• Title/Summary/Keyword: p a-SiC:H

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The fabrication of 6H- SiC UV photodiode and the analysis of the photoresponse (6H-SiC UV 광다이오드의 제작 및 수광특성 해석)

  • 박국상;이기암
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.7 no.1
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    • pp.126-136
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    • 1997
  • 6H-SiC UV photodiodes with $p^+$/n/n mesa structure were fabricated. The photocurrents of the photodiodes were measured in the wavelength range of 200~600 nm. The photocurrents were sensitive to ultraviolet radiation of 200~500 nm, and come to the maximum value at 260 nm. The quantum efficiency was calculated by using the diffusion model of minority carriers, and compared with the distribution of the photocurrent measured as a function of wavelength each other. The photocurrents of the 6H-SiC photodiode were explained by the diffusion model of the minority carriers which contained the optical absorption of the depletion region as well as the other layers.

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The Dependence of Mechanical Strain on a-Si:H TFTs and Metal Connection Fabricated on Flexible Substrate

  • Lee, M.H.;Ho, K.Y.;Chen, P.C.;Cheng, C.C;Yeh, Y.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.439-442
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    • 2006
  • We evaluated a-Si:H TFTs fabricated on polyimide substrate (PI) at the highest temperature of $160^{\circ}C$ with uniaxial and tensile strain to imitate flexible display. With tensile strain, the threshold voltage of a-Si:H TFTs have positive shift due to extra dangling bond formation in a-Si:H layer. However, no significant degradation of the subthreshold swing and effective mobility with tensile strain of a-Si:H TFTs indicates the similar level of band tail state. The metal wire with the width of $10\;{\mu}m$ for connection on flexible substrate can sustain with curvature radius 2.5 cm.

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XRD Study for the Effect of Aging and Gel Composition on the Crystdlinity of MCM-41 (숙성과 겔 성분이 MCM-41의 결정성에 미치는 효과에 대한 XRD 연구)

  • Park, Dong-Ho;Park, Sung-Soo
    • Journal of the Korean Chemical Society
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    • v.44 no.1
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    • pp.52-59
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    • 2000
  • The reaction gel mixtures of molar composition (0.3${\sim}$2.1) $SiO_2:\;(0.10{\sim}0.50)\;CTABr:\;0.15{\sim}0.23)\;TMAOH:\;(20{\sim}100)\;H_2O$ we prepared and then aged at room temperature for a definite duration. The aged gel is reacted hydrothermally at $150^{\circ}C$ for 2 days. The pH of reaction gel during synthesis is strongly influenced by the concentration of TMAOH and silica source. The pH change affects the phase of product, which is monitored by X-ray diffractometer. With increasing the TMAOH ratio from 0.19 to 0.23, the gel becomes more basic, and the product involves more lamellar phase. At TMAOH ratio lower than 0.19, the hexagonal phase is lower with decrease of pH. The content of the lamellar phase increases at a lower $SiO_2$ concentration, and higher concentrations have a clear detrimental effect on the crystallinity ofMCM-41 due to an excess silica source. The best quality MCM-41 is synthesized from a reaction gel composition of $1.0\;SiO_2:\;0.27\;CTABr:\;0.19\;TMAOH:\;40\;H_2O$. The pH values of this gel, aged one for 24 hr, and reacted one at $150^{\circ}C$ for 2 days are 12.3, 11.5, and 10.5, respectively. Gel aging for 24 h is essential for preparing high quality MCM-41. Longer aging causes a decrease of hexagonal phase.

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Amorphous silicon thin-film solar cells with high open circuit voltage by using textured ZnO:Al front TCO (ZnO:Al 투명전도막을 이용한 높은 개방전압을 갖는 비정질 실리콘 박막 태양전지 제조)

  • Lee, Jeeong-Chul;Ahn, Se-Hin;Yun, Jae-Ho;Song, Jin-Soo;Yoon, Kyung-Hoon
    • New & Renewable Energy
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    • v.2 no.3
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    • pp.31-36
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    • 2006
  • Superstrate pin amorphous silicon thin-film(a-Si:H) solar cells are prepared on $SnO_2:F$ and ZnO:Al transparent conducting oxides(TCO) in order to see the effect of TCO/p-layers on a-Si:H solar cell operation. The solar cells prepared on textured ZnO:Al have higher open circuit voltage VOC than cells prepared on $SnO_2:F$. Presence of thin microcrystalline p-type silicon layer(${\mu}c-Si:H$) between ZnO:Al and p a-SiC:H plays a major role by causing improvement in fill factor as well as $V_{OC}$ of a-Si:H solar cells prepared on ZnO:Al TCO. Without any treatment of pi interface, we could obtain high $V_{OC}$ of 994mV while keeping fill factor(72.7%) and short circuit current density $J_{SC}$ at the same level as for the cells on $SnO_2:F$ TCO. This high $V_{OC}$ value can be attributed to modification in the current transport in this region due to creation of a potential barrier.

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Amorphous silicon thin-film solar cells with high open circuit voltage by using textured ZnO:Al front TCO (ZnO:Al 투명전도막을 이용한 높은 개방전압을 갖는 비정질 실리콘 박막 태양전지 제조)

  • Lee, Jeong-Chul;Dutta, Viresh;Yi, Jun-Sin;Song, Jin-Soo;Yoon, Kyung-Hoon
    • 한국신재생에너지학회:학술대회논문집
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    • 2006.06a
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    • pp.158-161
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    • 2006
  • Superstrate pin amorphous silicon thin-film (a-Si:H) solar cells are prepared on $SnO_2:F$ and ZnO:Al transparent conducting oxides (TCO) In order to see the effect of TCO/P-layers on a-Si:H solar cell operation. The solar cells prepared on textured ZnO:Al have higher open circuit voltage $V_{oc}$ than cells prepared on $SnO_2:F$. Presence of thin microcrystalline p-type silicon layer $({\mu}c-Si:H)$ between ZnO:Al and p a-SiC:H plays a major role by causing improvement in fill factor as well as $V_{oc}$, of a-Si:H solar cells prepared on ZnO:Al TCO. Without any treatment of pi interface, we could obtain high $V_{oc}$, of 994mv while keeping fill factor (72.7%) and short circuit current density $J_{sc}$ at the same level as for the cells on $SnO_2:F$ TCO. This high $V_{oc}$ value can be attributed to modification in the current transport in this region due to creation of a potential barrier.

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Effects of Annealing on Solution Processed n-ZTO/p-SiC Heterojunction (용액 공정으로 형성된 n-ZTO/p-SiC 이종접합 열처리 효과)

  • Jeong, Young-Seok;Koo, Sang-Mo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.28 no.8
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    • pp.481-485
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    • 2015
  • We investigated the effects of annealing on the electrical and thermal properties of ZTO/4H-SiC heterojunction diodes. A ZTO thin film layer was grown on p-type 4H-SiC substrate by using solution process. The ZTO/SiC heterojunction structures annealed at $500^{\circ}C$ show that $I_{on}/I_{off}$ increases from ${\sim}5.13{\times}10^7$ to ${\sim}1.11{\times}10^9$ owing to the increased electron concentration of ZTO layer as confirmed by capacitance-voltage characteristics. In addition, the electrical characterization of ZTO/SiC heterojunction has been carried out in the temperature range of 300~500 K. When the measurement temperature increased from 300 K to 500 K, the reverse current variation of annealed device is higher than as-grown device, which is related to barrier height in the ZTO/SiC interface. It is shown that annealing process is possible to control the electrical characteristics of ZTO/SiC heterojunction diode.

A study on the structure of Si-O-C thin films with films size pore by ICPCVD (ICPCVD방법에 의한 나노기공을 갖는 Si-O-C 박막의 형성에 관한 연구)

  • Oh, Teresa
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2002.11a
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    • pp.477-480
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    • 2002
  • Si-O-C(-H) thin film with a tow dielectric constant were deposited on a P-type Si(100) substrate by an inductively coupled plasma chemical vapor deposition (ICPCVD). Bis-trimethylsilymethane (BTMSM, H$_{9}$C$_3$-Si-CH$_2$-Si-C$_3$H$_{9}$) and oxygen gas were used as Precursor. Hybrid type Si-O-C(-H) thin films with organic material have been generated many voids after annealing. Consequently, the Si-O-C(-H) films can be made a low dielectric material by the effect of void. The surface characterization of Si-O-C(-H) thin films were performed by SEM(scanning electron microscope). The characteristic analysis of Si-O-C(-H) thin films were performed by X-ray photoelectron spectroscopy (XPS).

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THE SEQUENCE OF P-T CURVES AROUND A QUATERNARY INVARIANT POINT IN THE SYSTEM NaAlSiO4-KAlSiO4-SiO2-H2O (NaAlSiO4-KAlSiO4-SiO2-H2O 4성분계(成分系)의 불변점부근(不變點附近)의 P-T 곡선(曲線)의 변이(變移))

  • Kim, Ki-Tae
    • Economic and Environmental Geology
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    • v.5 no.2
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    • pp.77-86
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    • 1972
  • The system NaAlSiO_4-KAlSiO_4-SiO_2-H_2O, Bowen's "Petrogeny's Residua System" of course is extremely important in understanding the phase relationships of igneous and metamorphic rock in the continental crust. The phase relationships in this system, however, have not been completely established in the P-T range above the Mohorovicic discontinuity. They need to be established. In this study, the most probable sequence of P-T curves around a quaternary invariant point(~5Kb/${\sim}635^{\circ}C$) in the system using Schreinemakers' rule, is deduced, essentially on the basis of Morse's(1969a and b) experimental data. Possible modifications of the sequence of the P-T curves considering likely changes of the invariant chemogram are also considered. It is concluded that the sequence of P-T curves around the invariant point (~5Kb/${\sim}635^{\circ}C$) is (L), (Anl), (Or), (V), (Ne) and (Ab) on the P-T projection, where the P-T curve (L) is extended towards lower P-T regions, and the (Anl) curve is extended towards a region of higher temperature and lower pressure from the invariant point respectively.

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Synthesis of Powder of the System Si-Al-O-N from Alkoxides I. Synthesis of Si3N4 and $\beta$-Sialon Ultrafine Powders from Alkoxides (알콕사이드로부터 Si-Al-O-N계 분말합성 I. 알콕사이드로부터 Si3N4와 $\beta$-Sialon 초미분말 합성)

  • 이홍림;유영창
    • Journal of the Korean Ceramic Society
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    • v.24 no.1
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    • pp.23-32
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    • 1987
  • Synthesis of high purity ultrafine Si3N4 and ${\beta}$-Sialon powders was investigated via the simultaneous reduction and nitriding of amorphous SiO2, SiO2-Al2O3 system prepaerd by hydrolysis of alkoxides, using carbonablack as a reducing agent. In Si(OC2H5)4-C2H5 OH-H2 O-NH4OH system, hydrolysis rate increased with increasing reaction temperature and pH. Pure ${\alpha}$-Si3N4 was formed at 1350$^{\circ}C$ for 5 hrs in N2 atmosphere. In Si(OC2H5)4-Al(OC3H7)3-C6H6-H2 O-NH4OH system, weight loss increased as Si/Al ratio decreased. Single phase ${\beta}$-Sialon consisted of Si/Al=2 was formed at 1350$^{\circ}C$ in N2 and minor phases of ${\alpha}$-Si3N4, AIN, and X-phase were existed besides theSialon phase at other Si/Al ratios. The Si3N4 and Sialon powders synthesized from alkoxides consisted of uniform find particles of 0.05-0.2$\mu\textrm{m}$ in diameter, respectively.

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Low Resistivity Ohmic Co/Si/Ti Contacts to P-type 4H-SiC (Co/Si/Ti P형 4H-SiC 오옴성 접합에서 낮은 접촉 저항에 관한 연구)

  • Yang, S.J.;Lee, J.H.;Nho, I.H.;Kim, C.K.;Cho, N.I.;Jung, K.H.;Kim, E.D.;Kim, N.K.
    • Proceedings of the KIEE Conference
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    • 2001.11a
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    • pp.112-114
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    • 2001
  • In this letter, we report on the investigation of Si/Ti, Pt/Si/Ti, Co/Si/Ti Ohmic contacts to p-type 4H-SiC. The contacts were formed by a 2-step vacuum annealing at $550^{\circ}C$ for 5 min, $850^{\circ}C$ for 2 min respectively. The contact resistances were measured using the transmission line model method, which resulted in specific $10^{-4}{\Omega}cm^2$, and the physical properties of the contactcontact resistivities in the $9.2{\times}10^{-4}$, $7.1{\times}10^{-4}$ and $4.5{\times}s$ were examined using microscopy, AES(auger electron spectroscopy). AES analysis has shown that, at this anneal temperature, there was a intermixing of the Ti and Si, migration of into SiC. Overlayer of Pt, Co had the effect of decreasing the specific contact resistivity and improving the surface morphology of the annealed contact.

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