• 제목/요약/키워드: p-Type semiconductor

검색결과 420건 처리시간 0.024초

Fabrication and characterization of n-IZO / p-Si and p-ZnO:(In, N) / n-Si thin film hetero-junctions by dc magnetron sputtering

  • Dao, Anh Tuan;Phan, Thi Kieu Loan;Nguyen, Van Hieu;Le, Vu Tuan Hung
    • 전기전자학회논문지
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    • 제17권2호
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    • pp.182-188
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    • 2013
  • Using a ceramic target ZnO:In with In doping concentration of 2%, hetero-junctions of n-ZnO:In/p-Si and p-ZnO:(In, N)/n-Si were fabricated by depositing Indium doped n - type ZnO (ZnO:In or IZO) and Indium-nitrogen co-doped p - type ZnO (ZnO:(In, N)) films on wafers of p-Si (100) and n-Si (100) by DC magnetron sputtering, respectively. These films with the best electrical and optical properties were then obtained. The micro-structural, optical and electrical properties of the n-type and p-type semiconductor thinfilms were characterized by X-ray diffraction (XRD), RBS, UV-vis; four-point probe resistance and room-temperature Hall effect measurements, respectively. Typical rectifying behaviors of p-n junction were observed by the current-voltage (I-V) measurement. It shows fairly good rectifying behavior with the fact that the ideality factor and the saturation current of diode are n=11.5, Is=1.5108.10-7 (A) for n-ZnO:In/p-Si hetero-jucntion; n=10.14, Is=3.2689.10-5 (A) for p-ZnO:(In, N)/n-Si, respectively. These results demonstrated the formation of a diode between n-type thin film and p-Si, as well as between p-type thin film and n-Si..

Borate 완충용액에서 철의 산화 반응구조와 산화피막의 전기적 특성 (Electronic Properties of the Oxide Film and Anodic Oxidation Mechanism of Iron in Borate Buffer Solution)

  • 김현철;김연규
    • 대한화학회지
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    • 제56권5호
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    • pp.542-547
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    • 2012
  • Borate 완충용액에서 Fe의 산화 반응 경로와 생성된 산화피막의 전기적 특성을 조사하였다. Fe는 pH에 의존하는 두 가지의 반응 경로에 의하여 산화되었으며 산화된 피막은 Mott-Schottky 식이 적용되는 n-형 반도체 성질을 가지고 있음을 알 수 있었다.

Effect of Alternating Magnetic Field on Ion Activation in Low Temperature Polycrystalline Silicon Technology

  • Hwang, Jin Ha;Lim, Tae Hyung
    • 반도체디스플레이기술학회지
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    • 제3권1호
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    • pp.35-39
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    • 2004
  • Statistical design of experiments was successfully employed to investigate the effect of alternating magnetic field on activation of polycrystalline Si (p-Si) doped as n-type using $\textrm{PH}_3$, by full factorial design of three factors with two levels. In this design, the input variables are graphite size, alternating current, and activation time. The output parameter, sheet resistance, is analyzed in terms of the primary effects and multi-factor interactions. Notably, the three-factor interaction is calculated to be a dominant interaction. The interaction between graphite size and activation time and the main effect of current are important effects compared to the other variables and relevant interactions. Alternating magnetic flux activation is proved a significantly beneficial processing technique.

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플라즈마 변수에 의한 불순물주입 다결정실리콘 박막의 식각율 변화 (Etch Rate Dependence of Differently Doped Poly-Si Films on the Plasma Parameters)

  • 박성호;김윤태;김진섭;김보우;마동성
    • 대한전자공학회논문지
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    • 제25권11호
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    • pp.1342-1349
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    • 1988
  • 플리즈마 변수로서 가스조성과 압력 및 RF 전력이 인 및 붕소가 각각 다른 양으로 주입된 다결정 실리콘의 식각율 변화에 미치는 영향을 고찰하였다. $POCl_3$에 의해 인이 주입된 경우, 염소조성보다 불소조성이 많은 영역, 즉 $Cl_2$$SF_4$의 비가 17대 33일 때, 가장 큰 비등방성과 가장 작은 선폭손실을 달성하였다. 플라즈마 조건에 관계없이 주입된 불순물 농도의 증가에 다라, 인이 주입된 경우는 식각율이 증가하였고, 붕소가 주입된 경우는 식각율이 반대로 감소하였다. 또한, 급속 열처리에 의한 활성화 시간의 함수로서 인이 주입된 다결정실리콘의 식각율변화를 측정한 결과, 도우핑 농도뿐 아니라 활성화된 운반자, 즉 전자의 농도가 그 식각율 증가에 중요한 역할을 한다는 것을 확인하였다.

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Optically transparent and electrically conductive indium-tin-oxide nanowires for transparent photodetectors

  • Kim, Hyunki;Park, Wanghee;Ban, Dongkyun;Kim, Hong-Sik;Patel, Malkeshkumar;Yadav, Pankaj;Kim, Joondong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.390.2-390.2
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    • 2016
  • Single crystalline indium-tin-oxide (ITO) nanowires (NWs) were grown by sputtering method. A thin Ni film of 5 nm was coated before ITO sputtering. Thermal treatment forms Ni nanoparticles, which act as templates to diffuse Ni into the sputtered ITO layer to grow single crystalline ITO NWs. Highly optical transparent photoelectric devices were realized by using a transparent metal-oxide semiconductor heterojunction by combining of p-type NiO and n-type ZnO. A functional template of ITO nanowires was applied to this transparent heterojunction device to enlarge the light-reactive surface. The ITO NWs/n-ZnO/p-NiO heterojunction device provided a significant high rectification ratio of 275 with a considerably low reverse saturation current of 0.2 nA. The optical transparency was about 80% for visible wavelengths, however showed an excellent blocking UV light. The nanostructured transparent heterojunction devices were applied for UV photodetectors to show ultra fast photoresponses with a rise time of 8.3 mS and a fall time of 20 ms, respectively. We suggest this transparent and super-performing UV responser can practically applied in transparent electronics and smart window applications.

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ITO 나노와이어 기반의 투명 산화물 반도체 광전소자 (ITO Nanowires-embedded Transparent Metal-oxide Semiconductor Photoelectric Devices)

  • 김현기;김홍식;;김준동
    • 한국전기전자재료학회논문지
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    • 제28권12호
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    • pp.808-812
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    • 2015
  • Highly optical transparent photoelectric devices were realized by using a transparent metal-oxide semiconductor heterojunction of p-type NiO and n-type ZnO. A functional template of ITO nanowires (NWs) was applied to this transparent heterojunction device to enlarge the light-reactive surface. The ITO NWs/n-ZnO/p-NiO heterojunction device provided a significant high rectification ratio of 275 with a considerably low reverse saturation current of 0.2 nA. The optical transparency was about 80% for visible wavelengths, however showed an excellent blocking UV light. The nanostructured transparent heterojunction devices were applied for UV photodetectors to show ultra fast photoresponses with a rise time of 8.3 mS and a fall time of 20 ms, respectively. We suggest this transparent and super-performing UV responser can practically applied in transparent electronics and smart window applications.

$Al_2O_3/SiN_x$ 후면 적층 패시베이션을 이용한 결정질 실리콘 태양전지의 효율 향상 연구 (Efficiency Improvement with $Al_2O_3/SiN_x$ Rear Passivation of p-type Mono-crystalline Silicon Solar Cells)

  • 천주용;백신혜;김인섭;천희곤
    • 반도체디스플레이기술학회지
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    • 제12권3호
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    • pp.47-51
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    • 2013
  • Current research trends of solar cells has focused on the high conversion efficiency and low-cost production technology. Passivation technology that can be easily adapted to mass production. Therefore, this study conducted experiments with aim of the following two methods for the fabrication of high-efficiency crystalline silicon solar cells. In the first task, an attempt is formation of local Al-BSF to a number of locally doped dots to increase the conversion efficiency of solar cells to reduce the loss of $V_{oc}$ overcome. The second major task, rear surface apply in $Al_2O_3/SiN_x$ stack layer, $Al_2O_3$ prominent negative fixed charge characteristics. As the result of task, Local Al-BSF and $Al_2O_3/SiN_x$ stack layer applied to the p-type single crystalline silicon solar cells, the average $V_{oc}$ of 644mV, $I_{sc}$ of 918mV and conversion efficiency of 18.70% were obtained.

Gate/Body-Tied 구조의 고감도 광검출기를 이용한 2500 fps 고속 바이너리 CMOS 이미지센서 (2500 fps High-Speed Binary CMOS Image Sensor Using Gate/Body-Tied Type High-Sensitivity Photodetector)

  • 김상환;권현우;장준영;김영모;신장규
    • 센서학회지
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    • 제30권1호
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    • pp.61-65
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    • 2021
  • In this study, we propose a 2500 frame per second (fps) high-speed binary complementary metal oxide semiconductor (CMOS) image sensor using a gate/body-tied (GBT) p-channel metal oxide semiconductor field effect transistor-type high-speed photodetector. The GBT photodetector generates a photocurrent that is several hundred times larger than that of a conventional N+/P-substrate photodetector. By implementing an additional binary operation for the GBT photodetector with such high-sensitivity characteristics, a high-speed operation of approximately 2500 fps was confirmed through the output image. The circuit for binary operation was designed with a comparator and 1-bit memory. Therefore, the proposed binary CMOS image sensor does not require an additional analog-to-digital converter (ADC). The proposed 2500 fps high-speed operation binary CMOS image sensor was fabricated and measured using standard CMOS process.

저분자 유기 광다이오드 소자의 p형 유기물 두께에 따른 전류 특성에 관한 연구 (A Study on the Thickness Dependence of p-type Organic Layer on the Current of Small Molecule-based Organic Photodiode)

  • 김영우;이동운;전용민;조의식;권상직
    • 반도체디스플레이기술학회지
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    • 제22권3호
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    • pp.101-105
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    • 2023
  • Organic photo Diodes (OPDi) give multiple advantages in the growing interest of the flexible optoelectronic devices. Organic semiconductors are freeform as they can deposit on any substrate, so it could be flexible. But the inorganic material photodiodes (PDs) are usually fabricated on silicon wafers which are solid. So, normally PDs are inflexible. By those reasons, we decided to make the vacuum deposited small molecule OPDi. We have investigated the OPDi's J-V characteristic by changing the thickness of p-type layer of OPDi. This device consists of indium-tin-oxide (ITO) / 2,3:6,7-dibenzanthracene (pentacene) / buckminsterfullerene (C60) / aluminum (Al). Its J-V characteristics were measured in the probe station(4156C) that can give dark condition while measuring. And for the luminance characteristics, the photocurrent was measured with the bright halogen lamp and a probe station.

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혼합소스 HVPE 방법에 의한 전력 반도체 소자용 p형 AlN 에피층 성장 (p-Type AlN epilayer growth for power semiconductor device by mixed-source HVPE method)

  • 이강석;김경화;김상우;전인준;안형수;양민;이삼녕;조채용;김석환
    • 한국결정성장학회지
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    • 제29권3호
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    • pp.83-90
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    • 2019
  • 본 논문에서는 전력 반도체 소자용 Mg-doped AlN 에피층을 혼합 소스 수소화물 기상 에피택시 방법에 의해 성장하였다. p형 재료로는 Mg을 사용하였다. 소자응용을 위한 기초 기판으로서 역할을 하기 위하여 GaN 에피층이 성장된 기판과 GaN 에피층이 성장되어 패턴이 형성된 사파이어 기판 위에 Mg-doped AlN 에피층을 선택 성장하였다. Mg-doped AlN 에피층의 표면과 결정 구조는 FE-SEM 및 HR-XRD에 의해 조사하였다. XPS 스펙트럼과 라만 스펙트럼 결과로부터 혼합소스 HVPE 방법에 의해 성장된 Mg-doped AlN 에피층은 전력소자 등에 응용이 가능할 것으로 판단된다.