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http://dx.doi.org/10.6109/jkiice.2013.17.8.1873

Electrical and Optical Properties of ITZO Thin Films Deposited by RF Magnetron Sputtering  

Seo, Jin-Woo (Department of Electrical&Semiconductor Engineering, Chonnam National University)
Joung, Yang-Hee (Department of Electrical&Semiconductor Engineering, Chonnam National University)
Kang, Seong-Jun (Department of Electrical&Semiconductor Engineering, Chonnam National University)
Abstract
ITZO ($In_2O_3$ : $SnO_2$ : ZnO = 90wt.% : 5wt.% : 5wt.%) thin films were fabricated on glass substrates (Eagle 2000) at room temperature with various working pressures (1~7 mTorr) by RF magnetron sputtering. The influence of the working pressure on the structural, electrical, and optical properties of the ITZO thin films were investigated. The XRD and FESEM results showed that all ITZO thin films are amorphous structures with very smooth surfaces regardless of the working pressure. Amorphous ITZO thin films deposited at 3 mTorr showed the best properties, such as a low resistivity, high transmittance, and figure of merit of $3.08{\times}10^{-4}{\Omega}{\cdot}cm$, 81 %, and $10.52{\times}10^{-3}{\Omega}^{-1}$, respectively.
Keywords
ITZO thin film; RF magnetron sputtering; Transmittance; Resistivity; Figure of merit;
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