}{\Omega}cm$ with high transmittance over 80%. The AZO films were coated with polyimide and performed selective polyimide stripping on head of column by reactive ion etching to measure resistance along columns surface. Current between the micro-columns flows onto the perpendicular plane of deposited AZO film with low resistance.

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Substrate Effects on the Response of PZT Infrared Detectors (상이한 기판조건에 따른 PZT 적외선 감지소자의 성능 변화)

  • Go, Jong-Su;Gwak, Byeong-Man;Liu, Weiguo;Zhu, Weiguang
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.26 no.3
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    • pp.428-435
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    • 2002
  • Pyroelectric $Pb(Zr_{0.3}Ti_{0.7})O_3$ (PZT30/70) thin film IR detectors has been fabricated and characterised. The PZT30/70 thin film was deposited onto $Pt/Ti/Si_3N_4/SiO_2/Si$ substrate by the sol-gel process. Four different substrate conditions were studied for their effects on the pyroelectric responses of the IR detectors. The substrate conditions were the combinations of the Si etching and the Pt/Ti patterning. In the Si etched substrate, the $Si_3N_4/SiO_2$ composite layer was used as silicon etch-stop, and was used as the membrane to support the PZT pyroelectric film element as well. The measured pyroelectric current and voltage responses of detectors fabricated on the micro-machined thin $Si_3N_4/SiO_2$ membrane were two orders higher than those of the detectors on the bulk-silicon. For detectors on the membrane substrate, the Pt/Ti patterned detectors showed a 2-times higher pyroelectric response than that of not-patterned detectors. On the other hand, the pyroelectric response of the detectors on the not-etched Si substrate was almost the same, regardless of the Pt/Ti patterning. It was also found that the rise time strongly depended on the substrate thickness: the thicker the substrate was, the longer the rise-time.

Fabrication and Characterization of Transparent Piezoresistors Using Carbon Nanotube Film (탄소나노튜브 필름을 이용한 투명 압저항체의 제작 및 특성 연구)

  • Lee, Kang-Won;Lee, Jung-A;Lee, Kwang-Cheol;Lee, Seung-Seob
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.34 no.12
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    • pp.1857-1863
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    • 2010
  • We present the fabrication and characterization of transparent carbon nanotube film (CNF) piezoresistors. CNFs were fabricated by vacuum filtration methods with 65?92% transmittance and patterned on Au-deposited silicon wafer by photolithography and dry etching. The patterned CNFs were transferred onto poly-dimethysiloxane (PDMS) using the weak adhesion property between the silicon wafer and the Au layer. The transferred CNFs were confirmed to be piezoresistors using the equation of concentrated-force-derived resistance change. The gauge factor of the CNFs was measured to range from 10 to 20 as the resistance of the CNFs increased with applied pressure. In polymer microelectromechanical systems, CNF piezoresistors are the promising materials because of their high sensitivity and low-temperature process.

3-D Structured Cu2ZnSn (SxSe1-x)4 (CZTSSe) Thin Film Solar Cells by Mo Pattern using Photolithography (Mo 패턴을 이용한 3-D 구조의 Cu2ZnSn (SxSe1-x)4 (CZTSSe) 박막형 태양전지 제작)

  • Jo, Eunjin;Gang, Myeng Gil;Shin, hyeong ho;Yun, Jae Ho;Moon, Jong-ha;Kim, Jin Hyeok
    • Current Photovoltaic Research
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    • v.5 no.1
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    • pp.20-24
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    • 2017
  • Recently, three-dimensional (3D) light harvesting structures are highly attracted because of their high light harvesting capacity and charge collection efficiencies. In this study, we have fabricated $Cu_2ZnSn(S_xSe_{1-x})_4$ based 3D thin film solar cells on PR patterned Molybdenum (Mo) substrates using photolithography technique. Specifically, Mo patterns were deposited on PR patterned Mo substrates by sputtering and the thin Cu-Zn-Sn stacked layer was deposited over this Mo patterns by sputtering technique. The stacked Zn-Sn-Cu precursor thin films were sulfo-selenized to form CZTSSe pattern. Finally, CZTSSe absorbers were coated with thin CdS layer using chemical bath deposition and ZnO window layer was deposited over CZTSSe/CdS using DC sputtering technique. Fabricated 3-D solar cells were characterized by X-ray diffraction (XRD), X-ray fluorescence (XRF) analysis, Field-emission scanning electron microscopy (FE-SEM) to study their structural, compositional and morphological properties, respectively. The 3% efficiency is achieved for this kind of solar cell. Further efforts will be carried out to improve the performance of solar cell through various optimizations.