• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.241-241
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• 2008

Macrofore formation in silicon and other semiconductors using electrochemical etching processes has been, in the last years, a subject of great attention of both theory and practice. Its first reason of concern is new areas of macropore silicone applications arising from microelectromechanical systems processing (MEMS), membrane techniques, solar cells, sensors, photonic crystals, and new technologies like a silicon-on-nothing (SON) technology. Its formation mechanism with a rich variety of controllable microstructures and their many potential applications have been studied extensively recently. Porous silicon is formed by anodic etching of crystalline silicon in hydrofluoric acid. During the etching process holes are required to enable the dissolution of the silicon anode. For p-type silicon, holes are the majority charge carriers, therefore porous silicon can be formed under the action of a positive bias on the silicon anode. For n-type silicon, holes to dissolve silicon is supplied by illuminating n-type silicon with above-band-gap light which allows sufficient generation of holes. To make a desired three-dimensional nano- or micro-structures, pre-structuring the masked surface in KOH solution to form a periodic array of etch pits before electrochemical etching. Due to enhanced electric field, the holes are efficiently collected at the pore tips for etching. The depletion of holes in the space charge region prevents silicon dissolution at the sidewalls, enabling anisotropic etching for the trenches. This is correct theoretical explanation for n-type Si etching. However, there are a few experimental repors in p-type silicon, while a number of theoretical models have been worked out to explain experimental dependence observed. To perform ordered macrofore formaion for p-type silicon, various kinds of mask patterns to make initial KOH etch pits were used. In order to understand the roles played by the kinds of etching solution in the formation of pillar arrays, we have undertaken a systematic study of the solvent effects in mixtures of HF, N-dimethylformamide (DMF), iso-propanol, and mixtures of HF with water on the macrofore structure formation on monocrystalline p-type silicon with a resistivity varying between 10 ~ 0.01 $\Omega$ cm. The etching solution including the iso-propanol produced a best three dimensional pillar structures. The experimental results are discussed on the base of Lehmann's comprehensive model based on SCR width.

• Journal of the Korean Magnetics Society
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• v.23 no.1
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• pp.1-6
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• 2013

Spin-orbit coupling (SOC) effect is known to be the physical origin for various exotic magnetic phenomena in the low-dimensional systems. Recently, SOC also draws lots of attention in the study on magnetically doped thermoelectric alloys to determine their properties as the thermoelectric application as well as the topological insulator via the exact electronic structures determination near the Fermi level. In this research, aiming to investigate the spin-orbit coupling effect on the structural properties such as the lattice constants and the bulk modulus of the most widely investigated thermoelectric host material, $Bi_2Te_3$, we carried out the first-principles electronic structure calculation using the all-electron FLAPW (full-potential linearized augmented plane-wave) method. Employing both the local density approximation (LDA) and the generalized gradient approximation (GGA), the structural optimization is achieved by varying the in-plane lattice constant fixing the perpendicular lattice constant and vice versa, to find that the SOC effect increases the equilibrium lattices slightly in both directions while it markedly reduces the bulk modulus value implying the strong orientational dependence, which are attributed to the material's intrinsic structural anisotropy.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.29 no.1
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• pp.30-34
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• 2016

In this paper, we report that selective etching on N-polar face by EC (electro-chemical)-etching effect on the reduction of bowing and strain of FS (free-standing)-GaN substrates. We applied the EC-etching to concave and convex type of FS-GaN substrates. After the EC-etching for FS-GaN, nano porous structure was formed on N-polar face of concave and convex type of FS-GaN. Consequently, the bowing in the convex type of FS-GaN substrate was decreased but the bowing in the concave type of FS-GaN substrate was increased. Furthermore, the FWHM (full width at half maximum) of (1 0 2) reflection for the convex type of FS-GaN was significantly decreased from 601 to 259 arcsec. In the case, we confirmed that the EC-etching method was very effective to reduce the bowing in the convex type of FS-GaN and the compressive stress in N-polar face of convex type of FS-GaN was fully released by Raman measurement.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.39-39
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• 2007

원자층 증착(Atomic Layer Deposition: ALD) 방법은 반응물질들을 펄스형태로 챔버에 공급하여 기판표면에 반응물질의 표면 포화반응에 의한 화학적 흡착과 탈착을 이용한 박막증착기술이다. ALD법은 기존의 화학적 기상증착(Chemical Vapor Deposition: CVD)과 달리 자기 제한적 반응(self-limiting reaction) 에 의하여 반응가스가 기판 표면에서만 반응하고 가스와 가스 간에는 반응하지 않는다. 따라서 박막의 조성 정밀제어가 쉽고, 파티클 발생이 없으며, 대면적의 박막 증착시 균일성이 우수하고, 박막 두께의 정밀 조절이 용이한 장점이 있다. 이러한 ALD 방식으로 3차원의 반도체 장치 구조물에 산화막 등을 형성하는 공정에서 중요한 요소 중의 하나는 전구체의 충분한 공급이다. 따라서 증기압이 높은 전구체를 선호하는 경향이 있다. 그러나 증기압이 낮은 전구체를 사용할 경우, 공급량이 부족하여 단차 도포성(step coverage)이 떨어지는 문제가 있다. 원자층 증착 공정에서 전구체를 충분히 공급하기 위해전구체 온도를 증가시키거나 전구체의 공급시간을 늘리는 방법을 사용한다. 그러나 전구체 온도를 상승시키는 경우, 전구체의 변질이나 수명을 단축시키는 문제점을 발생시킬 수 있으며. 전구체를 충분히 공급하기 위하여 전구체의 공급시간을 늘이는 방법을 사용하면, 원하는 박막을 형성하기 위하여 소요되는 공정시간과 전구체 사용량이 증가된다. 본 논문에서는 이러한 문제점을 해결하기 위해 반응기 안에서 전구체 노출 시간을 조절하는 새로운 ALD 공정을 소개한다. 특히 이러한 기술을 적용하면 나노튜브를 성장시키는데 매우 유리하다. 본 연구에서 전구체 노출 시간을 조절하기 위하여 사용된 ALD 장비는 Lucida-D200-PL (NCD Technology사)이며 (TEMA)Zr와 H2O를 사용하여 ZrO2 나노튜브를 폴리카보네이트 위에 성장시켰다. 전구체의 노출 시간은 반응기의 Stop 밸브를 이용하여 조절하였으며, SEM, TEM 등을 이용하여 나노튜브의 균일성과 단차피복성 등의 특성을 관찰하였다. 그 결과 전구체 노출시간을 조절함으로써 높은 종횡비를 갖는 나노튜브를 성장 시킬 수 있음을 확인하였다. 또한 낮은 증기압을 가지는 전구체를 이용하여도 우수한 특성의 나노튜브를 균일하게 성장시킬 수 있었다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.3
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• pp.182-187
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• 2011

In this paper, PBTI characteristics of NMOSFETs with La incorporated HfSiON and HfON are compared in detail. The charge trapping model shows that threshold voltage shift (${\Delta}V_{\mathrm{T}}$) of NMOSFETs with HfLaON is greater than that of HfLaSiON. PBTI lifetime of HfLaSiON is also greater than that of HfLaON by about 2~3 orders of magnitude. Therefore, high charge trapping rate of HfLaON can be explained by higher trap density than HfLaSiON. The different de-trapping behavior under recovery stress can be explained by the stable energy for U-trap model, which is related to trap energy level at zero electric field in high-k dielectric. The trap energy level of two devices at zero electric field, which is extracted using Frenkel-poole emission model, is 1,658 eV for HfLaSiON and 1,730 eV for HfLaON, respectively. Moreover, the optical phonon energy of HfLaON extracted from the thermally activated gate current is greater than that of HfLaSiON.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.228-228
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• 2007

전력선 통신용 비접촉식 커플러는 고속형(2~30 MHz)과 저속형(100~450KHz)으로 나누어 볼 수 있는데, 고속형은 현재 국내에서 독자적으로 개발되어 다양한 모델이 적용되고 있는 상황이지만, 저속형은 시작품수준으로 제조되어 있으나 신호전송 특성의 향상절구가 필요한 상황이다. 전력선 통신용 커플러는 전력선 또는 모뎀으로 통신신호를 전달하는 기능을 하는 것으로서, 전력선 통신을 위한 핵심부품이다. 따라서 본 연구에서는 100~450 KHz 대역에서 사용 가능한 저속형 비접촉식 커플러를 제조하기 위해, 권선조건, 대전류형 자심재료의 모의 해석, 노이즈 필터조건, 임피던스 매칭, 하우징방법 등의 각 공정 변수를 확립하고자 하였다. 자심재료의 모의해석에서 자심재료의 높이와 전력선 도체 단면적 변화는 자심재료의 전류포화특성에 영향을 미치지 않으며, 유효길이와 에어-갭 크기가 증가할수록 전류포화특성은 향상되는데, 자심재료의 내경이 64 mm일 때 자심재료의 폭((외경-내경)/2)은 15 mm 이상이어야 하고, 에어-갭은 약 $600\;{\mu}m$ 정도의 에어-갭을 형성시켜야함을 확인할 수 있었다. 또한 저속용 비접촉식 커플러 제조조건 실험에서 내경${\times}$외경${\times}$높이가 $64{\times}94{\times}140mm$인 자심재료를 이용하여 권선 수와 에어-갭을 각각 3회, $400{\sim}600\;{\mu}m$ 삽입했을 때, 가장 우수한 특성을 나타내었다. 그리고 저역 통과 필터를 출력부에 내장하여 통신신호 이외의 노이즈를 제거할 수 있었다. 본 연구에서 제조된 300 A급 지중선용 저속형 비접촉식 커플러는 내경${\times}$외경${\times}$높이가 $58{\times}1144{\times}158mm$이고, 100~450 KHz 통신대역에서 약$7{\pm}2dB$의 삽입손실을 나타내었다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.229-229
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• 2007

나노결정 합금재료를 전력선 통신 커플러용 자심재료로 응용하기 위해서는 고주파 대역에서의 손실 특성이 제어되어야 한다. 즉 고속 전력선 통신을 위한 자심재료의 투자율 및 완화 주파수 등의 전자기적 특성은 30MHz까지 우수하고 안정적으로 유지되어야 하며, 높은 투자율 및 자속밀도, 공진주파수뿐만 아니라 낮은 전력손실 값을 가져야 한다. 따라서 본 연구에서는 나노결점 합금 리본 표면에 딥 코팅, 졸-겔법, 진공함침 등의 방법을 이용하여 PZT, $TiO_2$ 및 $SiO_2$ 등의 산화물 고저항층을 형성시켜 자기적 성질을 유지하면서 고주파 대역의 와전류 손실을 감소시켜 통신용 자심재료로의 응용성을 향상시키고자 하였다. PZT 슬러리의 제타전위 조절을 통해 최적의 분산조건을 얻을 수 있었고, 평균 150nm인 PZT 입자의 초미립자와 가소제, 분산제, 결합제의 첨가조건을 확립할 수 있었다. 딥-코팅은 슬러리 내 유지시간 10초, 인상속도 5mm/min로 30회 반복되었을 때 가정 우수한 특성을 나타내었으며, 고주파 대역에서의 손실 감소효과를 나타내었다. 그리고 졸-겔법에 의해 제조된 슬러리를 이용한 $TiO_2$와 $SiO_2$ 산화물 저항층 코팅을 통해 금속 알콕사이드의 혼합조건 및 저항층 형성용 슬러리의 제조조건을 확립하였고, 합금 리본표면에 균일하고 우수한 점착력을 가지는 저항층을 형성시킬 수 있었으며, 이에 따른 코어손실의 감소효과를 나타낼 수 있었다. 또한 진공 함침법을 통한 저항층 형성에서, $TiO_2$ 나노분말을 표면 저항층으로 코팅했을 때, 가장 높은 코어손실 감소효과를 나타내었다. 한편, 표면 저항층이 형성된 나노결정 합금으로 제조한 자심재료를 이용하여 전력선 통신용 비접촉식 커플러에의 적용과 시험을 통해 고주파 손실 감소효과에 의한 신호전송 특성과 전류특성을 향상시킬 수 있었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.97-97
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• 2013

Recently, Cu2ZnSn(S,Se)4 (CZTSS), which is one of the In- and Ga- free absorber materials, has been attracted considerable attention as a new candidate for use as an absorber material in thin film solar cells. The CZTSS-based absorber material has outstanding characteristics such as band gap energy of 1.0 eV to 1.5 eV, high absorption coefficient on the order of 104 cm-1, and high theoretical conversion efficiency of 32.2% in thin film solar cells. Despite these promising characteristics, research into CZTSS based thin film solar cells is still incomprehensive and related reports are quite few compared to those for CIGS thin film solar cells, which show high efficiency of over 20%. I will briefly overview the recent technological development of CZTSS thin film solar cells and then introduce our research results mainly related to sputter based process. CZTSS thin film solar cells are prepared by sulfurization of stacked both metallic and sulfide precursors. Sulfurization process was performed in both furnace annealing system and rapid thermal processing system using S powder as well as 5% diluted H2S gas source at various annealing temperatures ranging from $520^{\circ}C$ to $580^{\circ}C$. Structural, optical, microstructural, and electrical properties of absorber layers were characterized using XRD, SEM, TEM, UV-Vis spectroscopy, Hall-measurement, TRPL, etc. The effects of processing parameters, such as composition ratio, sulfurization pressure, and sulfurization temperature on the properties of CZTSS absorber layers will be discussed in detail. CZTSS thin film solar cell fabricated using metallic precursors shows maximum cell efficiency of 6.9% with Jsc of 25.2 mA/cm2, Voc of 469 mV, and fill factor of 59.1% and CZTS thin film solar cell using sulfide precursors shows that of 4.5% with Jsc of 19.8 mA/cm2, Voc of 492 mV, and fill factor of 46.2%. In addition, other research activities in our lab related to the formation of CZTS absorber layers using solution based processes such as electro-deposition, chemical solution deposition, nano-particle formation will be introduced briefly.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.32 no.3
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• pp.201-206
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• 2019

This report constitutes the first demonstration in Korea of single-crystal lateral gallium oxide ($Ga_2O_3$) as a metal-oxide-semiconductor field-effect-transistor (MOSFET), with a breakdown voltage in excess of 480 V. A Si-doped channel layer was grown on a Fe-doped semi-insulating ${\beta}-Ga_2O_3$ (010) substrate by molecular beam epitaxy. The single-crystal substrate was grown by the edge-defined film-fed growth method and wafered to a size of $10{\times}15mm^2$. Although we fabricated several types of power devices using the same process, we only report the characterization of a finger-type MOSFET with a gate length ($L_g$) of $2{\mu}m$ and a gate-drain spacing ($L_{gd}$) of $5{\mu}m$. The MOSFET showed a favorable drain current modulation according to the gate voltage swing. A complete drain current pinch-off feature was also obtained for $V_{gs}<-6V$, and the three-terminal off-state breakdown voltage was over 482 V in a $L_{gd}=5{\mu}m$ device measured in Fluorinert ambient at $V_{gs}=-10V$. A low drain leakage current of 4.7 nA at the off-state led to a high on/off drain current ratio of approximately $5.3{\times}10^5$. These device characteristics indicate the promising potential of $Ga_2O_3$-based electrical devices for next-generation high-power device applications, such as electrical autonomous vehicles, railroads, photovoltaics, renewable energy, and industry.

• Journal of the Korean Applied Science and Technology
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• v.36 no.2
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• pp.592-599
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• 2019

This study is to stabilize insoluble and unstable active ingredient which is Idebenone (INCI name: hydroxydecyl ubiquinone) in a multi-lamellar vesicle (MLV) and to stabilize it in the skin care cosmetics. Idebenone is good effective raw material in the treatment of Alzheimer's disease in the medical field and a powerful antioxidant in dermatology. It is well known as a substance that inhibits the formation of melanin and cleans the skin pigment. However, it did not dissolve in any solvent and it was difficult to apply in cosmetic applications. Niosome vesicle was able to develop a nano-particle by making a multi-layer of idebenone encapsulated with a nonionic surfactant, hydrogenated lecithin and glycine soja (soybean) sterols and passing it through a high pressure microfluidizer. Idebenone niosome vesicle (INV) has been developed to have the ability to dissolve transparently in water and to promote transdermal penetration. The appearance of the INV was a yellowish liquid having specific odor, and the particle size distribution of INV was about 10~80 nm. The pH was 5~8 (mean=6.8). This capsulation with idebenone was stored in a $45^{\circ}C$ incubator for 3 months and its stability was observed and quantitatively measured by HPLC. As a result, the stability of the sample encapsulated in the niosome vesicle (97.5%) was about 66.3% higher than that of the non-capsule sample of 32.5%. Idebenone 1% INV was used for the efficacy test and clinical trial evaluation as follows. The anti-oxidative activity of INV was 38.2%, which was superior to that of 12.8% tocopherol (control). The melanin-reducing effect of B16 melanoma cells was better than INV (17.4%) and Albutin (control) (9.6%). Pro-collagen synthesis rate was 128.2% for INV and 89.3% for tocopherol (control). The skin moisturizing effect was 15.5% better than the placebo sample. The elasticity effect was 9.7% better than the placebo sample. As an application field, INV containing 1% of idebenone is expected to be able to develop various functional cosmetic formulations such as skin toner, ampoule essence, cream, eye cream and sunblock cream. In addition, it is expected that this encapsulated material will be widely applicable to emulsifying agents for skin use in the pharmaceutical industry as well as the cosmetics industry.