• 제목/요약/키워드: laser diffraction

검색결과 538건 처리시간 0.022초

PLD로 증착된 YBCO 박막의 두께에 따른 배향성과 전기적 특성 변화 (Thickness Effect on the Structural and Electrical Properties of YBCO Thin Films Grown by Pulsed Laser Deposition)

  • 허창회;한경보;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.617-619
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    • 2001
  • The effect of the superconducting film thickness on the substrate temperature has been investigated. Superconducting YBCO thin films have been grown on MgO substrates by pulsed laser deposition. The dependence of the orientation of YBCO film on thickness has been investigated by X-ray diffraction technique. X-ray diffraction indicated that the film orientation was changed by increasing the film thickness and by changing the substrate temperature.

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펄스 레이저 애블레이션이 결합된 고전압 방전 플라즈마 장치를 이용한 유전성 질화탄소 박막의 합성 (Formation of dielectric carbon nitride thin films using a pulsed laser ablation combined with high voltage discharge plasma)

  • 김종일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.208-211
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    • 2003
  • The dielectric carbon nitride thin films were deposited onto Si(100) using a pulsed laser ablation of pure graphite target combined with a high voltage discharge plasma in nitrogen gas atmosphere. We can be calculated dielectric constant, ${\varepsilon}_s$, with a capacitance Sobering bridge method. We reported to investigate the influence of the laser ablation of graphite target and DC high voltage source for the plasma. The properties of the deposited carbon nitride thin films were influenced by the high voltage source during the film growth. Deposition rate of carbon nitride films were found to increase drastically with the increase of high voltage source. Infrared absorption clearly shows the existence of C=N bonds and $C{\equiv}N$ bonds. The carbon nitride thin films were observed crystalline phase, as confirmed by x-ray diffraction data.

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펄스 레이저 애블레이션이 결합된 고전압 방전 플라즈마 장치를 이용한 유전성 질화탄소 박막의 합성 (Formation of Dielectric Carbon Nitride Thin Films using a Pulsed Laser Ablation Combined with High Voltage Discharge Plasma)

  • 김종일
    • 한국전기전자재료학회논문지
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    • 제16권7호
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    • pp.641-646
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    • 2003
  • The dielectric carbon nitride thin films were deposited onto Si(100) substrate using a pulsed laser ablation of pure graphite target combined with a high voltage discharge plasma in the presence of a N$_2$ reactive gas. We calculated dielectric constant, $\varepsilon$$\_$s/, with a capacitance Schering bridge method. We investigated the influence of the laser ablation of graphite target and DC high voltage source for the plasma. The properties of the deposited carbon nitride thin films were influenced by the high voltage source during the film growth. Deposition rate of carbon nitride films were increased drastically with the increase of high voltage source. Infrared absorption clearly shows the existence of C=N bonds and C=N bonds. The carbon nitride thin films were observed crystalline phase confirmed by x-ray diffraction data.

Multiple Order Diffractions by Laser-Induced Transient Grating in Nematic MBBA Film

  • 김성규;김학진
    • Bulletin of the Korean Chemical Society
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    • 제20권6호
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    • pp.705-711
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    • 1999
  • The laser-induced transient grating method is applied to study the dynamics of the nematic MBBA film. The nanosecond laser pulses of 355 nm are used to make the transient grating and the cw He-Ne laser of 633 nm is used to probe the dynamics. Strong multiple order diffractions are observed at high nematic temperatures. The reordering process induced by the phototransformed state, which is the locally melted state from the nematic sample, is attributed to the main origin of the multiple order diffractions from the nematic MBBA. The characteristics of the multiple order gratings are discussed with the grating profiles simulated from the multiple diffraction signals.

Ag/AsGeSeS 다층 박막의 홀로그래픽 격자 형성 (Holographic grating formation of Ag/AsGeSeS multi layer)

  • 나선웅;박종화;여철호;신경;이영종;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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    • pp.133-136
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    • 2001
  • In this paper, we investigated the diffraction efficiency of polarization holography using by amorphous $Ag/As_{40}Ge_{10}Se_{15}S_{35}$ multi-layer thin films by He-Ne laser. Multi-layer structures were formed by alternating a layer of meta1(Ag) and chalcogenide( $Ag/As_{40}Ge_{10}Se_{15}S_{35}$ ). The holographic grating in these thin flims has been formed using a linealy polarized He-Ne laser light (633nm). The diffraction efficiency was investigated the two sample of $Ag/As_{40}Ge_{10}Se_{15}S_{35}-7$ layers and $Ag/As_{40}Ge_{10}Se_{15}S_{35}-15$ layers. As the results, we found that the diffraction efficiency of $Ag/As_{40}Ge_{10}Se_{15}S_{35}-7$ layers and $Ag/As_{40}Ge_{10}Se_{15}S_{35}-15$ layers were 1.7% and 2.5% respectively.

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Ag/AsGeSeS 다층 박막의 홀로그래픽 격자 형성 (Holographic grating formation of Ag/AsGeSeS multi layer)

  • 나선웅;박종화;여철호;신경;이영종;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.133-136
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    • 2001
  • In this paper, we investigated the diffraction efficiency of polarization holography using by amorphous Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/ multi-layer thin films by He-Ne laser. Multi-layer structures were formed by alternating a layer of metal(Ag) and chalcogenide(As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/). The holographic grating in these thin films has been formed using a lineally polarized He-Ne laser light (633nm). The diffraction efficiency was investigated the two sample of Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-7 layers and Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-15 layers. As the results, we found that the diffraction efficiency of Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-7 layers and Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-15 layers were 1.7% and 2.5% respectively

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DIAL용 XeCl 레이저펌핑 쌍공진기색소레이저의 파장가변특성 (Wavelength tunability of XeCl laser pumped double-resonator dye laser for DIAL)

  • 이용우;이주희
    • 한국광학회지
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    • 제7권3호
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    • pp.238-243
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    • 1996
  • XeCl 레이저로 펌핑하는 쌍공진기 색소레이저와 2단 증폭시스템을 개발하여 DIAL시스템에 적합한 두개의 파장을 동시 또는 순차적으로 출력하였다. 개발된 쌍공진기는 1200g/mm의 회절격자를 갖는 grazing-incidence 방법에서 제1차 및 제2차 회절차수를 이용하여 구성되었다. 출력특성은 스펙트럼 선폭이 10pm이하이고 펌프 에너지에 대한 전체효율은 6% 이상이다. 또한, 파장가변 영역은 제1차 및 제2차의 회절차수에 대해 각각 434-470nm, 436-468nm이며 2단의 증폭기의 증폭이득은 37dB, 추출효율은 9%이다. 개발된 레이저 증폭시스템에서 Coumarine-450의 색소로 발진하고 이의 출력 6mJ을 DIAL 시스템의 레이저 광으로 전송하여 수원 상공의 NO$_{2}$가스 농도분포를 측정하였다. 이 결과 개발된 색소레이저 시스템은 DIAL의 레이저 광원으로 매우 적합함을 확인하였다.

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반도체 레이저용 홀로그래픽 시준 렌즈 설계 제작 (Design and Fabrication of Holographic Collimating Lens for Semiconductor Laser)

  • 임용석;곽종훈;최옥식
    • 한국광학회지
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    • 제9권3호
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    • pp.191-198
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    • 1998
  • 비점수차를 갖는 반도체 레이저에서 off-axis 흘로그램 렌즈를 이용하여 수차 제거 방법에 대해 논하였다. Dichromated gelatin 필름을 사용하여 높은 회절효율과 off-axis 방향으로 비점수차 없이 시준되는 반도체 레이저용 호로그래픽 시준 렌즈를 제작하였다. 홀로그램 렌즈는 홀로그래픽 회절과 광선추적(ray-tracing) 방법에 의해 계산 설게하였다. 비점수차의 제거는 기록 및 재생 각도를 적당히 선택하므로서 얻을 수 있다. 홀로그램은 488nm 파장인 Ar+ 레이저를 사용하여 기록하였고, 670nm 파장인 반도체 레이저광으로 재생하였다. 주요 피라미터인 기록 및 재생 각도, 파장, 그리고 비점수차 등을 계산하고 실험적으로 검증하였다.

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Sediment monitoring for hydro-abrasive erosion: A field study from Himalayas, India

  • Rai, Anant Kr.;Kumar, Arun
    • International Journal of Fluid Machinery and Systems
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    • 제10권2호
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    • pp.146-153
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    • 2017
  • Sediment flow through hydropower components causes hydro-abrasive erosion resulting in loss of efficiency, interruptions in power production and downtime for repair/maintenance. Online instruments are required to measure/capture the variations in sediment parameters along with collecting samples manually to analyse in laboratory for verification. In this paper, various sediment parameters viz. size, concentration (TSS), shape and mineral composition relevant to hydro-abrasive erosion were measured and discussed with respect to a hydropower plant in Himalayan region, India. A multi-frequency acoustic instrument was installed at a desilting chamber to continuously monitor particle size distribution (PSD) and TSS entering the turbine during 27 May to 6 August 2015. The sediment parameters viz. TSS, size distribution, mineral composition and shape entering the turbine were also measured and analysed, using manual samples collected twice daily from hydropower plant, in laboratory with instruments based on laser diffraction, dynamic digital image processing, gravimetric method, conductivity, scanning electron microscope, X-ray diffraction and turbidity. The acoustic instrument was able to capture the variation in TSS; however, significant deviations were found between measured mean sediment sizes compared to values found in the laboratory. A good relation was found for turbidity ($R^2=0.86$) and laser diffraction ($R^2=0.93$) with TSS, which indicated that turbidimeter and laser diffraction instrument can be used for continuous monitoring of TSS at the plant. Total sediment load passed through penstock during study period was estimated to be 15,500 ton. This study shall be useful for researchers and hydropower managers in measuring/monitoring sediment for hydro-abrasive erosion study in hydropower plants.

광 회절계를 이용한 격자 피치 표준 시편의 측정 및 불확도 해석 (Measurement of Grating Pitch Standards using Optical Diffractometry and Uncertainty Analysis)

  • 김종안;김재완;박병천;강주식;엄태봉
    • 한국정밀공학회지
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    • 제23권8호
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    • pp.72-79
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    • 2006
  • We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.