• Title/Summary/Keyword: oxides

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A Basic Study on Separation of U and Nd From LiCl-KCl-UCl3-NdCl3 System (LiCl-KCl-UCl3-NdCl3 system에서 U 및 Nd 분리에 관한 기초연구)

  • Kim, Tack-Jin;Ahn, Do-Hee;Eun, Hee-Chul;Lee, Sung-Jai
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.16 no.1
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    • pp.59-64
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    • 2018
  • In case of high contents of rare earths in the LiCl-KCl salt, it is not easy to recover U and TRU metals as a usable resource form from LiCl-KCl eutectic salts generated from the pyroprocessing of spent nuclear fuel. In this study, a conversion of $UCl_3$ into an oxide form using $K_2CO_3$ and an electrodeposition of $NdCl_3$ into a metal form in $LiCl-KCl-UCl_3-NdCl_3$ system were conducted to resolve the problem. Before conducting the conversion, experimental conditions for the conversion were determined by performing a thermodynamic equilibrium calculation. In this study, almost all of $UCl_3$ disappeared in the LiCl-KCl salt when the injection of $K_2CO_3$ reached theoretical equivalent for the conversion, and then $NdCl_3$ was effectively electrodeposited as a metal form using liquid zinc cathode. After that, the LiCl-KCl salt became transparent, and uranium oxides were precipitated to the bottom of the LiCl-KCl salt. These results will be utilized in designing a process to separate U and rare earths in LiCl-KCl salt.

Removal of TNT Reduction Products via Oxidative-Coupling Reaction Using Manganese Oxide (망간산화물을 이용한 TNT 환원부산물의 산화-결합반응에 의한 제거 연구)

  • Kang, Ki-Hoon;Lim, Dong-Min;Shin, Hyun-Sang
    • Journal of Korean Society of Environmental Engineers
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    • v.27 no.5
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    • pp.476-485
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    • 2005
  • In this study, abiotic transformation of TNT reduction products via oxidative-coupling reaction was investigated using Mn oxide. In batch experiments, all the reduction products tested were completely transformed by birnessite, one of natural Mn oxides present in soil. Oxidative-coupling was the major transformation pathway, as confirmed by mass spectrometric analysis. Using observed pseudo-first-order rate constants with respect to birnessite loadings, surface area-normalized specific rate constants, $k_{surf}$, were determined. As expected, $k_{surf}$ of diaminonitrotoluenes (DATs) ($1.49{\sim}1.91\;L/m^2{\cdot}day$) are greater about 2 orders than that of dinitroaminotoluenes (DNTs) ($1.15{\times}10^{-2}{\sim}2.09{\times}10^{-2}\;L/m^2{\cdot}day$) due to the increased number of amine group. In addition, by comparing the value of $k_{surf}$ between DNTs or DATs, amino group on ortho position is likely to be more preferred for the oxidation by birnessite. Although cross-coupling of TNT in the presence of various mediator compounds was found not to be feasible, transformation of TNT by reduction using $Fe^0$ followed by oxidative coupling using Mn oxide was efficient, as evaluated by UV-visible spectrometry.

Oxidative Transformation of 1-Naphthol Using Manganese Oxide (망간산화물을 이용한 1-Naphthol의 산화 제거 연구)

  • Lim, Dong-Min;Kang, Ki-Hoon;Shin, Hyun-Sang
    • Journal of Korean Society of Environmental Engineers
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    • v.28 no.5
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    • pp.535-542
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    • 2006
  • In this study, removals of 1-naphthol by oxidative-coupling reaction using birnessite, one of natural Mn oxides present in soil, was investigated in various experimental conditions(reaction time, Mn oxide loadings, pH, etc). Removal efficiency of 1-naphthol by birnessite was high in all the experimental conditions, and UV-vis. and mass spectrometric analyses on the supernatant after reaction confirmed that the reaction products were oligomers formed by oxidative-coupling reaction. Pseudo-first order rate constants, f, for the oxidative transformation of 1-naphthol by birnessite was derived from the kinetic experiments under various amount of birnessite loadings, and using the observed pseudo-first order rate constants with respect to birnessite loadings, surface area-normalized specific rate constant, $k_{surf}$ was also determined to be $9.31{\times}10^{-4}(L/m^2{\cdot}min)$ for 1-naphthol. In addition, the oxidative transformation of 1-naphthol was found to be dependent on solution pH, and the pseudo-first order rate constants were increased from 0.129 at pH 10 to 0.187 at pH 4.

Neuroprotective Effects of Ginsenoside Rg3 against 24-OH-cholesterol-induced Cytotoxicity in Cortical Neurons

  • Roh, Yoon-Seok;Kim, Hyoung-Bae;Kang, Chang-Won;Kim, Bum-Seok;Nah, Seung-Yeol;Kim, Jong-Hoon
    • Journal of Ginseng Research
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    • v.34 no.3
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    • pp.246-253
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    • 2010
  • Ginsenoside $Rg_3$ ($Rg_3$), one of the active ingredients in Panax ginseng, attenuates NMDA receptor-mediated currents in vitro and antagonizes NMDA receptors through a glycine modulatory site in rat cultured hippocampal neurons. In the present study, we examined the neuroprotective effects of $Rg_3$ on 24-hydroxycholesterol (24-OH-chol)-induced cytotoxicity in vitro. The results showed that $Rg_3$ treatment significantly and dose-dependently inhibited 24-OH-chol-induced cell death in rat cultured cortical neurons, with an $IC_{50}$ value of $28.7{\pm}7.5\;{\mu}m$. Furthermore, the $Rg_3$ treatment not only significantly reduced DNA damage, but also dose-dependently attenuated 24-OH-chol-induced caspase-3 activity. To study the mechanisms underlying the in vitro neuroprotective effects of $Rg_3$ against 25-OH-chol-induced cytotoxicity, we also examined the effect of $Rg_3$ on intracellular $Ca^{2+}$ elevations in cultured neurons and found that $Rg_3$ treatment dose-dependently inhibited increases in intracellular $Ca^{2+}$, with an $IC_{50}$ value of $40.37{\pm}12.88\;{\mu}m$. Additionally, $Rg_3$ treatment dose-dependently inhibited apoptosis with an $IC_{50}$ of $47.3{\pm}14.2\;{\mu}m$. Finally, after confirming the protective effect of $Rg_3$ using a terminal deoxynucleotidyl transferase-mediated dUTP nick end-labeling assay, we found that $Rg_3$ is an active component in ginseng-mediated neuroprotection. These results collectively indicate that $Rg_3$-induced neuroprotection against 24-OH-chol in rat cortical neurons might be achieved via inhibition of a 24-OH-chol-mediated $Ca^{2+}$ channel. This is the first report to employ cortical neurons to study the neuroprotective effects of $Rg_3$ against 24-OH-chol. In conclusion, $Rg_3$ was effective for protecting cells against 24-OH-chol-induced cytotoxicity in rat cortical neurons. This protective ability makes $Rg_3$ a promising agent in pathologies implicating neurodegeneration such as apoptosis or neuronal cell death.

Garlic flavor (마늘 flavor)

  • Kim, Mee Ree;Ahn, Seung Yo
    • Journal of the Korean Society of Food Science and Nutrition
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    • v.12 no.2
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    • pp.176-187
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    • 1983
  • Volatile flavor components of garlic and factors which influence on its flavors were reviewed. Growth, storage and processing conditions influence on the flavor intensity of garlic. To intensify garlic flavors, it is desirable that sufficient sulfate nutrition be supplied to the soil of growing garlic and that the suggested proportions of mineral composition and water content be considered. And to maintain the flavor intensity of post harvested garlic, flavor losses taken place during over inter storage mainly due to respiration, sprout and decay, have to be minimized. Among the various storage methods, combination method of post harvest hot-air drying and low temperature ($0^{\circ}C$), low humidity (RH 70-75%) is useful. The flavor of processed garlic is very much decreased as compared with that of fresh, and the decreasing rate of flavors depends on processing method. The synthetic garlic flavors were obtained by three types based on intermediate thiosulfinate, S-alk(en) yl-$\small{L}$-cyteine sulfoxlde-alliinase fission products and $\small{L}$-5-alk (en)yl thiomethylhydantoin ${\pm}$ S-oxides. These synthetic garlic flavors may be promised to be applied to food additives.

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A study on the structure of Si-O-C thin films with films size pore by ICPCVD (ICPCVD방법에 의한 나노기공을 갖는 Si-O-C 박막의 형성에 관한 연구)

  • Oh, Teresa
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2002.11a
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    • pp.477-480
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    • 2002
  • Si-O-C(-H) thin film with a tow dielectric constant were deposited on a P-type Si(100) substrate by an inductively coupled plasma chemical vapor deposition (ICPCVD). Bis-trimethylsilymethane (BTMSM, H$_{9}$C$_3$-Si-CH$_2$-Si-C$_3$H$_{9}$) and oxygen gas were used as Precursor. Hybrid type Si-O-C(-H) thin films with organic material have been generated many voids after annealing. Consequently, the Si-O-C(-H) films can be made a low dielectric material by the effect of void. The surface characterization of Si-O-C(-H) thin films were performed by SEM(scanning electron microscope). The characteristic analysis of Si-O-C(-H) thin films were performed by X-ray photoelectron spectroscopy (XPS).

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Surface reaction of $HfO_2$ etched in inductively coupled $BCl_3$ plasma ($BCl_3$ 유도결합 플라즈마를 이용하여 식각된 $HfO_2$ 박막의 표면 반응 연구)

  • Kim, Dong-Pyo;Um, Doo-Seunng;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.477-477
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    • 2008
  • For more than three decades, the gate dielectrics in CMOS devices are $SiO_2$ because of its blocking properties of current in insulated gate FET channels. As the dimensions of feature size have been scaled down (width and the thickness is reduced down to 50 urn and 2 urn or less), gate leakage current is increased and reliability of $SiO_2$ is reduced. Many metal oxides such as $TiO_2$, $Ta_2O_4$, $SrTiO_3$, $Al_2O_3$, $HfO_2$ and $ZrO_2$ have been challenged for memory devices. These materials posses relatively high dielectric constant, but $HfO_2$ and $Al_2O_3$ did not provide sufficient advantages over $SiO_2$ or $Si_3N_4$ because of reaction with Si substrate. Recently, $HfO_2$ have been attracted attention because Hf forms the most stable oxide with the highest heat of formation. In addition, Hf can reduce the native oxide layer by creating $HfO_2$. However, new gate oxide candidates must satisfy a standard CMOS process. In order to fabricate high density memories with small feature size, the plasma etch process should be developed by well understanding and optimizing plasma behaviors. Therefore, it is necessary that the etch behavior of $HfO_2$ and plasma parameters are systematically investigated as functions of process parameters including gas mixing ratio, rf power, pressure and temperature to determine the mechanism of plasma induced damage. However, there is few studies on the the etch mechanism and the surface reactions in $BCl_3$ based plasma to etch $HfO_2$ thin films. In this work, the samples of $HfO_2$ were prepared on Si wafer with using atomic layer deposition. In our previous work, the maximum etch rate of $BCl_3$/Ar were obtained 20% $BCl_3$/ 80% Ar. Over 20% $BCl_3$ addition, the etch rate of $HfO_2$ decreased. The etching rate of $HfO_2$ and selectivity of $HfO_2$ to Si were investigated with using in inductively coupled plasma etching system (ICP) and $BCl_3/Cl_2$/Ar plasma. The change of volume densities of radical and atoms were monitored with using optical emission spectroscopy analysis (OES). The variations of components of etched surfaces for $HfO_2$ was investigated with using x-ray photo electron spectroscopy (XPS). In order to investigate the accumulation of etch by products during etch process, the exposed surface of $HfO_2$ in $BCl_3/Cl_2$/Ar plasma was compared with surface of as-doped $HfO_2$ and all the surfaces of samples were examined with field emission scanning electron microscopy and atomic force microscope (AFM).

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Steam Reforming of Ethylene Glycol over Ni/Al2O3 Catalysts: Effect of the Preparation Method and Reduction Temperature (Ni/Al2O3 촉매를 사용한 에틸렌글리콜의 수증기 개질 반응: 촉매 제조 방법과 환원온도의 영향)

  • Choi, Dong Hyuck;Park, Jung Eun;Park, Eun Duck
    • Korean Chemical Engineering Research
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    • v.53 no.3
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    • pp.372-381
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    • 2015
  • The effect of preparation method on the catalytic activities of the $Ni/Al_2O_3$ catalysts on steam reforming of ethylene glycol was investigated. The catalysts were prepared with various preparation methods such as an incipient wetness impregnation, wet impregnation, and coprecipitation method. In the case of coprecipitation method, various precipitants such as KOH, $K_2CO_3$, and $NH_4OH$ were compared. The prepared catalysts were characterized by using $N_2$ physisorption, inductively coupled plasma-atomic emission spectroscopy, X-ray diffraction, temperatureprogrammed reduction, pulsed $H_2$ chemisorption, temperature-programmed oxidation, scanning electron microscopy, and thermogravimetric analysis. Among the catalysts reduced at 773 K, the $Ni/Al_2O_3$ catalyst prepared by a coprecipitation with KOH or $K_2CO_3$ as precipitants showed the best catalytic performance. The preparation method affected the particle size of Ni, reducibility of nickel oxides, catalytic performance (activity and stability), and types of coke formed during the reaction. The $Ni/Al_2O_3$ catalyst prepared by a coprecipitation with KOH showed the increasing catalytic activity with an increase in the reduction temperature from 773 to 1173 K because of an increase in the reduction degree of Ni oxide species even though the particle size of Ni increased with increasing reduction temperature.

Selective Oxidation of Hydrogen Sulfide Containing Ammonia and Water Using Fe2O3/SiO2 Catalyst (Fe2O3/SiO2 촉매 상에서 물과 암모니아가 함께 존재하는 황화수소의 선택적 산화 반응)

  • Kim, Moon-Il;Lee, Gu-Hwa;Chun, Sung-Woo;Park, Dae-Won
    • Korean Chemical Engineering Research
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    • v.50 no.3
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    • pp.398-402
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    • 2012
  • The catalytic performance of some metal oxides in the vapor phase selective oxidation of $H_2S$ in the stream containing ammonia and water was investigated. Among the catalysts tested $Fe_2O_3/SiO_2$ was the most promising catalyst for practical application. It showed higher than 90% $H_2S$ conversion and very small amount of $SO_2$ emission over a temperature range of $240{\sim}280^{\circ}C$. The effects of reaction temperature, $O_2/H_2S$ ratio, amount of ammonia and water vapor on the catalytic activity of $Fe_2O_3/SiO_2$ were discussed to better understand the reaction mechanism. The $H_2S$ conversion showed a maximum at $260^{\circ}C$ and it decreased with increasing temperature over $280^{\circ}C$. With an increase of $O_2/H_2S$ ratio from 0.5 to 4, the conversion was slightly increased, but the selectivity to elemental sulfur was remarkably decreased. The increase of ammonia amount favored the conversion and the selectivity to elemental sulfur with a decrease in $SO_2$ production. The presence of water vapor decreased both the activity and the selectivity to sulfur, but increased the ATS selectivity.

Computational Fluid Dynamics(CFD) Simulation for a Pilot-scale Selective Non-catalytic Reduction(SNCR) Process Using Urea Solution (요소용액을 이용한 파일럿규모 SNCR 공정에 대한 CFD 모델링 및 모사)

  • Nguyen, Thanh D.B.;Kang, Tae-Ho;Lim, Young-Il;Kim, Seong-Joon;Eom, Won-Hyeon;Yoo, Kyung-Seun
    • Korean Chemical Engineering Research
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    • v.46 no.5
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    • pp.922-930
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    • 2008
  • The selective non-catalytic reduction(SNCR) performance is sensitive to the process parameters such as flow velocity, reaction temperature and mixing of reagent(ammonia or urea) with the flue gases. Therefore, the knowledge of the velocity field, temperature field and species concentration distribution is crucial for the design and operation of an effective SNCR injection system. In this work, a full-scale two-dimensional computational fluid dynamics(CFD)-based reacting model involving a droplet model is built and validated with the data obtained from a pilot-scale urea-based SNCR reactor installed with a 150 kW LPG burner. The kinetic mechanism with seven reactions for nitrogen oxides($NO_x$) reduction by urea-water solution is used to predict $NO_x$ reduction and ammonia slip. Using the turbulent reacting flow CFD model involving the discrete droplet phase, the CFD simulation results show maximum 20% difference from the experimental data for NO reduction. For $NH_3$ slip, the simulation results have a similar tendency with the experimental data with regard to the temperature and the normalized stoichiometric ratio(NSR).