Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2006.10a
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- Pages.83-84
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- 2006
A Study on the Oxide CMP Characteristics of using $MnO_2$ -Mixed Abrasive Slurry ($MnO_2$ -MAS)
$MnO_2$ 연마제를 혼합한 Mixed Abraive Slurry (MAS)의 CMP 특성
- Han, Sung-Min (Daebul University) ;
- Park, Sung-Woo (Daebul University) ;
- Lee, Woo-Sun (Chosun University) ;
- Seo, Yong-Jin (Daebul University)
- Published : 2006.10.27
Abstract
Chemical mechanical polishing (CMP) process has been attracted as an essential technology of multi-level interconnection. However, the COO (cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40 %. So, we focused how to reduce the consumption of raw slurry. In this paper,
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