• 제목/요약/키워드: p-type silicon

검색결과 440건 처리시간 0.027초

The Study of N-type Crystalline Silicon Solar Cells by PC1D

  • Yi, Junsin;Jung, Junhee;Lau, Meng How
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.287.2-287.2
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    • 2014
  • PV (photovoltaic) has becoming an important industry to invest due to its high robustness and require very little maintenance which goes a long time. Solar cell fabrication involves a few critical processes such as doping to make the N-type and P-type silicon, contact metallization, surface texturization, and anti-reflection coatings. Anti-reflection coating is a kind of surface passivation which ensures the stability, and efficiency of the solar cell. Thus, I will focus on the changes happen to the solar cell due to the reflectance and anti-reflection coating by PC1D. By using the PC1D (solar cell simulation program), I would analysis the effect of reflectance on the N-type cell. At last I will conclude the result regarding what I learned throughout this experiment.

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Dislocations as native nanostructures - electronic properties

  • Reiche, Manfred;Kittler, Martin;Uebensee, Hartmut;Pippel, Eckhard;Hopfe, Sigrid
    • Advances in nano research
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    • 제2권1호
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    • pp.1-14
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    • 2014
  • Dislocations are basic crystal defects and represent one-dimensional native nanostructures embedded in a perfect crystalline matrix. Their structure is predefined by crystal symmetry. Two-dimensional, self-organized arrays of such nanostructures are realized reproducibly using specific preparation conditions (semiconductor wafer direct bonding). This technique allows separating dislocations up to a few hundred nanometers which enables electrical measurements of only a few, or, in the ideal case, of an individual dislocation. Electrical properties of dislocations in silicon were measured using MOSFETs as test structures. It is shown that an increase of the drain current results for nMOSFETs which is caused by a high concentration of electrons on dislocations in p-type material. The number of electrons on a dislocation is estimated from device simulations. This leads to the conclusion that metallic-like conduction exists along dislocations in this material caused by a one-dimensional carrier confinement. On the other hand, measurements of pMOSFETs prepared in n-type silicon proved the dominant transport of holes along dislocations. The experimentally measured increase of the drain current, however, is here not only caused by an higher hole concentration on these defects but also by an increasing hole mobility along dislocations. All the data proved for the first time the ambipolar behavior of dislocations in silicon. Dislocations in p-type Si form efficient one-dimensional channels for electrons, while dislocations in n-type material cause one-dimensional channels for holes.

비정질 실리콘 태양전지에서 TCO/p층 계면 특성의 영향 (The effects of TCO/p-layer Interface on Amorphous Silicon Solar Cell)

  • 지일환;서성택;최병소;홍성민
    • 태양에너지
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    • 제8권1호
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    • pp.68-73
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    • 1988
  • In the glass/TCO/p-i-n a-Si/Al type of amorphous silicon solar cell, the effects on solar cell efficiency and metastability for the various kinds of TCO analyzed by SAM and ESCA, which was used to measure the diffusion profiles of In and Sn and the Fermi energy shifts in the TCO/p interface respectively. Indium which diffused into a-Si p-layer did not have any significant effects on the Fermi level shift of p-layer when the content of $B_2H_6/SiH_4$ in p-layer was at 1 gas%. The cell fabricated on $SnO_2$ turned out to have the best cell photovoltaic characteristics. ITO fabricated by electron beam deposition system, which was shown to have the greatest rate of diffusion of Indium in ITO/p interface produced the worst metastability among the cells tested.

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The microstructure of polycrystalline silicon thin film that fabricated by DC magnetron sputtering

  • Chen, Hao;Park, Bok-Kee;Song, Min-Jong;Park, Choon-Bae
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.332-333
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    • 2008
  • DC magnetron sputtering was used to deposit p-type polycrystalline silicon on n-type Si(100) wafer. The influence of film microstructure properties on deposition parameters (DC power, substrate temperature, pressure) was investigated. The substrate temperature and pressure have the important influence on depositing the poly-Si thin films. Smooth ploy-Si films were obtained in (331) orientation and the average grain sizes are ranged in 25-30nm. The grain sizes of films deposited at low pressure of 10mTorr are a little larger than those deposited at high pressure of 15mTorr.

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Strong Red Photoluminescence from Nano-porous Silicon Formed on Fe-Contaminated Silicon Substrate

  • Kim, Dong-Lyeul;Lee, Dong-Yul;Bae, In-Ho
    • Transactions on Electrical and Electronic Materials
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    • 제5권5호
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    • pp.194-198
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    • 2004
  • The influences of the deep-level concentration of p-type Si substrates on the optical properties of nano-porous silicon (PS) are investigated by deep level transient spectroscopy (DLTS) and photoluminescence (PL). Utilizing a Si substrate with Fe contaminations significantly enhanced the PL intensity of PS. All the PS samples formed on Fe-contaminated silicon substrates had stronger PL yield than that of reference PS without any intentional Fe contamination but the emission peak is not significantly changed. For the PS 1000 sample with Fe contamination of 1,000 ppb, the maximum PL intensity showed about ten times stronger PL than that of the reference PS sample. From PL and DLTS results, the PL efficiency strongly depends on the Fe-related trap concentration in Si substrates.

박막증착조건 변화에 따른 실리콘 나노결정 박막의 광학적 특성 (Optical properties of nanocrystalline silicon thin films depending on deposition parameters)

  • 김건희;김종훈;전경아;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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    • pp.173-176
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    • 2004
  • Silicon thin films on p-type(100) silicon substrate have been prepared by a pulsed laser deposition(PLD) technique using a Nd:YAG laser. The pressure of the environmental gas during deposition was 1 Torr. After deposition, silicon thin film has been annealed in nitrogen ambient. Strong blue photoluminescence(PL) has been observed at room temperature. We report the optical properties of silicon thin films with the variation of the deposition parameters.

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Improved Understanding of LeTID of Single-crystalline Silicon Solar Cell with PERC

  • Kim, Kwanghun;Baik, Sungsun;Park, Jaechang;Nam, Wooseok;Jung, Jae Hak
    • Current Photovoltaic Research
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    • 제6권4호
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    • pp.94-101
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    • 2018
  • Light elevated temperature induced degradation (LeTID) was noted as an issue in multi-crystalline silicon solar cells (MSSC) by Ram speck in 2012. In contrast to light induced degradation (LID), which has been researched in silicon solar cells for a long time, research about both LeTID and the mechanism of LeTID has been limited. In addition, research about LeTID in single-crystalline silicon solar cells (SSSC) is even more limited. In order to improve understanding of LeTID in SSSC with a passivated emitter rear contact (PERC) structure, we fabricated four group samples with boron and oxygen factors and evaluated the solar cell characteristics, such as the cell efficiency, $V_{oc}$, $I_{sc}$, fill factor (FF), LID, and LeTID. The trends of LID of the four group samples were similar to the trend of LeTID as a function of boron and oxygen.

이종접합 실리콘 태양전지의 효율 개선을 위한 열처리의 효과 (Effect on the Thermal Treatment for Improving Efficiency in Silicon Heterojunction Solar Cells)

  • 박형기;이준신
    • 한국전기전자재료학회논문지
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    • 제37권4호
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    • pp.439-444
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    • 2024
  • This study investigates the post-thermal treatment effects on the efficiency of silicon heterojunction solar cells, specifically examining the influence of annealing on p-type microcrystalline silicon oxide and ITO thin films. By assessing changes in carrier concentration, mobility, resistivity, transmittance, and optical bandgap, we identified conditions that optimize these properties. Results reveal that appropriate annealing significantly enhances the fill factor and current density, leading to a notable improvement in overall solar cell efficiency. This research advances our understanding of thermal processing in silicon-based photovoltaics and provides valuable insights into the optimization of production techniques to maximize the performance of solar cells.

Photoluminescence properties of N-doped and nominally undoped p-type ZnO thin films

  • Jin, Hu-Jie;Jeong, Yun-Hwan;Park, Choon-Bae
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 춘계학술대회 및 기술 세미나 논문집 디스플레이 광소자
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    • pp.65-66
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    • 2008
  • The realization and origin of p-type ZnO are main issue for photoelectronic devices based on ZnO material. N-doped and nominally undoped p-type ZnO films were achieved on silicon (100) and homo-buffer layers by RF magnetron sputtering and post in-situ annealing. The undoped film shows high hole mobility of 1201 $cm^2V^{-1}s^{-1}$ and low resistivity of $0.0454\Omega{\cdot}cm$ with hole concentration of $1.145\times10^{17}cm^{-3}$. The photoluminescence(PL) spectra show the emissions related to FE, DAP and defects of $V_{Zn}$, $V_O$, $Zn_O$, $O_i$ and $O_{Zn}$.

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푸래너.다이오드와 트랜지스터의 시작[제I보] (Processes For Fabricating Planar p-n Diodes and Planar n-p-n Transistors)

  • 정만영;안병성;김준호
    • 대한전자공학회논문지
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    • 제3권2호
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    • pp.2-9
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    • 1966
  • 실리콘 프래너트 npn 랜짓스터 제작과정을 기술하였다. 표면처리, 산화, K.P.R. boron 확산, 인확산 및 Al 증착등은 중요한 과정들이다. Boron층은 box method로 B2O3-SiO2계확산물을 사용하여 만들었고 린은 P2O5-SiO2계확산물을 사용하였다. 이 중간과정으로서 "실리콘·프래너·다이오드"도 제작되었다.

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