• 한국의류산업학회지
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• 제6권6호
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• pp.803-809
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• 2004

In order to activate the characteristics of charcoal in fiber systems, this was carried out to experiment with the particle size from two micrometers to ten micrometers of charcoal powders on cotton fabrics. The results obtained were as follows; The fabrics were dyed with gray colors by charcoal. The K/S values, that were indicative of the dye affinity, became higher as the increase of dyeing temperature, dyeing time, and dyeing concentration. Also it was confirmed the morphology of the fiber surfaces adsorbed with the particle size from two micrometers to four micrometers of charcoal powder by scanning electronmicronscope. The cotton fabrics dyed by charcoals generally recorded 3-4 degree of wash fastness, 4-5 degree of dry-cleaning fastness, 4-5 degree acidic and alkaline perspirations and water fastness. In connection with the functional properties, cotton fabrics dyed with charcoal appeared that antibacterial, deodorization, far infrared emissivity were improved. Especially the deodorization was improved greatly by using charcoal.

• 한국재료학회지
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• 제8권9호
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• pp.837-842
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• 1998

ULSI급 소자의 집적도가 높아짐에 따라 공정의 신뢰도 및 수율 향상을 위한 세정 방법에 대한 관심이 더욱 높아지고 있다. 그중 가장 관심을 집중시키는 분야는 구리나 철과 같은 금속불순물의 제거에 관한 것이다. 본 연구에서는 금속 불순물 중 실제 공정에서 잘 오염되는 것으로 알려진 구리와 철 불순물을 인위적으로 오염시킨 후 $\textrm{H}_2\textrm{O}_2$와 HF의 혼합용액과 UV/$\textrm{O}_3$과 HF처리의 조합을 이용한 세정 방법을 이용하여 금속불순물을 제거하였다. 세정후 제정효과는 TXRF를 이용하여 측정하였고 Si 기판의 표면 거칠기를 AFM을 이용하여 측정하였다. 또한 금속 불순물의 흡착형태와 흡착기구 등을 SEM을 이용해 관찰하였고 AES를 이용하여 화학적 성분 분석을 실시하였다. 실험 결과 인위적 오염 후 구리의 오염도는 $\textrm{10}^{14}$ atoms/$\textrm{cm}^2$이었으며 각각의 세정을 통하여 $\textrm{10}^{10}$ atoms/$\textrm{cm}^2$으로 감소되었으며 반복된 세정으로 더욱 우수한 세정효과와 표면 거칠기의 개선 효과를 얻을 수 있었다. 구리는 박막의 형태가 아닌 구형의 입자 형태로 화학적 흡착에 의해 오염되는 것으로 관찰되었다. 철의 경우는 오염도가 $\textrm{10}^{13}$ atoms/$\textrm{cm}^2$ 이며 세정효과는 구리의 경우와 유사한 결과를 보여주었다. 철 불순물은 물리적 흡착에 의해 Si 표면에 오염되는 것으로 보이며 역시 구형의 입자형태로 표면에 흡착하는 것으로 관찰되었다.

• 한국태양에너지학회:학술대회논문집
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• 한국태양에너지학회 2009년도 추계학술발표대회 논문집
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• pp.279-284
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• 2009

Traditionally, so-called "industrial waste gases", such ad exhaust from boilers at industrial installations and a large quantity of soot discharged from power station, before their release into the atmosphere, have been on occasion subjected to an air cleaning process to remove fine particles that may pollute the atmosphere (such as mist and dust containing various powdery or oily substances and moisture from industrial waste gases). The release of industrial waste gases containing these particles directly into the atmosphere poses a serious threat to the earth environment; and recovery of these noxious substances is required by law in some countries and local governments. in urban areas, air pollution from automobile exhaust and others creates a serious condition. Some homes are equipped with and use indoor air purifiers. In many of the kitchens of restaurants, smoke generated during cooking and otherwise contaminated air are cleansed by air purifiers before being released outside or recycled inside. For the dust collecting devices to recover the fine particles contained in contaminated air, the cause for air pollution and how to purify air, many types based on various principles are known. Specifically, classified based on theories of particle collection, filtration, gravity, inertia, centrifugation, electricity, and cleaning types are cited as available processes. Among them, an appropriate type is selected according to the size or type of fine particles to be collected and conditions for installation. For the efficiency of dust collection, a filtration system (by using bag filters and others) and electric system are particularly outstanding and are therefore used widely in various areas of industry. In this research, rotary type high performance oil mist and smoke collecting system with self auto cleaning device equipped with the cleaning fluid spraying section is investigated.

• 한국입자에어로졸학회지
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• 제9권4호
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• pp.261-269
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• 2013

The chemical mechanical polishing (CMP) process is widely used in semiconductor manufacturing process for planarization of various materials and structures. Point-of-use (POU) filters are used in most of the CMP processes in order to reduce the unwanted micro-scratches which may result in defects. The performance of the POU filter is depends on type and size of the abrasives used during cleaning process. For this reason, there is a need to evaluate POU filters for their filtration efficiency (FE) with different types of abrasives. In this study, we developed filter test system to evaluate the FE of POU using ceria and silica abrasives (slurry). The POU filter is roll type capsule filter with retention size of 0.2 ${\mu}m$. Two POU filters of different make are evaluated for FE. We observed that both POU filters show similar filtration efficiency for silica and ceria slurry. Results reveal that the ceria slurry and the colloidal silica particle are removed not only by mechanical way but also hydrodynamic and electrostatic interaction way.

• 대한환경공학회지
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• 제22권1호
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• pp.21-31
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• 2000

본 연구에서는 공기청정기, 기수분리기 및 중성능 필터로 구성되는 습식 공기청정장치를 대상으로 입자와 유해가스인 $SO_2$, NO, $NO_2$, HCHO 및 $NH_3$의 제거 특성을 실험적으로 살펴보고, 실험결과를 대상물질의 물리화학적 특성과 연관시켜 검토하였다. 입자제거 실험에서는 대기 에어로졸을 송풍기를 통해 장치에 도입하여 장치의 3곳에서 2대의 레이저 입자계수기로 입자크기 분포를 측정하여 각 구성요소의 입자제거효율을 구하였다. 실험결과로부터 기수분리기에서는 입경이 $5{\mu}m$ 이상인 조대 입자가 주로 제거되고. 중성능 필터에서는 이보다 작은 미세 입자가 주로 제거됨을 알 수 있었다. 유해가스 제거 실험에서는 시험용 가스를 송풍기의 출구에 주입하여 공기청정기의 상류와 기수분리기의 하류에서 가스농도를 측정하여 유해가스 제거효율을 구하였다. 실험결과로부터 헨리상수가 큰 수용성인 $SO_2$, HCHO 및 $NH_3$는 제거효율이 높았으나, 헨리상수가 낮아 난용성인 NO와 $NO_2$는 제거효율이 낮음을 알 수 있었으며, 공기청정기에서 상당량의 음이온이 발생됨을 알았다.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2003년도 기술심포지움 논문집
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• pp.256-259
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• 2003

To develop cleaning process various particles should be deposited on wafer surfaces to measure particle removal efficiencies. The purpose of the article in to evaluate, removal efficient)r of silica and alumina particles from wafer surfaces when they are deposited by dry and wet method. Dry deposition in air and wet spray deposition using solutions are used. van der Waals are considered to calculate the adhesion force of particles on surfaces. Higher adhesion force is measured on alumina particles on silicon when particles are deposited in air.

• 산업기술연구
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• 제15권
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• pp.175-185
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• 1995

Under the new environmental regulations announced by the government, utilities will have to cut their sulfur dioxide emissions by 60% from 1991 levels by the year of 1999. Sulfur dioxide emissions can be reduced prior to combustion by physical, chemical or biological coal cleaning. The new technology of high gradient magnetic separation (HGMS) offers the potential of economic separatoins of a variety of fine, weakly magnetic minerals including inorganic sulfur and many ash-forming minerals from coals. In the present paper, magnetic separation tests have been conducted on Korean anthracite and high-sulfur Chinese coal to investigate the feasibility of these techniques for reducing sulfur content from coals. In wet magnetic separation, the studied operating parameters include particle size, pH, matrix types, feed solids content, feed rate, number of cleaning stages and etc. The results shows that for wet separation, 60~70% of total sulfur was removed from coals with over 80% combustible recovery, on the other hand, for dry separation, 47.6% of total sulfur was removed from coals with 75% recovery.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.537-537
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• 2008

Copper (Cu) has been widely used for interconnection structure in intergrated circuits because of its properties such as a low resistance and high resistance to electromigration compared with aluminuim. Damascene processing for the interconnection structure utilizes 2-steps chemical mechanical polishing(CMP). After polishing, the removal of abrasive particles on the surfaces becomes as important as the polishing process. In the paper, buffing process for the removal of colloidal silica from polished Cu wafer was proposed and demonstrated.

• 센서학회지
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• 제32권5호
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• pp.300-306
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• 2023

A hull-cleaning robot sticks to the surface of a vessel and moves for efficient cleaning. Precise path planning and tracking using the current position is crucial. Many robots rely on the INS algorithm, but errors accumulate. To fix this, GPS, sonar, and USBL are used, though with limitations. Selecting suitable sensors for the surface operation and accurate positioning algorithm are vital. In this study, we developed a robot position estimation algorithm using the structure of a ship. Problems that arise when expanding the 2D position estimation algorithm used in existing wall structures to 3D were evaluated and methods for solving them were proposed. In addition, we aimed to improve performance by deriving singularities that exist in the robot path and proposing an error correction algorithm based on the singularities.

• 마이크로전자및패키징학회지
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• 제16권1호
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• pp.45-50
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• 2009

레이저를 이용 실리콘 관통형 접속기술인 TSV(Through-Silicon-Via)를 형성할 경우 Debris(파편물) 및 Particle이 발생되므로 이를 제거하기 위한 세정공정을 연구하였다. 계면활성제를 이용한 화학적 세정과 Brush를 이용한 물리적 세정을 검토하기 위하여 세정기를 제작하고 8인치 CMOS Image Sensor wafer에 직경 $30{\mu}m$, 깊이 $100{\mu}m$를 갖는 Via를 제작하여 두 가지의 세정방법을 연구하였다. 세정액은 DI Water와 계면활성제의 혼합비 2:1에서 Debris 범위가 $73{\mu}m^2$로 희석비가 낮을수록 세정력이 우수하였다. 레이저의 주파수와 속도변위에 따른 가공 조건 변화에는 Debris 분포차가 5% 미만으로 세정력에는 영향이 없었다. Brush를 이용하여 Debris를 제거하는 실험에서 Strip $1000{\sim}3000rpm$, Rinse $50{\sim}3000rpm$, Brush $200{\sim}300rpm$ 으로 증가시켜 세정하였을 때 Crack이나 손상 없이 Debris의 분포가 감소하였다. 따라서 화학적 세정과 물리적 세정으로 Debris를 제거할 수 있다.