Journal of Korean Society of Environmental Engineers
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v.27
no.3
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pp.330-336
/
2005
The ozone injection method was proposed to improve the catalytic process for the removal of nitrogen oxides ($NO_x$). Nitric oxide (NO) in the exhaust gas was first oxidized to nitrogen dioxide ($NO_2$) by ozone produced by dielectric barrier discharge, and then the exhaust gas containing the mixture of NO and $NO_2$ was directed to the catalytic reactor where both NO and $NO_2$ were reduced to $N_2$ in the presence of ammonia as the reducing agent. A commercially available $V_2O_5-WO_3/TiO_2$ catalyst was used as the catalytic reactor. The $NO_2$ content in the mixture of NO and $NO_2$ was changed by the amount of ozone added the exhaust gas. The effect of reaction temperature, initial $NO_x$ concentration, feed gas flow rate, and ammonia concentration on the removal of $NO_x$ at various $NO_2$ contents was examined and discussed. The increase in the content of $NO_2$ by the ozone injection remarkably improved the performance of the catalytic reactor, especially at low temperatures. The present ozone injection method appears to be promising for the improvement of the catalytic reduction of $NO_x$.
Kim, Dae-Min;Han, Yoon-Soo;Kim, Seongwon;Oh, Yoon-Suk;Lim, Dae-Soon;Kim, Hyung-Tae;Lee, Sung-Min
Journal of the Korean Ceramic Society
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v.52
no.6
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pp.410-416
/
2015
Recently, a new $Y_2O_3$ coating deposited using the EB-PVD method has been developed for erosion resistant applications in fluorocarbon plasma environments. In this study, surface crack formation in the $Y_2O_3$ coating has been analyzed in terms of residual stress and elastic modulus. The coating, deposited on silicon substrate at temperatures higher than $600^{\circ}C$, showed itself to be sound, without surface cracks. When the residual stress of the coating was measured using the Stoney formula, it was found to be considerably lower than the value calculated using the elastic modulus and thermal expansion coefficient of bulk $Y_2O_3$. In addition, amorphous $SiO_2$ and crystalline $Al_2O_3$ coatings were similarly prepared and their residual stresses were compared to the calculated values. From nano-indentation measurement, the elastic modulus of the $Y_2O_3$ coating in the direction parallel to the coating surface was found to be lower than that in the normal direction. The lower modulus in the parallel direction was confirmed independently using the load-deflection curves of a micro-cantilever made of $Y_2O_3$ coating and from the average residual stress-temperature curve of the coated sample. The elastic modulus in these experiments was around 33 ~ 35 GPa, which is much lower than that of a sintered bulk sample. Thus, this low elastic modulus, which may come from the columnar feather-like structure of the coating, contributed to decreasing the average residual tensile stress. Finally, in terms of toughness and thermal cycling stability, the implications of the lowered elastic modulus are discussed.
The adsorption properties of the activated carbon-based adsorbents were studied to remove COS emitted from $SO_2$ catalytic reduction process on the integrated gasification combined cycle (IGCC) system in this work. Transition metal supported catalysts and mixed metal oxide catalysts were used for the $SO_2$ catalytic reduction. The mechanism of COS produced from the $SO_2$ reduction and the COS concentration s according to the reaction temperature were investigated. In this study, an activated carbon and a modified activated carbon doped with KOH were used to remove the very low concentration of COS effectively. The adsorption rate and the breakthrough time of COS were measured by a thermo gravity analyzer (TGA, Cahn Balance) and a fixed bed flow reactor equipped with GC-pulsed flammable photometric detector (PFPD), respectively. It was confirmed that the COS breakthrough time of the activated carbon doped with KOH was longer than that of an activated carbon. In conclusion, the modified-activated carbon having a high surface area showed a high adsorption rate of COS produced from the $SO_2$ reduction.
In the browning reaction of Korean ginseng, it appears that enzymatic and non-enzymatic browning reaction occurred In initial stage of steaming fresh ginseng at low temperature, and then non-enzymatic browning reaction followed in the drying period after steaming. Browning reaction of red ginseng occurred between $60{\sim}90$ min of steaming at $100^{\circ}C$, and browning pigments of red ginseng were mostly water soluble substances. The structural characteristics of water soluble browning reaction products(WS-BRPs) isolated from Korean red ginseng were showed the presence of hydroxyl, amide carbonyl and aliphatic methane groups. From sugar analysis it was identified that L and S-1, melanoidins isolated from red ginseng, contained two kinds of sugars, glucose and xylose, and the other melanoidin S-2 contained the previous and fructose. In order to find out pertinent methods for the acceleration of browning during ginseng processing, various treatment were made on fresh ginseng with sugars, amino acids and inorganic nitrogenous compounds and the extent of browning was measured. Among sugar tested, maltose resulted in the greatest acceleration of browning followed in decreasing order by glucose and lactose, whereas pentoses, fructose, sucrose and raffinose had negligible effect. A marked browning occurred in ginseng treated with basic amino acids, while the extent of browning was not greatly increased when ginseng was treated with aliphatic amino acids, hydroxyl amino acids, or acidic amino acids. The brown color intensity gradually increased with an increase of glucose concentration far up to 0.5M. L, S-1, and S-2 were found to have an ability to donate hydrogen to DPPH, and also they had anti-oxidative activity in the experiments of hydrogen peroxide scavenging, inhibitory activity in the formation of MDA from linoleic acid, auto oxidation of ok-brain homogenates, lipid peroxidation by the enzymatic and non-enzymatic system in liver microsome fraction, and mitochondrial fraction etc. The amounts of acidic polysaccharide(AP) in red ginseng were higher than those of wild and cultured Panax quinquefolius, Panax notoginseng as well as white ginseng (Panax ginseng). In white ginseng, the AP amount is no difference in root ages or sizes, also, the AP amount of ginseng body was similar to that of rhizome, but was higher than that of leaf and epidermis. Addition of red ginseng acidic polysaccharide(RGAP) increased production of nitric oxide(NO) and tumor necrosis factor (TNF)-$\alpha$ in the rodent macrophage cultures, and treatment of RGAP in vivo stimulated tumoricidal activities of natural killer (NK) cells.
The wooden armor frame and various lacquerware artifacts excavated from the low swamp remains in Imdang, Gyeongsan have very weak material and lacquer coating; in case they are exposed in the air, they are likely to be shrunken and deformed immediately. The wooden armor frame has large size and it might be dissolved during freeze-drying. The lacquer coating of lacquerware blocks the penetration of chemicals and it is very likely to swell or peel off during the treatment. Therefore, to prevent the dissolution during vacuum freeze-drying, the wooden armor frame was replaced with t-butanol and impregnated in t-butanol solution with PEG#3, 350 43%, and lacquerware was impregnated in PEG#3, 350 40% solution at room temperature and freeze-dried. According to the analysis of the lacquer fragment from the lacquerware, the lid and the mounted cup was pasted with the mixture of lacquer and black pigment (soot) on the base layer after the first coating and pasted two or three times more with natural lacquer; the red lacquered wooden cup was pasted with the mixture of lacquer and black pigment on the base layer and pasted once on the middle layer. The top lacquer (red) was pasted with the mixture of iron oxide(Fe2O3).
Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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2008.06a
/
pp.236-236
/
2008
(Bi,La)$Ti_3O_{12}$(BLT) thin film is one of the most attractive materials for ferroelectric random access memory (FRAM) applications due to its some excellent properties such as high fatigue endurance, low processing temperature, and large remanent polarization [1-2]. The authors firstly investigated and reported the damascene process of chemical mechanical polishing (CMP) for BLT thin film capacitor on behalf of plasma etching process for fabrication of FRAM [3]. CMP process could prepare the BLT capacitors with the superior process efficiency to the plasma etching process without the well-known problems such as plasma damages and sloped sidewall, which was enough to apply to the fabrication of FRAM [2]. BLT-CMP characteristics showed the typical oxide-CMP characteristics which were related in both pressure and velocity according to Preston's equation and Hernandez's power law [2-4]. Good surface roughness was also obtained for the densification of multilevel memory structure by CMP process [3]. The well prepared BLT capacitors fabricated by CMP process should have the sufficient ferroelectric properties for FRAM; therefore, in this study the electrical properties of the BLT capacitor fabricated by CMP process were analyzed with the process parameters. Especially, the effects of CMP pressure, which had mainly affected the removal rate of BLT thin films [2], on the electrical properties were investigated. In order to check the influences of the pressure in eMP process on the ferroelectric properties of BLT thin films, the electrical test of the BLT capacitors was performed. The polarization-voltage (P-V) characteristics show a decreased the remanent polarization (Pr) value when CMP process was performed with the high pressure. The shape of the hysteresis loop is close to typical loop of BLT thin films in case of the specimen after CMP process with the pressures of 4.9 kPa; however, the shape of the hysteresis loop is not saturated due to high leakage current caused by structural and/or chemical damages in case of the specimen after CMP process with the pressures of 29.4 kPa. The leakage current density obtained with positive bias is one order lower than that with negative bias in case of 29.4 kPa, which was one or two order higher than in case of 4.9 kPa. The high pressure condition was not suitable for the damascene process of BLT thin films due to the defects in electrical properties although the better efficiency of process. by higher removal rate of BLT thin films was obtained with the high pressure of 29.4 kPa in the previous study [2].
Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
/
2008.06a
/
pp.169-169
/
2008
To keep pace with scaling trends of CMOS technologies, high-k metal oxides are to be introduced. Due to their high permittivity, high-k materials can achieve the required capacitance with stacks of higher physical thickness to reduce the leakage current through the scaled gate oxide, which make it become much more promising materials to instead of $SiO_2$. As further studying on high-k, an understanding of the relation between the etch characteristics of high-k dielectric materials and plasma properties is required for the low damaged removal process to match standard processing procedure. There are some reports on the dry etching of different high-k materials in ICP and ECR plasma with various plasma parameters, such as different gas combinations ($Cl_2$, $Cl_2/BCl_3$, $Cl_2$/Ar, $SF_6$/Ar, and $CH_4/H_2$/Ar etc). Understanding of the complex behavior of particles at surfaces requires detailed knowledge of both macroscopic and microscopic processes that take place; also certain processes depend critically on temperature and gas pressure. The choice of $BCl_3$ as the chemically active gas results from the fact that it is widely used for the etching o the materials covered by the native oxides due to the effective extraction of oxygen in the form of $BCl_xO_y$ compounds. In this study, the surface reactions and the etch rate of $Al_2O_3$ films in $BCl_3/Cl_2$/Ar plasma were investigated in an inductively coupled plasma(ICP) reactor in terms of the gas mixing ratio, RF power, DC bias and chamber pressure. The variations of relative volume densities for the particles were measured with optical emission spectroscopy (OES). The surface imagination was measured by AFM and SEM. The chemical states of film was investigated using X-ray photoelectron spectroscopy (XPS), which confirmed the existence of nonvolatile etch byproducts.
Cho Young-Keun;Song Young-Jun;Lee Gye-Seung;Shin Kang-Ho;Kim Hyung-Seok;Kim Yun-Che;Cho Dong-Sung
Resources Recycling
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v.12
no.1
/
pp.33-40
/
2003
Mn was extracted by using a nitric acid from the reduced ferromanganese dust and the basic experiments were taken to refine the manganese nitrate solution by means of precipitation of Ca, Mg oxalate. The dust was generated in AOD process producing a medium-low carbon ferromanganese and collected in the bag filter. Manganese oxide content in the dust was about 90% and its phase was confirmed as $Mn_3$$O_4$. $Mn_3$$O_4$ in the dust was reduced to MnO by roasting with activated charcoal. The main impurities in the extracted solution prepared by leaching the reduced dust with nitric acid were Na, K, Fe, Si, Ca, Mg etc. Among them, Fe was removed by controlling pH of the solution more than 4 and precipitating $Fe(OH)_3$, simultaneously silicious material solved in the solution was removed by co-precipitation with the ferric hydroxide. Addition of 150 g reduced dust into 4N HNO3 solution 1$\ell$ was appropriate to control the pH of the solution to pH 4. To differ greatly the solubilities of manganese oxalate and calcium or magnesium oxalate in a solution containing a high concentration of Mn, pH of 4 or less and addition of ($NH_4$)$_2$$C_2$$O_4$ in equivalent with Ca and Mg are recommended. At this time, the higher temperature was the shorter the precipitation reaction time was needed.
Journal of the Korea Academia-Industrial cooperation Society
/
v.12
no.11
/
pp.5376-5383
/
2011
The objective of this study is the development of carbon-recycle technology, that converts carbon dioxide captured from flue gas to carbon monoxide or carbon for reuse in industrial fields. It is difficult to decompose $CO_2$ because $CO_2$ is very stable molecule. And then metal oxide was used as an activation agent or catalyst for the decomposition of $CO_2$ at low temperature. Metal oxides, which converts $CO_2$ to CO or C, were prepared using Ni-ferrite by solid state method and hydrothermal synthesis in this study. TPR/TPO and TGA were used as an analysis method to analyze the decomposition characteristics of $CO_2$. As the results, the reduction area of $H_2$ was high value at 15 wt% of NiO and the decomposition area of $CO_2$ was superior capacity at 5 wt% of NiO. However, TGA data showed contrary results that reduction area of $H_2$ was 28.47wt% and oxidation area by $CO_2$ was 26.95wt% at 2.5 wt% of NiO, one of the Ni-ferrite powders synthesized using solid state method. $CO_2$ decomposition efficiency was 94.66% and it is excellent results in comparison with previous studies.
Journal of the Korea Academia-Industrial cooperation Society
/
v.12
no.11
/
pp.5357-5364
/
2011
The objective of this study is development of carbon recycle technology which convert carbon dioxide captured from flue gas to carbon monoxide or carbon and reuse in industrial fields. Since carbon dioxide is very stable and difficult to decompose, metal oxide was used as activation agent for the decomposition of carbon dioxide at low temperature. Metal oxides which convert $CO_2$ to CO or carbon were prepared using Ba-ferrite by solid and hydrothermal synthesis. TPR/TPO and TGA were used in this study. The results of TPR by H2 and TPO by $CO_2$ showed that Ba-ferrite powders synthesized by hydrothermal method were better than those by solid method. TGA showed contrary results that reduction of Ba-ferrite powders synthesized using solid method by $H_2$ was 21.96 wt%, oxidation by $CO_2$ was 21.24 wt% and 96.72 wt% of $CO_2$ decomposition efficiency showing excellent oxidation-reduction characteristics at $500^{\circ}C$.
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