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http://dx.doi.org/10.46670/JSST.2021.30.1.10

Development of apparatus for Single-sided Wet Etching and its applications in Corrugated Membrane Fabrication  

Kim, Junsoo (Department of Mechanical Engineering, Pohang University of Science and Technology)
Moon, Wonkyu (Department of Mechanical Engineering, Pohang University of Science and Technology)
Publication Information
Journal of Sensor Science and Technology / v.30, no.1, 2021 , pp. 10-14 More about this Journal
Abstract
Wet etching is more economical than dry etching and provides a uniform etching depth regardless of wafer sizes. Typically, potassium hydroxide (KOH) and tetra-methyl-ammonium hydroxide (TMAH) solutions are widely used for the wet etching of silicon. However, there is a limit to the wet etching process when a material deposited on an unetched surface reacts with an etching solution. To solve this problem, in this study, an apparatus was designed and manufactured to physically block the inflow of etchants on the surface using a rubber O-ring. The proposed apparatus includes a heater and a temperature controller to maintain a constant temperature during etching, and the hydrostatic pressure of the etchant is considered for the thin film structure. A corrugation membrane with a diameter of 800 ㎛, thickness of 600 nm, and corrugation depth of 3 ㎛ with two corrugations was successfully fabricated using the prepared device.
Keywords
Single-sided wet etching; KOH wet etching; Corrugated membrane;
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