• 제목/요약/키워드: metal-organic chemical vapor deposition (MOCVD)

검색결과 216건 처리시간 0.027초

$H_2$ plasma treatment effects on electrical and optical properties of the BZO (ZnO:B) thin films

  • Yoo, Ha-Jin;Son, Chan-Hee;Choi, Joon-Ho;Kang, Jung-Wook;Cho, Won-Tae;Park, Sang-Gi;Lee, Yong-Hyun;Choi, Eun-Ha;Cho, Guang-Sup;Kwon, Gi-Chung
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.309-309
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    • 2010
  • We have investigated the effect of $H_2$ plasma treatment on the BZO (ZnO:B, Boron doped ZnO) thin films. The BZO thin films are prepared by LP-MOCVD (Low Pressure Metal Organic Chemical Vapor Deposition) technique and the samples of BZO thin film are performed with $H_2$ plasma treatment by plasma treatment system with 13.56 MHz as RIE (Reactive Ion Etching) type. After exposing $H_2$ plasma treatment, measurement of transmittance, reflectance and haze spectra in 300~1100 nm, electrical properties as resistivity, mobility and carrier concentration and work function was analysed. Regarding the results of the $H_2$ plasma treatment on the BZO thin films are application to the TCO for solar cells, such as the a-Si thin films solar cell.

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광통신 모듈용 분포 귀환형 InGaAsP/InP 레이저 다이오드 제작 및 소자 특성평가 (Fabrication process and device characterization of distributed feedback InGaAsP/InP laser diodes for optical fiber communication module)

  • 전경남;김근주
    • 반도체디스플레이기술학회지
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    • 제10권4호
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    • pp.131-138
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    • 2011
  • We fabricated distributed feedback InGaAsP/InP laser diodes for optical fiber communication module and characterized the lasing properties in continuous wave operation. The active layer of 7-period InGaAsP(1.127 eV)/InGaAsP(0.954 eV) multi-quantum well structure was grown by the metal-organic chemical vapor deposition. The grating for waveguide was also fabricated by the implementation of the Mach-Zehender holographic method of two laser beams interference of He- Cd laser and the fabricated laser diode has the dimension of the laser length of $400{\mu}m$ and the ridge width of $1.2{\mu}m$. The laser diode shows the threshold current of 3.59 mA, the threshold voltage of 1.059 V. For the room-temperature operation with the current of 13.54 mA and the voltage of 1.12 V, the peak wavelength is about 1309.70 nm and optical power is 13.254 mW.

Electrical and Optical Characteristics of Isoelectronic Al-doped GaN Films

  • Lee, Jae-Hoon;Ko, Hyun-Min;Park, Jae-Hee;Hahm, Sung-Ho;Lee, Jung-Hee
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2002년도 추계학술대회 발표 논문집
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    • pp.81-84
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    • 2002
  • The effects of the isoelectronic AI-doping of GaN grown by metal organic chemical vapor deposition were investigated for the first time using scanning electron microscopy (SEM), Hall measurements, photoluminescence (PL), and time-resolved PL. When a certain amount of Al was incorporated into the GaN films, the room temperature photoluminescence intensity of the films was approximately two orders larger than that of the undoped GaN. More importantly, the electron mobility significantly increased from 130 for the undoped sample to $500\textrm{cm}^2/Vs$ for the sample grown at a TMAl flow rate of $10{\mu}mol/min$, while the unintentional background concentration only increased slightly relative to the TMAl flow. The incorporation of Al as an isoelectronic dopant into GaN was easy during MOCVD growth and significantly improved the optical and electrical properties of the film. This was believed to result from a reduction in the dislocation-related non-radiative recombination centers or certain other defects due to the isoelectronic Al-doping.

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Growth and Characterization of Vertically Aligned ZnO nanowires with different Surface morphology

  • Das, S.N.;Choi, J.H.;Kar, J.P.;Myoung, J.M.
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2009년도 춘계학술발표대회
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    • pp.35.1-35.1
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    • 2009
  • Vertically aligned zinc oxide (ZnO) nanorods (NRs) with different surface morphology were grown by metal organic chemical vapor deposition (MOCVD) on sapphire substrate. The films thus prepared were characterized by measuring X-ray diffraction (XRD), Scanning electron microscopy (SEM) and Transmission electron microscopy (TEM) studies. To study the effect of surface morphology on wettability, the contact angle (CA) of water was measured. It was demonstrated that the CA of the deposited ZnO NRs varied between $104^{\circ}$ and $135^{\circ}$ depending upon the surface morphology. Variable temperature photoluminescence (PL) have employed to probe the exciton recombination in high density and vertically aligned ZnO Nanorod arrays. The low-temperature PL characterizes the dominant near-band-edge excitonic emissions from such nanorod arrays.

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화학증착법으로 제조한 실리카/알루미나 복합막의 기체분리특성과 stability에 관한 연구

  • 김성일;하홍용;남석우;홍성안;김인원
    • 한국막학회:학술대회논문집
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    • 한국막학회 1997년도 춘계 총회 및 학술발표회
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    • pp.27-28
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    • 1997
  • 최근 들어 분리공정의 발달과 산업의 고도화에 따라 기체 및 액체분리의 중요성이 강조되면서 열적, 화학적 그리고 기계적 안정성이 좋으며, 수명이 길고, 세척과 재생이 용이하며, 미생물에 의한 손상이 없는 무기막에 대한 연구가 진행중이다. 무기막은 기공의 크기에 따라 크게 다공성 막과 비다공성 막의 두 종류로 구분된다. 비다공성 금속막은 특정 기체에만 투과성을 가지며, 이때 기체는 용해-확산(solution-diffusion)기구에 의해 금속막을 투과하므로 특정기체에 대한 선택도는 매우 크나 투과도가 매우 작고 가격이 비싼 단점을 가지고 있다. 다공성 막은 기체 투과율이 큰 반면 기체 선택도가 작은 단점을 가지고 있다. 현재 기체분리에 사용되고 있는 무기막은 기공크기가 40${\AA}$ 이상으로 기체 분리가 Kundsen diffusion에 의해 이루어지므로, 기체 투과도는 큰 반면에 기체에 대한 선택도는 그리 크지 않다. 따라서 최근 들어서는 다공성 담체에 기공이 작은 ($d_{pore}<20{\AA}$)박막을 담지시켜 기체의 분리 선택도를 향상시키기 위한 연구가 활발히 이루어지고 있다. 본 연구에서는 유기금속 화학증착법(metal-organic chemical vapor deposition:MOCVD)을 이용하여 수소 선택성을 가지는 $SiO_2/Al_2O_3$ 복합막을 비율별로 제조하여 증착속도를 알아보고, 열과 수분에 노출시켜 박막의 기체투과도 변화를 살펴보았다.

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$SnO_2$ 박막 특성에 미치는 annealing 효과 (Annealing Effect on $SnO_2$ Thin Films Properties)

  • 박경희;서용진;이우선;박진성
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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    • pp.99-102
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    • 2003
  • Tin dioxide thin films were deposited at $375^{\circ}C$ on alumina substrate by metal-organic chemical vapor deposition process to find the relationship between physicochemical properties and the annealing treatments. The small grains with heat treatments grew to the bunch of grains and then showed the hillocks on the film surface. The thickness decreased with annealing treatment. The measured binding energy (BE) and branching ratio of the Sn 3d spin-orbital doublet were typical of oxidized states of Sn and the BE of the O1s core level of about 530~530.65eV also confirmed the presence of O-Sn bonds. The BE of oxygen and tin with annealing treatment shifted to higher position. O/Sn atomic ratios of films deposited at $375^{\circ}C$ for 2min and 4min were 1.99 and 2.01, respectively. The value of the atomic ratio O/Sn of films deposited at $375^{\circ}C$ for 2min changed from 1.99 to 2.45 with annealing treatment. Gas sensitivity depended on annealing temperature, the sensitivity increased with increasing annealing temperature.

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Optical properties of the $O_2$ plasma treatment on BZO (ZnO:B) thin films for TCO of a-Si solar cells

  • Yoo, Ha-Jin;Son, Chang-Gil;Cho, Won-Tea;Park, Sang-Gi;Choi, Eun-Ha;Kwon, Gi-Chung
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.454-454
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    • 2010
  • In order to achieve a high efficient a-Si solar cell, the TCO (transparent conductive oxide) substrates are required to be a low sheet resistivity, a high transparency, and a textured surface with light trapping effect. Recently, a zinc oxide (ZnO) thin film attracts our attention as new coating material having a good transparent and conductive for TCO of solar cells. In this paper the optical properties of $H_2$ post-treated BZO (boron doped ZnO, ZnO:B) thin film are investigated with $O_2$-plasma treatment. The BZO thin films by MOCVD (Metal Organic Chemical Vapor Deposition) are investigated and the samples of $H_2$ post-treated BZO thin film are tested with $O_2$-plasma treatment by plasma treatment system with 13.56 MHz as RIE (Reactive Ion Etching) type. We measured the optical properties and surface morphology of BZO thin film with and without $O_2$-plasma treatment. The optical properties such as transmittance, reflectance and haze are measured with integrating sphere and ellipsometer. This result of the BZO thin film with and without $O_2$-plasma treatment is application to the TCO for solar cells.

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Preparation and characterization of TiO2 anti-reflective layer for textured Si (100)

  • 최진우;남상훈;조상진;부진효
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.322-322
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    • 2010
  • Recently, anti-reflective films (AR) are one of the most studied parts of a solar cell since these films improve the efficiency of photovoltaic devices. Also, anti-reflection films on the textured silicon solar cells reduce the amount of reflection of the incident light, which improves the device performance due to light trapping of incident light into the cell. Therefore, we preformed two step processes to get textured Si (100) substrate in this experiment. Pyramid size of textured silicon had approximately $2{\sim}9\;{\mu}m$. A well-textured silicon surface can lower the reflectance to 10%. For more reduced reflection, TiO2 anti-reflection films on the textured silicon were deposited at $600^{\circ}C$ using titanium tetra-isopropoxide (TTIP) as a precursor by metal-organic chemical vapor deposition (MOCVD), and the deposited TiO2 layers were then treated by annealing for 2 h in air at 600 and $1000^{\circ}C$, respectively. In this process, the treated samples by annealing showed anatase and rutile phases, respectively. The thickness of TiO2 films was about $75{\pm}5\;nm$. The reflectance at specific wavelength can be reduced to 3% in optimum layer.

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Butt-coupled DBR-LD제작 및 동작특성 (Fabrication and lasing characteristics of tunable Butt-coupled DBR-LD)

  • 오수환;이철욱;김기수;이지면;고현성;박상기;박문호
    • 한국광학회지
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    • 제14권3호
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    • pp.327-330
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    • 2003
  • 본 논문에서는 도파로층이 1.3 $\mu\textrm{m}$ InGaAsP긴 파장 가변 BT(butt-coupled)-DBR(distributed bragg reflector)-LD(laser diode)를 제작하고, 특성을 측정하였다. Butt 결합 성장면의 성장조건을 건식식각과 선택식각 방법과 MOCVD(metal organic chemical vapor deposition)성장으로 최적화 한 후 활성층과 도파로층의 결합 효율을 측정한 결과 결합 효율이 85% 이상으로 나타났으며, 제작된 BT-DBR-LD에 연속전류를 인가 했을 때, 평균 임계전류는 약 21 ㎃, 최대 광출력이 25 ㎽ 이상으로 나타났다. 또한 위상제어 영역과 DBR영역에 각각 25㎃와 50 ㎃의 전류를 주입하여도 급격한 광출력 변화와 포화현상이 나타나지 않았다 이때 최대 파장 가변 폭은 7.4 nm, SMSR비는 40 ㏈이상으로 나타났다.

유기금속화학기상증착법을 이용한 적층 InAs 양자점 적외선 수광소자 성장 및 특성 평가 연구 (Study of Multi-stacked InAs Quantum Dot Infrared Photodetectors Grown by Metal Organic Chemical Vapor Deposition)

  • 김정섭;하승규;양창재;이재열;박세훈;최원준;윤의준
    • 한국진공학회지
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    • 제19권3호
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    • pp.217-223
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    • 2010
  • 유기금속화학기상증착법으로 적층 InAs/$In_{0.1}Ga_{0.9}As$ DWELL (dot-in-a-well) 구조를 성장하여 n-i-n 구조의 적외선 수광소자를 제작하였으며, PL (photoluminescence) 발광 특성 및 암전류 특성을 분석하였다. 동일한 조건으로 양자점을 적층하였을 때 크기 및 밀도의 변화에 의한 이중 PL peak을 관찰하였으며, TMIn의 유량을 조절함으로써 단일 peak을 갖는 균일한 크기의 양자점 적층 구조를 성장할 수 있었다. 적외선 수광소자 구조를 성장함에 있어서, 상부의 n-형 GaAs의 성장 온도가 600도 이상인 경우 PL 발광 세기가 급격히 감소하였고 이에 따른 암전류의 증가를 관찰하였다. 0.5 V 인가 전압에서 암전류의 온도 의존성에 대한 활성화 에너지의 크기는 성장온도가 580도인 경우 106 meV이고, 650도의 경우는 48 meV로 급격이 낮아졌다. 이는 고온의 성장 온도에 의한 InAs 양자점과 $In_{0.1}Ga_{0.9}As$ 양자우물구조 계면에서의 열적 상호 확산에 의하여 비발광 천이가 증가되었기 때문이다.