• Title/Summary/Keyword: low-temperature oxide

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A Study on the Drag Reduction for Performance the Improvement of Low Temperature Utilization Systems (저온 활용 시스템의 효율 제고를 위한 마찰 저항 감소 연구)

  • Chun, Won-Gee;Kim, Chul-Am;Sung, Jun-Hee;Choi, Hyoung-Jin;Kim, Chong-Bo;Kim, Hyung-Taek
    • Solar Energy
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    • v.17 no.4
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    • pp.13-22
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    • 1997
  • Drag reduction produced by the dilute solution of polymer under turbulent flow in a rotating disk apparatus(RDA) was investigated in this study for the purpose of potential application to the Ocean Thermal Energy Conversion(OTEC) system. Four different molecular weights of poly(ethylene oxide)(PEO) were used as drag reducing additives, and synthetic seawater was adopted as a solvent. Experiments were undertaken to observe the dependence of drag reduction on various factors such as polymer molecular weight, polymer concentration and the rotating speed of the disk. The concentration dependence on the drag reduction of this polymer system was shown to obey an empirical drag reduction equation of the Virk's universal correlation.

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Studies on the Photo-Electrochemical Properties of Ti$O_2$-x Thin Films Prepared by Air Oxidation and Water Vapor Oxidation (공기 산화와 수증기 산화에 의해 제조된 Ti$O_2$-x박막의 광전기화학적 성질에 관한 연구)

  • Choi Yong-Kook;Jo, Gi Hyeong;Choi Q-Won;Oh Jeong-Geun;Seong Jeong-Sub
    • Journal of the Korean Chemical Society
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    • v.37 no.6
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    • pp.549-554
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    • 1993
  • The titanium oxide thin film was prepared by air oxidation and water vapor oxidation. The photo-electrochemical properties of the electrode was studied in 1M NaOH solution. Titanium dioxide electrodes prepared at higher temperatures were found to have slightly more negative flat band potentials and slightly higher donor densities than their low temperature counterparts. The value of flat band potential ($V_{fb}$) was obtained to be -0.95 ∼ -1.1 V by the measurement of photocurrent and Motte-Schottky plots. The photocurrent of visible region was measured in terms of single crystal filter which entirely blocks the UV radiation. The photo-response of electrodes appeared good with the measument by direct current, when the slit of great resolution was used.

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Nitrogen Monoxide Gas Sensing Properties of CuO Nanorods Synthesized by a Hydrothermal Method (수열합성법으로 합성된 산화구리 나노막대의 일산화질소 가스 감지 특성)

  • Park, Soo-Jeong;Kim, Hyojin;Kim, Dojin
    • Korean Journal of Materials Research
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    • v.24 no.1
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    • pp.19-24
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    • 2014
  • We report the nitrogen monoxide (NO) gas sensing properties of p-type CuO-nanorod-based gas sensors. We synthesized the p-type CuO nanorods with breadth of about 30 nm and length of about 330 nm by a hydrothermal method using an as-deposited CuO seed layer prepared on a $Si/SiO_2$ substrate by the sputtering method. We fabricated polycrystalline CuO nanorod arrays at $80^{\circ}C$ under the hydrothermal condition of 1:1 morality ratio between copper nitrate trihydrate [$Cu(NO_2)_2{\cdot}3H_2O$] and hexamethylenetetramine ($C_6H_{12}N_4$). Structural characterizations revealed that we prepared the pure CuO nanorod array of a monoclinic crystalline structure without any obvious formation of secondary phase. It was found from the gas sensing measurements that the p-type CuO nanorod gas sensors exhibited a maximum sensitivity to NO gas in dry air at an operating temperature as low as $200^{\circ}C$. We also found that these CuO nanorod gas sensors showed reversible and reliable electrical response to NO gas at a range of operating temperatures. These results would indicate some potential applications of the p-type semiconductor CuO nanorods as promising sensing materials for gas sensors, including various types of p-n junction gas sensors.

Electrical and Optical Properties of ITZO Thin Films Deposited by RF Magnetron Sputtering (고주파 마그네트론 스퍼터링법에 의해 제작된 ITZO (indium tin zinc oxide) 박막의 전기적 및 광학적 특성)

  • Seo, Jin-Woo;Joung, Yang-Hee;Kang, Seong-Jun
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.17 no.8
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    • pp.1873-1878
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    • 2013
  • ITZO ($In_2O_3$ : $SnO_2$ : ZnO = 90wt.% : 5wt.% : 5wt.%) thin films were fabricated on glass substrates (Eagle 2000) at room temperature with various working pressures (1~7 mTorr) by RF magnetron sputtering. The influence of the working pressure on the structural, electrical, and optical properties of the ITZO thin films were investigated. The XRD and FESEM results showed that all ITZO thin films are amorphous structures with very smooth surfaces regardless of the working pressure. Amorphous ITZO thin films deposited at 3 mTorr showed the best properties, such as a low resistivity, high transmittance, and figure of merit of $3.08{\times}10^{-4}{\Omega}{\cdot}cm$, 81 %, and $10.52{\times}10^{-3}{\Omega}^{-1}$, respectively.

A STUDY ON THE RELATIONSHIP BETWEEN PLASMA CHARACTERISTICS AND FILM PROPERTIES FOR MgO BY PULSED DC MAGNETRON SPUTTERING

  • Nam, Kyung H.;Chung, Yun M.;Han, Jeon G.
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2001.11a
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    • pp.35-35
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    • 2001
  • agnesium Oxide (MgO) with a NaCI structure is well known to exhibit high secondary electron emission, excellent high temperature chemical stability, high thermal conductance and electrical insulating properties. For these reason MgO films have been widely used for a buffer layer of high $T_c$ superconducting and a protective layer for AC-plasma display panels to improve discharge characteristics and panel lifetime. Up to now MgO films have been synthesized by lE-beam evaporation, Molecular Beam Epitaxy (MBE) and Metalorganic Chemical Vapor Deposition (MOCVD), however there have been some limitations such as low film density and micro-cracks in films. Therefore magnetron sputtering process were emerged as predominant method to synthesis high density MgO films. In previous works, we designed and manufactured unbalanced magnetron source with high power density for the deposition of high quality MgO films. The magnetron discharges were sustained at the pressure of O.lmtorr with power density of $110W/\textrm{cm}^2$ and the maximum deposition rate was measured at $2.8\mu\textrm{m}/min$ for Cu films. In this study, the syntheses of MgO films were carried out by unbalanced magnetron sputtering with various $O_2$ partial pressure and specially target power densities, duty cycles and frequency using pulsed DC power supply. And also we investigated the plasma states with various $O_2$ partial pressure and pulsed DC conditions by Optical Emission Spectroscopy (OES). In order to confirm the relationships between plasma states and film properties such as microstructure and secondary electron emission coefficient were analyzed by X-Ray Diffraction(XRD), Transmission Electron Microscopy(TEM) and ${\gamma}-Focused$ Ion Beam (${\gamma}-FIB$).

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Comparative Evaluation of Mn Substitution in a Framework Site in MnAPSO-34 and Mn-impregnated SAPO-34 Molecular Sieves Studied by Electron Spin Resonance and Electron Spin-Echo Modulation Spectroscopy

  • Gernho Back;Cho, Young-Soo
    • Proceedings of the Korean Magnetic Resonance Society Conference
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    • 2002.08a
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    • pp.80-80
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    • 2002
  • MnPSO-34 and Mn-impregnated SAPO-34 (Mn-SAPO-34) sample were prepared with various manganese contents and studied by electron spin resonance (ESR) and electron spin-echo modulation (ESEM). Electron spin-echo modulation analysis of 0.07mol % Mn(relative to p) in MnAPSO-34 with adsorbed D$_2$O shows two deuteriums at 0.25 nm and two at 0.36 nm from Mn. This suggests that two waters hydrate an MnO4 configuration with a D-O bond orientation for the waters as expect for a negatively charged site at low manganese content (0.07 mol%), the ESR spectra of MnAPSO-34 and MnH-SAPO-34 exhibit the same parameters (g 2.02 and A 87 G), but the spectra obtained from MnAPSO-34 samples are better resolved. TGA of as-synthesized MnAPSO-34 shows that the decomposition temperature in the range 200-$600^{\circ}C$ of the morpholine is 12$^{\circ}C$ higher than that in as-synthesized MnH-SAPO-34. Infrared spectra shows that the position of a band at about 15 cm-1 toward higher energy in MnAPSO-34 versus MnH-SAPO-34. The modulation depth of the two-pulse ESE of MnAPSO-34 with absorbed D$_2$O is deeper than that of MnH-SAPO-34 with absorbed D$_2$O. Three-pulse ESEM of MnAPSO-34 and MnH-SAPO-34 with absorbed deuterium oxide shows that the local environments of manganese in the hydrated samples are different, suggesting that Mn(II) is framework substituted in MnAPSO-34 since it obviously occupies an extra-framework position in MnH-SAPO-34

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Analysis of mixing ratio of lacquer and glue for lacquer drying in low relative humidity environment (상온저습 환경에서의 옻의 건조를 위한 옻과 교의 배합 분석 연구)

  • Kim, Eun-Kyung;Jeong, Se-Ri;Yu, Jae-Eun
    • 보존과학연구
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    • s.32
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    • pp.37-52
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    • 2011
  • This study investigates the hardening characteristics of the mixture lacquer and glue at room temperature. Diverse samples were made from manufacturing of glue to the adding ratio in sap of the lacquer tree. After the examination of moisture content of samples, it has been seen that there is no relation with glue's kinds or adding ratio, but only with contain level of moisture. The samples made with film shape in order to examine the drying time. Samples with isinglass needed for over three days and had smooth surface. However, samples mixed with animal glue dried within a day and had ripples on the surface because of fast drying rate. In addition, the samples with isinglass had slow change of colour in early step of drying and no colour difference after completely drying although it had significant changes to black oxide as soon as contact with air. In structural analysis with FT-IR showed that the carbonyl bond increased in the samples of mixed with glue, compared to raw lacquer and treated lacquer.

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Hydrogen shallow donors in ZnO and $SnO_2$ thin films prepared by sputtering methods

  • Kim, Dong-Ho;Kim, Hyeon-Beom;Kim, Hye-Ri;Lee, Geon-Hwan;Song, Pung-Geun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.145-145
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    • 2010
  • In this paper, we report that the effects of hydrogen doping on the electrical and optical properties of typical transparent conducting oxide films such as ZnO and $SnO_2$ prepared by magnetron sputtering. Recently, density functional theory (DFT) calculations have shown strong evidence that hydrogen acts as a source of n-type conductivity in ZnO. In this work, the beneficial effect of hydrogen incorporation on Ga-doped ZnO thin films was demonstrated. It was found that hydrogen doping results a noticeable improvement of the conductivity mainly due to the increases in carrier concentration. Extent of the improvement was found to be quite dependent on the deposition temperature. A low resistivity of $4.0{\times}10^{-4}\;{\Omega}{\cdot}cm$ was obtained for the film grown at $160^{\circ}C$ with $H_2$ 10% in sputtering gas. However, the beneficial effect of hydrogen doping was not observed for the films deposited at $270^{\circ}C$. Variations of the electrical transport properties upon vacuum annealing showed that the difference is attributed to the thermal stability of interstitial hydrogen atoms in the films. Theoretical calculations also suggested that hydrogen forms a shallow-donor state in $SnO_2$, even though no experimental determination has yet been performed. We prepared undoped $SnO_2$ thin films by RF magnetron sputtering under various hydrogen contents in sputtering ambient and then exposed them to H-plasma. Our results clearly showed that the hydrogen incorporation in $SnO_2$ leads to the increase in carrier concentration. Our experimental observation supports the fact that hydrogen acting as a shallow donor seems to be a general feature of the TCOs.

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Control of ZnO Sputtering Growth by Changing Substrate Bias Voltage (ZnO 스퍼터링에서 기판전압의 변화에 의한 성장 조절)

  • Meng, Jun;Choi, Jaewon;Jeon, Wonjin;Jo, Jungyol
    • Journal of the Semiconductor & Display Technology
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    • v.16 no.2
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    • pp.94-97
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    • 2017
  • Amorphous Si has been used for data processing circuits in flat panel displays. However, low mobility of the amorphous Si is a limiting factor for the data transmission speed. Metal oxides such as ZnO have been studied to replace the amorphous Si. ZnO is a wide bandgap (3.3 eV) semiconductor with high mobility and good optical transparency. When ZnO is grown by sputtering with $O_2$ as an oxidizer, there can be many ion species arising from $O_2$ decomposition. $O^+$, $O_2{^+}$, and $O^-$ ions are expected to be the most abundant species, and it is not clear which one contributes to the ZnO growth. We applied alternating substrate voltage (0 V and -70 V) during sputtering growth. We studied changes in transistor characteristics induced by the voltage switching. We also compared ZnO grown by dc and rf sputtering. ZnO film was grown at $450^{\circ}C$ substrate temperature. ZnO thin-film transistor grown with these methods showed $7.5cm^2/Vsec$ mobility, $10^6$ on-off ratio, and -2 V threshold voltage.

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Current status and issues on prevention from the biological damage of cultural property (국내 문화재 생물피해 방제의 현황과 과제)

  • Choi, Yu Ri;Kang, Dai Ill
    • Korean Journal of Heritage: History & Science
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    • v.48 no.3
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    • pp.138-153
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    • 2015
  • For preventing the biological damage domestically, insect damage control method using chemical medicine has been applied. However, it is trend to avoid existing chemical medicine such as Methyl bromide because of the problem of being harmful to human body and environment. Therefore, the research for new medicine to replace this has been done and the interest to the physical treatment such as temperature(high & low) treatment, hypoxic treatment, carbon dioxide treatment, and radiation treatment has increased. However the systematic application standard and way has not been established. Therefore, in this research, we are going to organize present condition of domestic cultural asset preventing biological damage after the 1980's. It will also consider the direction through the characteristic of technology, limit, and replacement medicine by examining the past research.