• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.28 no.1
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• pp.7-11
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• 2015

In this study, $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film were prepared on glass substrate by DC/RF magnetron sputtering method. To prevent interfacial reaction between Ag and ITO layer, Ti buffer layer was inserted. Optical properties and sheet resistance were studied depending on laminating times of each multi-layered film especially in visible ray. The simulation program, EMP (essential macleod program), was adopted and compared with experimental data to expect the experimental result. It was found out that the transmittance of the first stacked $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film was more than 90%. However, with increasing stacking times, the optical properties of $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film get worse. Consequently, Ti layer is good for oxidation barrier, but too many uses of this layer may have an adverse effect to optical properties of TCO film.

• Resources Recycling
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• v.13 no.6
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• pp.37-42
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• 2004

The power loss analysis was carried out for Ni-Cu-Zn ferrite sample with different content of NiO and ZnO. The power loss, Pcv decreases monotonically with increasing temperature and attains to a certain value at around 100~120 degrees Celsius. The frequency dependence of Pcv can be explained by Pcv~f$^n$, and n is independent of the frequency, f up to 1 MHz. The Pcv decreases with an increase in ZnO/NiO. The Pcv was separated to hysteresis loss(Ph) and residual loss(Pcv-Ph). The temperature characteristics and compositional dependence of Pcv can be attributed to the Ph, while Pcv-Ph is not affected by both temperature and ZnO/NiO. By analyzing temperature and composition dependence of Ph and initial permeability, ${\mu}_i$ like following equations could be formularized. ${\mu}_i{\mu}_0=I_s^2/(K_I+b{\sigma}_0{\lambda}_s)$ Wh=13.5(I$_s^2/{\mu}_i{\mu}_0)$ Where ${\mu}_0$ is permeability of vacuum, I$_s$ is saturation magnetization, K$_I$ is anisotropy constant, $s_0$ is internal heterogeneous stress, ${\lambda}_s$ is magnetostriction constant, b is unknown constant, and Wh is hysteresis loss per one cycle of excitation (Ph=Wh${\times}$f). Steinmetz constant of Ni-Cu-Zn ferrite, m=1.64~2.2 is smaller than that of Mn-Zn ferrites, which suggests the difference of loss mechanisms between these materials.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.209-209
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• 2009

Fabrication of p-type ZnO has already proven difficult and usually inconsistent despite numerous worldwide efforts. Many research groups studied electrical and optical properties P, Li, As, N single doped ZnO thin film. In P-doped ZnO thin film, the reproducibility of p-type conduction with $P_2O_5$ as a dopant source was shown to be relatively poor. In this study, we made P single doped and Li & P co-doped ZnO target. To investigate electrical and optical properties of P single doped and Li & P co-doped ZnO thin film using $P_2O_5$ and $Li_3PO_4$ dopant source respectively was deposited by PLD. The growth temperature was changed 500, $700^{\circ}C$ and various oxygen partial pressure and post-annealing conditions was changed temperature, different gas ambient($O_2,N_2$). We investigate that how to change electrical and optical properties as function of growth temperature, oxygen partial pressure and post-annealing(RTA).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07b
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• pp.1096-1099
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• 2004

The principal problems in development of dielectric paste materials for PDP(plasma display panel)are PbO free paste and low melting temperature. We prepared PbO free paste from glasses in the system BaO-ZnO-$B_2O_3$-$V_2O_5$. DTA, and XRD were used to characterize BaO-ZnO-$B_2O_3$-$V_2O_5$ glasses. In this present study, PbO free paste had thermal expansion of $74\times10^{-7}/^{\circ}C$, DTA softening point of $460^{\circ}C$, and firing condition of $520^{\circ}C$, 20min

• Transactions on Electrical and Electronic Materials
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• v.9 no.1
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• pp.24-27
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• 2008

ZnO has intensively attracted interest for the next generation of short wavelength LEDs and semiconductor lasers. However, for the development and application of the devices based on this material, the fabrication of p-type ZnO thin films is pivotal. Generally, the process of preparation of ZnO is unavoidably accompanied by the natural donor ions such as interstitial Zn ions and oxygen vacancy ions that show n-type electrical property and make fabrication of p-type ZnO to be a hard problem. On this study, to realize stable high-quality p-type ZnO thin films, the undoped ZnO thin films were diffused with P in vapor state. The ZnO:P thin films showed high-quality p-type properties electrically and optically.

• Proceedings of the Materials Research Society of Korea Conference
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• 2012.05a
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• pp.85-85
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• 2012

NiO는 니켈 공공과 침입형 산소 이온에 의한 비화학적양론 특성 때문에 자발적으로 p-형 반도체 특성을 나타내는 것으로 알려져 있다. NiO는 3.7 eV 의 넓은 밴드갭을 가지고 있어 투명소자를 위한 hole injection layer 나 hole transport layer로 사용하기 위한 연구가 많이 이루어지고 있다. 또한, 안정적인 p-형 반도체 특성은 n-형 산화물 반도체와의 접합을 통해 복합소자의 구현이 용이하기 때문에, ZnO 등과의 접합을 통한 소자 구현이 가능하다.[1] 하지만, 기존의 많은 연구에서는 내부의 결함이 많이 존재하는 다결정 박막을 사용하였기 때문에, 전하의 이동에 제한이 발생해, 충분한 소자 특성을 나타내지 못하였다. 최근 Dutta의 연구에 의하면, 결정질 사파이어 기판위에 박막을 성장할 경우 [111] 방향으로 우선 배향성을 가진 NiO 박막을 얻을 수 있다고 알려져 있다.[2] 본 실험에서는 NiO 박막을 이용한 PN 접합소자 구현을 위해 사파이어 위에 p-NiO 박막을 에피택셜하게 성장한 후 구조적 특성을 분석하였으며, n-ZnO 박막을 그 위에 성장하여 소자를 제작하였다. 그 결과 ZnO 또한 에피택셜한 성장을 하는 것을 확인할 수 있었다. 성장순서에 따른 PN 접합구조 특성을 확인하기 위해 사파이어 위에 ZnO 를 성장시킨 후 NiO 를 성장시킨 결과 NiO 박막의 우선성장 방향이 [100]으로 변하는 것을 확인할 수 있었다.

• Korean Journal of Materials Research
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• v.26 no.6
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• pp.347-352
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• 2016

ZnO with wurtzite structure has a wide band gap of 3.37 eV. Because ZnO has a direct band gap and a large exciton binding energy, it has higher optical efficiency and thermal stability than the GaN material of blue light emitting devices. To fabricate ZnO devices with optical and thermal advantages, n-type and p-type doping are needed. Many research groups have devoted themselves to fabricating stable p-type ZnO. In this study, $As^+$ ion was implanted using an ion implanter to fabricate p-type ZnO. After the ion implant, rapid thermal annealing (RTA) was conducted to activate the arsenic dopants. First, the structural and optical properties of the ZnO thin films were investigated for as-grown, as-implanted, and annealed ZnO using FE-SEM, XRD, and PL, respectively. Then, the structural, optical, and electrical properties of the ZnO thin films, depending on the As ion dose variation and the RTA temperatures, were analyzed using the same methods. In our experiment, p-type ZnO thin films with a hole concentration of $1.263{\times}10^{18}cm^{-3}$ were obtained when the dose of $5{\times}10^{14}$ As $ions/cm^2$ was implanted and the RTA was conducted at $850^{\circ}C$ for 1 min.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.104-104
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• 2011

ZnO는 3.37 eV의 넓은 에너지 밴드갭을 갖는 투명 전도성 반도체이며 우수한 전기적, 광학적 특성으로 인해 광원소자 개발을 위한 새로운 물질로 많은 주목을 받아왔다. 더욱이, ZnO는 쉽게 나노구조 형성이 가능하기 때문에 이를 응용한 가스센서, 염료감응태양전지, 광검출기 등의 소자 개발이 활발히 이루어지고 있다. 최근에는 GaN 기반 발광다이오드 (light emitting diode, LED)의 광추출 효율을 향상시키기 위한 ZnO 나노구조 응용에 관한 연구가 보고되고 있다. GaN 기반 LED의 경우 반도체 물질과 공기 사이의 높은 굴절률 차이로 인하여 낮은 광추출 효율을 나타낸다. 이를 해결하기 위한 방법으로 표면 roughening, texturing 등 에칭공정을 이용해 광추출 효율을 개선하려는 연구들이 보고되고 있으나, 복잡한 공정과정을 필요로 하고 에칭공정에 의한 소자 표면 손상으로 전기적 특성이 나빠질 수 있다. 반면 전기화학증착법으로 성장된 ZnO 나노구조를 이용할 때, 보다 간단한 방법으로 쉽고 빠르게 나노구조를 형성할 수 있고 낮은 공정온도를 가지기 때문에 소자의 전기적 특성에 큰 영향을 주지 않는다. 수직방향으로 잘 정렬된 ZnO 나노구조를 갖는 LED의 경우 내부 Fresnel 반사 손실을 효과적으로 줄여 발광 효율을 크게 향상시킬 수 있다. 따라서, ZnO 나노구조의 성장제어 및 성장특성을 분석하는 것은 매우 중요하다. 본 연구에서는 ITO glass 위에 ZnO 나노구조를 성장하고 그 특성을 분석하였다. ITO glass 기판 위에 RF magnetron 스퍼터를 사용하여 Al 도핑된 ZnO (AZO)를 얇게 증착한 후 전기화학증착법으로 ZnO 나노구조를 성장하였다. 농도, 인가전압, 공정시간 등 다양한 공정조건을 변화시키면서 성장 메커니즘을 분석하였고, scanning electron microscope (SEM) 및 X-ray diffraction (XRD)을 통하여 구조 및 결정성 등을 분석하였다. 또한, UV-Visible-NIR spectrophotometer를 사용하여 투과율을 실험적으로 측정하여 ZnO 나노구조의 광학적 특성을 분석하였고, rigorous coupled wave analysis (RCWA) 방법을 사용하여 계면에서 발생하는 내부 반사율을 계산함으로써 나노구조의 효과를 이론적으로 분석하였다.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2011.05a
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• pp.696-698
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• 2011

We present a new method for the fabrication of film bulk acoustic wave resonator (FBAR) devices that exploits the thin piezoelectric ZnO films particularly sputter-deposited in a mixture of N2O and Ar gases as the reactive and sputtering gases, respectively. Some thermal annealing treatments were performed on the as-deposited ZnO films and also their effects on the resonance characteristics of the FBAR devices were investigated. It was found that with an optimized process, the resonance characteristics of the fabricated FBAR devices could be further improved.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.7
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• pp.656-661
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• 2005

The effects of gas atmosphere and in-situ thermal annealing in buffet layers on the characteristic of the ZnO grown by RF magnetron sputtering have been investigated. It was shown that the introduction of buffer layers grown at the gas atmospheres of the mixed $Ar/O_2$ and the in-situ thermal treatment of the ZnO buffer layer improved the structural and optical properties. In addition, the ZnO films on the buffer layer thermal-annealed at $N_2$ gas ambience showed the strong emission of the near band gap exciton with narrow linewidth by combining the high-temperature growth of the ZnO film.