• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.155-155
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• 2000

Adsorption of alkali metals on a silicon surface has attracted much attention due to its importance in metal-semiconductor interface technology, In particular, the bonding nature of alkali metal to silicon substrate has been a focus of fundamental research efforts. We examined the adsorbed layer of Cs on a Si(111)-(7$\times$) surface by reactive ion scattering (RIS) of hyperthermal Cs+ beams. RIS from a Cs-adsorbed surface gives rise to Cs, representing pickup of surface Cs by Cs projectile. The Cs intensity is proportional to surface coverage of Cs at a high substrate temperature (473 K), while it varies anomalously with Cs coverage at low temperatures (130-170 K). This observation indicates that RIS selectively detects metallic Cs on surface, but discriminates ionic Cs. Transition from ionic to metallic Cs adlayer is driven by thermal diffusion of Cs and their clustering process.

• 멤브레인
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• 제20권2호
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• pp.151-158
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• 2010

본 연구는 양성전해질막의 금속이온 특성을 조사하기 위하여 Taurine (TAU)막을 제조하였다. 제조방법으로는 방사선조사법에 의한 Glycidyl methacrylate (GMA)의 중공사막 표면위에 고정시키고, 이후 Taurine의 염기성 부분인 $-NH_2$기(amine fuction)와 GMA의 glycididyl의 개환 반응을 통하여 안정된 막을 형성하도록 하였다. 한편 TAU막과 비교를 위해 GMA가 고정된 중공사 막에 Sodium sulfite로 화학적 결합을 형성 SS막을 제조하였다. 이렇게 제조된 TAU막의 타우린 밀도가 높아져도 투과유속은 0.9 m/h로 변화 없으나, SS막은 술폰산기의 밀도가 높아짐에 따라 투과유속이 급격히 감소하는 것을 나타내었다. 타우린 밀도가 0.8 mmol/g인 막을 사용한 결과 금속이온의 량은 Cu > Cd > Mg > Sb > Pb의 순으로 나타내었다. 전반적으로 타우린막은 전화율과 밀도의 증가에 따라 많은 양의 금속이온 흡착과 높은 투과유속을 나타내었다.

• 대한화학회지
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• 제33권2호
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• pp.232-237
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• 1989

$NH_4^+,\;Zn^{2+}$ 및 $Al^{3+}$ 를 retining이온으로 치환시킨 양이온 교환수지관에 희토류를 직접 흡착시키거나 EDTA와 착물을 만들어 흡착시킨 후 0.0269M EDTA로 용리하여 각 분액에 포함된 화학종을 분석하여 이온교환 mechanism을 규명하였다. $Zn^{2+}$나 $Al^{3+}$으로 치환된 수지층에 희토류-EDTA 착물을 흡착시키면 retaining 이온과 EDTA가 착물을 형성하고 유리된 희토류가 수지에 흡착된 후 용리액인 EDTA 용액을 가하면 수지에 흡착되었던 희토류가 EDTA와 착물을 이루어 교환반응을 통해 용리된다. $NH_4^+$형 수지관에 희토류-EDTA 착물을 가하면 retaining 이온인 $NH_4^+$가 EDTA와 착물을 형성하지 못하므로 음의 전하를 띤 희토류-EDTA 화학종이 수지에 흡착되지 못하고 40ml이내에서 유출되었다. $Zn^{2+}$과 $Al^{3+}$형 수지관에 희토류 이온을 흡착시키면 희토류는 수지에 흡착되고 $Zn^{2+}$과 $Al^{3+}$이 유리된다.수지에 흡착된 희토류는 용리액인 EDTA용액과 반응하여 희토류-EDTA 착물을 이루어 교환반응을 하며 용리된다. $NH_4^+$형 수지관에 희토류 이온을 흡착시키면 희토류가 $NH_4^+$와 치환되어 흡착되어 EDTA를 가하면 희토류-EDTA 착물이 형성되어 교환반응 없이 그대로 유출되어 희토류가 빨리 용출된다. 이때에는 희토류 이외의 금속이 용출되지 않기 때문에 희토류의 분리에 대단히 유리하다. $Zn^{2+}$과 $Al^{3+}$으로 치환시킨 수지에서는 각 용출액의 pH는 용리액의 pH에 비해 대단히 감소하였다. 그 이유는 금속이온이 EDTA와 착물을 이룰때 EDTA에서 수소이온이 유리되기 때문이었다.

• 분석과학
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• 제19권4호
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• pp.316-322
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• 2006

The removal efficiencies of silver-ACFs were associated with their surface properties such as surface area, porosity, and the electro-chemical reaction time for the silver treatments. X-ray diffraction patterns of fibers electrochemically treated with silver display diffraction peaks for metallic silver and kinds of silver chloride complexes on the fiber surface after electrochemical adsorption. The results of SEM and EDX indicate that surface reaction motive of silver-ACF prepared by electrochemical reaction are depend on time function for the chloride ion removal efficiency. Finally, Cl ion adsorbed by the silver-ACFs from the ICP analysis seems to show an excellent removal effect.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.167.1-167.1
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• 2016

The interaction between adsorbed water and hydrogen on metallic surfaces is important for fundamental understanding of heterogeneous catalysis and electrode surface reactions in acidic environment. Here, we explore a long-standing question of whether hydronium ion can exist or not on a Pt surface coadsorbed with atomic hydrogen and water. Studies based on mass spectrometry and infrared spectroscopy show clear evidence that hydrogen atoms are converted into hydrated protons on a Pt(111) surface. The preferential structures of hydrated protons are identified as multiply hydrated $H_5O_2{^+}$ and $H_7O_3{^+}$ species rather than as hydronium ions. The multiply hydrated protons may be regarded as two dimensional zundel ($H_5O_2{^+}$) and Eigen cation ($H_7O_3{^+}$) in water-metal interface. These surface-bound hydrated protons may be key surface intermediates of the electrochemical interconversion between adsorbed hydrogen atoms and solvated protons.

• Journal of the Optical Society of Korea
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• 제17권1호
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• pp.10-15
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• 2013

Adsorption behavior of counterions under a Langmuir monolayer was investigated by sum-frequency generation (SFG) spectroscopy. By comparing SFG spectra of arachidic acid (AA) Langmuir monolayer/water interface with and without added salt, it was found that the simple trivalent cation $La^{3+}$ adsorbed on AA monolayer only when the carboxylic headgroups are charged (deprotonated), implying that counterion adsorption is induced by Coulomb interaction. On the other hand, metal hydroxide complex $Fe(OH)_3$ adsorbed even on a charge-neutral AA monolayer, indicating that the adsorption of iron hydroxide is due to chemical interaction such as covalent or hydrogen bonding to the headgroup of the molecules at the monolayer.

• 통합자연과학논문집
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• 제7권2호
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• pp.130-137
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• 2014

Resins were synthesized by mixing N-phenylaza-15-crown-5 macrocyclic ligand attached to styrene (2th petroleum in 4th class hazardous materials) divinylbenzene (DVB) copolymer with crosslink of 1%, 2%, 6%, and 12% by substitution reaction. The synthesis of these resins was confirmed by content of chlorine, element analysis, thermo gravimetric analysis (TGA), surface area, and IR-spectroscopy. The effects of pH, equilibrium arrival time, dielectric constant of solvent and crosslink on adsorption of metal ions by the synthetic resin adsorbent were investigated. The metal ions were showed fast adsorption on the resins above pH 4. The optimum equilibrium time for adsorption of metallic ions was about two hours. The adsorption selectivity determined in ethanol was in increasing order uranium (VI) > zinc (II) > europium (III) ions. The uranium ion adsorbed in the order of 1%, 2%, 6%, and 12% crosslink resin and adsorption of resin decreased in proportion to the order of dielectric constant of solvents.

• 한국응용과학기술학회지
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• 제16권1호
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• pp.33-40
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• 1999

We used Cu as a representative of metals to be directly adsorbed on the bare Si surface and studied its removal DHF, DHF-$H_2O_2$ and BHF solution. It has been found that Cu ion in DHF adheres on every Si wafer surface that we used in our study (n, p, n+, p+) especially on the n+-Si surface. The DHF-$H_2O_2$ solution is found to be effective in removing metals featuring high electronegativity such as Cu from the p-Si and n-Si wafers. Even when the DHF-$H_2O_2$ solution has Cu ions at the concentration of 1ppm, the solution is found effective in cleaning the wafer. In the case the n+-Si and p+-Si wafers, however, their surfaces get contaminated with Cu When Cu ion of 10ppb remains in the DHF-$H_2O_2$ solution. When BHF is used, Cu in BHF is more likely to contaminate the n+-Si wafer. It is also revealed that the surfactant added to BHF improve wettability onto p-Si, n-Si and p+-Si wafer surface. This effect of the surfactant, however, is not observed on the n+-Si wafer and is increased when it is immersed in the DHF-$H_2O_2$ solution for 10min. The rate of the metallic contamination on the n+-Si wafer is found to be much higher than on the other Si wafers. In order to suppress the metallic contamination on every type of Si surface below 1010atoms/cm2, the metallic concentration in ultra pure water and high-purity DHF which is employed at the final stage of the cleaning process must be lowered below the part per trillion level. The DHF-$H_2O_2$ solution, however, degrades surface roughness on the substrate with the n+ and p+ surfaces. In order to remove metallic impurities on these surfaces, there is no choice at present but to use the $NH_4OH-H_2O_2-H_2O$ and $HCl-H_2O_2-H_2O$ cleaning.

• 한국표면공학회지
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• 제22권2호
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• pp.69-77
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• 1989

Codeposion of inert particles particles in a metallic mateix by electroless plating process involves two phenomena. Firstly, the adsorption of inercles and secondly, the adsorption of inert particles on the cathode. In the present paper the first adsorption phenomenon and in the next paper the second ane are studied in greaterdetail for the Ni-SiCc, Ni-Al2AO3 and Ni-WC systems. Measurements of the Zeta potentials for the SiC and Al2AO3 particles have been in different electrolyte solutions and the ionic species adsorbed on the Particles studied. The addition of sodium acetate, trisodium citrate and sodium phosphinate to nikel sulface sruomotes the zeta potential of SiC and Al2O3 particles, but zeta phosphinate to nickel is more positive than Al2O3 particles although the amount of nickel ion adsorbrd on the Al2O3 particles become greater than that of SiC particles. It is suggested that this is due to adsortion of Na ion onto the surface SiC particles.

• 방사성폐기물학회지
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• 제19권1호
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• pp.39-49
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• 2021

The behaviors of various desorption agents were investigated during the desorption of cesium (Cs) from samples of clay minerals and actual soil. Results showed that polymeric cation exchange agents (polyethyleneimine (PEI)) efficiently desorbed Cs from expandable montmorillonite, whereas acidic desorption solutions containing HCl or PEI removed considerable Cs from hydrobiotite. However, most desorption agents could desorb only 54% of Cs from illite because of Cs's specific adsorption to selective adsorption sites. Cs desorption from an actual soil sample containing Cs-selective clay mineral illite (< 200 ㎛) and extracted from near South Korea's Kori Nuclear Power Plant was also investigated. Considerable adsorbed 137Cs was expected to be located at Cs-selective sites when the 137Cs loading was much lower than the sample's cation exchange capacity. At this low 137Cs loading, the total Cs amount desorbed by repeated washing varied by desorption agent in the order HCl > PEI > NH4+, and the highest Cs desorption amount achieved using HCl was 83%. Unlike other desorption agents with only cation exchange capabilities, HCl can attack minerals and induce dissolution of metallic elements. HCl's ability to both alter minerals and induce H+/Cs+ ion exchange is expected to promote Cs desorption from actual soil samples.