• 제목/요약/키워드: partial oxidation

검색결과 307건 처리시간 0.026초

Kinetics and Mechanism of the Oxidation of Carbon Monoxide on CoO-$\alpha-Fe_2O_3$ Catalysts

  • Kim, Keu Hong;Choi, Jae Shi;Kim, Young Bae
    • Bulletin of the Korean Chemical Society
    • /
    • 제8권5호
    • /
    • pp.389-393
    • /
    • 1987
  • The oxidation of carbon monoxide by gaseous oxygen on 0.53, 1.02, and 1.51 mol $\%$CoO-doped $-Fe_2O_3$ catalysts has been investigated in the temperature range from 340 to 480$^{\circ}C$ under various CO and $O_2$ partial pressures. The oxidation rates have been correlated with 1.5-order kinetics; the 0.5-order with respect to $O_2$ and the first-order with respect to CO. In the above temperature range, the activation energy is 0.34 $\pm$ 0.01 eV${\cdot}$$mol^{-1}$. The electrical conductivity of 0.53, 1.02, and 1.51 mol %CoO-doped $\alpha$-$Fe_2O_3$ has been measured at 350$^{\circ}C$ under various $P_{CO}and $P_{O_2}$. From the conductivity data it was found that $O_2$ was adsorbed on Vo formed by doping with CoO, while CO appeared essentially to be chemisorbed on the lattice oxygen of the catalyst surface. The proposed oxidation mechanism and the dominant defect were supported by the agreement between the kinetic data and conductivities.

퀴놀린 폐수의 습식산화와 호기성 생물학적 통합처리 (Integrated Wet Oxidation and Aerobic Biological Treatment of the Quinoline Wastewater)

  • 권순석;문해미;이용학;유용호;윤왕래;서일순
    • KSBB Journal
    • /
    • 제23권3호
    • /
    • pp.245-250
    • /
    • 2008
  • 퀴놀린은 생물학적으로 거의 산화 분해되지 않았으나, 250$^{\circ}C$ 습식산화에서 니코틴산과 초산 등으로 산화 분해되었다. 퀴놀린 습식산화는 균일촉매 $CuSO_4$ 또는 쉽게 습식산화 분해되는 페놀에 의해 반응조건이 완화되었다. 퀴놀린 습식산화 반응의 주 생성물 중 하나인 니코틴산은 호기성 Bacillus 종균에 의해 산화 분해되었다. 촉매를 사용하지 않은 고온에서의 퀴놀린 습식산화 생성물의 생물학적 산화는 저온에서 진행된 균일 촉매 ($CuSO_4$) 습식산화와 퀴놀린-페놀 혼합용액 습식산화 반응 생성물의 생물학적 산화에 비하여 늦게 진행되었다. 반면에, 호기성 균주의 습식산화 생성물에의 적응은 생물학적 처리에서의 니코틴산 산화 분해 반응의 지체기를 크게 단축시켰다.

The Lubricant Effect of Oxidation and Wear Products of HVOF Co-alloy T800 Powder Coating

  • Cho, Tong Yul;Yoon, Jae Hong;Kim, Kil Su;Song, Ki Oh;Youn, Suk Jo;Chun, Hui Gon;Hwang, Soon Young
    • Corrosion Science and Technology
    • /
    • 제6권4호
    • /
    • pp.159-163
    • /
    • 2007
  • Micron size Co-alloy 800 (T800) powder is coated on the high temperature, oxidation and corrosion resistant super alloy Inconel 718 substrate by the optimal high velocity oxy-fuel (HVOF) thermal spray coating process developed by this laboratory. For the study of durability improvement of high speed spindle operating without lubricants, friction and sliding wear behaviors of the coatings are investigated both at room and at an elevated temperature of $1000^{\circ}F(538^{\circ}C)$. Friction coefficients, wear traces and wear debris of coatings are drastically reduced compared to those of non-coated surface of Inconel 718 substrate both at room temperature and at $538^{\circ}C$. Friction coefficients and wear traces of both coated and non-coated surfaces are drastically reduced at higher temperature of $538^{\circ}C$ compared with those at room temperature. At high temperature, the brittle oxides such as CoO, $Co_{3}O_{4}$, $MoO_2$ and $MoO_3$ are formed rapidly on the sliding surfaces, and the brittle oxide phases are easily attrited by reciprocating slides at high temperature through oxidation and abrasive wear mechanisms. The brittle solid oxide particles, softens, melts and partial-melts play roles as solid and liquid lubricants reducing friction coefficient and wear. These show that the coating is highly recommendable for the durability improvement coating on the machine component surfaces vulnerable to frictional heat and wear.

Comparison of the Kinetic Behaviors of Fe2O3 Spherical Submicron Clusters and Fe2O3 Fine Powder Catalysts for CO Oxidation

  • Yoo, Seung-Gyun;Kim, Jin-Hoon;Kim, Un-Ho;Jung, Jin-Seung;Lee, Sung-Han
    • Bulletin of the Korean Chemical Society
    • /
    • 제35권5호
    • /
    • pp.1379-1384
    • /
    • 2014
  • ${\alpha}-Fe_2O_3$ spherical particles having an average diameter of ca. 420 nm and ${\alpha}-Fe_2O_3$ fine particles (< 10 ${\mu}m$ particle size) were prepared to examine as catalysts for CO oxidation. Kinetic studies on the catalytic reactions were performed in a flow reactor using an on-line gas chromatography system operated at 1 atm. The apparent activation energies and the partial orders with respect to CO and $O_2$ were determined from the rates of CO disappearance in the reaction stage showing a constant catalytic activity. In the temperature range of $150-275^{\circ}C$, the apparent activation energies were calculated to be 13.7 kcal/mol on the ${\alpha}-Fe_2O_3$ spherical submicron clusters and 15.0 kcal/mol on the ${\alpha}-Fe_2O_3$ fine powder. The Pco and $Po_2$ dependencies of rate were investigated at various partial pressures of CO and $O_2$ at $250^{\circ}C$. Zero-order kinetics were observed for $O_2$ on both the catalysts, but the reaction order for CO was observed as first-order on the ${\alpha}-Fe_2O_3$ fine powder and 0.75-order on the ${\alpha}-Fe_2O_3$ spherical submicron clusters. The catalytic processes including the inhibition process by $CO_2$ on the ${\alpha}-Fe_2O_3$ spherical submicron powder are discussed according to the kinetic results. The catalysts were characterized using XRD (X-ray powder diffraction), FE-SEM (field emission-scanning electron microscopy), HR-TEM (high resolution-transmission electron microscopy), and $N_2$ sorption measurements.

들깨잎 폴리페놀 산화효소의 pH 및 온도에 의한 영향 (Influence of Ph and Temperature on Polyphenol Oxidase in the Leaves of Perilla frutescens var. japonica)

  • 김유경;김안근
    • 약학회지
    • /
    • 제48권6호
    • /
    • pp.384-390
    • /
    • 2004
  • Polyphenol oxidase-catalyzed oxidation of substrates (t-butylcatechol, 4-methylcatechol, chlorogenic acid, caffeic acid and pyrocatechol) were performed in the Ph range 4~8. Co ncentrations of substrate's major oxidation products were monitored by high performance liquid chromatograph. The nature and amounts of products formed were highly pH dependent. They also were ifluenced by kinds of substrates. Major oxidation product of 4-methylcatechol appeared the maxium value at pH 5, them of chlorogenic acid, caffeic acid and pyrocatechol at pH 6.0 and that of t-butylcatechol at pH 5~7. Time-dependent PPO activity was determined at $4^{\circ}C\;and\;30^{\circ}C$. PPO extracted by phosphate buffer containing triton X-114 (t-PPO) was more stable than PPO by phosphate buffer (b-PPO). The result of electrophoresis, at first PPO was showed only a band at 48 kd. After 1~3 days a partial degrade band was appeared in b-PPO and three partial degrade bands in t-PPO. No activity band was appeared in PPOs at $30^{\circ}C$ and b-PPO at $4^{\circ}C$ after 4 days. And a band (37 kDa) in t-PPO was remained finally and disappered. PPO from Perillae leaves has two activity bands at 48 and 37 kDa in previous paper. It was supposed that PPO in the leaves of Perilla frutescens was a protein having one molecular weight as 48 kDa. And 37 kDa protein, relatively proteolysis-resistant, was a proteolyzed form of a major form.

반류수탈암모니아 공정 (Sidestream Deammonification)

  • 박영현;김정미;최원영;유재철;이태호
    • 한국물환경학회지
    • /
    • 제34권1호
    • /
    • pp.109-120
    • /
    • 2018
  • Sidestream in domestic wastewater treatment plants contains high concentration of ammonium, which increases nitrogen loading rate in the mainstream. The process for deammonification consisting of partial nitritation-anaerobic ammonium oxidation (ANAMMOX) and heterotrophic denitrification is an economical method of solving this problem. Currently, about 130 full-scale deammonification plants are fully operating around the world, but none is in Korea. In order to transfer the principal information about sidestream deammonification processes to researchers and operators, we summarized basic concepts, processes type, and key influence factors (e.g., concentration of nitrogen compounds, dissolved oxygen (DO), temperature, and pH). This review emphasis on the processes of single-stage sequencing batch reactor (SBR) deammonification, which are widely used as full-scale plants. Since simultaneous processes of partial nitritation, ANAMMOX and heterotrophic denitrification occur in a single reactor, the single-stage SBR deammonification requires appropriate control/monitoring strategies for several operating factors (DO and pH mostly) to achieve efficient and stable operation. In future, AB-process consisting of A-stage (energy harvesting from organics) and B-stage (ammonium removal without organics) will be applied to the wastewater treatment process. Thus, we suggest mainstream deammonification for B-stage connected with the sidestream deammonification as seeding source of ANAMMOX. We expect that many researchers will become more interested in the sidestream deammonification.

실리카 담지 12-몰리브도인산 촉매상에서의 아산화질소에 의한 메탄의 부분산화반응 (The Partial Oxidation of Methane by Nitrous Oxide over Silica-Supported 12-Molybdophosphoric Acid)

  • 홍성수;우희철;주창식;이근대
    • 공업화학
    • /
    • 제5권1호
    • /
    • pp.139-148
    • /
    • 1994
  • 실리카에 담지된 헤테로폴리산 촉매에서 아산화질소에 의한 메탄의 부분산화반응을 연구하였다. 여러 가지의 반응조건, 즉 반응온도, 반응물의 분압, 접촉시간, 촉매의 담지량 및 전처리온도 등이 전환율이나 생성물의 선택도 및 속도론에 미치는 영향이 연구되었다. 20 wt%로 담지된 촉매가 전환율과 포름알데히드의 수율에 있어서 가장 높은 값을 보여 주었다. 메탄은 전환반응에서의 속도식을 구한 결과, 메탄에 대해서는 1차식을 보여 주었고, 아산화질소에 대한 반응차수는 약 0.4였다. 또한 전체반응의 겉보기 활성화에너지는 30.78 kcal/mole 이었다. 반응물 중에 첨가된 소량의 사염화탄소는 메탄의 산화반응에서 실리카 담지 HPMo 촉매의 활성을 증가시키는 반면에, 반응물에 첨가된 물은 오히려 활성을 감소시키는 것을 볼 수 있었다.

  • PDF

The Sulfidation and Oxidation Behavior of Sputter-Deposited Nb-Al-Cr Alloys at High Temperatures

  • Habazaki, Hiroki;Yokoyama, Kazuki;Konno, Hidetaka
    • Corrosion Science and Technology
    • /
    • 제2권3호
    • /
    • pp.141-147
    • /
    • 2003
  • Sputter-deposited Nb-Al-Cr alloys. $3-5{\mu}m$ thick, have been prepared on quartz substrates as oxidation-and sulfidation-resistant materials at high temperatures. The oxidation or the alloys in the $Ar-O_2$ atmosphere of an oxygen partial pressure of 20 kPa follows approximately the parabolic rate law, thus being diffusion controlled. Their oxidation rates are almost the same as or even lower than those ofthc typical chromia-forming alloys. The multi-lavered oxide scales are formed on the ternary alloys. The outermost layer is composed of $Cr_2O_3$, which is"mainly responsible for the high oxidation'resistance of these alloys. In contrast to sputter-deposited Cr-Nb binary alloys reported previously, the inner layer is not porous. TEM observation as well as EDX analysis indicates that the innermost layer is a mixture of $Al_2O_3$ and niobium oxide. The dispersion of $Al_2O_3$ in niobium oxide may be attributable to the prevention of the formation of the porous oxide layer. The sulfidation rates of the present ternary alloys arc higher than those of the sputter-deposited Nb-AI binary alloys, but still several orders of magnitude lower than those of conventional high temperature alloys. Two-layered sulfide scales are formed, consisting of an outer $Al_2S_3$ layer containing chromium and an inner layer composed of $NbS_2$ and a small amount of $Cr_2S_3$. The presence of $Cr_2S_3$ in the inner protective $NbS_2$ layer may be attributed to the increase in the sulfidation rates.

스퍼터된 바나듐 산화막의 구조적 특성에 미치는 산소 분압의 효과 (Effects of Oxygen Partial Pressure on the Structural Properties of Sputtered Vanadium Oxide Thin Films)

  • 최복길;최용남;최창규;권광호
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
    • /
    • pp.435-438
    • /
    • 2001
  • Thin films of vanadium oxide(VO$\sub$x/) have been deposited by r.f. magnetron sputtering from V$_2$O$\sub$5/ target in gas mixture of argon and oxygen. The oxygen/(oxygen+argon) partial pressure ratio is changed from 0% to 8%. Crystal structure, chemical composition and bonding properties of films sputter-deposited under different oxygen gas pressures are characterized through XRO, XPS, RBS and FTIR measurements. All the films prepared below 8% O$_2$ are amorphous, and those prepared without oxygen are gray indicating the presence of V$_2$O$\sub$$_4$/ phase in the films. V$_2$O$\sub$5/ and lower oxides co-exist in sputter-deposited films and as the oxygen partial pressure is increased the films become more stoichiometric V$_2$O$\sub$5/. The increase of O/V ratio with increasing oxygen gas pressure is attributed to the partial filling of oxygen vacancies through diffusion. It is observed that the oxygen atoms. located on the V-O plane of V$_2$O$\sub$5/ layer participate more readily in the oxidation process.

  • PDF

스퍼터링으로 증착된 바나듐 산화막의 구조적, 광학적, 전기적 특성에 미치는 산소 분압의 효과 (Effect of Oxygen Partial Pressure on the Structural, Optical and Electrical Properties of Sputter-deposited Vanadium Oxide Thin Films)

  • 최복길;최창규;권광호;김성진;이규대
    • 한국전기전자재료학회논문지
    • /
    • 제14권12호
    • /
    • pp.1008-1015
    • /
    • 2001
  • Thin films of vanadium oxide(VO$\_$x/) have been deposited by r.f. magnetron sputtering from V$_2$O$\_$5/ target in gas mixture of argon and oxygen. The oxygen/(oxygen+argon) partial pressure ratio is changed from 0% to 8%. Crystal structure, chemical composition, bonding, optical and electrical properties of films sputter-deposited under different oxygen gas pressures are characterized through XPS, AES, RBS, FTIR, optical absorption and electrical conductivity measurements. V$_2$O$\_$5/ and lower oxides co-exist in sputter-deposited films and as the oxygen partial pressure is increased the films become more stoichiometric V$_2$O$\_$5/. The increase of O/V ratio with increasing oxygen gas pressure is attributed to the partial filling of oxygen vacancies through diffusion. It is observed that the oxygen atoms located on the V-O plane of V$_2$O$\_$5/ layer participate more readily in the oxidation process. With increasing oxygen gas pressure indirect and direct optical band gaps are increased, but thermal activation energies are decreased.

  • PDF