• Proceedings of the Optical Society of Korea Conference
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• 1990.02a
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• pp.215-218
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• 1990

A method for optical representation and modulation of synaptic interconnections between neurons using photoanisotropic amorphous As2S3 thin film is discussed. Experimental results show that the proposed method can be used for the representation of not only excitatory synaptic connections but also inhibitory synaptic connections. Applications of the method to the implementation of optical learning machine is also discussed.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.3
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• pp.209-212
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• 2012

In this paper, we have studied on the optimal design of the optical compensation film for the TN-LCDs. To have wide viewing angle panels, several methods such as multi-domain method, optical path method, and phase compensation method have been proposed. Among these methods, this paper focused on the phase compensation method. In the phase compensation method, the phase retardation generated from the optical birefringence for the off-axis incident is compensated by using optical films with refractive anisotropy. To compensate the phase retardation of the TN-LCDs, we have proposed design concept for the biaxial optical films and analyzed the optical performance for the proposed structures. The calculation of the dynamic motion of the liquid crystals was based on the Ericksen-Leslie theory and the optical performance of the TN-LCD was calculated from the Extended Jones Matrix Method. From the results, we have confirmed that the optical characteristics of the TN-LCDs with the biaxial films have been improved considerably compared with the TN-LCDs compensated by the combination of the uniaxial films.

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.773-775
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• 2004

For high end, large area displays, all current LC modes require some degree of optical compensation to improve the front of screen viewing experience. Currently most optical films are laminated to the outside of the LCD cell, between the glass and polariser. In this paper we wish to show how it is possible to integrate the compensating optical film within a VA mode LCD cell. The paper will describe the process of making the biaxial film through the process of in-situ photopolymerisation of an aligned film of reactive mesogens in the cholesteric phase using polarised UV light. The film can be made on the colour filter array side of the LCD panel. In addition the process of fabricating a VA mode LCD containing this film will be described and the performance of this module will be presented

• Journal of Information Display
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• v.5 no.2
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• pp.23-26
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• 2004

For high end, large area displays, all current LC modes require some degree of optical compensation to improve the front of screen viewing experience. Currently most optical films are laminated to the outside of the LCD cell, between the glass and polariser. In this paper we wish to show how it is possible to integrate the compensating optical film within a VA mode LCD cell. The paper will describe the process of making the biaxial film through the process of in-situ photopolymerisation of an aligned film of reactive mesogens in the cholesteric phase using polarised UV light. The film can be made on the colour filter array side of the LCD panel. In addition the process of fabricating a VA mode LCD containing this film will be described and the performance of this module will be presented.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.3
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• pp.177-181
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• 2011

We have studied structural, optical, and electrical properties of the Al-doped ZnO (AZO) thin films being usable in transparent conducting oxides. The AZO thin films were deposited on the corning 1737 glass plate by the RF magnetron sputtering system. To find optimal properties of AZO for transparent conducting oxides, the RF power in sputtering process was varied as 40 W, 60 W, and 80 W, respectively. As RF power increased, the crystallinity of AZO thin film was decreased, the optical bandgap of AZO thin film increased. The transmittance of the film was over 80% in the visible light range regardless of the changes in RF power. The measurement of Hall effect characterizes the whole thin film as n-type, and the electrical property was improved with increasing RF power. The structural, optical, and electrical properties of the AZO thin films were affected by Al dopant content in AZO thin film.

• Imaging Science in Dentistry
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• v.31 no.1
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• pp.17-22
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• 2001

Purpose: To compare the film density of Insight dental X-ray film (Eastman Kodak Co., Rochester, NY, USA) with that of Ektaspeed Plus film (Eastman Kodak) under manual and automatic processing conditions. Materials and Methods : Insight and Ektaspeed Plus films were exposed at three different exposure conditions with an aluminum step wedge on the films under the three different exposure times. The exposed films were processed by both manual and automatic ways. The Base plus fog density and the optical density made by exposing step wedge were calculated using a digital densitometer (model 07-443, Victoreen Inc, Cleveland, Ohio, USA). The optical densities of the Insight and Ektaspeed film versus thickness of alumimun wedge at the same exposure time were plotted on the graphs. Statistical analyses were applied for comparing the optical densities of the two films. Results: The film density of both Insight films and Ektaspeed Plus films under automatic processing condition was significantly higher over the manual processing. The film density of Insight films was significantly higher than that of Ektaspeed Plus films on both automatic and manual processing conditions. Conclusion: The radiation exposure time can be reduced when using Insight over Ektaspeed Plus film. To take the full advantage of reducing exposure time, Insight film should be processed automatically.

• Transactions on Electrical and Electronic Materials
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• v.13 no.2
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• pp.102-105
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• 2012

The structural, electrical, and optical properties of layer-by-layer ZnO nanoparticles deposited using sol-gel spin coating technique were studied and now presented. Thicknesses of the thin films were varied by increasing the number of deposited layers. As part of our characterization process, XRD and FE-SEM were used to characterize the structural properties, current-voltage measurements for the electrical properties, and UV-Vis spectra and photoluminescence spectra for the optical properties of the ZnO thin films. ZnO thin films with thicknesses ranging from 14.2 nm to 62.7 nm were used in this work. Film with thickness of 42.7 nm gave the lowest resistivity among all, $1.39{\times}10^{-2}{\Omega}{\cdot}cm$. Photoluminescence spectra showed two peaks which were in the UV emission centered at 380 nm, and visible emission centered at 590 nm. Optical transmittance spectra of the samples indicated that all films were transparent (>88%) in the visible-NIR range. The optical band gap energy was estimated to be 3.21~3.26 eV, with band gap increased with the thin film thickness.

• Proceedings of the Optical Society of Korea Conference
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• 2001.08a
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• pp.290-291
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• 2001

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.151-151
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• 2009

In this presentation, CD BLU optical film market and technology trends are introduced at first. Then hghly precise, cost-advantaged MNTECH's specialized Soft Mold replication Technology and its optic films are contained.

• Proceedings of the Optical Society of Korea Conference
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• 2002.11a
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• pp.160-161
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• 2002