• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제50권6호
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• pp.303-306
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• 2001

STFR were fabricated on the floating membrane which was formed by SOI-micromachining process. The floating membranes having a thickness range of $3{\sim}15{\mu}m$ could be simply formed by micromachining the directly-bonded and thinned SOI substrate. The STFR device fabricated on the $15{\mu}m$-thick membrane showed resonance frequency of fr = 1.65 GHz, coupling coefficient of Keff2 = 2.4 %, and series and parallel quality factors of Qs = 91.7 and Qp = 87.7, respectively.

• 센서학회지
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• 제30권1호
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• pp.10-14
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• 2021

Wet etching is more economical than dry etching and provides a uniform etching depth regardless of wafer sizes. Typically, potassium hydroxide (KOH) and tetra-methyl-ammonium hydroxide (TMAH) solutions are widely used for the wet etching of silicon. However, there is a limit to the wet etching process when a material deposited on an unetched surface reacts with an etching solution. To solve this problem, in this study, an apparatus was designed and manufactured to physically block the inflow of etchants on the surface using a rubber O-ring. The proposed apparatus includes a heater and a temperature controller to maintain a constant temperature during etching, and the hydrostatic pressure of the etchant is considered for the thin film structure. A corrugation membrane with a diameter of 800 ㎛, thickness of 600 nm, and corrugation depth of 3 ㎛ with two corrugations was successfully fabricated using the prepared device.

• Korean Chemical Engineering Research
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• 제55권2호
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• pp.214-219
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• 2017

본 연구에서는 블록공중합체의 자기조립(Self-assembly) 성질과 상전이를 통한 비대칭의 다공성 구조를 형성하는 NIPS 기술을 결합한 SNIPS (Self-assembly and non-solvent induced phase separation) 공정을 이용하여 PS-b-P4VP 블록공중합체 분리막을 제조하였다. 기존의 연구는 단순히 원하는 구조 구현에만 집중되었고 SNIPS 공정상의 내재 변수(농도, 증발시간, 용매의 조성, 습도)들에 대한 체계적인 연구는 보고되지 않았다. 본 연구에서는 PS-b-P4VP 와 DMF, 1,4-Dioxane, THF, DI를 이용해 내재 변수의 영향을 정성적으로 분석하였다. 그 결과, 용액의 농도와 휘발성 용매의 비율이 적당하고 습도가 낮은 환경에서 모폴로지가 최적화 되었으며, PS-b-P4VP 분리막은 표면에 잘 구현된 실린더 구조가 형성되었고 75%의 높은 기공도와 약 18%의 표면 기공도를 가지는 것을 확인하였다.

• 센서학회지
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• 제24권6호
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• pp.379-384
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• 2015

An infrared image sensor is a core device in a thermal imaging system. The fabrication method of a focal plane array (FPA) is a key technology for a high resolution infrared image sensor. Each pixels in the FPA have $Si_3N_4/SiO_2$ membranes including legs to deposit bolometric materials and electrodes on Si readout circuits (ROIC). Instead of polyimide used to form a sacrificial layer, the feasibility of an amorphous silicon (${\alpha}-Si$) was verified experimentally in a $8{\times}8$ micro-bolometer array with a $50{\mu}m$ pitch. The elimination of the polyimide sacrificial layer hardened by a following plasma assisted deposition process is sometimes far from perfect, and thus requires longer plasma ashing times leading to the deformation of the membrane and leg. Since the amorphous Si could be removed in $XeF_2$ gas at room temperature, however, the fabricated micro-bolomertic structure was not damaged seriously. A radio frequency (RF) sputtered nickel oxide film was grown on a $Si_3N_4/SiO_2$ membrane fabricated using a low stress silicon nitride (LSSiN) technology with a LPCVD system. The deformation of the membrane was effectively reduced by a combining the ${\alpha}-Si$ and LSSiN process for a nickel oxide micro-bolometer.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 추계학술대회 논문집
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• pp.498-501
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• 2005

Photonic crystals, periodic structure with a high refractive index contrast modulation, have recently become very interesting platform for manipulation of light. The existence of a photonic bandgap, a frequency range in which propagation of light is prevented in all direction, makes photonic crystal very useful in application where spatial localization of light is required for waveguide, beam splitter, and cavity. But fabrication of 3 dimensional photonic crystal is still difficult process. a concept that has recently attracted a lot of attention is a planar photonic crystal based on a dielectric membrane, suspended in the air, and perforated with 2 dimensional lattice of hole. We show that the polymer slabs suspended in air with triangular lattice of air hole can exhibit the in-plane photonic bandgap for TE-like modes. The fabrication of Si master with pillar structure using hot embossing process was investigated for 2 dimensional low-index-contrast photonic crystal waveguide.

• 센서학회지
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• 제31권6호
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• pp.366-370
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• 2022

A 12 ㎛ pixel-sized 360 × 240 microbolometer focal plane array (MBFPA) was fabricated using a complementary metaloxide-semiconductor (CMOS)-compatible process. To release the MBFPA membrane, an amorphous carbon layer (ACL) processed at a low temperature (<400 ℃) was deposited as a sacrificial layer. The thermal time constant of the MBFPA was improved by using serpentine legs and controlling the thickness of the SiNx layers at 110, 130, and 150 nm on the membrane, with response times of 6.13, 6.28, and 7.48 msec, respectively. Boron-doped amorphous Si (a-Si), which exhibits a high-temperature coefficient of resistance (TCR) and CMOS compatibility, was deposited on top of the membrane as an IR absorption layer to provide heat energy transformation. The structural stability of the thin SiNx membrane and serpentine legs was observed using field-emission scanning electron microscopy (FE-SEM). The fabrication yield was evaluated by measuring the resistance of a representative pixel in the array, which was in the range of 0.8-1.2 Mohm (as designed). The yields for SiNx thicknesses of SiNx at 110, 130, and 150 nm were 75, 86, and 86%, respectively.

• 제어로봇시스템학회논문지
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• 제14권5호
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• pp.420-425
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• 2008

PMMA light guiding plate with nano-sized pattern was fabricated using anodized aluminum oxide membrane as a template for nano imprint lithography. Nano-sized pore arrays were prepared by the self-organization processes of the anodic oxidation using the aluminum plate with 99.999% purity. Since the aluminum plate has a rough surface, the aluminum plate with thickness of 1mm was anodized after the pre-treatments of chemical polishing, and electrochemical polishing. The surface morphology of the alumina obtained by the first anodization process was controlled by the concentration of electrochemical solution during the first anodization. The surface morphology of the alumina was also changed according to temperature of the solution during chemical polishing performed after first anodization. The pore widening process was employed for obtaining the one-channel with flat surface and height of the channel because the pores of the alumina membrane prepared by the fixed voltage method shows the structure of two-channel with rough surface. It is shown from SPM results that the nano-sized pattern on PMMA light guiding plate fabricated by nano imprint lithography method was well transferred from that of anodized aluminum oxide template.

• 한국재료학회지
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• 제33권2호
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• pp.71-76
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• 2023

The electroconvection generated on the surface of an ion exchange membrane (IEM) is closely related to the electrical/chemical characteristics or topology of the IEM. In particular, when non-conductive regions are mixed on the surface of the IEM, it can have a great influence on the transfer of ions and the formation of nonlinear electroconvective vortices, so more theoretical and experimental studies are necessary. Here, we present a novel method for creating microscale non-conductive patterns on the IEM surface by laser ablation, and successfully visualize microscale vortices on the surface modified IEM. Microscale (~300 ㎛) patterns were fabricated by applying UV nanosecond laser processing to the non-conductive film, and were transferred to the surface of the IEM. In addition, UV nanosecond laser process parameters were investigated for obvious micro-pattern production, and operating conditions were optimized, such as minimizing the heat-affected zone. Through this study, we found that non-conductive patterns on the IEM surface could affect the generation and growth of electroconvective vortices. The experimental results provided in our study are expected to be a good reference for research related to the surface modification of IEMs, and are expected to be helpful for new engineering applications of electroconvective vortices using a non-conductive patterned IEM.

• 센서학회지
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• 제9권3호
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• pp.177-181
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• 2000

턴널링 전류는 전극사이의 거리에 지수적으로 비례한다. 따라서 턴널링 전류의 변화측정을 통하여 전극간격의 미세변위를 측정할 수 있다. 본 실험에서는 micro-tip과 membrane사이에 턴널링 전류가 흐르는 피라미드형 실리콘 턴널링소자를 micro-electro-mechanical systems (MEMS) 공정을 이용하여 제조하였다. 단결정 실리콘을 KOH 용액안에서 이방성 에칭 시켜 micro-tip을 제조하였으며, 이때 $SiO_2$막을 마스크로 사용하였다 $Si_3N_4$막으로 membrane을 형성하였다. 마스크 방향에 따른 에칭 진행과정의 차이를 조사하였으며 membrane으로 사용한 $Si_3N_4$막의 stiffness를 측정하였다. 실험으로 측정하기 어려운 영역의 $Si_3N_4$막 stiffness 예측을 위한 모델식을 제시하였다.

• 한국표면공학회지
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• 제54권1호
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• pp.25-29
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• 2021

The fabrication of nanopore membrane by deposition of Al2O3 film using electron-beam evaporation, which is fast, cost-effective, and negligible dependency on substance material, is investigated for potential applications in water purification and sensors. The decreased nanopore diameter owing to increased wall thickness is observed when Al2O3 film is deposited on anodic aluminum oxide membrane at higher deposition rate, although the evaporation process is generally known to induce a directional film deposition leading to the negligible change of pore diameter and wall thickness. This behavior can be attributed to the collision of evaporated Al2O3 particles by the decreased mean free path at higher deposition rate condition, resulting in the accumulation of Al2O3 materials on both the surface and the edge of the wall. The reduction of nanopore diameter by Al2O3 film deposition can be applied to the nanopore membrane fabrication with sub-100 nm pore diameter.