• Title/Summary/Keyword: n-ZnO

검색결과 916건 처리시간 0.032초

Crystal Structure and Optical Absorption of ZnO Thin Films Grown by Electrodeposition (전착법에 의한 ZnO 박막의 결정구조 및 광흡수 특성)

  • Choi, C.T.;Seo, J.N.
    • Journal of Sensor Science and Technology
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    • 제9권6호
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    • pp.455-460
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    • 2000
  • Zinc oxide(ZnO) thin films were cathodically deposited on ITO glass from an aqueous zinc nitrate electrolyte. Three main fabrication parameters were taken into account : deposition potential, solution concentration and growth temperature. Different layers of ZnO thin films grown by varying the three parameters were studied by X-ray diffraction, scanning electron microscope and optical absorption spectroscopy. The prepared ZnO thin films were shown as a hexagonal wurtzite structure on the X-ray diffraction patterns and the good quality of ZnO thin films were obtained by potentiostatic cathodic deposition at -0.7V vs. Ag/AgCl reference electrode onto ITO glass from aqueous 0.1 mol/liter zinc nitrate electrolyte at $60^{\circ}C$.

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Theoretical Studies on the Biochemical Roles of Zn (Zn 의 생화학적 역할에 관한 이론적 연구)

  • Kim, Ho Sun;Kim, Gwang Su
    • Journal of the Korean Chemical Society
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    • 제34권3호
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    • pp.232-238
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    • 1990
  • To study the biological roles of Zn, we investigated simple model systems of $Zn^{++}, coordinated with OH_2 or NH_3,$ or with O=C- in peptide. The geometrical structures and net atomic charges were calculated by the ab initio HF-SCF theory using double zeta basis sets. The ligands of O-H, N-H, and O=C- are very polar due to $Zn^{++}$. Therefore, the carbon atom in peptide becomes so electrophilic that it can be easily attacked by other nucleophiles. In addition, to understand how $Zn^{++}$ is coordinated with ligands in enzyme, a molecular mechanics method is applied to the system of the enzyme of carboxypeptidase A (CPA) with the substrate of glycyltyrosine. From our results, it appears that the Zn ion is coordinated not only by four ligands in enzyme and substrate but also by one water molecule.

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A Study on the Material Characteristics of the NiO/ZnO Ultraviolet Sensor Based on Solution Process (용액 공정 기반 NiO/ZnO계 자외선 센서용 재료 특성 연구)

  • Moon, Seong-Cheol;Lee, Ji-Seon;No, Kyeong-Jae;Yang, Seong-Ju;Lee, Seong-Eui
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • 제30권8호
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    • pp.508-513
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    • 2017
  • Ultraviolet (UV) photodetectors are used in various industries and fields of research, including optical communication, flame sensing, missile plume detection, astronomical studies, biological sensors, and environmental research. However, general UV detectors that employ Schottky junction diodes and p-n junctions have high fabrication cost and low quantum efficiency. In this study, we investigated the characteristics of materials used to manufacture UV photodetectors in a low-cost solution process that requires easy fabrication of flexible substrates. We fabricated p-type NiO and n-type ZnO substrates with wide band gap by the sol-gel method and compared the characteristics of substrates prepared under different spin-coating and heat-treatment conditions.

Sol-Gel법을 이용한 YZO/Si 이종접합 구조의 제작과 정류특성

  • Heo, Seong-Eun;Kim, Won-Jun;Kim, Chang-Min;Lee, Hwang-Ho;Lee, Byeong-Ho;Lee, Yeong-Min;Kim, Deuk-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.350-350
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    • 2013
  • Sol-gel법을 이용하여 p-Si 기판위에 yttrium이 도핑된 ZnO (YZO)를 성장하였다. ZnO의 precursor로는 zinc acetate dihydrate를, yttrium의 source로는 yttrium acetate hydrate를 사용하였으며, 용매와 안정제로는 각각 2-methoxy ethanol과 monoethanolamine (MEA)를 사용하였다. yttrium의 doping 농도에 따른 영향을 알아보기 위하여 1~4 at.%로 제작된 YZO sol을 각각 p-type Si 기판에 성장하였으며, 이 후 furnace를 이용하여 500oC에서 1시간 동안 열처리하였다. 성장된 YZO 박막의 표면과 두께를 SEM을 통하여 확인하였으며, XRD를 통한 구조적인 특성을 분석한 결과 모든 박막에서 뚜렷한 c-축 배양성을 갖는 ZnO (0002)피크를 확인하였다. Hall effect를 통하여 YZO는 모두 n-type 특성을 나타낸다는 것을 확인하였으며, 광학적인 특성은 PL을 통해서 분석하였다. n-YZO/p-Si 이종접합의 전류-전압 특성을 분석한 결과 뚜렷한 정류특성을 나타내었다.

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Characteristic of P doped ZnO-based thin film transistor by DC magnetron sputtering

  • Lee, Sih;Moon, Yeon-Keon;Moon, Dae-Yong;Kim, Woong-Sun;Kim, Kyung-Taek;Park, Jong-Wan
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.540-542
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    • 2009
  • Phosphorus doped ZnO (PZO) thin films were deposited on $SiO_2$/n-Si substrates using DC magnetron sputtering system varying oxygen partial pressures from 0 to 40 % under Ar atmosphere. The deposited films showed reduced n-type conductivity due to the compensating donor effects by phosphorus dopant. The bias-time stability shows relatively good stability over bias and time comparing to un-doped ZnO-based TFTs.

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Dry Etching Characteristics of ZnO Thin Films for the Optoelectronic Device by Using Inductively Coupled Plasma

  • Joo, Young-Hee;Woo, Jong-Chang;Kim, Chang-Il
    • Transactions on Electrical and Electronic Materials
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    • 제13권1호
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    • pp.6-9
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    • 2012
  • In this study, we carried out an investigation of the etching characteristics (etch rate, selectivity to $SiO_2$) of ZnO thin films in $N_2/Cl_2$/Ar inductivity coupled plasma. A maximum etch rate and selectivity of 108.8 nm/min and, 3.21, respectively, was obtained for ZnO thin film at a $N_2/Cl_2$/Ar gas mixing ratio of 15:16:4 sccm. The plasmas were characterized by optical emission spectroscopy. The x-ray photoelectron spectroscopy analysis showed the efficient destruction of oxide bonds by ion bombardment. An accumulation of low volatile reaction products on the etched surface was also shown. Based on this data, an ion-assisted chemical reaction is proposed as the main etch mechanism for plasmas containing $Cl_2$.

Highly Transparent Indium Oxide Doped ZnO Spreading Layer for GaN Based Light Emitting Diodes

  • Lim, Jae-Hong;Park, Seong-Ju
    • Korean Journal of Materials Research
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    • 제19권8호
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    • pp.443-446
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    • 2009
  • This study develops a highly transparent ohmic contact scheme using indium oxide doped ZnO (IZO) as a current spreading layer for p-GaN in order to increase the optical output power of nitride-based lightemitting diodes (LEDs). IZO based contact layers of IZO, Ni/IZO, and NiO/IZO were prepared by e-beam evaporation, followed by a post-deposition annealing. The transmittances of the IZO based contact layers were in excess of 80% throughout the visible region of the spectrum. Specific contact resistances of $3.4\times10^{-4}$, $1.2\times10^{-4}$, $9.2\times0^{-5}$, and $3.6\times10^{-5}{\Omega}{\cdot}cm^2$ for IZO, Ni/Au, Ni/IZO, and NiO/IZO, respectively were obtained. The forward voltage and the optical output power of GaN LED with a NiO/IZO ohmic contact was 0.15 V lower and was increased by 38.9%, respectively, at a forward current of 20 mA compared to that of a standard GaN LED with an Ni/Au ohmic contact due to its high transparency, low contact resistance, and uniform current spreading.

산화철 폐촉매를 사용한 NiZn-페라이트웨 합성 및 자기적 특성

  • Park, Sang-Il;Hwang, Yeon;Lee, Hyo-Sook
    • Proceedings of the Korea Crystallographic Association Conference
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    • 한국결정학회 2003년도 춘계학술연구발표회
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    • pp.26-26
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    • 2003
  • 산업 폐기물로서 전량 매립되고 있는 styrene monomer (SM) 공정에서 발생되는 산화철 폐촉매를 사용하여 NiZn-페라이트를 합성하였고, 그 자기적 특성을 조사하였다. 평균입경 0.5㎛로 미분쇄된 산화철 폐촉매에 NiO 및 ZnO를 혼합하여 900℃에서 하소한후 1230℃에서 5시간 동안 소결하여 스핀넬형 페라이트 소결체를 얻었다. Ni/sub x/Zn/ub 1-x/Fe₂O₄(x=0.36, 0.50, 0.66) 및 (Ni/sub 0.5/Zn/sub 0.5/)/sub 1-y/Fe/sub 2+y/O₄(y=-0.02, 0, 0.02) 조성에 대하여 초투자율을 측정하였다. S-parameter를 측정하여 반사 감쇄량을 계산하였다. Ni/sub 0.5/Zn/sub 0.5/fe₂O₄ 조성의 경우 밀도 5.38 g/㎤ kHz에서의 초투자율이 59인 특성을 얻었다. 산화철 폐촉매를 이용하여 X-band 주파수 영역에서 높은 전자파 흡수능을 갖는 전파흡수체를 제조할 수 있음을 확인하였다. Ni/sub 0.5/Zn/sub 0.5/Fe₂O₄ 조성에 대하여 1100℃에서 하소한 분말을 사용하여 실리콘 고무에 복합시킨 후 전파흡수능을 측정하였다. 폐촉매에는 산화철 이외에 CeO₂가 주된 첨가물로 함유되어 있어서 페라이트의 합성 후에도 2차상으로서 존재하였다. 출발 원료인 산화철 폐촉매에 존재하는 K₂O 및 CeO₂를 제거하기 위하여 산처리와 분산제를 이용한 CeO₂ 분리과정을 행하였다. 정제된 산화철 폐촉매에 NiO 및 ZnO를 혼합하여 900℃에서 하소하여 스핀넬형 페라이트를 합성하고 1325℃에서 5시간 소결하였다. 위와 마찬가지로 Ni/sub x/Zn/sub 1-x/Fe₂O₄(x=0.36, 0.50, 0.66)과 (Ni/sub 0.5/Zn/sub 0.5/)/sub 1-y/Fe/sub 2+y/O₄(y=-0.02, 0, 0.02) 조성에 대하여 자기적 특성을 조사하였다.화된 중성자빔으로 측정하였다 BPC-Si를 구부려 슬랩의 곡률반경을 변화시키면서 단색기-시료-검출기가 평행파 반평행배치일 때 Cu(111), (200), (220), (311), (331), (420)면의 회절선을 측정하여 각 조건에서 분해능과 강도를 평가하였다.료의 가시적 변화를 통해 illumination angle 1.25mrad(Dose rate : 334 × 10³ e/sup -//sec·n㎡)일 경우 약 3초 이내에 비정질화가 시작됨을 알 수 있었고 이는 약 1 × 10/sup 6/ e/sup -//sec·n㎡ 의 전자선량에 해당되며 이를 기준으로 각각의 illumination angle에 대한 임계전자선량을 평가할 수 있었다. 실질적으로 Cibbsite와 같은 무기수화물의 직접가열실험 시 전자빔 조사에 의해 야기되는 상전이 영향을 배제하고 실험을 수행하려면 illumination angle 0.2mrad (Dose rate : 8000 e/sup -//sec·n㎡)이하로 관찰하고 기록되어야 함을 본 자료로부터 알 수 있었다.운동횟수에 의한 영향으로써 운동시간을 1일 6시간으로 설정하여, 운동횟수를 결정하기 위하여 오전, 오후에 각 3시간씩 운동시키는 방법과 오전부터 6시간동안 운동시키는 두 방법을 이용하여 품질을 비교하였다. 각 조건에 따라 운동시킨 참돔의 수분함량을 나타낸 것으로, 2회(오전 3시간, 오후 3시간)에 나누어서 운동시키기 위한 육의 수분함량은 73.37±2.02%를 나타냈으며, 1회(6시간 운동)운동시키기 위한 육은 71.74±1.66%을 나타내었다. 각각의 운동조건에서 양식된 참돔은 사육초기에는 큰 변화가 없었으나, 사육 5일 이후에는 수분함량이 증가하여 15일에는 76.40±0.14, 75.62±0.98%의 수분함량을 2회와 1회 운동시킨 참돔의 육에서 각각 나타났다. 운동횟수에 따른 지질함량은 2회 운동시킨 참돔은 5.83±2.08, 1회 운

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Thermal treatments effects on the properties of zinc tin oxide transparent thin film transistors (Zinc tin oxide 투명박막트랜지스터의 특성에 미치는 열처리 효과)

  • Ma, Tae Young
    • Journal of IKEEE
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    • 제23권2호
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    • pp.375-379
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    • 2019
  • $ZnO-SnO_2(ZTO)$ was deposited by RF magnetron sputtering using a ceramic target whose Zn atomic ratio to Sn is 2:1 as a target, and the crystal structure variation with thermal treats was investigated. Transparent thin film transistors (TTFT) were fabricated using the ZTO films as active layers. About 100 nm-thick $Si_3N_4$ film grown on 100 nm-thick $SiO_2$ film was adopted as gate dielectrics. The mobility, threshold voltage, $I_{on}/I_{off}$, and interface trap density were obtained from the transfer characteristics of ZTO TTFTs. The effects of substrate temperature, and post-annealing on the property variation of ZTO TTFT were analyzed.

Investigation of Ru ohmic contacts to n-ZnO thin film for optoelectronis devices (광소자용 n-ZnO 박막의 Ru 오믹 접촉 연구)

  • 김한기;김경국;박성주;성태연;윤영수
    • Journal of the Korean Vacuum Society
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    • 제11권1호
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    • pp.35-42
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    • 2002
  • We fabricate thermally stable and low resistance Ru ohmic contacts to $n-ZnO:Al(3\times10^{18}\textrm{cm}^{-3})$, grown by specially designed dual target sputtering system. It is shown that the as-deposited Ru contact produces a specific contact resistance of $2.1{\times}10^{-3}{\Omega}\textrm{cm}^2$. Annealing of the Ru contacts leads to the improvement of current-voltage characteristics. For example, annealing of the contact at $700^{\circ}C$ for 1 min produces a contact resistance of $3.2{\times}10^{-5}}{\Omega}\textrm{cm}^2$. furthermore, the metallisation scheme is found to be thermally stable: the surface of the contact is fairly smooth with a rms roughness of 1.4 nm upon annealing at $700^{\circ}C$. These results strongly indicate that the Ru contact represents a suitable metallisation scheme for fabrication of high-performance ZnO-based optical devices and high-temperature devices. In addition, possible mechanisms are suggested to describe the annealing temperature dependence of the specific contact resistance.