• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.155-155
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• 2000

Adsorption of alkali metals on a silicon surface has attracted much attention due to its importance in metal-semiconductor interface technology, In particular, the bonding nature of alkali metal to silicon substrate has been a focus of fundamental research efforts. We examined the adsorbed layer of Cs on a Si(111)-(7$\times$) surface by reactive ion scattering (RIS) of hyperthermal Cs+ beams. RIS from a Cs-adsorbed surface gives rise to Cs, representing pickup of surface Cs by Cs projectile. The Cs intensity is proportional to surface coverage of Cs at a high substrate temperature (473 K), while it varies anomalously with Cs coverage at low temperatures (130-170 K). This observation indicates that RIS selectively detects metallic Cs on surface, but discriminates ionic Cs. Transition from ionic to metallic Cs adlayer is driven by thermal diffusion of Cs and their clustering process.

• Membrane Journal
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• v.20 no.2
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• pp.151-158
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• 2010

This paper presents the synthesis of ampholyte immobilized hollow-fiber membranes and adsorption characteristic of metallic ions. This is prepared by radiation induced grafting polymerization of an epoxy group containing Glycidyl methacrylate (GMA) onto an existing polyethylene porous hollow-fiber membrane. Ampholyte ion-exchanged alkalic group, $-NH_2$ (amine function) of Taurine (TAU) is reacted with glycidyl of GMA for the synthesis of stable membrane. However, Sodium sulfite (SS) membrane is also prepared by making chemical bonds with GMA of porous hollow-fiber membrane for the comparison of adsorption characteristic of metallic ions. These are called as TAU and SS membranes, respectively. It is shown that TAU membrane shows a steady flux, 0.9 m/h regardless of the density of TAU, while the flux of SS membrane decreases rapidly as the density of $SO_3H$ group increases. SS membrane showed a negligible flux. TAU membrane with the density 0.8 mmol/g shows the amount of metallic ions adsorbed in the following order, Cu > Cd > Mg > Sb > Pb. In general, TAU membrane with high density and reaction time showed the high amount of metallic ions adsorbed and flux.

• Journal of the Korean Chemical Society
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• v.33 no.2
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• pp.232-237
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• 1989

The elution mechanism of rare earth elements in cation exchange resin which was substituted with $NH_4^+,\;Zn^{2+}\;or\;Al^{3+}$ as a retaining ion had been investigated. Rare earths or rare earths-EDTA complex solution was loaded on the top of resin bed and eluted with 0.0269M EDTA solution. When the rare earth-EDTA complex was adsorbed on the $Zn^{2+}\;or\;Al^{3+}$ resin form, retaining ion was complexed with EDTA and liberated rare earths was adsorbed in the resin again. Adsorbed rare earths in resin phase could be eluted by the complexation reaction with EDTA eluent. On $NH_4^+$ resin form, the rare earth-EDTA complex which had negative charge could not adsorbed on the cation exchange resin because the complexation reaction between $NH_4^+$ and EDTA was impossible. So the elution time was much shorter than in $Zn^{2+}\;or\;Al^{3+}$ resin form. When the rare earths solution was loaded on the $Zn^{2+},\;Al^{3+}$ resin form bed, rare earths was adsorbed in the resin and the retaining ion was liberated. Adsorbed rare earths in resin bed was exchanged by EDTA eluent forming rare earths-EDTA complex, and eluted through these processes. On $NH_4^+$ resin form, rare earths loaded was adsorbed by exchange reaction with $NH_4^+$. As the EDTA eluent was added, rare earths was liberated from resin forming negatively charged rare earth-EDTA complex and eluted without any exchange reaction. So the elution time was greatly shortened and there was no metallic ion except rare earths in effluent. When the $Zn^{2+}\;and\;Al^{3+}$ was used as retaining ion, the pH of efflent was decreased seriousely because the $H^+$ liberated from EDTA molecule.

• Analytical Science and Technology
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• v.19 no.4
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• pp.316-322
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• 2006

The removal efficiencies of silver-ACFs were associated with their surface properties such as surface area, porosity, and the electro-chemical reaction time for the silver treatments. X-ray diffraction patterns of fibers electrochemically treated with silver display diffraction peaks for metallic silver and kinds of silver chloride complexes on the fiber surface after electrochemical adsorption. The results of SEM and EDX indicate that surface reaction motive of silver-ACF prepared by electrochemical reaction are depend on time function for the chloride ion removal efficiency. Finally, Cl ion adsorbed by the silver-ACFs from the ICP analysis seems to show an excellent removal effect.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.167.1-167.1
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• 2016

The interaction between adsorbed water and hydrogen on metallic surfaces is important for fundamental understanding of heterogeneous catalysis and electrode surface reactions in acidic environment. Here, we explore a long-standing question of whether hydronium ion can exist or not on a Pt surface coadsorbed with atomic hydrogen and water. Studies based on mass spectrometry and infrared spectroscopy show clear evidence that hydrogen atoms are converted into hydrated protons on a Pt(111) surface. The preferential structures of hydrated protons are identified as multiply hydrated $H_5O_2{^+}$ and $H_7O_3{^+}$ species rather than as hydronium ions. The multiply hydrated protons may be regarded as two dimensional zundel ($H_5O_2{^+}$) and Eigen cation ($H_7O_3{^+}$) in water-metal interface. These surface-bound hydrated protons may be key surface intermediates of the electrochemical interconversion between adsorbed hydrogen atoms and solvated protons.

• Journal of the Optical Society of Korea
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• v.17 no.1
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• pp.10-15
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• 2013

Adsorption behavior of counterions under a Langmuir monolayer was investigated by sum-frequency generation (SFG) spectroscopy. By comparing SFG spectra of arachidic acid (AA) Langmuir monolayer/water interface with and without added salt, it was found that the simple trivalent cation $La^{3+}$ adsorbed on AA monolayer only when the carboxylic headgroups are charged (deprotonated), implying that counterion adsorption is induced by Coulomb interaction. On the other hand, metal hydroxide complex $Fe(OH)_3$ adsorbed even on a charge-neutral AA monolayer, indicating that the adsorption of iron hydroxide is due to chemical interaction such as covalent or hydrogen bonding to the headgroup of the molecules at the monolayer.

• Journal of Integrative Natural Science
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• v.7 no.2
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• pp.130-137
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• 2014

Resins were synthesized by mixing N-phenylaza-15-crown-5 macrocyclic ligand attached to styrene (2th petroleum in 4th class hazardous materials) divinylbenzene (DVB) copolymer with crosslink of 1%, 2%, 6%, and 12% by substitution reaction. The synthesis of these resins was confirmed by content of chlorine, element analysis, thermo gravimetric analysis (TGA), surface area, and IR-spectroscopy. The effects of pH, equilibrium arrival time, dielectric constant of solvent and crosslink on adsorption of metal ions by the synthetic resin adsorbent were investigated. The metal ions were showed fast adsorption on the resins above pH 4. The optimum equilibrium time for adsorption of metallic ions was about two hours. The adsorption selectivity determined in ethanol was in increasing order uranium (VI) > zinc (II) > europium (III) ions. The uranium ion adsorbed in the order of 1%, 2%, 6%, and 12% crosslink resin and adsorption of resin decreased in proportion to the order of dielectric constant of solvents.

• Journal of the Korean Applied Science and Technology
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• v.16 no.1
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• pp.33-40
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• 1999

We used Cu as a representative of metals to be directly adsorbed on the bare Si surface and studied its removal DHF, DHF-$H_2O_2$ and BHF solution. It has been found that Cu ion in DHF adheres on every Si wafer surface that we used in our study (n, p, n+, p+) especially on the n+-Si surface. The DHF-$H_2O_2$ solution is found to be effective in removing metals featuring high electronegativity such as Cu from the p-Si and n-Si wafers. Even when the DHF-$H_2O_2$ solution has Cu ions at the concentration of 1ppm, the solution is found effective in cleaning the wafer. In the case the n+-Si and p+-Si wafers, however, their surfaces get contaminated with Cu When Cu ion of 10ppb remains in the DHF-$H_2O_2$ solution. When BHF is used, Cu in BHF is more likely to contaminate the n+-Si wafer. It is also revealed that the surfactant added to BHF improve wettability onto p-Si, n-Si and p+-Si wafer surface. This effect of the surfactant, however, is not observed on the n+-Si wafer and is increased when it is immersed in the DHF-$H_2O_2$ solution for 10min. The rate of the metallic contamination on the n+-Si wafer is found to be much higher than on the other Si wafers. In order to suppress the metallic contamination on every type of Si surface below 1010atoms/cm2, the metallic concentration in ultra pure water and high-purity DHF which is employed at the final stage of the cleaning process must be lowered below the part per trillion level. The DHF-$H_2O_2$ solution, however, degrades surface roughness on the substrate with the n+ and p+ surfaces. In order to remove metallic impurities on these surfaces, there is no choice at present but to use the $NH_4OH-H_2O_2-H_2O$ and $HCl-H_2O_2-H_2O$ cleaning.

• Journal of the Korean institute of surface engineering
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• v.22 no.2
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• pp.69-77
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• 1989

Codeposion of inert particles particles in a metallic mateix by electroless plating process involves two phenomena. Firstly, the adsorption of inercles and secondly, the adsorption of inert particles on the cathode. In the present paper the first adsorption phenomenon and in the next paper the second ane are studied in greaterdetail for the Ni-SiCc, Ni-Al2AO3 and Ni-WC systems. Measurements of the Zeta potentials for the SiC and Al2AO3 particles have been in different electrolyte solutions and the ionic species adsorbed on the Particles studied. The addition of sodium acetate, trisodium citrate and sodium phosphinate to nikel sulface sruomotes the zeta potential of SiC and Al2O3 particles, but zeta phosphinate to nickel is more positive than Al2O3 particles although the amount of nickel ion adsorbrd on the Al2O3 particles become greater than that of SiC particles. It is suggested that this is due to adsortion of Na ion onto the surface SiC particles.

• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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• v.19 no.1
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• pp.39-49
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• 2021

The behaviors of various desorption agents were investigated during the desorption of cesium (Cs) from samples of clay minerals and actual soil. Results showed that polymeric cation exchange agents (polyethyleneimine (PEI)) efficiently desorbed Cs from expandable montmorillonite, whereas acidic desorption solutions containing HCl or PEI removed considerable Cs from hydrobiotite. However, most desorption agents could desorb only 54% of Cs from illite because of Cs's specific adsorption to selective adsorption sites. Cs desorption from an actual soil sample containing Cs-selective clay mineral illite (< 200 ㎛) and extracted from near South Korea's Kori Nuclear Power Plant was also investigated. Considerable adsorbed 137Cs was expected to be located at Cs-selective sites when the 137Cs loading was much lower than the sample's cation exchange capacity. At this low 137Cs loading, the total Cs amount desorbed by repeated washing varied by desorption agent in the order HCl > PEI > NH4+, and the highest Cs desorption amount achieved using HCl was 83%. Unlike other desorption agents with only cation exchange capabilities, HCl can attack minerals and induce dissolution of metallic elements. HCl's ability to both alter minerals and induce H+/Cs+ ion exchange is expected to promote Cs desorption from actual soil samples.