• 제목/요약/키워드: liquid film thickness

검색결과 217건 처리시간 0.027초

열처리효과에 따른 저밀도 폴리에틸렌 박막의 유전특성 (The Dielectric Characteristics of Low Density Polyethylene Film due to Thermal Treatment Effect)

  • 김왕곤;가출현;이용우;홍진웅
    • 한국안전학회지
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    • 제11권1호
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    • pp.67-74
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    • 1996
  • In order to investigate the effect and reliability coming up to properties of the matter due to the change of solid structure in dielectrics, the effect of dielectric characteristics for thermal treated LDPE film was made researches. Specimens of LDPE with thickness 100 [$\mu\textrm{m}$] were investigated into the change of solid structure by ageing. Thermal treated specimen were made, that were after applying heat at 100 [$^{\circ}C$] for 1 [hour] \circled1 air-cooled specimen slowly, \circled2 water-cooled specimen under the ,com temperature, \circled3 liquid nitrogen gas-cooled specimen rapidly. With specimen of thermal treated three types turn out and original, it was for dielectric characteristics to be experimented in the temperature range of 20~120 [$^{\circ}C$], frequency range of 30~1.5${\times}10^5/$[Hz], appling voltage from 300 to 1500[㎷]. Consequently, the degree of crystallinity was changed with 49~57 [%] according to the thermal treatment. In case of frequency, 100 [Hz], on the thermal dependance in dielectric characteristics, tan decreases due to cooling method.

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프르브유닛 소자용 블레이드형 팁 제조방법 (A Fabrication Method of Blade Type Tip for Probe Unit Device)

  • 이근우;이재홍;김창교
    • 전기학회논문지
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    • 제56권8호
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    • pp.1436-1440
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    • 2007
  • Beryllium copper has been known to be an important material for the various fields of industry because it can be used for mechanical and electrical/electronic components that are subjected to elevated temperatures (up to $400^{\circ}C$ for short times). Blade type tip for probing the cells of liquid crystal display(LCD) was fabricated using beryllium copper foil. The dry film resist was employed as a mask for patterning of the blade type tip. The beryllium copper foil was etched using hydrochloric acidic iron-chloride solution. The concentration, temperature, and composition ratio of hydrochloric acidic iron-chloride solution affect the etching characteristics of beryllium copper foil. Nickel with the thickness of $3{\mu}m$ was electroplated on the patterned copper beryllium foil for enhancing its hardness, followed by electroplating gold for increasing its electrical conductivity. Finally, the dry film resist on the bridge was removed and half of the nickel was etched to complete the blade type tip.

Self-catalytic Growth of ${\beta}$-Ga2O3 Nanowires Deposited by Radio-Frequency Magnetron Sputtering

  • 최광현;강현철
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.291.2-291.2
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    • 2013
  • Growth behavior of b-Ga2O3 nanowires (NWs) on sapphire(0001) substrates during radio-frequency magnetron sputtering is reported. Upon fabrication, flat thin films grew initially, subsequent to which, NW bundles were formed on the surface of thin film with increasing film thickness. This transition of the growth mode occurred only at temperatures greater than ${\sim}450^{\circ}C$. The b-Ga2O3 NWs were grown through the self-catalytic vapor-liquid-solid mechanism with self-assembled Ga seeds. Secondary growth of NWs, which occurred from the sides of primary NWs resulting in branched NW structures, was also observed. Finally, the room temperature photoluminescence properties of as-grown and annealed b-Ga2O3 NW samples were investigated.

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鑄鐵에 있어서의 黑鉛球狀化 機構에 關한 硏究 (Ⅱ) (Study on the Spheroidizing Mechanism of Graphite in Cast Iron (II))

  • 최형섭;박원구
    • 대한화학회지
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    • 제8권2호
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    • pp.57-61
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    • 1964
  • It was verified at Part Ⅰ of this investigation that there is a minimum wettability between molten iron and graphite, which was preliminarily coated with magnesium, and thus the spheroidization of graphite might have resulted from the lack of wettability between magnesium-adsorbed graphite and iron matrix. Being continued from the last work, the wettability between pure iron and graphite, coated with the various thickness of cerium, are measured at melting point of pure iron in vacuum and 200 mmHg argon gas atmosphere. The result indicates the presence of a minimum wettability at a critical thickness of cerium film as was proved in the case of magnesium. The experimental analysis shows that, the minimum wettability could be attributed entirely to a minimum work of adhesion between liquid iron and graphite at a critical concentration of cerium in the iron-graphite interface.

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A dryout mechanism model for rectangular narrow channels at high pressure conditions

  • Song, Gongle;Liang, Yu;Sun, Rulei;Zhang, Dalin;Deng, Jian;Su, G.H.;Tian, Wenxi;Qiu, Suizheng
    • Nuclear Engineering and Technology
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    • 제52권10호
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    • pp.2196-2203
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    • 2020
  • A dryout mechanism model for rectangular narrow channels at high pressure conditions is developed by assuming that the Kelvin-Helmholtz instability triggered the occurrence of dryout. This model combines the advantages of theoretical analysis and empirical correlation. The unknown coefficients in the theoretical derivation are supported by the experimental data. Meanwhile, the decisive restriction of the experimental conditions on the applicability of the empirical correlation is avoided. The expression of vapor phase velocity at the time of dryout is derived, and the empirical correlation of liquid film thickness is introduced. Since the CHF value obtained from the liquid film thickness should be the same as the value obtained from the Kelvin-Helmholtz critical stability under the same condition, the convergent CHF value is obtained by iteratively calculating. Comparing with the experimental data under the pressure of 6.89-13.79 MPa, the average error of the model is -15.4% with the 95% confidence interval [-20.5%, -10.4%]. And the pressure has a decisive influence on the prediction accuracy of this model. Compared with the existing dryout code, the calculation speed of this model is faster, and the calculation accuracy is improved. This model, with great portability, could be applied to different objects and working conditions by changing the expression of the vapor phase velocity when the dryout phenomenon is triggered and the calculation formula of the liquid film.

마이크로파 소자용 에피틱시 YIG막의 성장과 특성 (Growth and Characterization of Epitaxial YIG Films for Microwave Devices)

  • 김덕실;조재경
    • 한국자기학회지
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    • 제9권2호
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    • pp.91-97
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    • 1999
  • 막후 4~80$\mu\textrm{m}$의 YIG(Y3FeO12)막을 GGG(Gd3Ga5O12) 기판 상에 수 종류의 화학조성이 서로 다른 Melt를 사용하여 성장 온도를 변화시키며 LPE(Liquid Phase Epitaxy)법으로 에피탁시 성장시켰다. 제조한 막의 성장속도, 표면 형상, 화학 조성, 격자상수, 포화 자화, 자기공명특성을 조사했다. 기판과 막간의 격자상수의 mismatch Δa, 포화자화 그리고 자기공명흡수반치폭 ΔH는 과냉각온도 ΔT가 증가함에 따라 각각 증가, 감소 및 증가하는 경향을 보였다. 또한, R1값이 작은 Melt를 사용한 경우, 동일한 Δa가 증가하면 막후 방향으로의 응력 분포가 불균일해져 막 내부의 자장이 불균일해지기 때문으로 생각된다. 따라서, 마이크로파 손실이 작은 양질의 마이크로파 소자용 YIG막을 제조하기 위해서는 R1값이 크고 R3값이 작은 Melt를 사용하여 ΔT가 작은 영역에서 막을 성장시켜 ΔT가 작은 영역에서 막을 성장시켜 Δa를 작게 해야만 한다.

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Preparation of Si(Al)ON Precursor Using Organoaluminum Imine and Poly (Phenyl Carbosilane), and the Compositional Change of the Film with Different Heat Treatment Condition

  • Lee, Yoonjoo;Shin, Dong-Geun;Kwon, Woo Teck;Kim, Soo Ryong;Kim, Younghee
    • 한국세라믹학회지
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    • 제52권4호
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    • pp.243-247
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    • 2015
  • Si(Al)ON precursor was synthesized by formation of new Si-N bond using organoaluminum imine and liquid type poly(phenyl carbosilane). It was decomposed between $200-600^{\circ}C$, and the ceramic yield was 51% after pyrolysis. 150 - 200 nm in thickness of coating film was obtained by spin coating method. The precursor was easily oxidized during process because it was unstable in air. However the oxygen content was limited to 0.5 - 0.7 to silicon in heat treatment step. Even though the content of nitrogen was decreased by pyrolysis, Al-N and Si-N bonds were formed in ammonia atmosphere, and Si(Al)ON film was formed with 0.2 in content to silicon.

ALD 공정을 이용한 플렉시블 유기태양전지용 투명전극 형성 (Fabrication of a Transparent Electrode for a Flexible Organic Solar Cell in Atomic Layer Deposition)

  • 송근수;김형태;유경훈
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2011년도 춘계학술대회 초록집
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    • pp.121.2-121.2
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    • 2011
  • Aluminum-doped Zinc Oxide (AZO) is considered as an excellent candidate to replace Indium Tin Oxide (ITO), which is widely used as transparent conductive oxide (TCO) for electronic devices such as liquid crystal displays (LCDs), organic light emitting diodes (OLEDs) and organic solar cells (OSCs). In the present study, AZO thin film was applied to the transparent electrode of a channel-shaped flexible organic solar cell using a low-temperature selective-area atomic layer deposition (ALD) process. AZO thin films were deposited on Poly-Ethylene-Naphthalate (PEN) substrates with Di-Ethyl-Zinc (DEZ) and Tri-Methyl-Aluminum (TMA) as precursors and $H_2O$ as an oxidant for the atomic layer deposition at the deposition temperature of $130^{\circ}C$. The pulse time of TMA, DEZ and $H_2O$, and purge time were 0.1 second and 20 second, respectively. The electrical and optical properties of the AZO films were characterized as a function of film thickness. The 300 nm-thick AZO film grown on a PEN substrate exhibited sheet resistance of $87{\Omega}$/square and optical transmittance of 84.3% at a wavelength between 400 and 800 nm.

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ZnO:Al투명전도막의 전기적 특성에 미치는 Bias 전압의 영향 (Effect of substrate bias on electrical properties of ZnO:Al transparent conducting film)

  • 박강일;김병섭;임동건;이수호;곽동주
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.408-411
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    • 2003
  • Al doped Zinc Oxide(ZnO:Al) films, which is widely used as a transparent conductor in optoelectronic devices such as solar cell, liquid crystal display, plasma display panel, thermal heater, and other sensors, were prepared by using the capacitively coupled DC magnetron sputtering method. The influence of the substrate temperature, working gas pressure, discharge power and doping amounts of Al on the electrical, optical and morphological properties were investigated experimentally. The effect of bias voltage on the electrical properties of ZnO thin film were also studied. Films with lowest resistivity of $5.4{\times}10^{-4}\;{\Omega}-cm$ have been achieved in case of films deposited at 1mtorr, $400^{\circ}C$ with a substrate bias of +10V for 840nm in film thickness.

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Temperature Analysis for the Linear Cell in the Vapor Deposition Process

  • Choi Jongwook;Kim Sungcho;Kim Jeongsoo
    • Journal of Mechanical Science and Technology
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    • 제19권6호
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    • pp.1329-1337
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    • 2005
  • The OLED (Organic Light Emitting Diodes) display recently used for the information indicating device has many advantages over the LCD (Liquid Crystal Display), and its demand will be increased highly. The linear cell should be designed carefully considering the uniformity of thin film on the substrate. Its design needs to compute the temperature field analytically because the uniformity for the thin film thickness depends on the temperature distribution of the source (organic material). In the present study, the design of the linear cell will be modified or improved on the basis of the temperature profiles obtained for the simplified linear cell. The temperature distributions are numerically calculated through the STAR-CD program, and the grids are generated by means of the ICEM CFD program. As the results of the simplified linear cell, the temperature deviation was shown in the parabolic form among the both ends and the center of the source. In order to reduce the temperature deviation, the configuration of the rectangular ends of the crucible was modified to the circular type. In consequence, the uniform temperature is maintained in the range of about 90 percent length of the source. It is expected that the present methods and results on the temperature analysis can be very useful to manufacture the vapor deposition device.