• 제목/요약/키워드: oxygen ambient

검색결과 344건 처리시간 0.029초

Electrospun Magnetic Nanofiber as Multifunctional Flexible EMI-Shielding Layer and its Optimization on the Effectiveness

  • Yu, Jiwoo;Nam, Dae-Hyun;Lee, Young-Joo;Joo, Young-Chang
    • 마이크로전자및패키징학회지
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    • 제23권2호
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    • pp.57-63
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    • 2016
  • We developed a flexible and micro-thick electromagnetic interference (EMI) shielding nanofabric layer that also functions as a water resisting and heat sinking material. Electrospinning followed by a simple heat treatment process was carried on to produce the EMI-shielding Ni/C hybrid nanofibers. The ambient oxygen partial pressure ($pO_2$ = 0.1, 0.7, 1.3 Torr) applied during the heat treatment was varied in order to optimize the effectiveness of EMI-shielding by modifying the size and crystallinity of the magnetic Ni nanoparticles distributed throughout the C nanofibers. Permittivity and permeability of the nanofibers under the electromagnetic (EM) wave frequency range of 300 MHz~1 GHz were measured, which implied the EMI-shielding effectiveness (SE) optimization at $pO_2$ = 0.7 Torr during the heat treatment. The materials' heat diffusivity for both in-plane direction and vertical direction was measured to confirm the anisotropic thermal diffusivity that can effectively deliver and sink the local heat produced during device operations. Also, the nanofibers were aged at room temperature in oxygen ambient for water resisting function.

PLD에 의해 제초된 PZT 박막의 특성에 관한 연구 (A study on the characteristics of the PZT thin films prepared by Pulsed Laser Depositon)

  • 김민철;박용욱;백동수;신현용;윤석진;김현재;윤기현
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.885-888
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    • 2000
  • The effects of deposition temperature and post annealing process of ferroelectric PbZr$\sub$0.52/Ti$\sub$0.48/O$_3$(PZT) thin films by pulsed laser deposition (PLD) were investigated. The PZT thin films were deposited at 400, 450, 500, and 550$^{\circ}C$, with/without post annealing at 650$^{\circ}C$ for 30 min. The PZT thin films deposited above 500$^{\circ}C$ without post annealing were crystallized into peroveskite phase, but the PZT thin films deposited below 450$^{\circ}C$ had pyrochlore phase. The PZT thin films deposited below 450$^{\circ}C$ with post annealing also crystallized into pure perovskite. Compared to the PZT thin films which were deposited at 450$^{\circ}C$ and post annealed, the films deposited at 550$^{\circ}C$ have a columnar microstructure and high remnant polarization 28 (${\mu}$C/cm$^2$). With in-situ annealing at oxygen ambient, the PZT thin films reduced oxygen vacancies and increased retained polarization.

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Deposition of Ferroelectric PB(Zr0.52Ti0.48)O3 Films on Platinized Silicon Using Nd:YAG Laser

  • Im, Hoong-Sun;Kim, Sang-Hyeob;Choi, Young-Ku;Lee, Kee-Hag;Jung, Kwang-Woo
    • Bulletin of the Korean Chemical Society
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    • 제18권1호
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    • pp.56-61
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    • 1997
  • Lead zirconate titanate (PZT) thin fills were deposited onto the Pt/Ti/SiO2/Si substrate by the pulsed laser deposition with the second harmonic wavelength (532 nm) of Nd:YAG laser. In order to determine the optimum conditions for the film deposition, the phase of the films were investigated as functions of ambient oxygen pressure, substrate temperature, and laser fluence. Also the chemical composition analysis was conducted for the PZT films deposited under various ambient oxygen pressure. When the distance between substrate and bulk PZT target is set to 20 mm, the optimum conditions have been determined to be 3 torr of oxygen pressure, 1.5 J/cm2 of laser fluence, and 823-848(±10) K range of substrate temperature. At these conditions, perovskite phase PZT films were obtained on platinized silicon. The chemical composition of the films is very similar to that of PZT bulk target. The physical structure of the deposited films analyzed by scanning electron microscopy shows a columnar morphology perpendicular to the substrate surface. Capacitance-Voltage hysteresis loop measurements show also a typical characteristics of ferroelectric thin film. The dielectric constant is found to be 528 for the 0.48 μm thickness of PZT thin film.

Al-Zn 혼합물을 용융 산화시켜 생성되는 ZnO 나노선의 성장에 미치는 산소압력의 영향 (Effect of Oxygen Pressure in the Synthesis of ZnO Nanowires through Melt Oxidation of Al-Zn Mixture)

  • 이근형
    • 한국재료학회지
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    • 제24권6호
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    • pp.301-304
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    • 2014
  • The effect of oxygen pressure on the synthesis of ZnO nanowires by means of melt-oxidation of an Al-Zn mixture was investigated. The samples were prepared in oxygen ambient for 1 h at $1,000^{\circ}C$ under oxygen pressure ranging from 0.5 to 100 Torr. ZnO nanowires were formed at oxygen pressures lower than 10 Torr. As the oxygen pressure increased from 0.5 to 10 Torr, the width of the nanowires increased, but their length decreased. The ZnO nanowires had a needle shape, which became gradually thinner toward the tip. X-ray diffraction patterns showed that the nanowires had a hexagonal wurtzite structure. However, ZnO nanowires were not observed when the oxygen pressure increased from 10 Torr to 100 Torr. In roomtemperature cathodeluminescence spectra of the ZnO nanowires, the intensity of ultra-violet emission at 380 nm increased with decreasing oxygen pressure, which indicated that the lower the oxygen pressure, the better the crystallinity of the ZnO nanowires.

O2 분위기에서 p-GaN 층의 Mg 활성화가 GaN계 녹색 발광소자에 미치는 전류-전압특성 (The Influence of the Mg-doped p-GaN Layer Activated in the O2 Ambient on the Current-Voltage Characteristics of the GaN-Based Green LEDs)

  • 윤창주;배성준
    • 한국전기전자재료학회논문지
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    • 제15권5호
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    • pp.441-448
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    • 2002
  • The electrical properties of the GaN-based green light emitting diodes(LEDs) with the Mg-doped p-GaN layer activated in $N_2$ or $O_2$ ambient have been compared. For the $N_2$ -ambient activation the current-voltage behavior of LEDs has been found to be improved when the Mg dopants activation was performed in the higher temperature. However, for the $O_2$-ambient activation the current-voltage characteristic has been observed to be enhanced when the Mg dopants activation was carried out in the lower temperature. The minimum forward voltage at 20mA was obtained to be 4.8 V for LEDs with the p-GaN layer activated at $900^{\circ}C$ in the $N_2$ ambient and 4.5V for LEDs with the p-GaN layer treated at $700^{\circ}C$ in the $O_2$ambient, repectively. The forward voltage reduction of the LEDs treated in the $O_2$-ambient may be related to the oxygen co-doping of the p-GaN layer during the activation process. The $O_2$ -ambient activation process is useful for the enhancement of the LED performance as well as the fabrication process since this process can activate the Mg dopants in the low temperature.

Au와 Pt 확산에 의한 실리콘 $p^{+}-n$ 접합 스위칭다이오드의 전기적 특성 (Electrical characteristics of Au and Pt diffused silicon $p^{+}-n$ Junction diode)

  • 정기복;이재곤;최시영
    • 센서학회지
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    • 제5권3호
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    • pp.101-108
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    • 1996
  • Au 또는 Pt를 확산시켜 실리콘 $p^{+}-n$ 접합 다이오드를 제작하였다. Au 또는 Pt의 확산을 $800{\sim}1010^{\circ}C$, 산소 및 질소분위기에서 실시하여 다이오드의 전기적 특성을 분석하였으며, Au 또는 Pt가 확산된 시편을 산소분위기의 $800{\sim}1010^{\circ}C$에서 2차 열처리를 실시한후 이 처리가 소자의 전기적 특성에 미치는 효과에 대해 고찰하였다. $1010^{\circ}C$의 온도에서 1차 확산결과 Pt가 확산된 다이오드의 누설전류는 Au가 확산된 다이오드 누설전류의 75배 였다. $1010^{\circ}C$, 질소분위기에서 1시간동안 Pt가 확산된 시편을 산소분위기에서 $800^{\circ}C$, 1시간동안 2차 열처리하였을 경우에 1차 열처리한 것보다 누설전류가 1/1100로 감소되었다. 초고속 실리콘 $p^{+}-n$ 접합 스위칭 다이오드의 특성을 만족하기 위해서는, Pt를 $1010^{\circ}C$, 질소분위기에선 1시간 확산시킨후 2차 열처리를 $800^{\circ}C$, 산소분위기에서 1시간동안 열처리하는 것이 최적 조건임을 알 수 있었다. 이때 다이오드의 제특성은 역회복시간 4ns, 항복전압 138V, 누설전류1.7nA 그리고 순방향 전압이 1V였다.

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분위기 가스에 따른 IZO 박막의 구조적 및 전기적 특성 (Structural and electrical characteristics of IZO thin films deposited under different ambient gases)

  • 이유림;이규만
    • 반도체디스플레이기술학회지
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    • 제9권3호
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    • pp.53-58
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    • 2010
  • In this study, we have investigated the effect of the ambient gases on the characteristics of IZO thin films for the OLED (organic light emitting diodes) devices. For this purpose, IZO thin films were deposited by RF magnetron sputtering under various ambient gases (Ar, $Ar+O_2$ and $Ar+H_2$) at $150^{\circ}C$. In order to investigate the influences of the oxygen and hydrogen, the flow rate of oxygen and hydrogen in argon mixing gas has been changed from 0.1sccm to 0.5sccm, respectively. All the samples show amorphous structure regardless of ambient gases. The electrical resistivity of IZO film increased with increasing flow rate of $O_2$ under $Ar+O_2$ while under $Ar+H_2$ atmosphere the electrical resistivity showed minimum value near 0.5sccm of $H_2$. All the films showed the average transmittance over 85% in the visible range. The OLED device was fabricated with different IZO substrates made by configuration of IZO/${\alpha}$-NPD/DPVB/$Alq_3$/LiF/Al to elucidate the performance of IZO substrate. OLED devices with the amorphous-IZO (a-IZO) anode film show better current densityvoltage-luminance characteristics than that of OLED devices with the commercial crystalline-ITO (c-ITO) anode film. It can be explained that very flat surface roughness and high work function of a-IZO anode film lead to more efficient hole injection by reduction of interface barrier height between anode and organic layers. This suggests that a-IZO film is a promising anode materials substituting conventional c-ITO anode in OLED devices.

Comparison of Blue Luminescence Between Spark-processed Photoluminescian Silicon and Ambient Air Aged Anodically Etched Porous Silicon

  • Chang, Sung-Sik;Yoon, Sang-Ok
    • The Korean Journal of Ceramics
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    • 제2권3호
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    • pp.137-141
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    • 1996
  • Ambient air aged anodically etched porous silicon (PS) and spark-processed silicon (sp-Si) show interesting similarities and dissimilarities in some of their luminescence-related properties. Among these similarties are: (1) the photoluminescence (PL) peak maximum in the blue/violet (410 nm);(2) the blue/violet PL peak positions are essentially unchanged with temperature ; (3) PL decay times in the nanosecond region which are independent of the detection wavelength, which is much faster in decay times compared to that of observed decay time in $SiO_2$.Among the dissimilarities are: (1) the PL intensity of blue/violet luminescence, namely, the PL intensity of sp-Si is at least 2 orders of magnitude larger than that of an ambient air aged PS; (2) the blue/violet PL intensity of sp-Si is more stable than that of ambient air aged PS under UV illuminations; (3) FTIR spectra of sp-Si favor those modes, which involve silicon -oxygen bonds in $SiO_2$ stoichiometry, whereas ambient air aged PS can be considered as a nonstoichiometric oxide judging from the observed vibrational spectra.

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Effect of Post Annealing in Oxygen Ambient on the Characteristics of Indium Gallium Zinc Oxide Thin Film Transistors

  • Jeong, Seok Won
    • 한국전기전자재료학회논문지
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    • 제27권10호
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    • pp.648-652
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    • 2014
  • We have investigated the effect of electrical properties of amorphous InGaZnO thin film transistors (a-IGZO TFTs) by post thermal annealing in $O_2$ ambient. The post-annealed in $O_2$ ambient a-IGZOTFT is found to be more stable to be used for oxide-based TFT devices, and has better performance, such as the on/off current ratios, sub-threshold voltage gate swing, and, as well as reasonable threshold voltage, than others do. The interface trap density is controlled to achieve the optimum value of TFT transfer and output characteristics. The device performance is significantly affected by adjusting the annealing condition. This effect is closely related with the modulation annealing method by reducing the localized trapping carriers and defect centers at the interface or in the channel layer.

산화물에서의 산소추적자확산계수를 결정하는 새로운 방법의 개발 II - 라만분광법에 의한 고체시료 중의 시간에 따른 $^{18}O$ 농도변화 측정 - (Development of Novel Techniques for Determining the Oxygen Tracer Diffusion Coefficients in Oxides II - Measurements of the Depth Profiles of $^{18}O$ Concentration in the solid Samples by Raman Spectroscopy)

  • 김병국;마하구찌히로오;박순자
    • 한국세라믹학회지
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    • 제31권12호
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    • pp.1459-1466
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    • 1994
  • A novel technique for determining the oxygen tracer diffusion coefficients in oxides was developed. After the 16O-18O solid-gas exchange reactions between 16O in the oxides and 18O in the ambient gas, Raman spectra of the cross sections of oxide samples were measured in a spatial resolution of 5 ${\mu}{\textrm}{m}$. From thus obtained Raman spectra, depth profiles of 18O concentration in the oxide samples were calculated. The oxygen tracer diffusion coefficients and the surface exchange coefficients were determined under the assumptions that samples are semi-infinite slab and that the surface exchange reactionsare not negligible. The oxygen tracer diffusion coefficient of 2.8 mol% Y2O3-containing tetragonal ZrO2 polycrystals, 8 mol% Y2O3-containing ZrO2 polycrystals, and 10 mol% Y2O3-containing cubic ZrO2 single crystals (along the a axis) are as follows.

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