Analysis of Positive Bias Temperature Instability Characteristic for Nano-scale NMOSFETs with La-incorporated High-k/metal Gate Stacks |
Kwon, Hyuk-Min
(Department of Electronics Engineering, Chungnam National University)
Han, In-Shik (Department of Electronics Engineering, Chungnam National University) Park, Sang-Uk (Department of Electronics Engineering, Chungnam National University) Bok, Jung-Deuk (Department of Electronics Engineering, Chungnam National University) Jung, Yi-Jung (Department of Electronics Engineering, Chungnam National University) Kwak, Ho-Young (Department of Electronics Engineering, Chungnam National University) Kwon, Sung-Kyu (Department of Electronics Engineering, Chungnam National University) Jang, Jae-Hyung (Department of Electronics Engineering, Chungnam National University) Go, Sung-Yong (DMS Co., Ltd) Lee, Weon-Mook (DMS Co., Ltd) Lee, Hi-Deok (Department of Electronics Engineering, Chungnam National University) |
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