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http://dx.doi.org/10.4313/JKEM.2015.28.1.7

The Optical Properties of Si3N4/SnZnO/AZO/Ag/Ti/ITO Multi-layer Thin Films with Laminating Times  

Lee, Sang-Yun (Research Development Team, UID)
Jang, Gun-Eik (Department of Materials Engineering, Chungbuk National University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.28, no.1, 2015 , pp. 7-11 More about this Journal
Abstract
In this study, $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film were prepared on glass substrate by DC/RF magnetron sputtering method. To prevent interfacial reaction between Ag and ITO layer, Ti buffer layer was inserted. Optical properties and sheet resistance were studied depending on laminating times of each multi-layered film especially in visible ray. The simulation program, EMP (essential macleod program), was adopted and compared with experimental data to expect the experimental result. It was found out that the transmittance of the first stacked $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film was more than 90%. However, with increasing stacking times, the optical properties of $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film get worse. Consequently, Ti layer is good for oxidation barrier, but too many uses of this layer may have an adverse effect to optical properties of TCO film.
Keywords
Transparent conductive oxide; Magnetron sputtering; Multi-layer; Transmittance;
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