• 제목/요약/키워드: moving substrate

검색결과 66건 처리시간 0.024초

Moving load response on the stresses produced in an irregular microstretch substrate

  • Kaur, Tanupreet;Sharma, Satish Kumar;Singh, Abhishek Kumar;Chaki, Mriganka Shekhar
    • Structural Engineering and Mechanics
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    • 제60권2호
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    • pp.175-191
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    • 2016
  • The present article is aimed at an investigation of stresses produced in a microstretch elastic half-space due to a moving load. The expressions of normal stress, shear stress and tangential couple stress produced in this case have been obtained in closed form. To find the displacement fields the perturbation method is applied. Significant effect of moving load on variation of stresses developed at different depths below the surface due to the depth of substrate and frictional coefficient of the rough surface of the medium has been observed. The effects of different shapes of irregularity and depth of irregularity on normal, shear and tangential couple stresses have been discussed. Some particular cases have also been deduced from the present investigation. Finally, the analytical developments have been illustrated numerically for aluminium-epoxy-like material substrate under the action of moving load.

반송제어모드를 이용한 인라인 식각/세정장치의 ITO 전극형성기술 (ITO Patterning of an In-line Wet Etch/Cleaning System by using a Reverse Moving Control System)

  • 홍성재;임승혁;한형석;권상직;조의식
    • 제어로봇시스템학회논문지
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    • 제14권4호
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    • pp.327-331
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    • 2008
  • An in-line wet etch/cleaning system was established for the research and development in wet etch process as a formation of electrode such as metal or transparent conductive oxide layer. A reverse moving system was equipped in the in-line wet etch/cleaning system for the alternating motion of glass substrate in a wet etch bath of the system. Therefore, it was possible for the glass substrate to be moved back and forth and it was possible to reduce the size of the system by using the reversing moving system. For the effect of the alternating motion of substrate on the etch rate in the in-line wet etch bath, indium tin oxide(ITO) patterns were obtained through wet etch process in the in-line system in which the substrate was moved back and forth. From the CD(critical dimension) skews resulted from the ADI CD and ACI CD of the ITO patterns, it was concluded that the alternating motion of glass substrate are possible to be applied to the mass production of wet etch process.

분무 열분해 CVD법으로 이동 중인 LaAlO_3(100) 단결정 위에 증착시킨 YBCO 박막의 특성 (Deposition of YBCO Films on Moving Substrate by a Spray Pyrolysis method)

  • 김재근;홍석관;김호진;유석구;조한우;안지현;주진호;이희균;홍계원
    • Progress in Superconductivity
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    • 제8권1호
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    • pp.93-97
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    • 2006
  • YBCO films were deposited on a moving substrate by a spray pyrolysis method using nitrate aqueous solution as precursors. Deposition was made on $LaAlO_3$(100) single crystal substrate by spraying precursor droplets generated by a concentric nozzle. The cation ratio of precursor solution was Y:Ba:Cu=1:2.65:4.5. The distance between nozzle and substrate was 15 cm. Substrate was transported with a speed ranging from 0.23 cm/min to 0.5 cm/min. Films were deposited at the pressure ranging from 10 Torr to 20 Torr and the deposition temperature was ranged from $740^{\circ}C\;to\;790^{\circ}C$. Oxygen partial pressure was controlled between 1 Tow and S Torr. Superconducting YBCO films were obtained from $740^{\circ}C\;to\;790^{\circ}C$ with an oxygen partial pressure of 3 Torr. Scanning electron microscope(SEM) and X-ray diffraction(XRD) observation revealed that films are smooth and highly texture with(001) plans parallel to substrate plane. Highest Jc was 0.72 $MA/cm^2$ at 77K and self-field for the film with a thickness of 0.15 m prepared at a substrate temperature of $740^{\circ}C$ and $PO_2$=3 Torr.

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A Compacted In-line Wet Etch/Cleaning System With a Reverse Moving Control System

  • Im, Seung-Hyeok;Cho, Eou-Sik;Kwon, Sang-Jik
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.863-866
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    • 2008
  • For the cost reduction in the fabrication of display panels, a reverse moving system was equipped to a compacted in-line wet etch/cleaning system. For the effect of the alternating movement of substrate on the wet etch process, ITO layers were etched in various moving modes of substrates and the results were compared and analyzed.

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고온 회전 척을 구비한 포토레지스트 Spray Coating 방법 및 장치 (The Method and Apparatus for Photoresist Spray Coating with High Temperature Rotational Chuck)

  • 박태규;김준태;김국진;석창길
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2003년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.42-44
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    • 2003
  • The paper presents the method and apparatus for conformal photoresist spray coating on the 3D structured substrate. The system consists of a high-temperature-rotational chuck, ultrasonic spray nozzle module, angle control module and nozzle moving module. The coating uniformity is acquired by controlling the moving speed of the ultrasonic spray nozzle across the substrate which is rotated constantly. To coat the photoresist conformally the spray angle of the nozzle and the temperature of the substrate are controlled during spray coating. The rotational chuck can be heated up by hot air or $N_2$. The photoresist (AZ1512) has been coated on the 3D structured wafer by spray coating system and the characteristics have been evaluated.

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Influence of surface irregularity on dynamic response induced due to a moving load on functionally graded piezoelectric material substrate

  • Singh, Abhishek K.;Negi, Anil;Koley, Siddhartha
    • Smart Structures and Systems
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    • 제23권1호
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    • pp.31-44
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    • 2019
  • The present study investigate the compressive stress, shear stress, tensile stress, vertical electrical displacement and horizontal electrical displacement induced due to a load moving with uniform velocity on the free rough surface of an irregular transversely isotropic functionally graded piezoelectric material (FGPM) substrate. The closed form expressions ofsaid induced stresses and electrical displacements for both electrically open condition and electrically short condition have been deduced. The influence of various affecting parameters viz. maximum depth of irregularity, irregularity factor, parameter of functionally gradedness, frictional coefficient of the rough upper surface, piezoelectricity/dielectricity on said induced stresses and electrical displacements have been examined through numerical computation and graphical illustration for both electrically open and short conditions. The comparative analysis on the influence of electrically open and short conditions as well as presence and absence of piezoelectricity on the induced stresses and induced electrical displacements due to a moving load serve as the salient features of the present study. Moreover, some important peculiarities have also been traced out by means of graphs.

다중 전극 어레이 기반 전기수력학 인쇄 기술을 이용한 생분해성 고분자의 2차원 마이크로 패터닝 연구 (A Study of 2D Micro-patterning of Biodegradable Polymers by MEA (Multi Electrode Array)-based Electrohydrodynamic (EHD) printing)

  • 황태헌;류원형
    • 한국입자에어로졸학회지
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    • 제13권3호
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    • pp.111-118
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    • 2017
  • 전기수력학 (Electrohydrodynamic, EHD) 프린팅 기술은 전기장을 이용하여 일반 프린팅 기술보다 더 작은 크기의 액적을 분사하고 패터닝할 수 있는 장점을 갖고 있다. EHD 프린팅은 일반적으로 인쇄 노즐이나 기판을 X-Y 방향으로 움직여 패턴을 제작하는 방식으로 사용되어 왔으나 본 연구에서는 다중전극 어레이 (Multielectrode array, MEA)를 이용하여 원하는 기판위에 2차원의 패터닝이 가능함을 연구하였다. 특히, 약물전달장치 등의 바이오메디칼 디바이스로의 응용이 가능한 생분해성 고분자와 염료를 혼합한 잉크의 EHD 프린팅을 시도하였으며 노즐이나 기판의 움직임 없이 안정적으로 분사할 수 있는 2차원 범위에 대한 연구를 통해 최소 약 $6{\mu}m$ 크기를 갖는 패턴을 노즐 위치로부터 수평방향으로 약 1 mm 범위까지 안정적 패터닝이 가능함을 확인하였다. 또한, MEA 전극 간의 거리에 의한 패턴 조밀도의 한계를 극복하기 위해 MEA와 인쇄가 이루어지는 기판과의 상대적 이동을 통해 더 조밀한 패터닝이 가능함을 보여주었다.

SMOLDERING IGNITION OF FLAMMABLE SUBSTRATE

  • Yi, Sung-Chul;Kim, Hee-Taik;Ryu, Kyong-Ok
    • 한국화재소방학회:학술대회논문집
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    • 한국화재소방학회 1997년도 International Symposium on Fire Science and Technology
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    • pp.162-168
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    • 1997
  • A theoretical model for the interaction of the moving heat source and a solid substrate when they are in contact is described. for purposes of the model the substrate is assumed to act as a continuum and the Fourier equation for transient. three-dimensional conduction is solved using Laplace and Fourier transformations. Unlike most previous models, this model shows the explicit relations between the properties of heat source and that of the substrate. Since the size, shape and speed of heat source impact the ignition of substrate, considerable attention is devoted to evaluating these parameters. Results are presented which show the effects of the size, shape and speed of heat source on the substrate.

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용융금속 액적의 고체표면 충돌거동 (Collision Behavior of Molten Metal Droplet with Solid Surface)

  • 양영수;손광재;강대현
    • Journal of Welding and Joining
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    • 제18권4호
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    • pp.55-63
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    • 2000
  • This paper presents a study of the solder bumping process. The theoretical model, based on the variational principle instead of solving the Navier-Stokes equation with moving boundaries, was developed to considered the energy dissipation in semi-solid phase and the approximate solidification time of the molten metal droplet. The simulation results revealed that the developed model could reasonably describe the collision behavior of molten metal with solid surface. Simulations were made with variation of initial droplet temperature, substrate metal and initial substrate temerature.

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