• Transactions of Materials Processing
• /
• v.14 no.5 s.77
• /
• pp.477-481
• /
• 2005

Wafer scale micro mirror array with high surface quality for small form factor (SFF) optical pick-up was fabricated by micro UV-molding. To replicate micro mirror array for SFF optical pick-up, a high- precision mold was fabricated using micro-machining technology. Wafer scale micro mirror array was UV-molded using the mold and then the process was optimized experimentally. The surface flatness and roughness of UV-molded micro mirror array were measured by white light scanning interferomety system and analyzed the transcribing characteristics. Finally, the measured flatness of UV-molded micro mirror away for SFF optical pick-up, which was fabricated in the optimum processing condition, was less than 70nm.

• Proceedings of the Korean Society for Technology of Plasticity Conference
• /
• 2005.05a
• /
• pp.47-50
• /
• 2005

In this study, micro mirror array for small form factor optical pick-up was replicated by micro UV-molding. First, mold for micro mirror array was fabricated using micromachining. Also, to analyze the characteristics of the surface quality, flatness of replicated mirror surface were measured by white light scanning inteferometry system. The results show that the micro mirror array with a sufficient surface quality can be obtained by polymer replication process.

• Proceedings of the KIEE Conference
• /
• 1996.07c
• /
• pp.1735-1737
• /
• 1996

Using a modified Michelson interferometer configuration, the flatness of micro mirror cell surface was probed. Interferograms were captured at CCD camera plane by defocusing object beam onto the micro mirror with microscope objective lens. And these were compared with the interferograms made with the flat metallic mirror. Also, the theoretical analysis is presented.

• Proceedings of the KIEE Conference
• /
• 2002.07c
• /
• pp.1985-1987
• /
• 2002

Silicon bulk micromachined micromirrors are designed and fabricated for out-of-plane right angle reflection. The micromirror is comprised of a minor plate, springs, magnetic bars and electrodes. Single crystalline silicon is used for a flatness improvement of a mirror plate. Out-of-plane right angle reflection requires a 45 degree operation of the micromirror. The micromirrors are operated by applying a magnetic field, which is generated by a coil located below a substrate. For an individual mirror operation, each mirror is clamped using an electrostatic force against the electromagnetic force. Angular deflections are measured and compared with theoretical data. The micro mirror operates up to 45 degree when magnetic field is 4 kA/m which is generated by a 115 mA coil current Simple addressing is tested, and it is shown that a clamping voltage is less than 5V.

• Journal of Sensor Science and Technology
• /
• v.19 no.2
• /
• pp.130-136
• /
• 2010

The microbolometer array sensor with fine pitch pixel array has been implemented to the released amorphous silicon layer supported by two contact pads. For the design of focal plane mirror with geometrical flatness, the simple beam test structures were fabricated and characterized. As the beam length decreased, the effect of beam width on the bending was minimized, Mirror deformation of focal plane in a real pixel showed downward curvature by residual stress of a-Si and Ti layer. The mirror tilting was caused by the mis-align effect of contact pad and confirmed by FEA simulation results. The properties of bolometer have been measured as such that the NETD 145 mK, the TCR -2 %/K, and thermal time constant 1.99 ms.

• Journal of the Optical Society of Korea
• /
• v.13 no.2
• /
• pp.245-250
• /
• 2009

We propose a digital holographic interference analysis method based on a 2-frame phase-shifting technique for measuring an optical mirror surface. The technique using 2-frame phase-shifting digital interferometry is more efficient than multi-frame phase-shifting techniques because the 2-frame method has the advantage of a reduced number of interferograms, and then takes less time to acquire the wanted topography information from interferograms. In this measurement system, 2-frame phase-shifting digital interferograms are acquired by moving the reference flat mirror surface, which is attached to a piezoelectric transducer, with phase step of 0 or $\pi$/2 in the reference beam path. The measurements are recorded on a CCD detector. The optical interferometry is designed on the basis of polarization characteristics of a polarizing beam splitter. Therefore the noise from outside turbulence can be decreased. The proposed 2-frame algorithm uses the relative phase difference of the neighbor pixels. The experiment has been carried out on an optical mirror which flatness is less than $\lambda$/4. The measurement of the optical mirror surface topography using 2-frame phase-shifting interferometry shows that the peak-to-peak value is calculated to be about $0.1779{\mu}m$, the root-mean-square value is about $0.034{\mu}m$. Thus, the proposed method is expected to be used in nondestructive testing of optical components.

• Journal of Electrical Engineering and Technology
• /
• v.5 no.2
• /
• pp.337-341
• /
• 2010

In this paper, an extremely low voltage operated micro corner cube retroreflector (CCR) was fabricated for free-space optical communication applications by using bulk silicon micromachining technologies. The CCR was comprised of an orthogonal vertical mirror and a horizontal actuated mirror. For low voltage operation, the horizontal actuated mirror was designed with two PZT cantilever actuators, torsional bars, hinges, and a mirror plate with a size of $400{\mu}m{\times}400{\mu}m$. In particular, the torsional bars and hinges were carefully simulated and designed to secure the flatness of the mirror plate by using a finite element method (FEM) simulator. The measured tilting angle was approximately $2^{\circ}$ at the applied voltage of 5 V. An orthogonal vertical mirror with an extremely smooth surface texture was fabricated using KOH wet etching and a double-SOI (silicon-on-insulator) wafer with a (110) silicon wafer. The fabricated orthogonal vertical mirror was comprised of four pairs of two mutually orthogonal flat mirrors with $400{\mu}m4 (length) $\times400{\mu}m$ (height) $\times30{\mu}m$ (thickness). The cross angles and surface roughness of the orthogonal vertical mirror were orthogonal, almost $90^{\circ}$ and 3.523 nm rms, respectively. The proposed CCR was completed by combining the orthogonal vertical and horizontal actuated mirrors. Data transmission and modulation at a frequency of 10 Hz was successfully demonstrated using the fabricated CCR at a distance of approximately 50 cm.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2004.08a
• /
• pp.325-327
• /
• 2004

Novel surface profiler system for inspection of the display components is demonstrated In the case of the liquid crystal display, for example, not only the flatness of the alignment film but also the quality of rubbing can be inspected. Furthermore, the shape of the component such as the color filter, electrode and mirror can be inspected without removing each component.

• International Journal of Precision Engineering and Manufacturing
• /
• v.1 no.1
• /
• pp.98-105
• /
• 2000

The projectors using liquid crystal display(LCD) have faults such as low optical efficiency, low brightness and even heat generation. To solve these problems reflective-type spatial light modulators based on MEMS (Microelectromechanical Systems) technology have emerged. Digital Micromirror DeviceTM(DMDTM), which was already developed by Texas Instruments Inc., and Thin-film Micromirror ArrayTM(TMATM), which has been recently developed by Daewoo Electronics Co., are the representative examples. The display using TMATM has particularly much higher optical efficiency than other projectors. But the micromirrors manufactured by semiconductor processes have inevitable distortion because of the limitations of the manufacturing processes, so that the distortions of their surfaces have great influence on the optical efficiency of the projector. This study investigated the effects of mirror flatness on the optical performance, including the optical efficiency, of the TMATM projector. That is to say, as a part of the efforts to enhance the performance of the TMATM projector, how much influence the form errors of a micromirror surface exert on the optical efficiency and the modulation of gray scale of the projector were analyzed through a pertinent modeling and simulations.

• Korean Journal of Optics and Photonics
• /
• v.15 no.1
• /
• pp.56-62
• /
• 2004

We present a diffraction grating interferometer of large equivalent wavelength specially designed for flatness testing of rough surfaces. Two transmission diffraction gratings are illuminated on the object under test by use of two measurement beams with different angles of incidence, which yields a large equivalent wavelength. This interferometer design minimizes unnecessary diffraction rays and the systematic error caused by the diffraction gratings, and provides a large working distance and easy alignment. To improve the measurement accuracy, phase shifting technique is applied and the equivalent wavelength error caused by defocus is calibrated. Test results obtained from mirror surfaces and machined rough surfaces are discussed.