• 제목/요약/키워드: on-wafer measurement

검색결과 199건 처리시간 0.029초

Characteristics of a-IGZO TFTs with Oxygen Ratio

  • 이초;박지용;문제용;김보석
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.341.1-341.1
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    • 2014
  • In the advanced material for the next generation display device, transparent amorphous oxide semiconductors (TAOS) are promising materials as a channel layer in thin film transistor (TFT). The TAOS have many advantages for large-area application compared with hydrogenated amorphous silicon TFT (a-Si:H) and organic semiconductor TFT. For the reasonable characteristics of TAOS, The a-IGZO has the excellent performances such as low temperature fabrication (R.T~), high mobility, visible region transparent, and reasonable on-off ratio. In this study, we investigated how the electric characteristics and physical properties are changed as various oxygen ratio when magnetron sputtering. we analysis a-IGZO film by AFM, EDS and I-V measurement. decreasing the oxygen ratio, the threshold voltage is shifted negatively and mobility is increasing. Through this correlation, we confirm the effect of oxygen ratio. We fabricated the bottom-gate a-IGZO TFTs. The gate insulator, SiO2 film was grown on heavily doped silicon wafer by thermal oxidation method. a-IGZO channel layer was deposited by RF magnetron sputtering. and the annealing condition is $350^{\circ}C$. Electrode were patterned Al deposition through a shadow mask(160/1000 um).

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A Study on the Characteristics of Ammonia Doped Plasma Polymer Thin Film with a Controlled Plasma Power

  • 서현진;황기환;주동우;유정훈;이진수;전소현;남상훈;윤상호;부진효
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.242.2-242.2
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    • 2014
  • Plasma-polymer thin films (PPTF) have been deposited on a Si(100) wafer and glass under several conditions such as different RF power by using plasma-enhanced chemical vapor deposition (PECVD) system. Ethylcyclohexane, ammonia gas, hydrogen and argon were utilized as organic precursor, doping gas, bubbler gas and carrier gases, respectively. PPTFs were grown up with RF (ratio frequency using 13.56 MHz) powers in the range of 20~60 watt. PPTFs were characterized by FT-IR (Fourier Transform Infrared), FE-SEM (Scanning Electron Microscope), AFM (Atomic Force Microscope), Contact angle and Probe station. The result of FT-IR measurement showed that the PPTFs have high cross-link density nitrogen doping ratio was also changed with a RF power increasing. AFM and FE-SEM also showed that the PPTFs have smooth surface and thickness. Impedance analyzer was utilized for the measurements of C-V curves having different dielectric constant as RF power.

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실리콘 웨이퍼를 이용한 이방성의 젖음성을 가지는 초소유성 표면 제작 (Fabrication of Superoleophobic Surface with Anisotropic Wettability Using Silicon Wafer)

  • 이동기;이은행;조영학
    • 한국생산제조학회지
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    • 제23권6호
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    • pp.533-538
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    • 2014
  • We fabricated grooved mushroom structures with anisotropic wettability on silicon substrates using basic MEMS processes. The geometry of these grooved mushroom structures could be changed by controlling the additional IPA solution during Si etching by TMAH solution. To understand anisotropic wettability, contact angles (CAs) of hexadecane droplets were measured in the orthogonal and parallel directions to grooved lines. The CA measurement results displayed anisotropic wetting on the grooved mushroom structures. However, specimens with $80{\mu}m$ distance between top layers displayed isotropic and superoleophobic wetting. This study demonstrates that the thickness of the top layer is more critical than the width or height of the ridge when determining the wettability of organic solvent. Despite the wide distance between top layers ($80{\mu}m$), the specimen with a thin top layer (100 nm) showed highly anisotropic wetting and low CA due to the pinning of droplets at the edge of the top layer.

Angle Sensors Based on Oblique Giant Magneto Impedance Devices

  • Kim, Do-Hun;Na, Ji-Won;Jeung, Won-Young
    • Journal of Magnetics
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    • 제14권1호
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    • pp.42-46
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    • 2009
  • The measurement of external magnetic field orientation using Giant Magneto Impedance (GMI) sensors has been performed. A soft magnetic alloy of $Co_{30}Fe_{34}Ni_{36}$ was electroplated on a Si wafer with a CoFeNi seed layer. V-shaped microwire patterns were formed using a conventional photolithography process. An external magnetic field was generated by a rectangular AlNiCo permanent magnet. The reference direction was defined as the external magnetic field direction oriented in the middle of 2 GMI devices. As the orientation of the magnetic field deviated from the reference direction, variation in the field component along each device introduced voltage changes. It was found that, by taking the voltage difference between the left and right arms of the Vshaped device, the nonlinearity of each device could be significantly reduced. The fabricated angle sensor had a linear range of approximately $70^{\circ}$ and an overall sensitivity of approximately 10 mV.

기판 표면 조도에 따른 구리박막의 실시간 고유응력 거동 (The Effect of Substrate Surface Roughness on In-Situ Intrinsic Stress Behavior in Cu Thin Films)

  • 조무현;황슬기;류상;김영만
    • 대한금속재료학회지
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    • 제47권8호
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    • pp.466-473
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    • 2009
  • Our group previously observed the intrinsic stress evolution of Cu thin films during deposition by changing the deposition rate. Intrinsic stress of Cu thin films, which show Volmer-Weber growth, is reported to display three unique stress stages, initial compressive, broad tensile, and incremental compressive stress. The mechanisms of the initial compressive stress and incremental compressive stages remain subjects of debate, despite intensive research inquiries. The tensile stress stage may be related to volume contraction through grain growth and coalescence to reduce over-accumulate Cu adatoms on the film surface. The in-situ intrinsic stresses behavior in Cu thin films was investigated in the present study using a multi-beam curvature measurement system attached to a thermal evaporation device. The effect of substrate surface roughness was monitored by observed the in-situ intrinsic stress behavior in Cu thin films during deposition, using $100{\mu}m$ thick Si(111) wafer substrates with three different levels of surface roughness.

벌지 실험을 통한 Ti 박막의 크기 효과 관찰 및 기계적 물성 측정 (Observation of Size Effect and Measurement of Mechanical Properties of Ti Thin Film by Bulge Test)

  • 정봉부;이헌기;황경호;박현철
    • 대한기계학회논문집B
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    • 제37권1호
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    • pp.19-25
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    • 2013
  • 본 연구에서는 벌지 실험을 이용하여 티타늄 박막의 기계적 물성을 측정하였다. 벌지 실험은 외적 지지구조를 가지지 않는 박막 시편의 한 면에 일정한 압력을 가하여 박막의 변위를 측정, 압력과 변위의 관계를 이용하여 박막의 기계적 물성을 측정하는 실험이다. 스퍼터링을 이용해 증착된 티타늄 박막의 두께는 1.0, 1.5, $2.0{\mu}m$ 이고, 물성의 열처리 시간에 대한 영향을 알아보기 위해 증착된 시편은 $600^{\circ}C$에서 각각 150, 300, 600 초 동안 열처리 되었다. 박막의 탄성 계수, 잔류 응력, 항복 응력이 벌지 실험을 통해 측정되었고, 실험 결과 항복 응력은 열처리 시간에 의존하는 특성을 확인하였다. 또한 시편 두께가 감소할수록 강도가 증가하는 크기효과를 관찰하였다.

저 편광의존성을 가지는 반도체 광증폭기의 제작에 관한 연구 (A study on the fabrication of the polarization-insensitive semiconductor optical amplifier)

  • 황상구;김정호;김운섭;김동욱;박윤호;홍창의
    • 한국정보통신학회논문지
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    • 제4권5호
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    • pp.1135-1142
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    • 2000
  • 본 연구에서는 <1.55um 대역의 편광비의존성을 가지는 반도체 광증폭기를 제작하기 위하여 InGaAsP/InP 이중이종접합 웨이퍼를 이용하여 정방매립형 반도체 광증폭기(SOA)를 제작하였다. 제작된 반도체 광증폭기의 특성을 측정한 결과 3㏈대역폭은 35nm이었으며, 3dB포화출력은 4dBm이었다. ISOmA의 CW구동에서 최대이득은 19.4dB이었다. 반도체 광증폭기의 ASE power를 ASE측정시스템을 이용하여 TE, TM모드에 대하여 측정한 결과 최대이득을 나타내는 영역부근에서 TE 및 TM모드의 분포가 거의 일치하였다. 따라서 본 연구에서 제작된 반도체 광증폭기는 비편광의존성 SOA임을 실험적으로 확인하였다.

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반도체 Ash 공정용 PWM 제어 Plasma 발생방법 (Plasma Generation Method using PWM Control for Ash Process)

  • 이정호;최대규;최상돈;이병국;원충연;김수석
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2006년도 전력전자학술대회 논문집
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    • pp.470-474
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    • 2006
  • This dissertation discuses about a ferrite core plasma source using low operating frequency without sputtering problem by the stored electric field. Compared with the conventional RF power system with 13.56MHz switching frequency, the proposed plasma power system is only separated at 400kHz, so that it makes possible to use of low cost switching elements, PWM control and soft switching. Moreover, it could improve the coupling efficiency for plasma and antenna by using the ferrite core in order to transfer the energy of the load This dissertation tried to analyze new plasma generation method for the plasma generation system by modeling the plasma load and grafting the concept of impedance matching in order to interpret it with the formula This dissertation verified the ferrite core inductive coupling plasma source authorized for 400kHz of low frequency power by applying to the semi-conductor ash process thru the measurement of ash capacity and uniformed plasma distribution on the actual wafer.

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Friction and Wear of Nitrogen Incorporated Diamond-like Carbon Films Under a Vacuum

  • Yoon, Eui-Sung;Kong, Hosung;Lee, Kwang-Ryeol;Oh, Jae-Eung
    • Tribology and Lubricants
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    • 제11권5호
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    • pp.59-65
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    • 1995
  • Tribological behaviors of nitrogen incorporated amorphous diamond-like carbon films were experimentally measured under a vacuum ($3 \times 10^{-5}$ Torr) using a ball (AISI 52100 steel)-on-disk wear-rig. Nitrogen incorporated DLC films were deposited by r.f. plasma assisted chemical vapor deposition method. Mixtures of benzene and ammonia or nitrogen gases were used as the reaction gases for the r.f. PACVD, and Si (100) wafer was used as the substrate. In the tribo-test, effects of DLC film thickness and normal load in friction were measured and discussed. Results showed that friction of nitrogen incorporated DLC films from a mixture gas of benzene and ammonia was lower than that of 100% benzene, specially in the measurement of minimum coefficient of friction. Differences in frictional characteristics of nitrogen incorporated DLC films were explained with the changes in chemical structures of the films. Result also showed that friction of DLC films increased with the sliding contact cycle, which remarkably accompanied with roll-shaped wear debris. Mechanisms and roles of the polymer-like wear debris were presented and discussed.

A 10-Gbit/s Limiting Amplifier Using AlGaAs/GaAs HBTs

  • Park, Sung-Ho;Lee, Tae-Woo;Kim, Yeong-Seuk;Kim, Il-Ho;Park, Moon-Pyung
    • Journal of Electrical Engineering and information Science
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    • 제2권6호
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    • pp.197-201
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    • 1997
  • To realize 10-Gbit/s optical transmission systems, we designed and fabricated a limiting amplifier with extremely high operation frequencies over 10-GHz using AlGaAs/GaAs heterojunction bipolar transistors (HBTs), and investigated their performances. Circuit design and simulation were performed using SPICE and LABRA. A discrete AlGaAs/GaAs HBT with the emitter area of 1.5${\times}$10$\mu\textrm{m}$$^2$, used for the circuit fabrication, exhibited the cutoff frequency of 63GHz and maximum oscillation frequency of 50GHz. After fabrication of MMICs, we observed the very wide bandwidth of DC∼15GHz for a limiting amplifier from the on-wafer measurement. Ceramic-packaged limiting amplifier showed the excellent eye opening, the output voltage swing of 750mV\ulcorner, and the rise/fall time of 40ps, measured at the data rates of 10-Gbit/s.

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