• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.3
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• pp.272-277
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• 2004

The primary aim of this study is to investigate new semi-abrasive free slurry including acid colloidal silica and hydrogen peroxide for copper chemical-mechanical planarization (CMP). In general, slurry for copper CMP consists of colloidal silica as an abrasive, organic acid as a complex-forming agent, hydrogen peroxide as an oxidizing agent, a film forming agent, a pH control agent and several additives. We developed new semi-abrasive free slurry (SAFS) including below 0.5％ acid colloidal silica. We evaluated additives as stabilizers for hydrogen peroxide as well as accelerators in tantalum nitride CMP process. We also estimated dispersion stability and Zeta potential of the acid colloidal silica with additives. The extent of enhancement in tantalum nitride CMP was verified through anelectrochemical test. This approach may be useful for the application of single and first step copper CMP slurry with one package system.

• Journal of Environmental Science International
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• v.12 no.3
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• pp.325-335
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• 2003

An agricultural land application of swine slurry is one of the best management practices in Jeju island whose ground water must be protected. So as to study the effect of appling swine slurry on ground water or aquifer, incubation-leaching technique was used by assuming the incubating period of 1, 2, 4, 8, 16, or 32 days, and application rate of 3200.0 mgT-N/$\ell$ , 820.0 mgT-P/$\ell$, and 1887.0 mgK$\^$+/$\ell$ in swine slurry. The leachates were collected from the soil columns(PVC 30 cm L${\times}$5.5 cm D) packed 15cm in depth with Gangjeong soil series by washing with 100 mL distilled water. The leached components were measured by using ion chromatography far Cl$\^$-/, NO$_3$-N, F$\^$-/, Br$\^$-/, Na$\^$+/, K$\^$+/, Ca$^2$$\^$+/, and Mg$^2$$\^$+/ , atomic absorption spectrophotometry for Fe and Mn, and UV-Vis spectrophotometry for T-N and T-p. Application of swine slurry in naked soil could influence on the ground water or aquifer by increasing nitrate-nitrogen in leachate with time, or leaching the cations present in soils in accompany with anions because of H$\^$+/produced in nitrification. Therefore, careful consideration should be taken about what amount, when, where, and how fur protecting ground water system.

• Transactions on Semiconductor Engineering
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• v.2 no.2
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• pp.1-9
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• 2024

CMP (Chemical Mechanical Polishing) processes have become essential for creating multilayered component structures in semiconductor manufacturing. Typically, the slurry composition in CMP processes involves a balance of three components such as ceria, dispersant, and deionized water. In this study, we conducted research on the stability of ceria slurries using an amphoteric surfactant with controlled concentrations of AMP (2-Amino-2-methyl-1-propanol). The results indicated pH stabilization influenced by carboxylic (-COOH) groups depending on the AMP concentration. Additionally, there was no occurrence of aggregation in the ceria slurry, confirming the absence of dispersion stability issues.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.10a
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• pp.24.2-24.2
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• 2011

Ru is used as a bottom electrode capacitor in dynamic random access memories (DRAMs) and ferroelectric random access memories (FRAMs). The surface of the Ru needs to be planarized which is usually done by chemical mechanical polishing (CMP). Ru CMP process requires chemical slurry consisting of abrasive particles and oxidizer. A slurry containing NaIO4 and alumina particles is already proposed for Ru CMP process. However, the stability of the slurry is critical in the CMP process since if the particles in the slurry get agglomerated it would leave scratches on the surface being planarized. Thus, in the present work, the stability behavior of the slurry using a suitable anionic polyelectrolyte is investigated. The parameters such as slurry pH, polyelectrolyte concentration, adsorption time and the sequence of addition of chemicals are optimized. The results show that the slurry is stable for longer time at an optimized condition. The polishing behavior of the Ru using the optimized slurry is also investigated.

• Korean Journal of Organic Agriculture
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• v.18 no.2
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• pp.271-282
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• 2010

This study was conducted to investigate the effects of concentrated pig slurry and byproduct liquid fertilizer on the growth and yield of chinese cabbage. The experiment was conducted in a rain-shelter house which was installed in the agriculture farm. Plants were fertilized with concentrated slurry (CS), byproduct fertilizer (BF), mixture of concentrated slurry and byproduct liquid fertilizer (CS+BF), combined organic and chemical fertilizer (CS+BF+BF) and chemical fertilizer (CF) as control. 1. The pH level of byproduct liquid was decreased from the 3rd to the 7th day and increased 9 day to 14th day, but pH of concentrated slurry (CS) was not greatly varied. EC of concentrated slurry (CS) and byproduct liquid was increased gradually during the fermentation. 2. The concentrated slurry (CS) was low in phosphorus, calcium, magnesium, rich in potassium and unbalanced as a low nitrogen and high potassium. But byproduct liquid fertilizer was balanced in nitrogen and potassium ratio. 3. The leaf number, head height, head width of chinese cabbage in treatment with organic and chemical fertilizer (CS+BF+N) showed significant difference compared with control. The plant and head weight of chinese cabbage in treatment of concentrated slurry was severely decreased, but that in treatment organic and chemical fertilizer (CS+BF+N) were increased 8, 10% compared with control chemical fertilizer (CF), respectively. 4. The content of $K_2O$ in plant tissue and in soil was increased after using concentrated slurry. On the other hand, mineral content of except $K_2O$ did not differ significantly between any of the treatments. In conclusion, organic and chemical fertilizer (CS+BF+N) could improve growth and head weight of chinese cabbage.

• Journal of Animal Environmental Science
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• v.19 no.1
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• pp.47-54
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• 2013

Two types of reactors were set to investigate the change of characteristics of pig slurry by aeration during fertilization period. One system was equipped with air diffuser to supply oxygen to pig slurry for liquid fertilization, but there was no air diffuser in the other system. Air supply to the experimental systems was regulated by air flow meter. The reactors were set up in the laboratory to protect the pig slurry from external condition such as temperature and humidity changes. Maintaining optimal pH range in the experimental reactors is an important factor for liquid fertilization of pig slurry. In this study, pH ranges of aerobic reactor and anoxic reactor was 7.04~7.19 and 7.34~7.81, respectively. The temperature of aerobic reactors was $2{\sim}3^{\circ}C$ higher then indoor temperature. The amount of sludge accumulated at the bottom layer of non-aerated reactors was 4~5 times more than that of aerated reactors.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.31 no.6
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• pp.264-269
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• 2021

In this study, amorphous aluminum silicate powder was prepared using co-precipitation method, and the influence of spray-dried aluminum silicate granular powder was analyzed and optimized by controlling the amount of aluminum silicate powder and dispersant added to the slurry. As a result, granular powder was optimally produced under the conditions of powder content of aluminum silicate slurry of 27.5 wt% or less, dispersant addition amount of 0.8 wt% or more, pH 6~9. An average particle size of granular powder showed approximately 14 ㎛ at the powder contents of 20 and 22.5 wt% of the slurry, and approximately 19 ㎛ at the powder contents of 25 and 27.5 wt% of the slurry.

• Applied Chemistry for Engineering
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• v.10 no.7
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• pp.1073-1078
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• 1999

The objectives of this study are to examine the applicability of waste slurry from soda ash manufacturing industries as a coagulant for the treatment of wastewater containing fine silica particles, and to reduce the cost of wastewater treatment containing silica. Acceptable water quality can be obtained with a little dosing of waste slurry by gelation before the coagulation process so it could be concluded that the waste slurry from soda ash can be used as a coagulant. Based on the results of experiments, the optimum pH of gelation for silica in wastewater was around five and the treatment process with the gelation of silica could reduce the chemical dosage and waste sludge after coagulation. Dewatering and settling characteristics of the floc after coagulation with the waste slurry are better than those of the floc after coagulation with the lime milk only.

• Korean Journal of Air-Conditioning and Refrigeration Engineering
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• v.9 no.2
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• pp.134-143
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• 1997

A theoretical and experimental study has been performed to investigate the characteristics of ice-slurry product. By diffusion-controlled model, the possibility of ice slurry has been theoretically anticipated. The water vapor evaporated from the surface of droplets is extracted continuously from the chamber by a vacuum pump. The droplet diameter was measured by silion immersed method. The ice slurry has been obtained by spraying droplets of ethylene-glycol aqueous solution in the chamber where pressure is maintained under the triple point of water. The droplet of which the diameter is $300{\mu}m$, and the initial temperature is $20^{\circ}C$, was changed into ice particle within the chamber of which the height is 1.33m.

• Proceedings of the KIEE Conference
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• 2006.10a
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• pp.83-84
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• 2006

Chemical mechanical polishing (CMP) process has been attracted as an essential technology of multi-level interconnection. However, the COO (cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40 %. So, we focused how to reduce the consumption of raw slurry. In this paper, $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. Also, the addition effects of $MnO_2$ abrasives and the diluted silica slurry (DSS) on CMP performances were evaluated. Finally, we have investigated the possibility of new abrasive for the oxide CMP application.