• Title/Summary/Keyword: nanodot

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Full 3D Level Set Simulation of Nanodot Fabrication using FIBs

  • Kim, Heung-Bae
    • Applied Science and Convergence Technology
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    • v.25 no.5
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    • pp.98-102
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    • 2016
  • The level set method has recently become popular in the simulation of semiconductor processes such as etching, deposition and photolithography, as it is a highly robust and accurate computational technique for tracking moving interfaces. In this research, full three-dimensional level set simulation has been developed for the investigation of focused ion beam processing. Especially, focused ion beam induced nanodot formation was investigated with the consideration of three-dimensional distribution of redeposition particles which were obtained by Monte-Carlo simulation. Experimental validations were carried out with the nanodots that were fabricated using focused $Ga^+$ beams on Silicon substrate. Detailed description of level set simulation and characteristics of nanodot formation will be discussed in detail as well as surface propagation under focused ion beam bombardment.

Formation of Si Nanodot by Using SiNx Thin Films (SiNx 박막을 이용한 Si Nanodot의 형성)

  • Lee, Jang Woo;Park, Ik Hyun;Shin, Byul;Chung, Chee Won
    • Applied Chemistry for Engineering
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    • v.16 no.6
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    • pp.768-771
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    • 2005
  • The deposition of silicon nitride ($SiN_x$) thin films was carried out on $SiO_2/Si$ substrate at room temperature by reactive dc magnetron sputtering. The analysis of deposited $SiN_x$ films using x-ray photoelectron spectroscopy indicated that the composition of $SiN_x$ films was Si-rich. The deposited $SiN_x$ thin films were annealed by varying annealing temperature and time. X-ray diffraction (XRD) analysis was performed in order to examine the crystallization of Si in $SiN_x$ thin films. The optical and electrical properties of $SiN_x$ thin films were measured for the observation of Si nanodot. As a result, we observed the XRD peaks that might be the Si crystals. As the annealing time and annealing temperature increased, the photoluminescence intensity of $SiN_x$ films gradually increased. The capacitance-voltage characteristics of $SiN_x$ film measured before and after annealing indicated that the trap effect of electrons or holes occurred due to the existence Si nanodots in the $SiN_x$ thin films.

2D Nanodot and Nanowires Arrays of Titania and Silica with Tunable Morphologies via Self-Assembled Block Copolymers and Sol-gel Chemistry (자기조립 이중블록공중합체와 졸-겔 공정을 이용한 이산화티타늄과 이산화규소 2차원 나노점 및 나노선 배열의 모폴로지 제어)

Plasmonic gold nanodot array optimization on a-Si thin film solar cells using anodic aluminum oxide templates (비정질 실리콘 박막 태양전지 효율 향상을 위한 양극산화 알루미늄 템플레이트을 이용한 플라즈모닉 금 나노점 배열 최적화)

  • Bae, Kyuyoung;Kim, Kyoungsik
    • Transactions of the Society of Information Storage Systems
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    • v.9 no.2
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    • pp.67-71
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    • 2013
  • The fabrication method of plasmonic nanodots on silicon substrate has been developed to improve the efficiency of thin film solar cells. Nanoscale metallic nanodots arrays are fabricated by anodic aluminum oxide (AAO) template mask which can have different structural parameters by varying anodization conditions. In this paper, the structural parameters of gold nanodots, which can be controlled by the diverse structures of AAO template mask, are investigated to enhance the optical properties of a-Si thin film solar cells. It is found that optical properties of the thin film solar cells are improved by finding optimization values of the structural parameters of the gold nanodot array.

Low Temperature Optical Properties of NiO coated ZnO Nanorods (NiO 코팅 두께에 따른 ZnO 나노막대의 저온분광특성)

  • Shin, Y.H.;Park, Y.H.;Kim, Yong-Min
    • Journal of the Korean Vacuum Society
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    • v.16 no.4
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    • pp.286-290
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    • 2007
  • We fabricated NiO coated ZnO nanorods using ZnO nanorods grown on a Si substrate. After thermal hydrogenation process of these NiO-ZnO core-shell nanorods, we confirm that Ni nanodots were built up on the surface of ZnO nanorods. Photoluminescence (PL) measurements at T=5 K were made to understand the optical properties of these various nanorods. As samples sequencially transformed into $ZnO{\rightarrow}NiO-ZnO{\rightarrow}Ni$ nanodot-ZnO, PL transition energies and intensities are varied as well. In comparison to pure ZnO nanorod, the acceptor bound exciton ($A^0X$) became the minor peak for NiO-ZnO nanorods. On the other hand, for Ni nanodot-ZnO sample, ($A^0X$) transition peak intensity became the most dominant peak. This is due to the fact that during thermal hydrogenation process, appreciable amounts of Ni and hydrogen ions defused into ZnO nanorod which played as accepters.

Effect of an Au Nanodot Nucleation Layer on CO Gas Sensing Properties of Nanostructured SnO2 Thin Films

  • Hung, Nguyen Le;Kim, Hyojin;Kim, Dojin
    • Korean Journal of Materials Research
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    • v.24 no.3
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    • pp.152-158
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    • 2014
  • We report the effect of the fabric of the surface microstructure on the CO gas sensing properties of $SnO_2$ thin films deposited on self-assembled Au nanodots ($SnO_2$/Au) that were formed on $SiO_2/Si$ substrates. We characterized structural and morphological properties, comparing them to those of $SnO_2$ thin films deposited directly onto $SiO_2/Si$ substrates. We observed a significant enhancement of CO gas sensing properties in the $SnO_2$/Au gas sensors, specifically exhibiting a high maximum response at $200^{\circ}C$ and quite a low detection limit of 1 ppm level in dry air. In particular, the response of the $SnO_2/Au$ gas sensor was found to reach the maximum value of 32.5 at $200^{\circ}C$, which is roughly 27 times higher than the response (~1.2) of the $SnO_2$ gas sensor obtained at the same operating temperature of $200^{\circ}C$. Furthermore, the $SnO_2/Au$ gas sensors displayed very fast response and recovery behaviors. The observed enhancement in the CO gas sensing properties of the $SnO_2/Au$ sensors is mainly ascribed to the formation of a nanostructured morphology in the active $SnO_2$ layer having a high specific surface-reaction area by the insertion of a nanodot form of Au nucleation layer.