• Title/Summary/Keyword: offset structure

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A novel self-aligned offset gated polysilicon thin film transistor without an additional offset mask (오프셋 마스크를 이용하지 않는 새로운 자기 정합 폴리 실리콘 박막 트랜지스터)

  • 민병혁;박철민;한민구
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.32A no.5
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    • pp.54-59
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    • 1995
  • We have proposed a novel self-aligned offset gated polysilicon TFTs device without an offset mask in order to reduce a leakage current and suppress a kink effect. The photolithographic process steps of the new TFTs device are identical to those of conventional non-offset structure TFTs and an additional mask to fabricate an offset structure is not required in our device due to the self-aligned process. The new device has demonstrated a lower leakage current and a better ON/OFF current ratio compared with the conventional non-offset device. The new TFT device also exhibits a considerable reduction of the kink effect because a very thin film TFT devices may be easily fabricated due to the elimination of contact over-etch problem.

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Packet Detection and Frequency Offset Estimation/Correction Architecture Design and Analysis for OFDM-based WPAN Systems (OFDM-기반 WPAN 시스템을 위한 패킷 검출 및 반송파 주파수 옵셋 추정/보정 구조 설계 및 분석)

  • Back, Seung-Ho;Lee, Han-Ho
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.49 no.7
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    • pp.30-38
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    • 2012
  • This paper presents packet detection, frequency offset estimation architecture and performance analysis for OFDM-based wireless personal area network (WPAN) systems. Packet detection structure is used to find the start point of a packet exactly in WPAN system as the correlation value passes the constant threshold value. The applied autocorrelation structure of the algorithm can be implemented simply compared to conventional packet detection algorithms. The proposed frequency offset estimation architecture is designed for phase rotation process structure, internal bit reduction to reduce hardware size and the frequency offset adjustment block to reduce look-up table size unlike the conventional structure. If the received signal can be compensated by estimated frequency offset through the correction block, it can reduce the impact on the frequency offset. Through the performance result, the proposed structure has lower hardware complexity and gate count compared to the conventional structure. Thus, the proposed structure for OFDM-based WPAN systems can be applied to the initial synchronization process and high-speed low-power WPAN chips.

Negative Bias Stress Effect with Offset Structure in Poly-Si TFT's (Offset 구조 Poly-Si TFT의 Negative Bias Stress 효과)

  • 이제혁;변문기;임동규;조봉희;김영호
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.11a
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    • pp.141-144
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    • 1998
  • The electrical characteristics of poly-Si TFT's with offset structure by negative bias stress are systematically investigated as a function of offset length. The changes of electrical characteristics, V$\_$th/, off-current, on/off ratio, in the offset structured poly-Si TFT's are smaller than that of the conventional structured poly-Si TFT's under the stress condition (V$\_$ds/=20V, V$\_$gs/=-20V). It is found that the hot carrier effect by negative bias stress is suppressed by the offset structured poly-Si TFT's because the local electric field near the drain region is decreased by offset region.

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Design of Reader Baseband Receiver Structure for Demodulating Backscattered Tag Signal in a Passive RFID Environment

  • Bae, Ji-Hoon;Choi, Won-Kyu;Park, Chan-Won;Pyo, Cheol-Sig;Kim, Kyung-Tae
    • ETRI Journal
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    • v.34 no.2
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    • pp.147-158
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    • 2012
  • In this paper, we present a demodulation structure suitable for a reader baseband receiver in a passive radio frequency identification (RFID) environment. In a passive RFID configuration, an undesirable DC-offset phenomenon may appear in the baseband of the reader receiver, which can severely degrade the performance of the extraction of valid information from the received tag signal. To eliminate this DC-offset phenomenon, the primary feature of the proposed demodulation structures for the received FM0 and Miller subcarrier signals is to reconstruct the signal corrupted by the DC-offset phenomenon by creating peak signals from the corrupted signal. It is shown that the proposed method can successfully detect valid data, even when the received baseband signal is distorted by the DC-offset phenomenon.

Low-Power Frequency Offset Synchronization Block Design and Implementation using Pipeline CORDIC (Pipeline CORDIC을 이용한 저전력 주파수 옵셋 동기화기 설계 및 구현)

  • Ha, Jun-Hyung;Jung, Yo-Sung;Cho, Yong-Hoon;Jang, Young-Beom
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.47 no.10
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    • pp.49-56
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    • 2010
  • In this paper, a low-power frequency offset synchronization structure using CORDIC algorithm is proposed. Main blocks of frequency offset synchronization are estimation and compensation block. In the proposed frequency offset estimation block, implementation area is reduced by using sequential CORDIC, and throughput is accelerated by using 2 step CORDIC. In the proposed frequency offset compensation block, pipeline CORDIC is utilized for area reduction and high speed processing. Through MatLab simulation, function for proposed structure is verified. Proposed frequency offset synchronization structure is implemented by Verilog-HDL coding and implementation area is estimated by Synopsys logic synthesis tool.

Self-aligned Offset Gated Poly-Si TFTs by Employing a Photo Resistor Reflow Process (Photo Resistor Reflow 방법을 이용한 오프셋 마스크를 이용하지 않는 새로운 자기 정합 폴리 실리콘 박막 트랜지스터)

  • Park, Cheol-Min;Min, Byung-Hyuk;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 1995.07c
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    • pp.1085-1087
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    • 1995
  • A large leakage current may be one of the critical issues for poly-silicon thin film transistors(poly-Si TFTs) for LCD applications. In order to reduce the leakage current of poly-Si TFTs, several offset gated structures have been reported. However, those devices, where the offset length in the source region is not same as that in the drain region, exhibit the asymmetric electrical performances such as the threshold voltage shift and the variation of the subthreshold slope. The different offset length is caused by the additional mask step for the conventional offset structures. Also the self-aligned implantation may not be applicable due to the mis-alignment problem. In this paper, we propose a new fabrication method for poly-Si TFTs with a self-aligned offset gated structure by employing a photo resistor reflow process. Compared with the conventional poly-Si TFTs, the device is consist of two gate electrodes, of which one is the entitled main gate where the gate bias is employed and the other is the entitled subgate which is separate from both sides of the main gate. The poly-Si channel layer below the offset oxide is protected from the injected ion impurities for the source/drain implantation and acts as an offset region of the proposed device. The key feature of our new device is the offset lesion due to the offset oxide. Our experimental results show that the offset region, due to the photo resistor reflow process, has been successfully obtained in order to fabricate the offset gated poly-Si TFTs. The advantages of the proposed device are that the offset length in the source region is the same as that in the drain region because of the self-aligned implantation and the proposed device does not require any additional mask process step.

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The Optimum Offset Range on the Top of T-Bar Stiffener and Bracket (최적 T-Bar Offset(Vertical Stiffener Misalignment) 허용오차 정립)

  • Lee, Kyung-Seok;Yu, Chang-Hwa;Shon, Sang-Yong;Che, Jung-Sin
    • Special Issue of the Society of Naval Architects of Korea
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    • 2008.09a
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    • pp.1-9
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    • 2008
  • This report contains the results of structural analysis for the verification of the optimum offset range on the top of T-Bar with stiffener and BKT using at DSME Offset range as $6.0{\sim}10.0mm$ based on the 3-D FE analysis and experimental results of angie type stiffener as described in Annex 1 has been used as yard standard over ten (10) years under all Classification approval. Recently, Owner and Class have requested the confirmation for the misalignment based on the Yard's Standard so that a couple of locations for LNGC and LPGC has been investigated the structural strength by FE method using the offset ranges from 0.0 to 18.0 mm.

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Improved Coplanar Waveguide-to-Microstrip Right-Angled Transition using an Offset Microstrip Section (Offset Microstrip을 이용한 Coplanar Waveguide-to-Microstrip Right-Angled 전이의 특성 개선)

  • 이맹열;이해영
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.13 no.5
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    • pp.445-450
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    • 2002
  • We analyzed and measured a CPW(coplanar waveguide)-to-microstrip right-angled transition. Asymmetric CPW-to-microstrip transitions show significant resonances by the slot mode generation at the discontinuities. The air-bridge just shifting the resonance frequency can not fundamentally suppress the occurrence of the slot mode. So, we proposed the structure using offset microstrip section to eliminate the resonance. The proposed structure may be useful for the application of multi-layed structure.

Low-Area Symbol Timing Offset Synchronization Structure for WLAN Modem (WLAN용 저면적 심볼 타이밍 옵셋 동기화기 구조)

  • Ha, Jun-Hyung;Jang, Young-Beom
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.12 no.3
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    • pp.1387-1394
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    • 2011
  • In this paper, a low-area symbol timing offset synchronization structure for WLAN Modem is proposed. Using CSD(Canonic Signed Digit) coefficients and CSS(Common Sub-expression Sharing) technique for the filter implementation, efficient structure for multiplication block can be obtained. Function simulation for proposed structure is done by using the preamble with timing offset. Through Verilog-HDL coding and synthesis, it is shown that the proposed symbol timing offset synchronization structure can be implemented with low-area semiconductor.

Novel offset gated poly-Si TFTs with folating sub-gate (부동 게이트를 가진 새로운 구조의 오프셋 다결정 실리콘 박막 트랜지스터)

  • 박철민;민병혁;한민구
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.7
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    • pp.127-133
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    • 1996
  • In this paper, we propose a new fabrication method for poly-Si TFTs with a self-aligned offset gated structure by employing a photoresist reflow process. Compared with the conventional poly-Si TFTs, the device is consist of two gate electrodes, of which one is the entitled main gate where the gate bias is employed and the other is the entitled subgate which is separate form both sides of the main gate. The poly-Si channel layer below the offset oxide is protected form the injected ion impurities for the source/drain implantation and acts as an offset region of the proposed device. The key feature of oru new device is the offset region due to the offset oxide. our experimental reuslts show that the offset region, due to the photoresist reflow process, has been sucessfully obtained in order to fabricate the offset gated poly-Si TFTs. The maximum ON/OFF ratio occurs at the L$_{off}$ of 1.1${\mu}$m and exceeds 1X10$^{6}$.

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