• Journal of the Korean Electrochemical Society
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• v.22 no.2
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• pp.60-68
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• 2019

High-voltage operation of the lithium ion battery is one of the advantageous approaches to obtain high energy capacity without changing the conventional cell components and structure. However, operating at harsh condition inevitably results in severe side reactions at the electrode surface and structural disintegration of active material particles. Herein we coated layers composed of $Al_2O_3$ and ZnO on the electrode based on NCM using atomic layer deposition (ALD). Thicker layers of novel Al-doped ZnO (AZO) coating compared to conventional ALD coated layers are prepared. Cathode based on NCM with the varying AZO coating thickness are fabricated and used for coin cell assembly. Effect of ALD coating thickness on the charge-discharge cycle behavior obtained at high-voltage operation was investigated.

• Journal of the Korean Ceramic Society
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• v.31 no.8
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• pp.927-933
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• 1994

Alumina composite membranes were prepared by chemical vapor deposition (CVD) using aluminum-tri-isopropoxide as a precursor. Porous alumina supports were used in deposition, which were in disk shape with mean pore diameter of 0.1 ${\mu}{\textrm}{m}$ and prepared by slip-coasting process. film deposition morphology on porous support was simulated through depositing alumina film on polycrystalline silicon pattern, and its step coverage observed by SEM showed one deviated from uniform step coverage. N2 permeability through composite membranes and the pressure dependence decreased as the deposition time increased. Initially, the N2 permeability of the top layer was tend to decrease rapidly, and then the degree of decrease in N2 permeability was tend to diminish with deposition time. The N2 permeability increased with heat treatment temperature and the crack was generated in top layer at 100$0^{\circ}C$.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.10
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• pp.88-95
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• 2006

Cold gas dynamic spray is a relatively new coating process by which coatings can be produced without significant heating during the process. Cold-spray uses supersonic gas flow to carry metallic powders to the substrate. Its low process temperature can minimize thermal stress and also reduce the deformation of the substrate. Most researches on cold-spray have focused on micro scale coating, but in this study macro scale deposition was conducted. Properties of aluminum layer by cold-spray deposition such as coefficient of thermal expansion (CTE), modulus of elasticity. hardness, and electric conductivity were measured. The results showed that properties of aluminum layer by cold-spray deposition were different from properties of pure aluminum and aluminum alloy.

• Journal of Magnetics
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• v.15 no.1
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• pp.17-20
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• 2010

The relationship between ferromagnet anisotropic magnetization and the antiferromagnet atomic spin configuration was investigated for various angles of the uniaxial deposition magnetic field of the FeMn layer in the Corning glass/Ta(5nm)/NiFe(7nm)/FeMn(25nm)/Ta(5nm) multilayer that was prepared by the ion beam sputter deposition. The exchange bias field ($H_{ex}$) obtained from the measurement of the easy-axis MR loop decreased to 40 Oe at the deposition field angle of $45^{\circ}$, and to 0 Oe at the angle of $90^{\circ}$. When the difference between the uniaxial axis between the ferromagnet NiFe and the antiferromagnet FeMn was $90^{\circ}$, the strong antiferromagnetic dipole moment of FeMn caused the weak ferromagnetic dipole moment of NiFe to rotate in the interface.

• Journal of Welding and Joining
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• v.34 no.4
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• pp.17-22
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• 2016

In this study, we compared the physical and chemical properties evaluation for each size in the SUS316L metal powder produced by water atomization and gas atomization. and we analyzed the experimental data in order to find the basis of a suitable metal powder (SUS316L) for DED (Direct Energy Deposition) processing. Also it evaluated the properties of each layered surface and cross section according to the number of deposition and deposition speed. In the result of optical microscopy measurements, the metal powder by water atomization was the crack generated between the deposition layer, the deposition layer was poor quality. However, metal powder by gas atomization was obtained a relatively good deposition results than metal powder by water atomization.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.4
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• pp.357-361
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• 2006

The electrical performances of organic thin-film transistors (OTFTs) have been improved for the last decade. In this paper, it was demonstrated that the electrical characteristics of the organic thin film transistors (OTFTs) were improved by using polymeric material as adhesion layer on gate insulator. We have investigated OTFTs with polyimide adhesion layer which was fabricated by vapor deposition polymerization (VDP) processing and formed by co-deposition of 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride and 4,4'-oxydianiline. It was found that the OTFTs with adhesion layer showed better electrical characteristics than with bare layer because of good matching between semiconductor and gate insulator. Our devices of performance are field effect mobility of $0.4cm^2/Vs$, threshold voltage of -0.8 V and on-off current ratio of $10^6$. In addition, to improve the electrical characteristics of OTFT, we have reduced the thickness of adhesion layer up to a few nanometrs.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.70-71
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• 2005

The electrical performances of organic thin-film transistors (OTFTs) have been improved for the last decade. In this paper, it was demonstrated that the electrical characteristics of the organic thin film transistors (OTFTs) were improved by using polymeric material as adhesion layer on gate insulator. We have investigated OTFTs with polyimide adhesion layer which was fabricated by vapor deposition polymerization (VDP) processing and formed by co-deposition of 6FDA and ODA. It was found that the OTFTs with adhesion layer showed better electrical characteristics than with bare layer because of good matching between semiconductor and gate insulator. Our devices of performance are field effect mobility of $0.4cm^2$/Vs, threshold voltage of -0.8 V and on-of current ratio of $10^6$. In addition, to improve the electrical characteristics of OTFT, we have reduced the thickness of adhesion layer up to a few nanometrs.

• Journal of Ceramic Processing Research
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• v.18 no.11
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• pp.810-814
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• 2017

Proton exchange membrane fuel cells (PEMFCs) are some of the most efficient electrochemical energy sources for transportation applications because of their clean, green, and high efficiency characteristics. The optimization of catalyst layer morphology is considered a feasible approach to achieve high performance of PEMFC membrane electrode assembly (MEA). In this work, we studied the effect of the solvent on the catalyst layer of PEMFC MEAs fabricated using the electrostatic spray deposition method. The catalyst ink comprised of Pt/C, a Nafion ionomer, and a solvent. Two types of solvent were used: isopropyl alcohol (IPA) and dimethylformamide (DMF). Compared with the catalyst layer prepared using IPA-based ink, the catalyst layer prepared with DMF-based ink had a dense structure because the DMF dispersed the Pt/C-Nafion agglomerates smaller and more homogeneously. The size distribution of the agglomerates in catalyst ink was confirmed through Dynamic Light Scattering (DLS) and the microstructure of the catalyst layer was compared using field emission scanning electron microscopy (FE-SEM). In addition, the electrochemical investigation was performed to evaluate the solvent effect on the fuel cell performance. The catalyst layer prepared with DMF-based ink significantly enhanced the cell performance (1.2 A cm-2 at 0.5 V) compared with that fabricated using IPA-based ink (0.5 A cm-2 at 0.5 V) due to the better dispersion and uniform agglomeration on the catalyst layer.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.395-395
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• 2012

We fabricate organic-inorganic hybrid thin film for the purpose of encapsulation by molecular layer deposition (MLD) using Trimethylaluminium (TMA) and Adipoyl Chloride (AC). Ellipsometry was employed to verify self limiting reaction of ALD. Linear relationship between number of cycle and thickness was obtained. We found that desirable organic thin film fabrication is possible by MLD surface reaction in nanoscale. Purging was carried out after dosing of each precursor to form monolayer in each sequence. We also confirmed roughness of the organic thin film by atomic force microscopy. We deposit TMA and AC at $70^{\circ}C$ and that 1.78A root mean square was obtained which indicates that uniform organic thin film was formed. We confirmed precursor's functional group by IR spectrum. We calculated WVTR of organic-inorganic hybrid super-lattice epitaxial layer using Ca test. WVTR indicates superlattice film can be possibly use as encapsulation in flexible devices.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.28 no.7
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• pp.415-418
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• 2015

In this paper, $TiO_2$ based thin-film transistors (TFTs) were fabricated using by an atomic layer deposition with high aspect ratio and excellent step coverage. $TiO_2$ semiconducting layer was deposited showing a rutile phase through the rapid thermal annealing process, and exhibited TFT characteristics with a $200{\mu}m$ channel length of low-leakage currents (none of current flow during off-state), stable threshold voltages (-10 V ~ 0 V), and a much higher on/off current ratio (<$10^5$), respectively.